TW200622483A - Aqueous developable photo-imageable composition precursors for use in photo-patterning methods - Google Patents
Aqueous developable photo-imageable composition precursors for use in photo-patterning methodsInfo
- Publication number
- TW200622483A TW200622483A TW094126813A TW94126813A TW200622483A TW 200622483 A TW200622483 A TW 200622483A TW 094126813 A TW094126813 A TW 094126813A TW 94126813 A TW94126813 A TW 94126813A TW 200622483 A TW200622483 A TW 200622483A
- Authority
- TW
- Taiwan
- Prior art keywords
- photo
- functional unit
- functional
- aqueous developable
- copolymer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Photoreceptors In Electrophotography (AREA)
- Glass Compositions (AREA)
- Graft Or Block Polymers (AREA)
- Gas-Filled Discharge Tubes (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/913,874 US7135267B2 (en) | 2004-08-06 | 2004-08-06 | Aqueous developable photoimageable compositions for use in photo-patterning methods |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200622483A true TW200622483A (en) | 2006-07-01 |
Family
ID=35757802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094126813A TW200622483A (en) | 2004-08-06 | 2005-08-08 | Aqueous developable photo-imageable composition precursors for use in photo-patterning methods |
Country Status (7)
Country | Link |
---|---|
US (1) | US7135267B2 (zh) |
EP (1) | EP1779195A2 (zh) |
JP (1) | JP4769803B2 (zh) |
KR (1) | KR100884691B1 (zh) |
CN (1) | CN101031845B (zh) |
TW (1) | TW200622483A (zh) |
WO (1) | WO2006017791A2 (zh) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100996235B1 (ko) * | 2004-06-01 | 2010-11-25 | 주식회사 동진쎄미켐 | PDP 어드레스 전극용 Pb 미함유 Ag 페이스트 조성물 |
US20060027307A1 (en) * | 2004-08-03 | 2006-02-09 | Bidwell Larry A | Method of application of a dielectric sheet and photosensitive dielectric composition(s) and tape(s) used therein |
KR100927611B1 (ko) * | 2005-01-05 | 2009-11-23 | 삼성에스디아이 주식회사 | 감광성 페이스트 조성물, 이를 이용하여 제조된 pdp전극, 및 이를 포함하는 pdp |
KR100927610B1 (ko) * | 2005-01-05 | 2009-11-23 | 삼성에스디아이 주식회사 | 감광성 페이스트 조성물, 및 이를 이용하여 제조된플라즈마 디스플레이 패널 |
US7569165B2 (en) * | 2005-03-09 | 2009-08-04 | E. I. Du Pont De Nemours And Company | Black conductive compositions, black electrodes, and methods of forming thereof |
JP4644878B2 (ja) * | 2005-06-08 | 2011-03-09 | Dowaエレクトロニクス株式会社 | 黒色電極およびプラズマディスプレイパネル |
US7214466B1 (en) * | 2005-12-14 | 2007-05-08 | E. I. Du Pont De Nemours And Company | Cationically polymerizable photoimageable thick film compositions, electrodes, and methods of forming thereof |
WO2008031601A1 (en) * | 2006-09-13 | 2008-03-20 | Dsm Ip Assets B.V. | Antimicrobial hydrophilic coating comprising metallic silver particles |
JP2008297409A (ja) * | 2007-05-30 | 2008-12-11 | Jsr Corp | 無機粉体含有樹脂組成物、パターン形成方法およびフラットパネルディスプレイ用電極の製造方法 |
TW201013742A (en) * | 2008-05-19 | 2010-04-01 | Du Pont | Co-processable photoimageable silver and carbon nanotube compositions and method for field emission devices |
US8129088B2 (en) * | 2009-07-02 | 2012-03-06 | E.I. Du Pont De Nemours And Company | Electrode and method for manufacturing the same |
JP5003773B2 (ja) * | 2010-02-15 | 2012-08-15 | 東京エレクトロン株式会社 | 現像装置、現像方法及び記憶媒体 |
TW201235783A (en) * | 2010-12-10 | 2012-09-01 | Sumitomo Chemical Co | Photosensitive resin composition |
CN105867067A (zh) * | 2011-03-14 | 2016-08-17 | 东丽株式会社 | 感光性导电糊剂和导电图案的制造方法 |
CN102212304B (zh) * | 2011-03-25 | 2013-01-02 | 北京化工大学 | 一种柔性电路导电组成物及其制备方法与使用方法 |
CN104204946A (zh) * | 2012-03-22 | 2014-12-10 | 东丽株式会社 | 感光性导电浆料和导电图案的制造方法 |
JP6097556B2 (ja) * | 2012-12-25 | 2017-03-15 | 太陽インキ製造株式会社 | 導電性樹脂組成物及び導電回路 |
JP5733483B1 (ja) * | 2013-09-25 | 2015-06-10 | 東レ株式会社 | 感光性遮光ペースト及びタッチセンサー用積層パターンの製造方法 |
KR20210081510A (ko) * | 2019-12-23 | 2021-07-02 | 주식회사 잉크테크 | 자외선 경화형 수성 잉크 조성물 및 이의 제조방법 |
US20240045331A1 (en) * | 2020-09-28 | 2024-02-08 | Toray Industries, Inc. | Photosensitive resin composition, board with conductive pattern, antenna element, production method for image display device, and production method for touch panel |
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NL101499C (zh) * | 1951-08-20 | |||
US2875047A (en) * | 1955-01-19 | 1959-02-24 | Oster Gerald | Photopolymerization with the formation of coherent plastic masses |
US2850445A (en) * | 1955-01-19 | 1958-09-02 | Oster Gerald | Photopolymerization |
NL218803A (zh) * | 1956-07-09 | |||
US3074974A (en) * | 1957-12-06 | 1963-01-22 | Monsanto Chemicals | Method for the preparation of diglycidyl ether of tetrachlorobisphenol-a |
US3097097A (en) * | 1959-02-12 | 1963-07-09 | Gisela K Oster | Photo degrading of gel systems and photographic production of reliefs therewith |
NL254306A (zh) * | 1959-08-07 | |||
US3380831A (en) * | 1964-05-26 | 1968-04-30 | Du Pont | Photopolymerizable compositions and elements |
GB1090142A (en) * | 1965-02-26 | 1967-11-08 | Agfa Gevaert Nv | Photochemical insolubilisation of polymers |
US3479185A (en) * | 1965-06-03 | 1969-11-18 | Du Pont | Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers |
US3549367A (en) * | 1968-05-24 | 1970-12-22 | Du Pont | Photopolymerizable compositions containing triarylimidazolyl dimers and p-aminophenyl ketones |
US3583931A (en) * | 1969-11-26 | 1971-06-08 | Du Pont | Oxides of cubic crystal structure containing bismuth and at least one of ruthenium and iridium |
US4162162A (en) * | 1978-05-08 | 1979-07-24 | E. I. Du Pont De Nemours And Company | Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions |
JPS63265979A (ja) | 1987-04-23 | 1988-11-02 | Toyobo Co Ltd | 光硬化型導電性焼成ペ−スト |
US4925771A (en) * | 1988-05-31 | 1990-05-15 | E. I. Dupont De Nemours And Company | Process of making photosensitive aqueous developable ceramic coating composition including freeze drying the ceramic solid particles |
US4912019A (en) * | 1988-05-31 | 1990-03-27 | E. I. Du Pont De Nemours And Company | Photosensitive aqueous developable ceramic coating composition |
US5049480A (en) * | 1990-02-20 | 1991-09-17 | E. I. Du Pont De Nemours And Company | Photosensitive aqueous developable silver conductor composition |
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EP0589241B1 (en) * | 1992-09-23 | 1999-04-28 | E.I. Du Pont De Nemours And Company | Photosensitive dielectric sheet composition and multilayer interconnect circuits |
US5858616A (en) * | 1995-10-13 | 1999-01-12 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same |
TW367504B (en) | 1996-05-21 | 1999-08-21 | Du Pont | Photosensitive aqueous developable thick film composition employing vinylpyrrolidone polymer |
US5851732A (en) * | 1997-03-06 | 1998-12-22 | E. I. Du Pont De Nemours And Company | Plasma display panel device fabrication utilizing black electrode between substrate and conductor electrode |
JP3510761B2 (ja) * | 1997-03-26 | 2004-03-29 | 太陽インキ製造株式会社 | アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル |
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JP3953625B2 (ja) * | 1998-03-02 | 2007-08-08 | 太陽インキ製造株式会社 | 感光性組成物 |
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US6762009B2 (en) * | 2001-10-12 | 2004-07-13 | E. I. Du Pont De Nemours And Company | Aqueous developable photoimageable thick film compositions with photospeed enhancer |
US20030124461A1 (en) * | 2001-10-12 | 2003-07-03 | Suess Terry R. | Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes |
US6994948B2 (en) * | 2001-10-12 | 2006-02-07 | E.I. Du Pont De Nemours And Company, Inc. | Aqueous developable photoimageable thick film compositions |
TW594404B (en) * | 2001-12-31 | 2004-06-21 | Ind Tech Res Inst | Photosensitive thick film composition |
JP3943057B2 (ja) * | 2003-07-11 | 2007-07-11 | 太陽インキ製造株式会社 | アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル |
JP2005249998A (ja) * | 2004-03-03 | 2005-09-15 | Toray Ind Inc | 感光性セラミックス組成物およびそれを用いたセラミックス多層基板 |
-
2004
- 2004-08-06 US US10/913,874 patent/US7135267B2/en active Active
-
2005
- 2005-08-05 JP JP2007525053A patent/JP4769803B2/ja not_active Expired - Fee Related
- 2005-08-05 WO PCT/US2005/028005 patent/WO2006017791A2/en active Application Filing
- 2005-08-05 CN CN2005800263608A patent/CN101031845B/zh not_active Expired - Fee Related
- 2005-08-05 EP EP05779885A patent/EP1779195A2/en not_active Withdrawn
- 2005-08-05 KR KR1020077005204A patent/KR100884691B1/ko not_active IP Right Cessation
- 2005-08-08 TW TW094126813A patent/TW200622483A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20070040833A (ko) | 2007-04-17 |
WO2006017791A2 (en) | 2006-02-16 |
JP2008509439A (ja) | 2008-03-27 |
CN101031845B (zh) | 2012-04-25 |
US20060029882A1 (en) | 2006-02-09 |
US7135267B2 (en) | 2006-11-14 |
JP4769803B2 (ja) | 2011-09-07 |
CN101031845A (zh) | 2007-09-05 |
EP1779195A2 (en) | 2007-05-02 |
WO2006017791A3 (en) | 2007-05-18 |
KR100884691B1 (ko) | 2009-02-18 |
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