SG169934A1 - Method for preparing sulfonium salt and sulfonium salt prepared by the same - Google Patents

Method for preparing sulfonium salt and sulfonium salt prepared by the same

Info

Publication number
SG169934A1
SG169934A1 SG201005862-6A SG2010058626A SG169934A1 SG 169934 A1 SG169934 A1 SG 169934A1 SG 2010058626 A SG2010058626 A SG 2010058626A SG 169934 A1 SG169934 A1 SG 169934A1
Authority
SG
Singapore
Prior art keywords
sulfonium salt
preparing
same
formula
prepared
Prior art date
Application number
SG201005862-6A
Inventor
Jung-Hoon Oh
Joon-Hee Han
Sang-Wook Park
Seung-Jae Lee
Sung-Bo Ko
Sung-Jun Yoon
Original Assignee
Korea Kumho Petrochem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Kumho Petrochem Co Ltd filed Critical Korea Kumho Petrochem Co Ltd
Publication of SG169934A1 publication Critical patent/SG169934A1/en

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)

Abstract

There are provided a method for preparing a sulfonium salt and a sulfonium salt prepared by the method. The method for preparing a sulfonium salt includes a first step of reacting a compound represented by the following formula (1) with an alcohol and an amine to obtain an ammonium salt; and a second step of reacting the ammonium salt with a reducing agent and an inorganic base to obtain a compound represented by the following formula (2): [Formula 1] [Formula 2] wherein in the formulas (1) and (2), R1, R2, Q1, Q2, M and n are defined in the Specification. The method for preparing a sulfonium salt employs simple reaction steps, does not require purification processes, and is not accompanied by a problem that reaction intermediate substances adhere to the reaction vessel during the purification processes, causing a decrease in yield.
SG201005862-6A 2009-10-01 2010-08-12 Method for preparing sulfonium salt and sulfonium salt prepared by the same SG169934A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020090094099A KR101115576B1 (en) 2009-10-01 2009-10-01 Method for preparing sulfonium salt and sulfonium salt prepared by the same

Publications (1)

Publication Number Publication Date
SG169934A1 true SG169934A1 (en) 2011-04-29

Family

ID=43884198

Family Applications (1)

Application Number Title Priority Date Filing Date
SG201005862-6A SG169934A1 (en) 2009-10-01 2010-08-12 Method for preparing sulfonium salt and sulfonium salt prepared by the same

Country Status (5)

Country Link
JP (1) JP5351103B2 (en)
KR (1) KR101115576B1 (en)
CN (1) CN102030686B (en)
SG (1) SG169934A1 (en)
TW (1) TWI423952B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108003033A (en) * 2017-12-05 2018-05-08 常州大学 A kind of preparation method of quaternary ammonium salt for super capacitor
CN114149349A (en) * 2021-12-21 2022-03-08 江苏汉拓光学材料有限公司 Preparation method of photoacid generator, photoacid generator and intermediate thereof

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7304175B2 (en) * 2005-02-16 2007-12-04 Sumitomo Chemical Company, Limited Salt suitable for an acid generator and a chemically amplified resist composition containing the same
JP5070802B2 (en) * 2005-10-28 2012-11-14 住友化学株式会社 Salt for acid generator of chemically amplified resist composition
JP5226994B2 (en) * 2006-09-11 2013-07-03 住友化学株式会社 Intermediate of acid generator of chemically amplified resist composition
JP5033471B2 (en) * 2007-05-09 2012-09-26 住友化学株式会社 Crystal of organic compound and method for producing the same
JP2008290980A (en) * 2007-05-25 2008-12-04 Tokyo Ohka Kogyo Co Ltd Compound, acid generator, resist composition, and method of resist pattern formation
JP5347349B2 (en) * 2007-09-18 2013-11-20 セントラル硝子株式会社 Process for producing 2-bromo-2,2-difluoroethanol and 2- (alkylcarbonyloxy) -1,1-difluoroethanesulfonates
JP5681339B2 (en) * 2007-10-02 2015-03-04 東京応化工業株式会社 Method for producing compound
JP5399639B2 (en) * 2008-02-18 2014-01-29 東京応化工業株式会社 Resist composition and resist pattern forming method
KR100940915B1 (en) * 2008-03-13 2010-02-08 금호석유화학 주식회사 Acid generator for chemically amplified resist compositions
KR100973033B1 (en) * 2008-05-21 2010-07-30 금호석유화학 주식회사 Acid generating agent for chemically amplified resist compositions
KR101054485B1 (en) * 2008-09-23 2011-08-04 금호석유화학 주식회사 Onium salt compound, a polymer compound comprising the same, a chemically amplified resist composition comprising the polymer compound and a pattern forming method using the composition
KR100998503B1 (en) * 2008-10-30 2010-12-07 금호석유화학 주식회사 Photoacid generator containing aromatic anion
JP5580632B2 (en) * 2009-03-31 2014-08-27 住友化学株式会社 Chemically amplified photoresist composition
JP5612883B2 (en) * 2009-03-31 2014-10-22 住友化学株式会社 Chemically amplified photoresist composition
JP5829795B2 (en) * 2009-03-31 2015-12-09 住友化学株式会社 Chemically amplified photoresist composition

Also Published As

Publication number Publication date
TW201113247A (en) 2011-04-16
KR20110036431A (en) 2011-04-07
KR101115576B1 (en) 2012-03-06
CN102030686A (en) 2011-04-27
JP2011074061A (en) 2011-04-14
TWI423952B (en) 2014-01-21
JP5351103B2 (en) 2013-11-27
CN102030686B (en) 2014-07-02

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