TW200708633A - Composition for removing photoresist and transparent conducting film - Google Patents

Composition for removing photoresist and transparent conducting film

Info

Publication number
TW200708633A
TW200708633A TW095131205A TW95131205A TW200708633A TW 200708633 A TW200708633 A TW 200708633A TW 095131205 A TW095131205 A TW 095131205A TW 95131205 A TW95131205 A TW 95131205A TW 200708633 A TW200708633 A TW 200708633A
Authority
TW
Taiwan
Prior art keywords
conducting film
transparent conducting
composition
remover
photoresist
Prior art date
Application number
TW095131205A
Other languages
Chinese (zh)
Other versions
TWI402377B (en
Inventor
Byung-Uk Kim
Suk-Il Yoon
Wy-Yong Kim
Soon-Beom Huh
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of TW200708633A publication Critical patent/TW200708633A/en
Application granted granted Critical
Publication of TWI402377B publication Critical patent/TWI402377B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2068—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/34—Organic compounds containing sulfur
    • C11D3/3472—Organic compounds containing sulfur additionally containing -COOH groups or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The invention relates to a composition of a stripping solution for removing a photoresist and a transparent conducting film. More particularly, the invention provides a remover which is able to remove an organic-acid transparent conducting film on a semiconductor device, and a stripping solution comprising the remover and a bi-component stripping solution consisting of organo-amine and solvent. The composition of the invention may further comprise a glycol ether compound serving as an anti-isolation resistant. The composition of the invention has the remover which may remove an organic-acid transparent conducting film, thereby being capable of removing the transparent conducting film. The remover of transparent conducting film includes sulfur, thereby serving as a corrosion inhibitor inhibiting the corrosion of a metal layout in the lower metal films. Therefore, in the condition of maintaining metal patterns made by the present LCD process, the invention not only removes the photoresist having formed patterns, but also optionally or wholly removes the transparent electrode coated on the photoresist and removes the transparent electrode on the metal layout.
TW095131205A 2005-08-25 2006-08-24 Composition for removing photoresist and transparent conducting film TWI402377B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050078244A KR101285123B1 (en) 2005-08-25 2005-08-25 Composition for removing photoresist and transparent conducting film

Publications (2)

Publication Number Publication Date
TW200708633A true TW200708633A (en) 2007-03-01
TWI402377B TWI402377B (en) 2013-07-21

Family

ID=37778420

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095131205A TWI402377B (en) 2005-08-25 2006-08-24 Composition for removing photoresist and transparent conducting film

Country Status (3)

Country Link
KR (1) KR101285123B1 (en)
CN (1) CN1920672B (en)
TW (1) TWI402377B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI588253B (en) * 2012-03-16 2017-06-21 巴地斯顏料化工廠 Photoresist stripping and cleaning composition, method of its preparation and its use

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3403187B2 (en) * 2001-08-03 2003-05-06 東京応化工業株式会社 Stripping solution for photoresist
JP3738992B2 (en) * 2001-12-27 2006-01-25 東京応化工業株式会社 Photoresist stripping solution
EP1335016A1 (en) * 2002-02-06 2003-08-13 Shipley Company LLC Cleaning composition
JP3516446B2 (en) * 2002-04-26 2004-04-05 東京応化工業株式会社 Photoresist stripping method
US20060166846A1 (en) 2002-08-19 2006-07-27 Ying-Hao Li Remover solution
US7384900B2 (en) * 2003-08-27 2008-06-10 Lg Display Co., Ltd. Composition and method for removing copper-compatible resist

Also Published As

Publication number Publication date
TWI402377B (en) 2013-07-21
KR20070023916A (en) 2007-03-02
CN1920672A (en) 2007-02-28
CN1920672B (en) 2011-07-20
KR101285123B1 (en) 2013-07-19

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