SU1651760A1 - METHOD OF PLASMA GENERATION - Google Patents

METHOD OF PLASMA GENERATION

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Publication number
SU1651760A1
SU1651760A1 SU4678376/25A SU4678376A SU1651760A1 SU 1651760 A1 SU1651760 A1 SU 1651760A1 SU 4678376/25 A SU4678376/25 A SU 4678376/25A SU 4678376 A SU4678376 A SU 4678376A SU 1651760 A1 SU1651760 A1 SU 1651760A1
Authority
SU
USSR - Soviet Union
Prior art keywords
frequency
plasma
working chamber
discharge
plasma generation
Prior art date
Application number
SU4678376/25A
Other languages
Russian (ru)
Inventor
А.А. Балмашнов
А.К. Голубев
Original Assignee
Университет дружбы народов им.Патриса Лумумбы
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Университет дружбы народов им.Патриса Лумумбы filed Critical Университет дружбы народов им.Патриса Лумумбы
Priority to SU4678376/25A priority Critical patent/SU1651760A1/en
Application granted granted Critical
Publication of SU1651760A1 publication Critical patent/SU1651760A1/en

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  • Electron Sources, Ion Sources (AREA)

Abstract

Способ генерации плазмы, включающий подачу газа в рабочую камеру, создание в рабочей камере магнитного поля с пробочной конфигурацией силовых линий, подачу СВЧ-энергии в резонатор, в полости которого находится рабочая камера, и зажигание разряда при частоте ωСВЧ-поля, выбранной из условия электронно-циклотронного резонанса в плазме разряда, отличающийся тем, что, с целью повышения эффективности ионизации рабочего газа, на плазму разряда дополнительно воздействуют СВЧ-полем, частоту ωкоторого выбирают из условиягде ω- ионно-звуковая или ионно-плазменная частота.The method of plasma generation, including the flow of gas into the working chamber, the creation in the working chamber of a magnetic field with plug configuration of power lines, the supply of microwave energy to the resonator, in the cavity of which the working chamber is located, and the ignition of the discharge at the frequency ωSHF-field selected -cyclotron resonance in the discharge plasma, characterized in that, in order to increase the ionization efficiency of the working gas, the discharge plasma is additionally affected by a microwave field, the frequency of which is chosen from the condition where ω is ion-sound or tionally-plasma frequency.

SU4678376/25A 1989-04-18 1989-04-18 METHOD OF PLASMA GENERATION SU1651760A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU4678376/25A SU1651760A1 (en) 1989-04-18 1989-04-18 METHOD OF PLASMA GENERATION

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU4678376/25A SU1651760A1 (en) 1989-04-18 1989-04-18 METHOD OF PLASMA GENERATION

Publications (1)

Publication Number Publication Date
SU1651760A1 true SU1651760A1 (en) 1999-07-20

Family

ID=60531684

Family Applications (1)

Application Number Title Priority Date Filing Date
SU4678376/25A SU1651760A1 (en) 1989-04-18 1989-04-18 METHOD OF PLASMA GENERATION

Country Status (1)

Country Link
SU (1) SU1651760A1 (en)

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