TW200643923A - Tunable magnetic recording medium and its fabricating method - Google Patents

Tunable magnetic recording medium and its fabricating method

Info

Publication number
TW200643923A
TW200643923A TW094119723A TW94119723A TW200643923A TW 200643923 A TW200643923 A TW 200643923A TW 094119723 A TW094119723 A TW 094119723A TW 94119723 A TW94119723 A TW 94119723A TW 200643923 A TW200643923 A TW 200643923A
Authority
TW
Taiwan
Prior art keywords
recording medium
magnetic recording
tunable
fabricating method
underlayer
Prior art date
Application number
TW094119723A
Other languages
English (en)
Other versions
TWI312151B (en
Inventor
An-Cheng Sun
Po-Cheng Kuo
Jen-Hwa Hsu
Huei-Li Huang
Ching-Ray Chang
Original Assignee
Ching-Ray Chang
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ching-Ray Chang filed Critical Ching-Ray Chang
Priority to TW094119723A priority Critical patent/TWI312151B/zh
Priority to US11/334,605 priority patent/US20060280973A1/en
Priority to SG200600411A priority patent/SG128539A1/en
Priority to JP2006060931A priority patent/JP2006351162A/ja
Publication of TW200643923A publication Critical patent/TW200643923A/zh
Application granted granted Critical
Publication of TWI312151B publication Critical patent/TWI312151B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/64Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/658Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368Non-polymeric layer under the lowermost magnetic recording layer
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7369Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851Coating a support with a magnetic layer by sputtering
TW094119723A 2005-06-14 2005-06-14 Tunable magnetic recording medium and its fabricating method TWI312151B (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
TW094119723A TWI312151B (en) 2005-06-14 2005-06-14 Tunable magnetic recording medium and its fabricating method
US11/334,605 US20060280973A1 (en) 2005-06-14 2006-01-19 Tunable magnetic recording medium and its fabricating method
SG200600411A SG128539A1 (en) 2005-06-14 2006-01-20 Tunable magnetic recording medium and its fabricating method
JP2006060931A JP2006351162A (ja) 2005-06-14 2006-03-07 チューナブル磁気記録媒体及びその製作方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094119723A TWI312151B (en) 2005-06-14 2005-06-14 Tunable magnetic recording medium and its fabricating method

Publications (2)

Publication Number Publication Date
TW200643923A true TW200643923A (en) 2006-12-16
TWI312151B TWI312151B (en) 2009-07-11

Family

ID=37524440

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094119723A TWI312151B (en) 2005-06-14 2005-06-14 Tunable magnetic recording medium and its fabricating method

Country Status (4)

Country Link
US (1) US20060280973A1 (zh)
JP (1) JP2006351162A (zh)
SG (1) SG128539A1 (zh)
TW (1) TWI312151B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7993766B2 (en) 2007-12-03 2011-08-09 Ching-Ray Chang Perpendicular magnetic recording medium and method for fabricating the same
TWI421353B (zh) * 2011-03-18 2014-01-01 Univ Nat Taiwan 具奈米級釘紮效應的磁性材料

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5252859B2 (ja) * 2007-08-28 2013-07-31 株式会社東芝 磁性体膜の製造方法および磁性体膜
TWI389107B (zh) * 2009-11-03 2013-03-11 Sheng Chi Chen 具垂直磁異向性之單層鐵磁性合金薄膜
TWI383886B (zh) * 2010-01-08 2013-02-01 Ger Pin Lin 具垂直磁異向性之不連續島狀鐵磁性合金薄膜
CN102163433B (zh) * 2010-02-23 2013-12-25 昭和电工株式会社 热辅助磁记录介质和磁存储装置
CN101886258B (zh) * 2010-07-01 2012-01-18 北方工业大学 一种制备镁合金表面转化耐蚀膜层的方法
JP5346348B2 (ja) * 2011-02-23 2013-11-20 株式会社日立製作所 磁気記録媒体、磁気記録装置
CN102842312B (zh) * 2012-07-17 2015-04-22 东北大学 一种垂直磁记录材料的制备方法
JP6317896B2 (ja) * 2013-07-26 2018-04-25 昭和電工株式会社 磁気記録媒体および磁気記憶装置
CN109136832B (zh) * 2018-08-16 2020-04-24 广州本康环保科技有限公司 一种质量厚度为600-1200μg/cm2自支撑铟薄膜及其制备方法
CN109136831B (zh) * 2018-08-16 2020-04-24 广州本康环保科技有限公司 一种质量厚度为700-1400μg/cm2自支撑锗薄膜及其制备方法
CN109082634B (zh) * 2018-08-16 2020-04-24 广州本康环保科技有限公司 一种质量厚度为500-1000μg/cm2自支撑镓薄膜及其制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08221734A (ja) * 1995-02-20 1996-08-30 Fujitsu Ltd 磁気記録媒体及び磁気記録装置
JP2002541671A (ja) * 1999-03-30 2002-12-03 ドイッチェ テレコム アーゲー 制御キャビネット
JP2001344740A (ja) * 2000-05-26 2001-12-14 Hitachi Ltd 磁気記録媒体及び磁気記憶装置
JP3385004B2 (ja) * 2000-10-11 2003-03-10 秋田県 磁気記録媒体
JP2003217107A (ja) * 2002-01-17 2003-07-31 Fuji Electric Co Ltd 磁気記録媒体
US20040191578A1 (en) * 2003-03-24 2004-09-30 Jingsheng Chen Method of fabricating L10 ordered fePt or FePtX thin film with (001) orientation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7993766B2 (en) 2007-12-03 2011-08-09 Ching-Ray Chang Perpendicular magnetic recording medium and method for fabricating the same
TWI421353B (zh) * 2011-03-18 2014-01-01 Univ Nat Taiwan 具奈米級釘紮效應的磁性材料

Also Published As

Publication number Publication date
TWI312151B (en) 2009-07-11
SG128539A1 (en) 2007-01-30
US20060280973A1 (en) 2006-12-14
JP2006351162A (ja) 2006-12-28

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