TW200704604A - Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same - Google Patents

Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same

Info

Publication number
TW200704604A
TW200704604A TW094147460A TW94147460A TW200704604A TW 200704604 A TW200704604 A TW 200704604A TW 094147460 A TW094147460 A TW 094147460A TW 94147460 A TW94147460 A TW 94147460A TW 200704604 A TW200704604 A TW 200704604A
Authority
TW
Taiwan
Prior art keywords
same
induced birefringence
synthetic silica
low polarization
lithographic device
Prior art date
Application number
TW094147460A
Other languages
Chinese (zh)
Other versions
TWI312768B (en
Inventor
Douglas Clippinger Allan
Dana Craig Bookbinder
Ulrich W H Neukirch
Charlene Marie Smith
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/241,075 external-priority patent/US7589039B2/en
Application filed by Corning Inc filed Critical Corning Inc
Publication of TW200704604A publication Critical patent/TW200704604A/en
Application granted granted Critical
Publication of TWI312768B publication Critical patent/TWI312768B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ.cm-2.pulse-1 and a pulse length of about 25 ns for 5 x 109 pulses.
TW094147460A 2004-12-30 2005-12-29 Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same TWI312768B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US64069604P 2004-12-30 2004-12-30
US64986005P 2005-02-02 2005-02-02
US69610605P 2005-06-30 2005-06-30
US11/241,075 US7589039B2 (en) 2004-12-29 2005-09-30 Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same

Publications (2)

Publication Number Publication Date
TW200704604A true TW200704604A (en) 2007-02-01
TWI312768B TWI312768B (en) 2009-08-01

Family

ID=36293465

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094147460A TWI312768B (en) 2004-12-30 2005-12-29 Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same

Country Status (4)

Country Link
JP (1) JP5538679B2 (en)
DE (1) DE112005003341B4 (en)
TW (1) TWI312768B (en)
WO (1) WO2006074083A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013075827A (en) * 2005-11-07 2013-04-25 Corning Inc Deuteroxyl-doped silica glass, optical member and lithographic system comprising the glass and method for making the glass
US7635658B2 (en) * 2005-11-07 2009-12-22 Corning Inc Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE116448T1 (en) 1989-06-09 1995-01-15 Heraeus Quarzglas OPTICAL PARTS AND BLANKS MADE OF SYNTHETIC SILICON DIOXIDE GLASS AND METHOD FOR THEIR PRODUCTION.
US5325230A (en) 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
US5410428A (en) 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
US5616159A (en) 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
JPH0959034A (en) * 1995-08-22 1997-03-04 Sumitomo Metal Ind Ltd Synthetic quartz glass material and its production
JP3403317B2 (en) * 1997-05-20 2003-05-06 信越石英株式会社 High power synthetic silica glass optical material for vacuum ultraviolet light and method for producing the same
EP1061052B1 (en) * 1998-01-30 2003-07-30 Asahi Glass Co., Ltd. Synthetic silica glass optical members and process for the production thereof
JPH11232681A (en) 1998-02-13 1999-08-27 Fujitsu Ltd Optical information storage device
JP3893816B2 (en) * 1998-10-28 2007-03-14 旭硝子株式会社 Synthetic quartz glass and manufacturing method thereof
US6499317B1 (en) 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
JP3069562B1 (en) * 1999-10-19 2000-07-24 信越石英株式会社 Silica glass optical material for excimer laser and excimer lamp and method for producing the same
EP1330679A4 (en) * 2000-10-03 2006-09-06 Corning Inc Photolithography methods and systems
DE10159961C2 (en) * 2001-12-06 2003-12-24 Heraeus Quarzglas Quartz glass blank for an optical component and method of making and using same
JP4104338B2 (en) * 2002-01-31 2008-06-18 信越石英株式会社 Synthetic quartz glass material for ArF exposure equipment
US7534733B2 (en) * 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage
DE102004017031B4 (en) * 2004-04-02 2008-10-23 Heraeus Quarzglas Gmbh & Co. Kg Quartz glass optical component, method of making the component and use thereof

Also Published As

Publication number Publication date
JP5538679B2 (en) 2014-07-02
TWI312768B (en) 2009-08-01
DE112005003341B4 (en) 2019-01-31
WO2006074083A1 (en) 2006-07-13
JP2008526672A (en) 2008-07-24
DE112005003341T5 (en) 2008-02-28

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