SG115590A1 - Lithographic projection apparatus and device manufacturing method - Google Patents

Lithographic projection apparatus and device manufacturing method

Info

Publication number
SG115590A1
SG115590A1 SG200306868A SG200306868A SG115590A1 SG 115590 A1 SG115590 A1 SG 115590A1 SG 200306868 A SG200306868 A SG 200306868A SG 200306868 A SG200306868 A SG 200306868A SG 115590 A1 SG115590 A1 SG 115590A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
projection apparatus
lithographic projection
lithographic
manufacturing
Prior art date
Application number
SG200306868A
Other languages
English (en)
Inventor
Arno Jan Bleeker
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG115590A1 publication Critical patent/SG115590A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
SG200306868A 2002-11-27 2003-11-24 Lithographic projection apparatus and device manufacturing method SG115590A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02258163 2002-11-27

Publications (1)

Publication Number Publication Date
SG115590A1 true SG115590A1 (en) 2005-10-28

Family

ID=32731513

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200306868A SG115590A1 (en) 2002-11-27 2003-11-24 Lithographic projection apparatus and device manufacturing method

Country Status (6)

Country Link
US (2) US7141340B2 (ja)
JP (1) JP4023541B2 (ja)
KR (1) KR100589232B1 (ja)
CN (1) CN100357830C (ja)
SG (1) SG115590A1 (ja)
TW (1) TWI243969B (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG115590A1 (en) * 2002-11-27 2005-10-28 Asml Netherlands Bv Lithographic projection apparatus and device manufacturing method
US7012674B2 (en) * 2004-01-13 2006-03-14 Asml Holding N.V. Maskless optical writer
US7500218B2 (en) * 2004-08-17 2009-03-03 Asml Netherlands B.V. Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same
WO2006047127A1 (en) * 2004-10-21 2006-05-04 Saint-Gobain Ceramics & Plastics, Inc. Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices
US20060232753A1 (en) 2005-04-19 2006-10-19 Asml Holding N.V. Liquid immersion lithography system with tilted liquid flow
US7268357B2 (en) * 2005-05-16 2007-09-11 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography apparatus and method
US7508491B2 (en) * 2006-04-12 2009-03-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath SLM interface to dose uniformity
DE102007028371B4 (de) 2007-06-13 2012-05-16 Seereal Technologies S.A. Einrichtung zur Lichtmodulation
US8514475B2 (en) * 2010-10-27 2013-08-20 Lawrence Livermore National Security, Llc Electro-optic device with gap-coupled electrode
JP5731063B2 (ja) 2011-04-08 2015-06-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、プログラマブル・パターニングデバイス、及びリソグラフィ方法
TWI467162B (zh) * 2011-04-18 2015-01-01 Ind Tech Res Inst 電光調變裝置、電光檢測器及其檢測方法
US8975601B1 (en) 2013-11-25 2015-03-10 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for electron beam lithography
US8969836B1 (en) 2013-11-26 2015-03-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for electron beam lithography
US9690208B2 (en) 2013-12-10 2017-06-27 Taiwan Semiconductor Manufacturing Company, Ltd. Mirror array in digital pattern generator (DPG)
US10437082B2 (en) * 2017-12-28 2019-10-08 Tetravue, Inc. Wide field of view electro-optic modulator and methods and systems of manufacturing and using same
KR102568796B1 (ko) 2018-06-15 2023-08-21 삼성전자주식회사 광변조 소자 및 이를 포함하는 장치

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523193A (en) * 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
DE69128103T2 (de) * 1990-04-05 1998-04-02 Seiko Epson Corp Optische Vorrichtung
ATE123885T1 (de) * 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
JP3257556B2 (ja) 1990-09-21 2002-02-18 セイコーエプソン株式会社 光学装置
US6392689B1 (en) * 1991-02-21 2002-05-21 Eugene Dolgoff System for displaying moving images pseudostereoscopically
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
WO1997033205A1 (en) * 1996-03-06 1997-09-12 Philips Electronics N.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
WO1998028665A1 (en) * 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
US5998069A (en) * 1998-02-27 1999-12-07 Micron Technology, Inc. Electrically programmable photolithography mask
US6261728B1 (en) * 1998-10-19 2001-07-17 Vanguard International Semiconductor Corporation Mask image scanning exposure method
JP2000330814A (ja) * 1999-05-19 2000-11-30 Toshiba Corp 二重化サーバシステム
JP2002194626A (ja) * 2000-12-21 2002-07-10 Mitsubishi Rayon Co Ltd 炭素繊維、炭素繊維強化複合材料、炭素繊維の製造方法
US6619359B2 (en) * 2001-02-16 2003-09-16 Brooks Automation, Inc. Pellicle mounting apparatus
SG115590A1 (en) * 2002-11-27 2005-10-28 Asml Netherlands Bv Lithographic projection apparatus and device manufacturing method

Also Published As

Publication number Publication date
JP4023541B2 (ja) 2007-12-19
US20040145712A1 (en) 2004-07-29
CN100357830C (zh) 2007-12-26
TWI243969B (en) 2005-11-21
US7141340B2 (en) 2006-11-28
KR20040047673A (ko) 2004-06-05
CN1503062A (zh) 2004-06-09
TW200421045A (en) 2004-10-16
US20070058145A1 (en) 2007-03-15
KR100589232B1 (ko) 2006-06-14
JP2004214625A (ja) 2004-07-29

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