TW200623249A - Wet-etching apparatus and wet-etching method - Google Patents

Wet-etching apparatus and wet-etching method

Info

Publication number
TW200623249A
TW200623249A TW093141615A TW93141615A TW200623249A TW 200623249 A TW200623249 A TW 200623249A TW 093141615 A TW093141615 A TW 093141615A TW 93141615 A TW93141615 A TW 93141615A TW 200623249 A TW200623249 A TW 200623249A
Authority
TW
Taiwan
Prior art keywords
wet
etching
etching chamber
rinsing
etch
Prior art date
Application number
TW093141615A
Other languages
Chinese (zh)
Other versions
TWI257667B (en
Inventor
Sheng-Chou Gau
Jung-Lung Huang
Chen-Hsien Ou
Li-Feng Chiu
Original Assignee
Innolux Display Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Innolux Display Corp filed Critical Innolux Display Corp
Priority to TW93141615A priority Critical patent/TWI257667B/en
Application granted granted Critical
Publication of TWI257667B publication Critical patent/TWI257667B/en
Publication of TW200623249A publication Critical patent/TW200623249A/en

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  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The present invention relates to a wet-etching apparatus includes an area of cassette and buffer, a first etching chamber, a rinsing room, a second etching chamber, an area of rinsing, air-knifing and transferring orderly. Pre-Etch and Main-Etch was made in the first etching chamber; the resultants in the first etching chamber were scraped off in the rinsing room.
TW93141615A 2004-12-31 2004-12-31 Wet-etching apparatus and wet-etching method TWI257667B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW93141615A TWI257667B (en) 2004-12-31 2004-12-31 Wet-etching apparatus and wet-etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW93141615A TWI257667B (en) 2004-12-31 2004-12-31 Wet-etching apparatus and wet-etching method

Publications (2)

Publication Number Publication Date
TWI257667B TWI257667B (en) 2006-07-01
TW200623249A true TW200623249A (en) 2006-07-01

Family

ID=37764226

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93141615A TWI257667B (en) 2004-12-31 2004-12-31 Wet-etching apparatus and wet-etching method

Country Status (1)

Country Link
TW (1) TWI257667B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI607977B (en) * 2012-06-14 2017-12-11 Nsc Co Ltd Chemical polishing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI607977B (en) * 2012-06-14 2017-12-11 Nsc Co Ltd Chemical polishing device

Also Published As

Publication number Publication date
TWI257667B (en) 2006-07-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees