TW200620477A - Thermal treatment apparatus and tuning technology for thermal treatment process - Google Patents
Thermal treatment apparatus and tuning technology for thermal treatment processInfo
- Publication number
- TW200620477A TW200620477A TW093137726A TW93137726A TW200620477A TW 200620477 A TW200620477 A TW 200620477A TW 093137726 A TW093137726 A TW 093137726A TW 93137726 A TW93137726 A TW 93137726A TW 200620477 A TW200620477 A TW 200620477A
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- heat
- thermal treatment
- heat lamp
- lamp group
- Prior art date
Links
Abstract
A tuning technology for thermal treatment process is disclosed. It includes the following steps. First, a heat lamp and a reflective mask thereof are installed on a wafer to measure and adjust the heat flux distribution from the single heat lamp towards the wafer. Next, a heat lamp group composed of a plurality of the heat lamps is installed on the wafer, wherein the heat lamps are arranged in an array including a plurality of axially asymmetric circles. And then, a location between the heat lamp group and the wafer is adjusted, so a horizontal offset vector is between an array center axis of the heat lamp group and a center axis of the wafer. Next, heating powers of these heat lamps are adjusted. Afterwards, the wafer and the heat lamp group are relatively rotated parallely along the center axis of the wafer to receive the uniform heat flux from the heat lamp group.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW93137726A TWI240333B (en) | 2004-12-07 | 2004-12-07 | Thermal treatment apparatus and tuning technology for thermal treatment process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW93137726A TWI240333B (en) | 2004-12-07 | 2004-12-07 | Thermal treatment apparatus and tuning technology for thermal treatment process |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI240333B TWI240333B (en) | 2005-09-21 |
TW200620477A true TW200620477A (en) | 2006-06-16 |
Family
ID=37007723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW93137726A TWI240333B (en) | 2004-12-07 | 2004-12-07 | Thermal treatment apparatus and tuning technology for thermal treatment process |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI240333B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI567857B (en) * | 2014-10-10 | 2017-01-21 | 杰宜斯科技有限公司 | Heater apparatus for substrate processing and liquid processing apparatus for substrate comprising the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111785667B (en) * | 2020-07-31 | 2022-10-21 | 上海华力集成电路制造有限公司 | Wafer position monitoring device and method of laser annealing equipment |
-
2004
- 2004-12-07 TW TW93137726A patent/TWI240333B/en active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI567857B (en) * | 2014-10-10 | 2017-01-21 | 杰宜斯科技有限公司 | Heater apparatus for substrate processing and liquid processing apparatus for substrate comprising the same |
CN106575618A (en) * | 2014-10-10 | 2017-04-19 | 杰宜斯科技有限公司 | Substrate processing heater device and substrate solution processing device having same |
Also Published As
Publication number | Publication date |
---|---|
TWI240333B (en) | 2005-09-21 |
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