SG132640A1 - Binary sinusoidal sub-wavelength gratings as alignment marks - Google Patents

Binary sinusoidal sub-wavelength gratings as alignment marks

Info

Publication number
SG132640A1
SG132640A1 SG200608119-4A SG2006081194A SG132640A1 SG 132640 A1 SG132640 A1 SG 132640A1 SG 2006081194 A SG2006081194 A SG 2006081194A SG 132640 A1 SG132640 A1 SG 132640A1
Authority
SG
Singapore
Prior art keywords
alignment marks
wavelength gratings
sinusoidal sub
binary
structures
Prior art date
Application number
SG200608119-4A
Other languages
English (en)
Inventor
Haren Richard Johannes Fra Van
Sami Musa
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG132640A1 publication Critical patent/SG132640A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200608119-4A 2005-11-22 2006-11-22 Binary sinusoidal sub-wavelength gratings as alignment marks SG132640A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/284,407 US7863763B2 (en) 2005-11-22 2005-11-22 Binary sinusoidal sub-wavelength gratings as alignment marks

Publications (1)

Publication Number Publication Date
SG132640A1 true SG132640A1 (en) 2007-06-28

Family

ID=37744363

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200608119-4A SG132640A1 (en) 2005-11-22 2006-11-22 Binary sinusoidal sub-wavelength gratings as alignment marks

Country Status (8)

Country Link
US (1) US7863763B2 (zh)
EP (1) EP1788451B1 (zh)
JP (1) JP4454614B2 (zh)
KR (1) KR100777417B1 (zh)
CN (1) CN1983036B (zh)
DE (1) DE602006005886D1 (zh)
SG (1) SG132640A1 (zh)
TW (1) TWI411895B (zh)

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JP6465540B2 (ja) * 2013-07-09 2019-02-06 キヤノン株式会社 形成方法及び製造方法
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WO2016197145A1 (en) * 2015-06-04 2016-12-08 Chou Stephen Y Subwavelength structured lens, use and methods of making the same
CN105467747A (zh) * 2016-01-09 2016-04-06 北京工业大学 对准标记及掩膜版
CN106206545B (zh) * 2016-07-14 2018-11-23 深圳市华星光电技术有限公司 标记、显示装置及利用标记曝光和蚀刻制程稳定性的方法
EP3367165A1 (en) * 2017-02-23 2018-08-29 ASML Netherlands B.V. Methods of aligning a diffractive optical system and diffractive optical element
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US11022889B2 (en) * 2017-11-13 2021-06-01 Taiwan Semiconductor Manufacturing Co., Ltd. Overlay-shift measurement system and method for manufacturing semiconductor structure and measuring alignment mark of semiconductor structure
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WO2020169357A1 (en) * 2019-02-21 2020-08-27 Asml Holding N.V. Wafer alignment using form birefringence of targets or product
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CN109860153B (zh) * 2019-03-29 2020-08-04 长江存储科技有限责任公司 集成电路器件、形成对准测量图形的方法以及光掩模
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CN111856636B (zh) * 2020-07-03 2021-10-22 中国科学技术大学 一种变间距光栅掩模线密度分布可控微调方法
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Also Published As

Publication number Publication date
CN1983036A (zh) 2007-06-20
US20070114678A1 (en) 2007-05-24
DE602006005886D1 (de) 2009-05-07
US7863763B2 (en) 2011-01-04
KR100777417B1 (ko) 2007-11-20
TW200732866A (en) 2007-09-01
CN1983036B (zh) 2012-04-11
KR20070054123A (ko) 2007-05-28
EP1788451A1 (en) 2007-05-23
JP2007142419A (ja) 2007-06-07
TWI411895B (zh) 2013-10-11
EP1788451B1 (en) 2009-03-25
JP4454614B2 (ja) 2010-04-21

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