SG139554A1 - Lithographic apparatus, device manufacturing method, and device manufactured thereby - Google Patents

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Info

Publication number
SG139554A1
SG139554A1 SG200602682-7A SG2006026827A SG139554A1 SG 139554 A1 SG139554 A1 SG 139554A1 SG 2006026827 A SG2006026827 A SG 2006026827A SG 139554 A1 SG139554 A1 SG 139554A1
Authority
SG
Singapore
Prior art keywords
cleaning
optical elements
lithographic apparatus
radiation
cleaned
Prior art date
Application number
SG200602682-7A
Other languages
English (en)
Inventor
Lucas Henricus Johanne Stevens
Martinus Hendrikus An Leenders
Hans Meiling
Johannes Hubertus Joseph Moors
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG139554A1 publication Critical patent/SG139554A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • General Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Environmental & Geological Engineering (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
  • Cleaning In General (AREA)
SG200602682-7A 2002-12-20 2003-12-18 Lithographic apparatus, device manufacturing method, and device manufactured thereby SG139554A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02258914 2002-12-20

Publications (1)

Publication Number Publication Date
SG139554A1 true SG139554A1 (en) 2008-02-29

Family

ID=32798727

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200307558-7A SG135934A1 (en) 2002-12-20 2003-12-18 Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG200602682-7A SG139554A1 (en) 2002-12-20 2003-12-18 Lithographic apparatus, device manufacturing method, and device manufactured thereby

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG200307558-7A SG135934A1 (en) 2002-12-20 2003-12-18 Lithographic apparatus, device manufacturing method, and device manufactured thereby

Country Status (6)

Country Link
US (1) US7095479B2 (zh)
JP (1) JP4060268B2 (zh)
KR (1) KR100836830B1 (zh)
CN (1) CN100565344C (zh)
SG (2) SG135934A1 (zh)
TW (1) TWI254840B (zh)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
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US7843632B2 (en) * 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
JP4617143B2 (ja) * 2004-11-24 2011-01-19 Ｏｋｉセミコンダクタ株式会社 露光装置及び自己洗浄方法
US7145631B2 (en) * 2004-12-27 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, illumination system and method for mitigating debris particles
US7193229B2 (en) * 2004-12-28 2007-03-20 Asml Netherlands B.V. Lithographic apparatus, illumination system and method for mitigating debris particles
SG155256A1 (en) * 2005-02-10 2009-09-30 Asml Netherlands Bv Immersion liquid, exposure apparatus, and exposure process
JP2007067344A (ja) * 2005-09-02 2007-03-15 Canon Inc 露光装置および方法ならびにデバイス製造方法
JP4599342B2 (ja) * 2005-12-27 2010-12-15 エーエスエムエル ネザーランズ ビー．ブイ． 光学装置、リソグラフィ装置、および、デバイス製造方法
US7518128B2 (en) * 2006-06-30 2009-04-14 Asml Netherlands B.V. Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned
US7671347B2 (en) * 2006-10-10 2010-03-02 Asml Netherlands B.V. Cleaning method, apparatus and cleaning system
DE102006049924A1 (de) * 2006-10-19 2008-04-30 Carl Zeiss Smt Ag System zur Reinigung einer Oberfläche eines Bauteils
JP2008263173A (ja) * 2007-03-16 2008-10-30 Canon Inc 露光装置
JP2008277585A (ja) 2007-04-27 2008-11-13 Canon Inc 露光装置の洗浄装置及び露光装置
DE102008000709B3 (de) * 2008-03-17 2009-11-26 Carl Zeiss Smt Ag Reinigungsmodul, EUV-Lithographievorrichtung und Verfahren zu seiner Reinigung
JP5061069B2 (ja) * 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光を用いる半導体露光装置
NL2003152A1 (nl) * 2008-08-14 2010-02-16 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
DE102008041827A1 (de) * 2008-09-05 2010-03-18 Carl Zeiss Smt Ag Schutzmodul für EUV-Lithographievorrichtung sowie EUV-Lithographievorrichtung
DE102009045008A1 (de) * 2008-10-15 2010-04-29 Carl Zeiss Smt Ag EUV-Lithographievorrichtung und Verfahren zum Bearbeiten einer Maske
JP5559562B2 (ja) * 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
DE102009055083B4 (de) 2009-12-21 2013-12-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optischer Schichtstapel und Verfahren zu dessen Herstellung
DE102009055088B4 (de) 2009-12-21 2015-04-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Herstellen einer Struktur, optisches Bauteil, optischer Schichtstapel
DE102009055080B4 (de) * 2009-12-21 2019-11-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Herstellen einer Struktur, Abformwerkzeug
DE102011079451A1 (de) * 2011-07-20 2012-08-09 Carl Zeiss Smt Gmbh Optische Anordnung und Verfahren zur Verringerung von oxidischen Verunreinigungen
JP6071325B2 (ja) 2012-08-21 2017-02-01 キヤノン株式会社 露光装置、露光方法及び物品の製造方法
JP2014053416A (ja) * 2012-09-06 2014-03-20 Toshiba Corp Ｅｕｖ露光装置及びクリーニング方法
JP5302450B2 (ja) * 2012-09-20 2013-10-02 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学面から汚染層を除去するための方法、洗浄ガスを生成するための方法、ならびに対応する洗浄および洗浄ガス生成の構造
US20150227054A1 (en) * 2014-02-07 2015-08-13 Kabushiki Kaisha Toshiba Extreme ultraviolet radiation exposure apparatus and method of lithography thereby
DE102014114572A1 (de) * 2014-10-08 2016-04-14 Asml Netherlands B.V. EUV-Lithographiesystem und Betriebsverfahren dafür
DE102015212878A1 (de) * 2015-07-09 2017-01-12 Carl Zeiss Smt Gmbh Strahlführungsvorrichtung
NL2017671A (en) * 2015-11-11 2017-05-26 Asml Netherlands Bv A radiation system and optical device
US9981293B2 (en) 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems
DE102020202179A1 (de) * 2020-02-20 2021-08-26 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Bestimmen eines Soll-Werts eines Ziel-Plasmaparameters
CN113059807B (zh) * 2021-03-18 2022-05-06 之江实验室 基于均匀活性光片的高轴向分辨率三维打印方法和装置
US11687012B2 (en) * 2021-06-25 2023-06-27 Taiwan Semiconductor Manufacturing Company, Ltd. Reduce mask defect impact by contamination decompose

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4665315A (en) * 1985-04-01 1987-05-12 Control Data Corporation Method and apparatus for in-situ plasma cleaning of electron beam optical systems
US5401974A (en) * 1993-03-18 1995-03-28 Fujitsu Limited Charged particle beam exposure apparatus and method of cleaning the same
KR0141659B1 (ko) * 1993-07-19 1998-07-15 가나이 쓰토무 이물제거 방법 및 장치
AU8356298A (en) 1997-07-22 1999-02-16 Nikon Corporation Projection exposure method, projection aligner, and methods of manufacturing andoptically cleaning the aligner
DE19830438A1 (de) * 1998-07-08 2000-01-13 Zeiss Carl Fa Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen
US6192897B1 (en) * 1999-01-27 2001-02-27 Euv Llc Apparatus and method for in-situ cleaning of resist outgassing windows
US20020053353A1 (en) * 2000-03-13 2002-05-09 Shintaro Kawata Methods and apparatus for cleaning an object using an electron beam, and device-fabrication apparatus comprising same
TWI240151B (en) * 2000-10-10 2005-09-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
ATE460688T1 (de) 2000-12-21 2010-03-15 Euv Llc Reduction de la contamination superficielle causee par des radiations
EP1220038B1 (en) 2000-12-22 2007-03-14 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
JP4060268B2 (ja) 2008-03-12
CN1510518A (zh) 2004-07-07
US7095479B2 (en) 2006-08-22
CN100565344C (zh) 2009-12-02
KR20040055697A (ko) 2004-06-26
TWI254840B (en) 2006-05-11
US20050057734A1 (en) 2005-03-17
JP2004207730A (ja) 2004-07-22
SG135934A1 (en) 2007-10-29
TW200424795A (en) 2004-11-16
KR100836830B1 (ko) 2008-06-11

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