SI23611A - Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme - Google Patents

Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme Download PDF

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Publication number
SI23611A
SI23611A SI201100025A SI201100025A SI23611A SI 23611 A SI23611 A SI 23611A SI 201100025 A SI201100025 A SI 201100025A SI 201100025 A SI201100025 A SI 201100025A SI 23611 A SI23611 A SI 23611A
Authority
SI
Slovenia
Prior art keywords
coil
coils
plasma
excitation
individual
Prior art date
Application number
SI201100025A
Other languages
English (en)
Slovenian (sl)
Inventor
ZAPLOTNIK@Rok
VESEL@Alenka
MOZETIÄŚ@Miran
Original Assignee
Institut@@quot@JoĹľef@Stefan@quot
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institut@@quot@JoĹľef@Stefan@quot filed Critical Institut@@quot@JoĹľef@Stefan@quot
Priority to SI201100025A priority Critical patent/SI23611A/sl
Priority to PCT/SI2012/000002 priority patent/WO2012099548A1/en
Priority to DE112012000015.3T priority patent/DE112012000015B4/de
Publication of SI23611A publication Critical patent/SI23611A/sl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
SI201100025A 2011-01-20 2011-01-20 Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme SI23611A (sl)

Priority Applications (3)

Application Number Priority Date Filing Date Title
SI201100025A SI23611A (sl) 2011-01-20 2011-01-20 Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme
PCT/SI2012/000002 WO2012099548A1 (en) 2011-01-20 2012-01-19 Device for high-frequency gas plasma excitation
DE112012000015.3T DE112012000015B4 (de) 2011-01-20 2012-01-19 Vorrichtung für die Anregung eines Hochfrequenz-Gasplasmas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SI201100025A SI23611A (sl) 2011-01-20 2011-01-20 Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme

Publications (1)

Publication Number Publication Date
SI23611A true SI23611A (sl) 2012-07-31

Family

ID=45922789

Family Applications (1)

Application Number Title Priority Date Filing Date
SI201100025A SI23611A (sl) 2011-01-20 2011-01-20 Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme

Country Status (3)

Country Link
DE (1) DE112012000015B4 (de)
SI (1) SI23611A (de)
WO (1) WO2012099548A1 (de)

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401350A (en) 1993-03-08 1995-03-28 Lsi Logic Corporation Coil configurations for improved uniformity in inductively coupled plasma systems
US5815047A (en) * 1993-10-29 1998-09-29 Applied Materials, Inc. Fast transition RF impedance matching network for plasma reactor ignition
US5683539A (en) 1995-06-07 1997-11-04 Applied Materials, Inc. Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling
US5874704A (en) * 1995-06-30 1999-02-23 Lam Research Corporation Low inductance large area coil for an inductively coupled plasma source
KR970064327A (ko) * 1996-02-27 1997-09-12 모리시다 요이치 고주파 전력 인가장치, 플라즈마 발생장치, 플라즈마 처리장치, 고주파 전력 인가방법, 플라즈마 발생방법 및 플라즈마 처리방법
US5689215A (en) * 1996-05-23 1997-11-18 Lam Research Corporation Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor
US6373022B2 (en) * 1997-06-30 2002-04-16 Applied Materials, Inc. Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry
US6154465A (en) 1998-10-06 2000-11-28 Vertical Networks, Inc. Systems and methods for multiple mode voice and data communications using intelligenty bridged TDM and packet buses and methods for performing telephony and data functions using the same
US6248251B1 (en) * 1999-02-19 2001-06-19 Tokyo Electron Limited Apparatus and method for electrostatically shielding an inductively coupled RF plasma source and facilitating ignition of a plasma
JP2001052894A (ja) 1999-08-04 2001-02-23 Ulvac Japan Ltd 誘導結合高周波プラズマ源
US6694915B1 (en) * 2000-07-06 2004-02-24 Applied Materials, Inc Plasma reactor having a symmetrical parallel conductor coil antenna
US6459066B1 (en) 2000-08-25 2002-10-01 Board Of Regents, The University Of Texas System Transmission line based inductively coupled plasma source with stable impedance
KR100444189B1 (ko) * 2001-03-19 2004-08-18 주성엔지니어링(주) 유도결합 플라즈마 소스의 임피던스 정합 회로
US6855225B1 (en) * 2002-06-25 2005-02-15 Novellus Systems, Inc. Single-tube interlaced inductively coupling plasma source
US20040182319A1 (en) * 2003-03-18 2004-09-23 Harqkyun Kim Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes
DE10320472A1 (de) * 2003-05-08 2004-12-02 Kolektor D.O.O. Plasmabehandlung zur Reinigung von Kupfer oder Nickel
SI21903A (sl) * 2004-09-06 2006-04-30 Uros Cvelbar Naprava za generiranje nevtralnih atomov
DE602004011407T2 (de) * 2004-09-16 2009-01-15 Kolektor Group D.O.O. Verfahren zur verbesserung der elektrischen verbindungseigenschaften der oberfläche eines produkts aus einem polymer-matrix-verbundwerkstoff
SI1828434T1 (sl) 2004-09-16 2008-06-30 Kolektor Group D.O.O. Postopek za izboljšanje električnih povezovalnih lastnosti površine na izdelku iz kompozitne snovi s polimerno matriko
KR101107393B1 (ko) * 2004-11-12 2012-01-19 오리콘 솔라 아게, 트루바흐 용량 결합형 ｒｆ 플라즈마 반응기
KR100774521B1 (ko) * 2005-07-19 2007-11-08 주식회사 디엠에스 다중 안테나 코일군이 구비된 유도결합 플라즈마 반응장치
AT504466B1 (de) * 2006-10-25 2009-05-15 Eiselt Primoz Verfahren und vorrichtung zur entfettung von gegenständen oder materialien mittels oxidativer radikale
US7938379B2 (en) 2007-07-11 2011-05-10 General Electric Company Three axis adjustable mounting system

Also Published As

Publication number Publication date
WO2012099548A1 (en) 2012-07-26
DE112012000015B4 (de) 2016-04-21
DE112012000015T5 (de) 2013-05-08

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Effective date: 20120809

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