SG43457A1 - Surface processing method and apparatus - Google Patents

Surface processing method and apparatus

Info

Publication number
SG43457A1
SG43457A1 SG1996011908A SG1996011908A SG43457A1 SG 43457 A1 SG43457 A1 SG 43457A1 SG 1996011908 A SG1996011908 A SG 1996011908A SG 1996011908 A SG1996011908 A SG 1996011908A SG 43457 A1 SG43457 A1 SG 43457A1
Authority
SG
Singapore
Prior art keywords
processing method
surface processing
processing
Prior art date
Application number
SG1996011908A
Other languages
English (en)
Inventor
Takuya Miyakawa
Tsutsui Shoji
Yoshiaki Mori
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of SG43457A1 publication Critical patent/SG43457A1/en

Links

SG1996011908A 1995-11-07 1996-12-24 Surface processing method and apparatus SG43457A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP32814595 1995-11-07
JP30254096A JP3796857B2 (ja) 1995-11-07 1996-10-28 表面処理方法及びその装置

Publications (1)

Publication Number Publication Date
SG43457A1 true SG43457A1 (en) 1997-10-17

Family

ID=26563154

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996011908A SG43457A1 (en) 1995-11-07 1996-12-24 Surface processing method and apparatus

Country Status (3)

Country Link
JP (1) JP3796857B2 (ja)
SG (1) SG43457A1 (ja)
TW (1) TW367536B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000017923A1 (fr) * 1998-09-17 2000-03-30 Kabushiki Kaisha Tamura Seisakusho Formation de bosses, procedes et dispositifs de preparation au soudage et de soudage
JP2004006511A (ja) * 2002-05-31 2004-01-08 Toppan Printing Co Ltd プラズマ処理装置
JP4804345B2 (ja) 2004-03-31 2011-11-02 関東電化工業株式会社 Ｆ２含有ガスの製造方法及びｆ２含有ガスの製造装置
JP5679139B2 (ja) * 2008-03-06 2015-03-04 東洋炭素株式会社 表面処理装置
JP6138441B2 (ja) * 2011-09-21 2017-05-31 株式会社Ｎｂｃメッシュテック 浮遊ウイルス除去ユニット
JP2022163526A (ja) * 2021-04-14 2022-10-26 東京エレクトロン株式会社 基板処理方法

Also Published As

Publication number Publication date
JP3796857B2 (ja) 2006-07-12
JPH09205272A (ja) 1997-08-05
TW367536B (en) 1999-08-21

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