SI23611A - Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme - Google Patents
Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme Download PDFInfo
- Publication number
- SI23611A SI23611A SI201100025A SI201100025A SI23611A SI 23611 A SI23611 A SI 23611A SI 201100025 A SI201100025 A SI 201100025A SI 201100025 A SI201100025 A SI 201100025A SI 23611 A SI23611 A SI 23611A
- Authority
- SI
- Slovenia
- Prior art keywords
- coil
- coils
- plasma
- excitation
- individual
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SI201100025A SI23611A (sl) | 2011-01-20 | 2011-01-20 | Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme |
PCT/SI2012/000002 WO2012099548A1 (en) | 2011-01-20 | 2012-01-19 | Device for high-frequency gas plasma excitation |
DE112012000015.3T DE112012000015B4 (de) | 2011-01-20 | 2012-01-19 | Vorrichtung für die Anregung eines Hochfrequenz-Gasplasmas |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SI201100025A SI23611A (sl) | 2011-01-20 | 2011-01-20 | Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme |
Publications (1)
Publication Number | Publication Date |
---|---|
SI23611A true SI23611A (sl) | 2012-07-31 |
Family
ID=45922789
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SI201100025A SI23611A (sl) | 2011-01-20 | 2011-01-20 | Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE112012000015B4 (de) |
SI (1) | SI23611A (de) |
WO (1) | WO2012099548A1 (de) |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5401350A (en) | 1993-03-08 | 1995-03-28 | Lsi Logic Corporation | Coil configurations for improved uniformity in inductively coupled plasma systems |
US5815047A (en) * | 1993-10-29 | 1998-09-29 | Applied Materials, Inc. | Fast transition RF impedance matching network for plasma reactor ignition |
US5683539A (en) | 1995-06-07 | 1997-11-04 | Applied Materials, Inc. | Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling |
US5874704A (en) * | 1995-06-30 | 1999-02-23 | Lam Research Corporation | Low inductance large area coil for an inductively coupled plasma source |
KR970064327A (ko) * | 1996-02-27 | 1997-09-12 | 모리시다 요이치 | 고주파 전력 인가장치, 플라즈마 발생장치, 플라즈마 처리장치, 고주파 전력 인가방법, 플라즈마 발생방법 및 플라즈마 처리방법 |
US5689215A (en) * | 1996-05-23 | 1997-11-18 | Lam Research Corporation | Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor |
US6373022B2 (en) * | 1997-06-30 | 2002-04-16 | Applied Materials, Inc. | Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry |
US6154465A (en) | 1998-10-06 | 2000-11-28 | Vertical Networks, Inc. | Systems and methods for multiple mode voice and data communications using intelligenty bridged TDM and packet buses and methods for performing telephony and data functions using the same |
US6248251B1 (en) * | 1999-02-19 | 2001-06-19 | Tokyo Electron Limited | Apparatus and method for electrostatically shielding an inductively coupled RF plasma source and facilitating ignition of a plasma |
JP2001052894A (ja) | 1999-08-04 | 2001-02-23 | Ulvac Japan Ltd | 誘導結合高周波プラズマ源 |
US6694915B1 (en) * | 2000-07-06 | 2004-02-24 | Applied Materials, Inc | Plasma reactor having a symmetrical parallel conductor coil antenna |
US6459066B1 (en) | 2000-08-25 | 2002-10-01 | Board Of Regents, The University Of Texas System | Transmission line based inductively coupled plasma source with stable impedance |
KR100444189B1 (ko) * | 2001-03-19 | 2004-08-18 | 주성엔지니어링(주) | 유도결합 플라즈마 소스의 임피던스 정합 회로 |
US6855225B1 (en) * | 2002-06-25 | 2005-02-15 | Novellus Systems, Inc. | Single-tube interlaced inductively coupling plasma source |
US20040182319A1 (en) * | 2003-03-18 | 2004-09-23 | Harqkyun Kim | Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes |
DE10320472A1 (de) * | 2003-05-08 | 2004-12-02 | Kolektor D.O.O. | Plasmabehandlung zur Reinigung von Kupfer oder Nickel |
SI21903A (sl) * | 2004-09-06 | 2006-04-30 | Uros Cvelbar | Naprava za generiranje nevtralnih atomov |
DE602004011407T2 (de) * | 2004-09-16 | 2009-01-15 | Kolektor Group D.O.O. | Verfahren zur verbesserung der elektrischen verbindungseigenschaften der oberfläche eines produkts aus einem polymer-matrix-verbundwerkstoff |
SI1828434T1 (sl) | 2004-09-16 | 2008-06-30 | Kolektor Group D.O.O. | Postopek za izboljšanje električnih povezovalnih lastnosti površine na izdelku iz kompozitne snovi s polimerno matriko |
KR101107393B1 (ko) * | 2004-11-12 | 2012-01-19 | 오리콘 솔라 아게, 트루바흐 | 용량 결합형 rf 플라즈마 반응기 |
KR100774521B1 (ko) * | 2005-07-19 | 2007-11-08 | 주식회사 디엠에스 | 다중 안테나 코일군이 구비된 유도결합 플라즈마 반응장치 |
AT504466B1 (de) * | 2006-10-25 | 2009-05-15 | Eiselt Primoz | Verfahren und vorrichtung zur entfettung von gegenständen oder materialien mittels oxidativer radikale |
US7938379B2 (en) | 2007-07-11 | 2011-05-10 | General Electric Company | Three axis adjustable mounting system |
-
2011
- 2011-01-20 SI SI201100025A patent/SI23611A/sl not_active IP Right Cessation
-
2012
- 2012-01-19 DE DE112012000015.3T patent/DE112012000015B4/de not_active Expired - Fee Related
- 2012-01-19 WO PCT/SI2012/000002 patent/WO2012099548A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2012099548A1 (en) | 2012-07-26 |
DE112012000015B4 (de) | 2016-04-21 |
DE112012000015T5 (de) | 2013-05-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OO00 | Grant of patent |
Effective date: 20120809 |
|
KO00 | Lapse of patent |
Effective date: 20210125 |