TW200706394A - Process for proudcing color filter, color filter and display device - Google Patents
Process for proudcing color filter, color filter and display deviceInfo
- Publication number
- TW200706394A TW200706394A TW095121978A TW95121978A TW200706394A TW 200706394 A TW200706394 A TW 200706394A TW 095121978 A TW095121978 A TW 095121978A TW 95121978 A TW95121978 A TW 95121978A TW 200706394 A TW200706394 A TW 200706394A
- Authority
- TW
- Taiwan
- Prior art keywords
- color filter
- exposure
- photosensitive layer
- display device
- drawing portions
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Sustainable Development (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005182677A JP2008233112A (ja) | 2005-06-22 | 2005-06-22 | カラーフィルタの製造方法、及びカラーフィルタ並びに表示装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200706394A true TW200706394A (en) | 2007-02-16 |
Family
ID=37570373
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095121978A TW200706394A (en) | 2005-06-22 | 2006-06-20 | Process for proudcing color filter, color filter and display device |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2008233112A (zh) |
TW (1) | TW200706394A (zh) |
WO (1) | WO2006137343A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9776362B2 (en) | 2014-10-27 | 2017-10-03 | Industrial Technology Research Institute | Additive manufacturing system and additive manufacturing method |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011064749A (ja) * | 2009-09-15 | 2011-03-31 | Dnp Fine Chemicals Co Ltd | 感光性着色組成物 |
KR20120021488A (ko) * | 2010-08-03 | 2012-03-09 | 주식회사 동진쎄미켐 | 네가티브 감광성 수지 조성물 |
JP5611016B2 (ja) * | 2010-12-07 | 2014-10-22 | 株式会社日立ハイテクノロジーズ | 露光装置、露光方法、及び表示用パネル基板の製造方法 |
CN103958379B (zh) * | 2011-11-04 | 2016-12-28 | 株式会社尼康 | 基板处理装置及基板处理方法 |
KR102259562B1 (ko) * | 2014-03-31 | 2021-06-03 | 엘지디스플레이 주식회사 | 액정표시장치용 노광마스크와 이를 이용한 액정표시장치의 노광방법 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4731787B2 (ja) * | 2002-04-10 | 2011-07-27 | 富士フイルム株式会社 | 露光ヘッド及び露光装置 |
JP2004157219A (ja) * | 2002-11-05 | 2004-06-03 | Fuji Photo Film Co Ltd | 露光ヘッドおよび露光装置 |
JP2004347831A (ja) * | 2003-05-22 | 2004-12-09 | Fuji Photo Film Co Ltd | カラーフィルター |
JP4486323B2 (ja) * | 2003-06-10 | 2010-06-23 | 富士フイルム株式会社 | 画素位置特定方法、画像ずれ補正方法、および画像形成装置 |
-
2005
- 2005-06-22 JP JP2005182677A patent/JP2008233112A/ja active Pending
-
2006
- 2006-06-16 WO PCT/JP2006/312138 patent/WO2006137343A1/ja active Application Filing
- 2006-06-20 TW TW095121978A patent/TW200706394A/zh unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9776362B2 (en) | 2014-10-27 | 2017-10-03 | Industrial Technology Research Institute | Additive manufacturing system and additive manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
WO2006137343A1 (ja) | 2006-12-28 |
JP2008233112A (ja) | 2008-10-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200706394A (en) | Process for proudcing color filter, color filter and display device | |
TW200707122A (en) | Exposure method and apparatus | |
TW200606578A (en) | Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit... | |
US20180052395A1 (en) | Exposure method, substrate and exposure apparatus | |
CN105717737B (zh) | 一种掩膜版及彩色滤光片基板的制备方法 | |
CN104656366B (zh) | 光掩模及其制造方法、图案转印方法、显示装置的制造方法 | |
JP2008310332A (ja) | 液晶表示素子用フォトマスクおよびこれを用いたカラーフィルタの製造方法 | |
US9001305B2 (en) | Ultra-large size flat panel display maskless photolithography system and method | |
TW586149B (en) | Graytone mask producing method | |
TW200739137A (en) | Method for forming surface unevenness | |
TW200710606A (en) | Method for manufacturing internal cell structure, internal cell structure, and display device | |
CN108585537B (zh) | 一种渐变玻璃的制备方法 | |
JP2015012258A5 (zh) | ||
CN103748489B (zh) | 图案相位差膜的制造方法、图案相位差膜及图像显示装置 | |
TW201037467A (en) | Exposition method, fabrication method of color filter and exposition device | |
CN107065312B (zh) | 一种平曲面共用改善液晶显示穿透率的方法 | |
TW200705546A (en) | Process for forming pattern | |
JP2011158718A (ja) | 露光装置、露光方法、及び表示用パネル基板の製造方法 | |
TWI752059B (zh) | 光罩、光罩製造方法、及使用光罩的彩色濾光片之製造方法 | |
WO2007145769A3 (en) | Arrangement for and method of projecting an image to be viewed over extended viewing range | |
TW201306689A (zh) | 形成圖案之方法及採用該方法形成有圖案之殼體 | |
CN100463775C (zh) | 微细结构元件的制造方法及其应用 | |
TW200706975A (en) | Manufacturing method of LCD panel | |
CN1238764C (zh) | 光掩模的制造方法、光掩模、图形转印方法 | |
KR102229514B1 (ko) | 패턴 묘화 방법, 포토마스크의 제조 방법, 포토마스크, 및 표시 장치의 제조 방법 |