TW200623249A - Wet-etching apparatus and wet-etching method - Google Patents
Wet-etching apparatus and wet-etching methodInfo
- Publication number
- TW200623249A TW200623249A TW093141615A TW93141615A TW200623249A TW 200623249 A TW200623249 A TW 200623249A TW 093141615 A TW093141615 A TW 093141615A TW 93141615 A TW93141615 A TW 93141615A TW 200623249 A TW200623249 A TW 200623249A
- Authority
- TW
- Taiwan
- Prior art keywords
- wet
- etching
- etching chamber
- rinsing
- etch
- Prior art date
Links
Landscapes
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The present invention relates to a wet-etching apparatus includes an area of cassette and buffer, a first etching chamber, a rinsing room, a second etching chamber, an area of rinsing, air-knifing and transferring orderly. Pre-Etch and Main-Etch was made in the first etching chamber; the resultants in the first etching chamber were scraped off in the rinsing room.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW93141615A TWI257667B (en) | 2004-12-31 | 2004-12-31 | Wet-etching apparatus and wet-etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW93141615A TWI257667B (en) | 2004-12-31 | 2004-12-31 | Wet-etching apparatus and wet-etching method |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI257667B TWI257667B (en) | 2006-07-01 |
TW200623249A true TW200623249A (en) | 2006-07-01 |
Family
ID=37764226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW93141615A TWI257667B (en) | 2004-12-31 | 2004-12-31 | Wet-etching apparatus and wet-etching method |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI257667B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI607977B (en) * | 2012-06-14 | 2017-12-11 | Nsc Co Ltd | Chemical polishing device |
-
2004
- 2004-12-31 TW TW93141615A patent/TWI257667B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI607977B (en) * | 2012-06-14 | 2017-12-11 | Nsc Co Ltd | Chemical polishing device |
Also Published As
Publication number | Publication date |
---|---|
TWI257667B (en) | 2006-07-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |