TW200508799A - Photosensitive resin composition and color filter using the same - Google Patents
Photosensitive resin composition and color filter using the sameInfo
- Publication number
- TW200508799A TW200508799A TW093123169A TW93123169A TW200508799A TW 200508799 A TW200508799 A TW 200508799A TW 093123169 A TW093123169 A TW 093123169A TW 93123169 A TW93123169 A TW 93123169A TW 200508799 A TW200508799 A TW 200508799A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- photosensitive resin
- reacting
- parts
- weight
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 3
- 239000004615 ingredient Substances 0.000 abstract 3
- 239000004593 Epoxy Substances 0.000 abstract 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- 125000002252 acyl group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 150000008064 anhydrides Chemical class 0.000 abstract 1
- 150000001735 carboxylic acids Chemical class 0.000 abstract 1
- 239000003086 colorant Substances 0.000 abstract 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
- C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
- C07D471/08—Bridged systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D498/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D498/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
- C07D498/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
The present invention is aimed to provide a photosensitive resin composition for use in color filters, which can form a pattern with excellent dimensional stability, proper margin, good adherence and sharp edge shape. Namely, the photosensitive resin composition according to the present invention contains the following ingredients (A) to (D) as the essential ingredients: (A) an unsaturated group-containing, alkali-soluble resin obtained by reacting an epoxy compound containing 2 glycidyl ether group derived from a bisphenolic compound with (meth)acrylic acid, then reacting the resulting product with a polybasic carboxylic acid or an anhydride thereof, (B) a photopolymerizable monomer having at least one of ethylenic unsaturated bond, (C) a photopolymerization initiator, and (D) a coloring agent; characterized in that (A)/(B) ratio is 20/80 to 90/10 (by weight), the content of (C) is 2 to 30 parts by weight relative to 100 parts of total weight of (A) and (B), and the ingredient (C) is an O-acyloxime compound represented by the formula of (I): , (wherein, R1 represents phenyl, alkyl etc.; R2 represents acyl).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003304248A JP4437651B2 (en) | 2003-08-28 | 2003-08-28 | Photosensitive resin composition and color filter using the same |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200508799A true TW200508799A (en) | 2005-03-01 |
TWI351581B TWI351581B (en) | 2011-11-01 |
Family
ID=34407988
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100126952A TWI447523B (en) | 2003-08-28 | 2004-08-03 | Photosensitive resin composition and color filter using the same |
TW093123169A TWI351581B (en) | 2003-08-28 | 2004-08-03 | Photosensitive resin composition and color filter |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100126952A TWI447523B (en) | 2003-08-28 | 2004-08-03 | Photosensitive resin composition and color filter using the same |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4437651B2 (en) |
KR (1) | KR101077077B1 (en) |
TW (2) | TWI447523B (en) |
Families Citing this family (70)
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JP3754065B2 (en) * | 2003-06-10 | 2006-03-08 | 三菱化学株式会社 | Photopolymerizable composition and color filter using the same |
JP4484482B2 (en) * | 2003-09-25 | 2010-06-16 | 東洋インキ製造株式会社 | Photosensitive coloring composition and color filter |
JP2005202252A (en) * | 2004-01-16 | 2005-07-28 | Dainippon Printing Co Ltd | Photosensitive coloring composition for solid-state imaging device color filter, solid-state imaging device color filter, solid-state imaging device and manufacturing method of solid-state imaging device color filter |
JP2005215147A (en) * | 2004-01-28 | 2005-08-11 | Fuji Photo Film Co Ltd | Polymerizable composition |
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TWI385485B (en) * | 2004-11-17 | 2013-02-11 | Jsr Corp | A photosensitive resin composition, a display panel spacer, and a display panel |
JP2006195425A (en) * | 2004-12-15 | 2006-07-27 | Jsr Corp | Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel |
JP4526964B2 (en) * | 2005-01-27 | 2010-08-18 | 旭化成イーマテリアルズ株式会社 | Photopolymerizable resin laminate, glass substrate with black matrix using the same, and method for producing color filter |
JP4508929B2 (en) * | 2005-03-31 | 2010-07-21 | 新日鐵化学株式会社 | Photosensitive resin composition for insulating film |
TW200710572A (en) * | 2005-05-31 | 2007-03-16 | Taiyo Ink Mfg Co Ltd | Photocuring/thermosetting resin composition, curing/setting product thereof and printed wiring board obtained using the same |
CN101107566B (en) | 2005-07-20 | 2012-08-29 | 凸版印刷株式会社 | Alkali-developable photosensitive color composition |
JP4821206B2 (en) * | 2005-07-29 | 2011-11-24 | 東レ株式会社 | Photosensitive coloring composition for color filter and color filter |
KR100787341B1 (en) * | 2005-09-06 | 2007-12-18 | 다이요 잉키 세이조 가부시키가이샤 | A resin composition, cured material therefrom, and printing wiring boards using the same |
JP4633582B2 (en) * | 2005-09-06 | 2011-02-16 | 東京応化工業株式会社 | Photosensitive composition |
JP2007072035A (en) * | 2005-09-06 | 2007-03-22 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
JP4640971B2 (en) * | 2005-09-08 | 2011-03-02 | 東京応化工業株式会社 | Photosensitive resin composition for light shielding pattern formation of plasma display |
JP4826415B2 (en) * | 2005-10-12 | 2011-11-30 | 東レ株式会社 | Photosensitive resin composition |
KR100777561B1 (en) * | 2005-11-24 | 2007-11-28 | 주식회사 엘지화학 | Alkali-developable resins and photosensitive resin composition comprising the same |
KR100655044B1 (en) | 2005-12-30 | 2006-12-06 | 제일모직주식회사 | Photosensitive resin composition having electric property and color filter using the same |
KR100740550B1 (en) * | 2006-02-10 | 2007-07-18 | 주식회사 코오롱 | Composition for resin black matrix |
JP2007233230A (en) * | 2006-03-03 | 2007-09-13 | Toyo Ink Mfg Co Ltd | Photosensitive black composition and color filter |
JP2007279668A (en) * | 2006-03-14 | 2007-10-25 | Asahi Kasei Electronics Co Ltd | Black matrix and method for producing the same |
CN101416111B (en) * | 2006-03-28 | 2012-07-04 | 富士胶片株式会社 | Photosensitive composition, photosensitive film, method of forming permanent pattern, and printed wiring board |
JP5073342B2 (en) * | 2006-03-31 | 2012-11-14 | 新日鐵化学株式会社 | Photosensitive resin composition and color filter using the same |
JP4827088B2 (en) * | 2006-04-13 | 2011-11-30 | 太陽ホールディングス株式会社 | Alkali development type solder resist, cured product thereof, and printed wiring board obtained using the same |
CN102445850B (en) * | 2006-04-13 | 2013-07-31 | 太阳控股株式会社 | Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same |
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JP5108300B2 (en) * | 2006-12-28 | 2012-12-26 | 新日鉄住金化学株式会社 | Photosensitive resin composition and color filter using the same |
KR101047703B1 (en) * | 2007-02-20 | 2011-07-08 | 동우 화인켐 주식회사 | Colored photosensitive resin composition and color filter |
JP5003200B2 (en) * | 2007-02-26 | 2012-08-15 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element |
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JP5096814B2 (en) * | 2007-07-04 | 2012-12-12 | 東京応化工業株式会社 | Colored photosensitive composition |
JP5529370B2 (en) * | 2007-10-03 | 2014-06-25 | 新日鉄住金化学株式会社 | Photosensitive resin composition for black resist containing polyfunctional thiol compound, black matrix for color filter using the same, and color filter |
JP2009244401A (en) * | 2008-03-28 | 2009-10-22 | Fujifilm Corp | Black photosensitive resin composition for solid state image sensor and method of forming image |
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JP4999891B2 (en) * | 2009-07-13 | 2012-08-15 | 東洋インキScホールディングス株式会社 | Photosensitive coloring composition and color filter |
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US9051397B2 (en) | 2010-10-05 | 2015-06-09 | Basf Se | Oxime ester |
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KR102006041B1 (en) | 2011-12-07 | 2019-07-31 | 바스프 에스이 | Oxime ester photoinitiators |
US8885124B2 (en) | 2011-12-19 | 2014-11-11 | Dic Corporation | Liquid crystal display device |
US8860912B2 (en) | 2012-02-01 | 2014-10-14 | Dic Corporation | Liquid crystal display device |
WO2013167515A1 (en) | 2012-05-09 | 2013-11-14 | Basf Se | Oxime ester photoinitiators |
WO2014045371A1 (en) | 2012-09-20 | 2014-03-27 | Dic株式会社 | Liquid crystal display device |
TWI476270B (en) * | 2012-10-04 | 2015-03-11 | Dainippon Ink & Chemicals | Liquid crystal display device |
EP2837964B1 (en) | 2013-06-06 | 2016-09-21 | DIC Corporation | Liquid crystal display device |
KR20160030233A (en) | 2013-07-08 | 2016-03-16 | 바스프 에스이 | Oxime ester photoinitiators |
KR102282647B1 (en) | 2013-09-10 | 2021-07-28 | 바스프 에스이 | Oxime ester photoinitiators |
EP2983037B1 (en) | 2013-09-24 | 2018-05-09 | DIC Corporation | Liquid-crystal display |
CN105683830B (en) | 2013-10-30 | 2018-12-28 | Dic株式会社 | Liquid crystal display element |
US10437107B2 (en) | 2013-10-30 | 2019-10-08 | Dic Corporation | Liquid-crystal display element |
CN105745572A (en) | 2013-11-12 | 2016-07-06 | Dic株式会社 | Liquid-crystal display element |
KR20170037948A (en) | 2014-07-29 | 2017-04-05 | 디아이씨 가부시끼가이샤 | Liquid-crystal display element |
KR20170037949A (en) | 2014-07-29 | 2017-04-05 | 디아이씨 가부시끼가이샤 | Liquid-crystal display element |
JP6437388B2 (en) * | 2015-05-28 | 2018-12-12 | 日本化薬株式会社 | Resin composition containing epoxy (meth) acrylate compound and cured product thereof |
KR20170048422A (en) | 2014-08-29 | 2017-05-08 | 바스프 에스이 | Oxime sulfonate derivatives |
KR102654596B1 (en) * | 2016-03-30 | 2024-04-04 | 동우 화인켐 주식회사 | Negative-type Photosensitive Resin Composition |
WO2019059359A1 (en) | 2017-09-25 | 2019-03-28 | 東レ株式会社 | Colored resin composition, colored film, color filter and liquid crystal display device |
US20220121113A1 (en) | 2019-01-23 | 2022-04-21 | Basf Se | Oxime ester photoinitiators having a special aroyl chromophore |
WO2021175855A1 (en) | 2020-03-04 | 2021-09-10 | Basf Se | Oxime ester photoinitiators |
CN113189842B (en) * | 2020-12-20 | 2024-05-17 | 江苏穿越光电科技有限公司 | Preparation method of color filter |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MY121423A (en) | 1998-06-26 | 2006-01-28 | Ciba Sc Holding Ag | Photopolymerizable thermosetting resin compositions |
JP3860170B2 (en) | 2001-06-11 | 2006-12-20 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | Photoinitiators of oxime esters with combined structures |
JP3986406B2 (en) | 2002-09-25 | 2007-10-03 | 株式会社ニデック | Non-contact tonometer |
TWI289577B (en) * | 2002-10-28 | 2007-11-11 | Mitsubishi Chem Corp | Photopolymerization composition and color filter using the same |
JP2005062494A (en) | 2003-08-13 | 2005-03-10 | Fujifilm Arch Co Ltd | Photosetting composition and color filter using same |
-
2003
- 2003-08-28 JP JP2003304248A patent/JP4437651B2/en not_active Expired - Fee Related
-
2004
- 2004-08-03 TW TW100126952A patent/TWI447523B/en active
- 2004-08-03 TW TW093123169A patent/TWI351581B/en active
- 2004-08-27 KR KR1020040067905A patent/KR101077077B1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20050021902A (en) | 2005-03-07 |
TWI447523B (en) | 2014-08-01 |
JP2005077451A (en) | 2005-03-24 |
TWI351581B (en) | 2011-11-01 |
TW201142502A (en) | 2011-12-01 |
KR101077077B1 (en) | 2011-10-26 |
JP4437651B2 (en) | 2010-03-24 |
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