TW200624254A - Process for production of substrates having water-repellent hydrophilic films on the surface - Google Patents

Process for production of substrates having water-repellent hydrophilic films on the surface

Info

Publication number
TW200624254A
TW200624254A TW094137930A TW94137930A TW200624254A TW 200624254 A TW200624254 A TW 200624254A TW 094137930 A TW094137930 A TW 094137930A TW 94137930 A TW94137930 A TW 94137930A TW 200624254 A TW200624254 A TW 200624254A
Authority
TW
Taiwan
Prior art keywords
water
repellent
area
production
hydrophilic
Prior art date
Application number
TW094137930A
Other languages
Chinese (zh)
Inventor
Yutaka Furukawa
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of TW200624254A publication Critical patent/TW200624254A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/04—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a surface receptive to ink or other liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/75—Hydrophilic and oleophilic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/76—Hydrophobic and oleophobic coatings

Abstract

The invention provides a novel substrate which has a desired patterning and which has both a water-repellent area and a hydrophilic area; and a process for the production thereof which can dispense with special equipment or long-time irradiation with light. A process for the production of a substrate having a water-repellent hydrophilic film on the surface by conducting the following steps (1) to (3) successively: step (1) of forming on a substrate a surface on which hydrogen atoms bonded to silicon atoms are present, step (2) of reacting part of the hydrogen atoms bonded to silicon atoms with a water-repellent compound (B) which has both an unsaturated bond capable of being hydrosilylated and a water-repellent moiety through hydrosilylation in the presence of a hydrosilylation catalyst to introduce the water-repellent moiety to part of the surface and thus form a surface having a water-repellent area, and step (3) of converting at least part of the residual hydrogen atoms bonded to silicon atoms on the resulting surface from step (2) into hydrophilic groups to introduce a hydrophilic area to the surface and thus form a surface having both a water-repellent area and a hydrophilic area.
TW094137930A 2004-10-28 2005-10-28 Process for production of substrates having water-repellent hydrophilic films on the surface TW200624254A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004313558 2004-10-28

Publications (1)

Publication Number Publication Date
TW200624254A true TW200624254A (en) 2006-07-16

Family

ID=36227939

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094137930A TW200624254A (en) 2004-10-28 2005-10-28 Process for production of substrates having water-repellent hydrophilic films on the surface

Country Status (3)

Country Link
JP (1) JP4661785B2 (en)
TW (1) TW200624254A (en)
WO (1) WO2006046699A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107075349A (en) * 2014-08-07 2017-08-18 大金工业株式会社 Antifouling process composition, processing unit, processing method and processing article
CN107532068A (en) * 2015-04-10 2018-01-02 大金工业株式会社 Antifouling process composition, processing unit, processing method and processing article

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WO2007102785A1 (en) 2006-03-09 2007-09-13 Agency For Science, Technology And Research Apparatus for performing a reaction in a droplet and method of using the same
US9874501B2 (en) 2006-11-24 2018-01-23 Curiox Biosystems Pte Ltd. Use of chemically patterned substrate for liquid handling, chemical and biological reactions
WO2008063135A1 (en) 2006-11-24 2008-05-29 Agency For Science, Technology And Research Apparatus for processing a sample in a liquid droplet and method of using the same
EP2116900A4 (en) * 2007-03-01 2012-06-27 Asahi Glass Co Ltd Processed substrates having water-repellent areas in patterns, process for production thereof, and process for production of members having patterms made of functional material films
EP2028432A1 (en) * 2007-08-06 2009-02-25 Université de Mons-Hainaut Devices and method for enhanced heat transfer
WO2013114217A1 (en) 2012-02-05 2013-08-08 Curiox Biosystems Pte Ltd. Array plates and methods for making and using same
US10725020B2 (en) 2007-11-14 2020-07-28 Curiox Biosystems Pte Ltd. High throughput miniaturized assay system and methods
US8784752B2 (en) 2009-04-17 2014-07-22 Curiox Biosystems Pte Ltd Use of chemically patterned substrate for liquid handling, chemical and biological reactions
JP5618524B2 (en) 2009-11-18 2014-11-05 公益財団法人九州先端科学技術研究所 Device, thin film transistor, and manufacturing method thereof
US9878328B2 (en) 2010-07-23 2018-01-30 Curiox Biosystems Pte Ltd. Apparatus and method for multiple reactions in small volumes
KR20140065351A (en) * 2012-11-21 2014-05-29 신닛테츠 수미킨 가가쿠 가부시키가이샤 Treating agent for inkjet substrate
JP2014122152A (en) * 2012-11-21 2014-07-03 Nippon Steel & Sumikin Chemical Co Ltd Treatment agent for an inkjet base
US9557318B2 (en) 2013-07-09 2017-01-31 Curiox Biosystems Pte Ltd. Array plates for washing samples
WO2016140201A1 (en) * 2015-03-03 2016-09-09 旭硝子株式会社 Method for manufacturing substrate into which organic group including fluorine atom and carbon-carbon double bond is introduced
US10545139B2 (en) 2015-06-16 2020-01-28 Curiox Biosystems Pte Ltd. Methods and devices for performing biological assays using magnetic components
US20190169467A1 (en) * 2016-08-08 2019-06-06 Surfix B.V. Process for modification of a solid surface
WO2018185554A1 (en) 2017-04-05 2018-10-11 Curiox Biosystems Pte Ltd. Methods, devices, and apparatus for washing samples on array plates
EP3524582A1 (en) * 2018-02-08 2019-08-14 Surfix B.V. Process for modification of a solid surface
JP6978690B2 (en) 2018-05-25 2021-12-08 日亜化学工業株式会社 A method for forming a translucent member, a method for manufacturing a light emitting device, and a light emitting device.

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4911075A (en) * 1988-08-19 1990-03-27 Presstek, Inc. Lithographic plates made by spark discharges
JP3384544B2 (en) * 1997-08-08 2003-03-10 大日本印刷株式会社 Pattern forming body and pattern forming method
JP3879312B2 (en) * 1999-03-31 2007-02-14 セイコーエプソン株式会社 Film forming method and device manufacturing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107075349A (en) * 2014-08-07 2017-08-18 大金工业株式会社 Antifouling process composition, processing unit, processing method and processing article
TWI614233B (en) * 2014-08-07 2018-02-11 大金工業股份有限公司 Anti-containment treating composition, treating apparatus, treating method and treated article
CN107075349B (en) * 2014-08-07 2020-08-21 大金工业株式会社 Antifouling treatment composition, treatment device, treatment method, and treated article
CN107532068A (en) * 2015-04-10 2018-01-02 大金工业株式会社 Antifouling process composition, processing unit, processing method and processing article
CN107532068B (en) * 2015-04-10 2021-03-12 大金工业株式会社 Antifouling treatment composition, treatment device, treatment method, and treated article

Also Published As

Publication number Publication date
JP4661785B2 (en) 2011-03-30
WO2006046699A1 (en) 2006-05-04
JPWO2006046699A1 (en) 2008-05-22

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