TW200503249A - Method for code programming mask ROM - Google Patents
Method for code programming mask ROMInfo
- Publication number
- TW200503249A TW200503249A TW093119952A TW93119952A TW200503249A TW 200503249 A TW200503249 A TW 200503249A TW 093119952 A TW093119952 A TW 093119952A TW 93119952 A TW93119952 A TW 93119952A TW 200503249 A TW200503249 A TW 200503249A
- Authority
- TW
- Taiwan
- Prior art keywords
- photoresist layer
- coded
- transparent holes
- mask rom
- code
- Prior art date
Links
Landscapes
- Semiconductor Memories (AREA)
- Read Only Memory (AREA)
Abstract
The present invention discloses a method for code programming mask ROM, which includes the following steps: forming a first photoresist layer on the word lines on the substrate buried with bit lines and on the gate oxide layer; next, patterning the first photoresist layer to form the pre-code transparent holes on all memory cells corresponding to the crossed word lines and bit lines; employing ion implantation or plasma to solidify the first photoresist layer; then, forming a second photoresist layer on the first photoresist layer, and patterning the second photoresist layer to form the actual code transparent holes on the memory cells coded with logical value zero; and, conducting the ion implantation for each memory cell to be coded through the pre-coded transparent holes and the actual code transparent holes.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/614,698 US6875659B2 (en) | 2002-08-12 | 2003-07-03 | Methods of code programming a mask ROM |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200503249A true TW200503249A (en) | 2005-01-16 |
| TWI330402B TWI330402B (en) | 2010-09-11 |
Family
ID=34794484
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093119952A TW200503249A (en) | 2003-07-03 | 2004-07-01 | Method for code programming mask ROM |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN100395844C (en) |
| TW (1) | TW200503249A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101980421B (en) * | 2010-10-15 | 2012-12-19 | 福建一华电机有限公司 | Quick damping device for voltage regulator of generating set |
| CN103779232B (en) * | 2014-01-28 | 2016-08-17 | 北京京东方光电科技有限公司 | A kind of manufacture method of thin film transistor (TFT) |
| CN105448839B (en) * | 2014-08-21 | 2019-06-04 | 中芯国际集成电路制造(上海)有限公司 | The photolithography method of semiconductor devices, the production method of flush memory device and flush memory device |
| CN108288581A (en) * | 2018-01-26 | 2018-07-17 | 德淮半导体有限公司 | Semiconductor devices and forming method thereof |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6022644A (en) * | 1998-03-18 | 2000-02-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Mask containing subresolution line to minimize proximity effect of contact hole |
| TW508761B (en) * | 1999-09-09 | 2002-11-01 | Taiwan Semiconductor Mfg | Manufacturing method of self-aligned mask type ROM |
| JP2001351992A (en) * | 2000-06-08 | 2001-12-21 | Nec Corp | Method for manufacturing semiconductor device |
-
2004
- 2004-07-01 TW TW093119952A patent/TW200503249A/en unknown
- 2004-07-02 CN CNB2004100633049A patent/CN100395844C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| TWI330402B (en) | 2010-09-11 |
| CN1619703A (en) | 2005-05-25 |
| CN100395844C (en) | 2008-06-18 |
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