SG148102A1 - Exposure apparatus - Google Patents
Exposure apparatusInfo
- Publication number
- SG148102A1 SG148102A1 SG200803425-8A SG2008034258A SG148102A1 SG 148102 A1 SG148102 A1 SG 148102A1 SG 2008034258 A SG2008034258 A SG 2008034258A SG 148102 A1 SG148102 A1 SG 148102A1
- Authority
- SG
- Singapore
- Prior art keywords
- exposure apparatus
- optical element
- barrel
- ultraviolet light
- extreme ultraviolet
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007131794A JP2008288377A (ja) | 2007-05-17 | 2007-05-17 | 露光装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG148102A1 true SG148102A1 (en) | 2008-12-31 |
Family
ID=40027483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200803425-8A SG148102A1 (en) | 2007-05-17 | 2008-05-05 | Exposure apparatus |
Country Status (5)
Country | Link |
---|---|
US (1) | US7692762B2 (ja) |
JP (1) | JP2008288377A (ja) |
KR (1) | KR20080101751A (ja) |
SG (1) | SG148102A1 (ja) |
TW (1) | TW200912552A (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009016319A1 (de) * | 2009-04-06 | 2010-10-14 | Carl Zeiss Smt Ag | Verfahren zur Kontaminationsvermeidung und EUV-Lithographieanlage |
DE102013204445A1 (de) * | 2013-03-14 | 2014-09-18 | Carl Zeiss Smt Gmbh | Vergrößernde abbildende Optik sowie EUV-Maskeninspektionssystem mit einer derartigen abbildenden Optik |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999050892A1 (fr) * | 1998-03-31 | 1999-10-07 | Nikon Corporation | Dispositif optique et systeme d'exposition equipe du dispositif optique |
JP2003045782A (ja) | 2001-07-31 | 2003-02-14 | Canon Inc | 反射型縮小投影光学系及びそれを用いた露光装置 |
-
2007
- 2007-05-17 JP JP2007131794A patent/JP2008288377A/ja active Pending
-
2008
- 2008-05-05 SG SG200803425-8A patent/SG148102A1/en unknown
- 2008-05-12 US US12/118,797 patent/US7692762B2/en not_active Expired - Fee Related
- 2008-05-13 TW TW097117499A patent/TW200912552A/zh unknown
- 2008-05-16 KR KR1020080045253A patent/KR20080101751A/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2008288377A (ja) | 2008-11-27 |
US20080285713A1 (en) | 2008-11-20 |
US7692762B2 (en) | 2010-04-06 |
TW200912552A (en) | 2009-03-16 |
KR20080101751A (ko) | 2008-11-21 |
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