TW200508799A - Photosensitive resin composition and color filter using the same - Google Patents

Photosensitive resin composition and color filter using the same

Info

Publication number
TW200508799A
TW200508799A TW093123169A TW93123169A TW200508799A TW 200508799 A TW200508799 A TW 200508799A TW 093123169 A TW093123169 A TW 093123169A TW 93123169 A TW93123169 A TW 93123169A TW 200508799 A TW200508799 A TW 200508799A
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
reacting
parts
weight
Prior art date
Application number
TW093123169A
Other languages
Chinese (zh)
Other versions
TWI351581B (en
Inventor
Manabu Higashi
Masahiro Tsuchiya
Masanori Kono
Original Assignee
Nippon Steel Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Chemical Co filed Critical Nippon Steel Chemical Co
Publication of TW200508799A publication Critical patent/TW200508799A/en
Application granted granted Critical
Publication of TWI351581B publication Critical patent/TWI351581B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/08—Bridged systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D498/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D498/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D498/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

The present invention is aimed to provide a photosensitive resin composition for use in color filters, which can form a pattern with excellent dimensional stability, proper margin, good adherence and sharp edge shape. Namely, the photosensitive resin composition according to the present invention contains the following ingredients (A) to (D) as the essential ingredients: (A) an unsaturated group-containing, alkali-soluble resin obtained by reacting an epoxy compound containing 2 glycidyl ether group derived from a bisphenolic compound with (meth)acrylic acid, then reacting the resulting product with a polybasic carboxylic acid or an anhydride thereof, (B) a photopolymerizable monomer having at least one of ethylenic unsaturated bond, (C) a photopolymerization initiator, and (D) a coloring agent; characterized in that (A)/(B) ratio is 20/80 to 90/10 (by weight), the content of (C) is 2 to 30 parts by weight relative to 100 parts of total weight of (A) and (B), and the ingredient (C) is an O-acyloxime compound represented by the formula of (I): , (wherein, R1 represents phenyl, alkyl etc.; R2 represents acyl).
TW093123169A 2003-08-28 2004-08-03 Photosensitive resin composition and color filter TWI351581B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003304248A JP4437651B2 (en) 2003-08-28 2003-08-28 Photosensitive resin composition and color filter using the same

Publications (2)

Publication Number Publication Date
TW200508799A true TW200508799A (en) 2005-03-01
TWI351581B TWI351581B (en) 2011-11-01

Family

ID=34407988

Family Applications (2)

Application Number Title Priority Date Filing Date
TW100126952A TWI447523B (en) 2003-08-28 2004-08-03 Photosensitive resin composition and color filter using the same
TW093123169A TWI351581B (en) 2003-08-28 2004-08-03 Photosensitive resin composition and color filter

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW100126952A TWI447523B (en) 2003-08-28 2004-08-03 Photosensitive resin composition and color filter using the same

Country Status (3)

Country Link
JP (1) JP4437651B2 (en)
KR (1) KR101077077B1 (en)
TW (2) TWI447523B (en)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3754065B2 (en) * 2003-06-10 2006-03-08 三菱化学株式会社 Photopolymerizable composition and color filter using the same
JP4484482B2 (en) * 2003-09-25 2010-06-16 東洋インキ製造株式会社 Photosensitive coloring composition and color filter
JP2005202252A (en) * 2004-01-16 2005-07-28 Dainippon Printing Co Ltd Photosensitive coloring composition for solid-state imaging device color filter, solid-state imaging device color filter, solid-state imaging device and manufacturing method of solid-state imaging device color filter
JP2005215147A (en) * 2004-01-28 2005-08-11 Fuji Photo Film Co Ltd Polymerizable composition
TWI285297B (en) * 2004-02-09 2007-08-11 Chi Mei Corp Light-sensitive resin composition for black matrix
JP4556479B2 (en) * 2004-04-27 2010-10-06 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and liquid crystal display panel
JP4448381B2 (en) * 2004-05-26 2010-04-07 東京応化工業株式会社 Photosensitive composition
JP4492238B2 (en) * 2004-07-26 2010-06-30 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display panel
TWI385485B (en) * 2004-11-17 2013-02-11 Jsr Corp A photosensitive resin composition, a display panel spacer, and a display panel
JP2006195425A (en) * 2004-12-15 2006-07-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
JP4526964B2 (en) * 2005-01-27 2010-08-18 旭化成イーマテリアルズ株式会社 Photopolymerizable resin laminate, glass substrate with black matrix using the same, and method for producing color filter
JP4508929B2 (en) * 2005-03-31 2010-07-21 新日鐵化学株式会社 Photosensitive resin composition for insulating film
TW200710572A (en) * 2005-05-31 2007-03-16 Taiyo Ink Mfg Co Ltd Photocuring/thermosetting resin composition, curing/setting product thereof and printed wiring board obtained using the same
CN101107566B (en) 2005-07-20 2012-08-29 凸版印刷株式会社 Alkali-developable photosensitive color composition
JP4821206B2 (en) * 2005-07-29 2011-11-24 東レ株式会社 Photosensitive coloring composition for color filter and color filter
KR100787341B1 (en) * 2005-09-06 2007-12-18 다이요 잉키 세이조 가부시키가이샤 A resin composition, cured material therefrom, and printing wiring boards using the same
JP4633582B2 (en) * 2005-09-06 2011-02-16 東京応化工業株式会社 Photosensitive composition
JP2007072035A (en) * 2005-09-06 2007-03-22 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JP4640971B2 (en) * 2005-09-08 2011-03-02 東京応化工業株式会社 Photosensitive resin composition for light shielding pattern formation of plasma display
JP4826415B2 (en) * 2005-10-12 2011-11-30 東レ株式会社 Photosensitive resin composition
KR100777561B1 (en) * 2005-11-24 2007-11-28 주식회사 엘지화학 Alkali-developable resins and photosensitive resin composition comprising the same
KR100655044B1 (en) 2005-12-30 2006-12-06 제일모직주식회사 Photosensitive resin composition having electric property and color filter using the same
KR100740550B1 (en) * 2006-02-10 2007-07-18 주식회사 코오롱 Composition for resin black matrix
JP2007233230A (en) * 2006-03-03 2007-09-13 Toyo Ink Mfg Co Ltd Photosensitive black composition and color filter
JP2007279668A (en) * 2006-03-14 2007-10-25 Asahi Kasei Electronics Co Ltd Black matrix and method for producing the same
CN101416111B (en) * 2006-03-28 2012-07-04 富士胶片株式会社 Photosensitive composition, photosensitive film, method of forming permanent pattern, and printed wiring board
JP5073342B2 (en) * 2006-03-31 2012-11-14 新日鐵化学株式会社 Photosensitive resin composition and color filter using the same
JP4827088B2 (en) * 2006-04-13 2011-11-30 太陽ホールディングス株式会社 Alkali development type solder resist, cured product thereof, and printed wiring board obtained using the same
CN102445850B (en) * 2006-04-13 2013-07-31 太阳控股株式会社 Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same
JP4827089B2 (en) * 2006-04-13 2011-11-30 太陽ホールディングス株式会社 Alkali development type solder resist, cured product thereof, and printed wiring board obtained using the same
TWI416174B (en) * 2006-06-01 2013-11-21 Nippon Steel & Sumikin Chem Co Resit composition for color filter, method for making such composition and color filter using such composition
JP5108300B2 (en) * 2006-12-28 2012-12-26 新日鉄住金化学株式会社 Photosensitive resin composition and color filter using the same
KR101047703B1 (en) * 2007-02-20 2011-07-08 동우 화인켐 주식회사 Colored photosensitive resin composition and color filter
JP5003200B2 (en) * 2007-02-26 2012-08-15 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
KR101526618B1 (en) 2007-05-11 2015-06-05 바스프 에스이 Oxime ester photoinitiators
JP5535064B2 (en) 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア Oxime ester photoinitiator
JP5096814B2 (en) * 2007-07-04 2012-12-12 東京応化工業株式会社 Colored photosensitive composition
JP5529370B2 (en) * 2007-10-03 2014-06-25 新日鉄住金化学株式会社 Photosensitive resin composition for black resist containing polyfunctional thiol compound, black matrix for color filter using the same, and color filter
JP2009244401A (en) * 2008-03-28 2009-10-22 Fujifilm Corp Black photosensitive resin composition for solid state image sensor and method of forming image
JP5189392B2 (en) * 2008-03-28 2013-04-24 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP2010053330A (en) * 2008-08-01 2010-03-11 Jsr Corp Curable composition, liquid crystal sealing agent and liquid crystal display element
KR101279614B1 (en) * 2008-11-12 2013-06-27 주식회사 엘지화학 Alkali soluble resin polymer with fluorene group, method of manufacturing the polymer and negative photosensitive resin composition including the polymer
US8507569B2 (en) 2009-03-23 2013-08-13 Basf Se Photoresist compositions
JP5439937B2 (en) * 2009-04-30 2014-03-12 Ｊｓｒ株式会社 Colored radiation-sensitive composition, color filter, and color liquid crystal display element
JP4999891B2 (en) * 2009-07-13 2012-08-15 東洋インキＳｃホールディングス株式会社 Photosensitive coloring composition and color filter
JP6038033B2 (en) 2010-10-05 2016-12-07 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
EP2668156B1 (en) 2011-01-28 2018-10-31 Basf Se Polymerizable composition comprising an oxime sulfonate as thermal curing agent
KR102006041B1 (en) 2011-12-07 2019-07-31 바스프 에스이 Oxime ester photoinitiators
US8885124B2 (en) 2011-12-19 2014-11-11 Dic Corporation Liquid crystal display device
US8860912B2 (en) 2012-02-01 2014-10-14 Dic Corporation Liquid crystal display device
WO2013167515A1 (en) 2012-05-09 2013-11-14 Basf Se Oxime ester photoinitiators
WO2014045371A1 (en) 2012-09-20 2014-03-27 Dic株式会社 Liquid crystal display device
TWI476270B (en) * 2012-10-04 2015-03-11 Dainippon Ink & Chemicals Liquid crystal display device
EP2837964B1 (en) 2013-06-06 2016-09-21 DIC Corporation Liquid crystal display device
KR20160030233A (en) 2013-07-08 2016-03-16 바스프 에스이 Oxime ester photoinitiators
KR102282647B1 (en) 2013-09-10 2021-07-28 바스프 에스이 Oxime ester photoinitiators
EP2983037B1 (en) 2013-09-24 2018-05-09 DIC Corporation Liquid-crystal display
CN105683830B (en) 2013-10-30 2018-12-28 Dic株式会社 Liquid crystal display element
US10437107B2 (en) 2013-10-30 2019-10-08 Dic Corporation Liquid-crystal display element
CN105745572A (en) 2013-11-12 2016-07-06 Dic株式会社 Liquid-crystal display element
KR20170037948A (en) 2014-07-29 2017-04-05 디아이씨 가부시끼가이샤 Liquid-crystal display element
KR20170037949A (en) 2014-07-29 2017-04-05 디아이씨 가부시끼가이샤 Liquid-crystal display element
JP6437388B2 (en) * 2015-05-28 2018-12-12 日本化薬株式会社 Resin composition containing epoxy (meth) acrylate compound and cured product thereof
KR20170048422A (en) 2014-08-29 2017-05-08 바스프 에스이 Oxime sulfonate derivatives
KR102654596B1 (en) * 2016-03-30 2024-04-04 동우 화인켐 주식회사 Negative-type Photosensitive Resin Composition
WO2019059359A1 (en) 2017-09-25 2019-03-28 東レ株式会社 Colored resin composition, colored film, color filter and liquid crystal display device
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
WO2021175855A1 (en) 2020-03-04 2021-09-10 Basf Se Oxime ester photoinitiators
CN113189842B (en) * 2020-12-20 2024-05-17 江苏穿越光电科技有限公司 Preparation method of color filter

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY121423A (en) 1998-06-26 2006-01-28 Ciba Sc Holding Ag Photopolymerizable thermosetting resin compositions
JP3860170B2 (en) 2001-06-11 2006-12-20 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド Photoinitiators of oxime esters with combined structures
JP3986406B2 (en) 2002-09-25 2007-10-03 株式会社ニデック Non-contact tonometer
TWI289577B (en) * 2002-10-28 2007-11-11 Mitsubishi Chem Corp Photopolymerization composition and color filter using the same
JP2005062494A (en) 2003-08-13 2005-03-10 Fujifilm Arch Co Ltd Photosetting composition and color filter using same

Also Published As

Publication number Publication date
KR20050021902A (en) 2005-03-07
TWI447523B (en) 2014-08-01
JP2005077451A (en) 2005-03-24
TWI351581B (en) 2011-11-01
TW201142502A (en) 2011-12-01
KR101077077B1 (en) 2011-10-26
JP4437651B2 (en) 2010-03-24

Similar Documents

Publication Publication Date Title
TW200508799A (en) Photosensitive resin composition and color filter using the same
EP1712537A4 (en) Calixarene compound, process for producing the same, intermediate therefor, and composition thereof
CN100551935C (en) A kind of mono-stripped hydrogen light initiating agent and its production and use
CN100447127C (en) Single-component hydrogen-capture-type light initiator and its preparing method and use
SG168462A1 (en) Novel copolymer and photoresist composition comprising the same
EP0407932A3 (en) Uv light-absorbing skin-protecting composition
JPS5690871A (en) Adhesive composition
GB1507793A (en) Photo-setting resin compositions suitable for forming relief images
EP1801142A3 (en) Resin composition,resin cured product, and liquid discharge head
ATE369832T1 (en) TOPICAL PREPARATION CONTAINING GALLIC ACID DERIVATIVES
JP2008088394A5 (en)
JPS5710605A (en) Photopolymerizable composition
DE60138488D1 (en) FLUORATED PHOTOINITIATORS IN DUAL CURE RESINS
RU2000122439A (en) AN OBSTACLE COATING
JPS56136865A (en) Adhesive composition for hard living tissue
JPS54127495A (en) Vulcanizable composition of acrylic rubber
WO2005054951A3 (en) Thick film photoresist composition and method of forming resist pattern
MY117828A (en) Antireflective coating material for photoresists.
JPS5575405A (en) Photopolymerizable composition
FI874844A (en) LIMKOMPOSITIONER.
JPS5495691A (en) Photocurable resin composition
WO2004041949A8 (en) Curable coating compositions containing reactive compounds having a secondary or tertiary hydroxy or halide group separated from a primary carbamate group by three or more carbon atoms
CN102504055B (en) Benzophenone initiating agent with aqueous reactivity and synthetic method thereof
JPS5738750A (en) 2,3-bis 3,4-dicarboxybenzoyloxy propyl methacrylate and its preparation
RU93004472A (en) POLYCYCLIC BIOCIDAL COMPOUNDS AND COMPOSITION ON THEIR BASIS