TW200636319A - Optical measurement and evaluation method - Google Patents

Optical measurement and evaluation method

Info

Publication number
TW200636319A
TW200636319A TW094141097A TW94141097A TW200636319A TW 200636319 A TW200636319 A TW 200636319A TW 094141097 A TW094141097 A TW 094141097A TW 94141097 A TW94141097 A TW 94141097A TW 200636319 A TW200636319 A TW 200636319A
Authority
TW
Taiwan
Prior art keywords
focusing
automatic
optical system
wafer
image
Prior art date
Application number
TW094141097A
Other languages
Chinese (zh)
Inventor
Tomoaki Yamada
Tatsuo Fukui
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2004343688A external-priority patent/JP2006153621A/en
Priority claimed from JP2004344401A external-priority patent/JP4573163B2/en
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200636319A publication Critical patent/TW200636319A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/34—Systems for automatic generation of focusing signals using different areas in a pupil plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Abstract

To stably perform automatic-focusing by improving non-linear characteristics caused by a ringing phenomenon in an automatic focusing optical system. The automatic focusing apparatus in an optical measuring apparatus including an illumination optical system and an observation optical system 10, is provided with a wedge mirror 23 arranged in almost a pupil position in an automatic focusing optical path, an AF photoelectric conversion element 26 for obtaining an image nearly conjugate to a position detection mark M on a wafer W in response to the reflected light transmitted through the wedge mirror, a focusing position detecting apparatus 31 for calculating a focusing error signal based on an image imaged by the element 26, and a wafer stage 33 for adjusting the position of the wafer in the optical axis direction based on the focusing error signal, and a relay lens 22 arranged in the automatic focusing optical path is shifted in a direction shown by an arrow A so as to shift the focal position of the image by a prescribed amount.
TW094141097A 2004-11-29 2005-11-23 Optical measurement and evaluation method TW200636319A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004343688A JP2006153621A (en) 2004-11-29 2004-11-29 Optical measurement and evaluation method
JP2004344401A JP4573163B2 (en) 2004-11-29 2004-11-29 Autofocus device and autofocus adjustment method

Publications (1)

Publication Number Publication Date
TW200636319A true TW200636319A (en) 2006-10-16

Family

ID=36498173

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094141097A TW200636319A (en) 2004-11-29 2005-11-23 Optical measurement and evaluation method

Country Status (2)

Country Link
TW (1) TW200636319A (en)
WO (1) WO2006057451A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104914551A (en) * 2014-03-12 2015-09-16 玉晶光电(厦门)有限公司 Measuring apparatus and measuring method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11167060A (en) * 1997-12-03 1999-06-22 Nikon Corp Focusing detecting device and method therefor
JP4613357B2 (en) * 2000-11-22 2011-01-19 株式会社ニコン Apparatus and method for adjusting optical misregistration measuring apparatus
JP2002190439A (en) * 2000-12-21 2002-07-05 Nikon Corp Position measurement method and its apparatus, exposure method and aligner, and device-manufacturing method
JP2004102064A (en) * 2002-09-11 2004-04-02 Nikon Corp Image measurement apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104914551A (en) * 2014-03-12 2015-09-16 玉晶光电(厦门)有限公司 Measuring apparatus and measuring method thereof

Also Published As

Publication number Publication date
WO2006057451A1 (en) 2006-06-01

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