TW200710581A - Protective film-forming material for a process of liquid immersion lithography and method of photoresist patterning with it - Google Patents

Protective film-forming material for a process of liquid immersion lithography and method of photoresist patterning with it

Info

Publication number
TW200710581A
TW200710581A TW095117501A TW95117501A TW200710581A TW 200710581 A TW200710581 A TW 200710581A TW 095117501 A TW095117501 A TW 095117501A TW 95117501 A TW95117501 A TW 95117501A TW 200710581 A TW200710581 A TW 200710581A
Authority
TW
Taiwan
Prior art keywords
protective film
liquid immersion
forming material
immersion lithography
film formation
Prior art date
Application number
TW095117501A
Other languages
Chinese (zh)
Inventor
Masaaki Yoshida
Keita Ishiduka
Tomoyuki Hirano
Tomoyuki Ando
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005144270A external-priority patent/JP2006323002A/en
Priority claimed from JP2005344644A external-priority patent/JP2007148167A/en
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200710581A publication Critical patent/TW200710581A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

This invention provides a material for protective film formation for a liquid immersion exposure process, suitable for use in a liquid immersion exposure process, particularly a local exposure liquid immersion process for filling a liquid immersion medium into only between an exposure lens and a substrate comprising a protective film provided on a photoresist layer, the material for protective film formation being formed on a photoresist film, wherein the material for protective film formation comprises a cyclic fluoroalkyl polyether and a fluoro organic solvent, and a method for photoresist pattern formation using the material for protective film formation.
TW095117501A 2005-05-17 2006-05-17 Protective film-forming material for a process of liquid immersion lithography and method of photoresist patterning with it TW200710581A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005144270A JP2006323002A (en) 2005-05-17 2005-05-17 Material for forming photoresist protective film for liquid immersion exposure process, and photoresist pattern forming method using the material
JP2005344644A JP2007148167A (en) 2005-11-29 2005-11-29 Material for protective film formation for liquid immersion exposure process, and method for photoresist pattern formation using the same

Publications (1)

Publication Number Publication Date
TW200710581A true TW200710581A (en) 2007-03-16

Family

ID=37431215

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095117501A TW200710581A (en) 2005-05-17 2006-05-17 Protective film-forming material for a process of liquid immersion lithography and method of photoresist patterning with it

Country Status (2)

Country Link
TW (1) TW200710581A (en)
WO (1) WO2006123643A1 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3979553B2 (en) * 1998-06-12 2007-09-19 東京応化工業株式会社 Coating liquid composition for forming antireflection film and resist material using the same
TW200424767A (en) * 2003-02-20 2004-11-16 Tokyo Ohka Kogyo Co Ltd Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method
JP2005099646A (en) * 2003-03-28 2005-04-14 Tokyo Ohka Kogyo Co Ltd Resist composition for liquid immersion lithography process, and resist pattern forming method using it
JP2005173474A (en) * 2003-12-15 2005-06-30 Tokyo Ohka Kogyo Co Ltd Resist composition for liquid immersion exposure process and method for forming resist pattern by using the resist material

Also Published As

Publication number Publication date
WO2006123643A1 (en) 2006-11-23

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