SG11202111470XA - Wafer loading support, wafer loading system, and wafer mounting method for cmp process - Google Patents

Wafer loading support, wafer loading system, and wafer mounting method for cmp process

Info

Publication number
SG11202111470XA
SG11202111470XA SG11202111470XA SG11202111470XA SG11202111470XA SG 11202111470X A SG11202111470X A SG 11202111470XA SG 11202111470X A SG11202111470X A SG 11202111470XA SG 11202111470X A SG11202111470X A SG 11202111470XA SG 11202111470X A SG11202111470X A SG 11202111470XA
Authority
SG
Singapore
Prior art keywords
wafer
wafer loading
mounting method
cmp process
support
Prior art date
Application number
SG11202111470XA
Inventor
Hui Xu
Linghan Shen
Original Assignee
Hangzhou Zhonggui Electronic Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hangzhou Zhonggui Electronic Technology Co Ltd filed Critical Hangzhou Zhonggui Electronic Technology Co Ltd
Publication of SG11202111470XA publication Critical patent/SG11202111470XA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • B24B37/30Work carriers for single side lapping of plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/16Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
    • B24B49/165Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load for grinding tyres
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25BTOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005Vacuum work holders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG11202111470XA 2019-04-17 2019-09-04 Wafer loading support, wafer loading system, and wafer mounting method for cmp process SG11202111470XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201910309589 2019-04-17
PCT/CN2019/104291 WO2020211260A1 (en) 2019-04-17 2019-09-04 Wafer loading support, wafer loading system, and wafer mounting method for cmp process

Publications (1)

Publication Number Publication Date
SG11202111470XA true SG11202111470XA (en) 2021-11-29

Family

ID=67593144

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202111470XA SG11202111470XA (en) 2019-04-17 2019-09-04 Wafer loading support, wafer loading system, and wafer mounting method for cmp process

Country Status (6)

Country Link
US (1) US20220152777A1 (en)
KR (1) KR102605197B1 (en)
CN (1) CN110142689B (en)
SG (1) SG11202111470XA (en)
TW (1) TWI713141B (en)
WO (1) WO2020211260A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110142689B (en) * 2019-04-17 2021-09-14 杭州众硅电子科技有限公司 Wafer loading support, wafer loading system and wafer loading method
CN111469046B (en) * 2020-04-22 2020-12-29 华海清科股份有限公司 Wafer loading cup
CN113400195B (en) * 2021-07-21 2022-08-19 北京烁科精微电子装备有限公司 Method and system for online partition adjustment of loading and unloading pressure of polishing head
CN113649945B (en) * 2021-10-20 2022-04-15 杭州众硅电子科技有限公司 Wafer polishing device
CN114279380B (en) * 2021-12-27 2024-02-02 华海清科股份有限公司 Spring piece type wafer in-situ detection device and detection method

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5957751A (en) * 1997-05-23 1999-09-28 Applied Materials, Inc. Carrier head with a substrate detection mechanism for a chemical mechanical polishing system
KR20010030213A (en) * 1999-09-02 2001-04-16 아끼모토 유미 Polishing head, polishing apparatus using polishing head, and method for sensing polished surface state
CN100433269C (en) * 2000-05-12 2008-11-12 多平面技术公司 Pneumatic diaphragm head having independent retaining ring and multi-region pressure control, and method to use the same
JP2002346918A (en) * 2001-05-29 2002-12-04 Speedfam Co Ltd Both surface polishing device
KR100437456B1 (en) * 2001-05-31 2004-06-23 삼성전자주식회사 Polishing head of a chemical mechanical polishing machine and polishing method using the polishing head
KR100470227B1 (en) * 2001-06-07 2005-02-05 두산디앤디 주식회사 Carrier Head for Chemical Mechanical Polishing
JP3892703B2 (en) * 2001-10-19 2007-03-14 富士通株式会社 Semiconductor substrate jig and semiconductor device manufacturing method using the same
KR20060023735A (en) * 2004-09-10 2006-03-15 삼성전자주식회사 Arm for transferring a wafer
TWI354347B (en) * 2006-06-02 2011-12-11 Applied Materials Inc Fast substrate loading on polishing head without m
KR100989432B1 (en) * 2008-07-23 2010-10-26 주식회사 아토 Apparatus for loading wafer on susceptor
CN102049730B (en) * 2010-12-29 2012-02-15 清华大学 Wafer replacing device used in chemical mechanical polishing equipment
JP5875950B2 (en) * 2012-06-29 2016-03-02 株式会社荏原製作所 Substrate holding device and polishing device
CN104625941B (en) * 2013-11-14 2018-09-04 盛美半导体设备(上海)有限公司 Wafer processing apparatus
JP6225088B2 (en) * 2014-09-12 2017-11-01 株式会社荏原製作所 Polishing method and polishing apparatus
KR102412773B1 (en) * 2015-11-27 2022-06-24 주식회사 케이씨텍 Apparatus of loading wafeer in chemical mechanical polishing system
KR101946786B1 (en) * 2017-02-15 2019-02-12 주식회사 케이씨텍 Substrate procesing apparatus
CN109500716A (en) * 2017-09-14 2019-03-22 上海新昇半导体科技有限公司 A kind of polishing disk pedestal, polishing disk, polishing machine and final polishing method
CN110142689B (en) * 2019-04-17 2021-09-14 杭州众硅电子科技有限公司 Wafer loading support, wafer loading system and wafer loading method

Also Published As

Publication number Publication date
WO2020211260A1 (en) 2020-10-22
TWI713141B (en) 2020-12-11
KR102605197B1 (en) 2023-11-22
KR20210126104A (en) 2021-10-19
CN110142689B (en) 2021-09-14
CN110142689A (en) 2019-08-20
US20220152777A1 (en) 2022-05-19
TW202040743A (en) 2020-11-01

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