SG142242A1 - Using an interferometer as a high speed variable attenuator - Google Patents

Using an interferometer as a high speed variable attenuator

Info

Publication number
SG142242A1
SG142242A1 SG200716829-7A SG2007168297A SG142242A1 SG 142242 A1 SG142242 A1 SG 142242A1 SG 2007168297 A SG2007168297 A SG 2007168297A SG 142242 A1 SG142242 A1 SG 142242A1
Authority
SG
Singapore
Prior art keywords
high speed
speed variable
interferometer
variable attenuator
radiation
Prior art date
Application number
SG200716829-7A
Other languages
English (en)
Inventor
Noordman Oscar Franci Jozephus
Kreuzer Justin L
Henri Johannes Petrus Vink
Den Dool Teunis Cornelis Van
Calero Daniel Perez
Original Assignee
Asml Holding Nv
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv, Asml Netherlands Bv filed Critical Asml Holding Nv
Publication of SG142242A1 publication Critical patent/SG142242A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
SG200716829-7A 2006-10-17 2007-10-11 Using an interferometer as a high speed variable attenuator SG142242A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/581,786 US7683300B2 (en) 2006-10-17 2006-10-17 Using an interferometer as a high speed variable attenuator

Publications (1)

Publication Number Publication Date
SG142242A1 true SG142242A1 (en) 2008-05-28

Family

ID=39015708

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200716829-7A SG142242A1 (en) 2006-10-17 2007-10-11 Using an interferometer as a high speed variable attenuator

Country Status (7)

Country Link
US (2) US7683300B2 (ja)
EP (1) EP1914583A3 (ja)
JP (2) JP4938616B2 (ja)
KR (1) KR20080034794A (ja)
CN (1) CN101165533A (ja)
SG (1) SG142242A1 (ja)
TW (2) TWI471599B (ja)

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US20120092634A1 (en) * 2010-10-13 2012-04-19 Solak Harun H Method and apparatus for printing periodic patterns
US8525973B2 (en) * 2010-10-13 2013-09-03 Eulitha A.G. Method and apparatus for printing periodic patterns
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CN109238316A (zh) * 2018-09-26 2019-01-18 上海市雷智电机有限公司 一种透反一体式光栅组件
RU202422U1 (ru) * 2018-10-05 2021-02-17 Эдуард Васильевич Кувалдин Калиброванный ослабитель лазерного излучения
WO2020141050A1 (en) * 2018-12-31 2020-07-09 Asml Netherlands B.V. Position metrology apparatus and associated optical elements
EP3715951A1 (en) * 2019-03-28 2020-09-30 ASML Netherlands B.V. Position metrology apparatus and associated optical elements
TWI729615B (zh) * 2019-12-10 2021-06-01 財團法人國家實驗研究院 反射式聚光干涉儀

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Also Published As

Publication number Publication date
US20080106717A1 (en) 2008-05-08
TW201303360A (zh) 2013-01-16
JP4938616B2 (ja) 2012-05-23
TWI424274B (zh) 2014-01-21
EP1914583A3 (en) 2017-12-27
KR20080034794A (ko) 2008-04-22
EP1914583A2 (en) 2008-04-23
TW200821774A (en) 2008-05-16
CN101165533A (zh) 2008-04-23
JP2008109132A (ja) 2008-05-08
JP2012084919A (ja) 2012-04-26
TWI471599B (zh) 2015-02-01
JP5250121B2 (ja) 2013-07-31
US20080117494A1 (en) 2008-05-22
US7898646B2 (en) 2011-03-01
US7683300B2 (en) 2010-03-23

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