SG11202007413VA - Vaporizer, substrate processing apparatus and method of manufacturing semiconductor device - Google Patents
Vaporizer, substrate processing apparatus and method of manufacturing semiconductor deviceInfo
- Publication number
- SG11202007413VA SG11202007413VA SG11202007413VA SG11202007413VA SG11202007413VA SG 11202007413V A SG11202007413V A SG 11202007413VA SG 11202007413V A SG11202007413V A SG 11202007413VA SG 11202007413V A SG11202007413V A SG 11202007413VA SG 11202007413V A SG11202007413V A SG 11202007413VA
- Authority
- SG
- Singapore
- Prior art keywords
- vaporizer
- semiconductor device
- processing apparatus
- substrate processing
- manufacturing semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
- 239000006200 vaporizer Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
- H01L21/02337—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a gas or vapour
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2018/011626 WO2019180906A1 (en) | 2018-03-23 | 2018-03-23 | Vaporizer, substrate treatment device, and method for manufacturing semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202007413VA true SG11202007413VA (en) | 2020-09-29 |
Family
ID=67987022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202007413VA SG11202007413VA (en) | 2018-03-23 | 2018-03-23 | Vaporizer, substrate processing apparatus and method of manufacturing semiconductor device |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6907406B2 (en) |
KR (2) | KR20230142659A (en) |
CN (1) | CN111742394A (en) |
SG (1) | SG11202007413VA (en) |
WO (1) | WO2019180906A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7033622B2 (en) | 2020-03-19 | 2022-03-10 | 株式会社Kokusai Electric | Vaporizer, substrate processing equipment, cleaning method and manufacturing method of semiconductor equipment |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3823591B2 (en) * | 1999-03-25 | 2006-09-20 | 三菱電機株式会社 | Vaporizing apparatus for CVD raw material and CVD apparatus using the same |
JP4439030B2 (en) * | 1999-04-01 | 2010-03-24 | 東京エレクトロン株式会社 | Vaporizer, processing apparatus, processing method, and semiconductor chip manufacturing method |
JP2005051006A (en) * | 2003-07-28 | 2005-02-24 | Shimadzu Corp | Vaporizer |
JP2009188266A (en) * | 2008-02-07 | 2009-08-20 | Tokyo Electron Ltd | Liquid raw material vaporizer and film-forming device using it |
JP2010087169A (en) * | 2008-09-30 | 2010-04-15 | Tokyo Electron Ltd | Carburetor and film-forming system using the same |
JP5852774B2 (en) * | 2010-07-14 | 2016-02-03 | 株式会社堀場エステック | Liquid sample heating vaporizer |
JP2013089911A (en) * | 2011-10-21 | 2013-05-13 | Hitachi Kokusai Electric Inc | Substrate processing apparatus and manufacturing method of semiconductor device |
KR101615584B1 (en) | 2011-11-21 | 2016-04-26 | 가부시키가이샤 히다치 고쿠사이 덴키 | Apparatus for manufacturing semiconductor device, method for manufacturing semiconductor device, and recording medium |
WO2013094680A1 (en) * | 2011-12-20 | 2013-06-27 | 株式会社日立国際電気 | Substrate processing device, method for manufacturing semiconductor device, and vaporizer |
KR101678100B1 (en) * | 2015-02-12 | 2016-11-22 | (주)티티에스 | Source supply device and substrate processing apparatus |
CN108780752A (en) * | 2016-03-24 | 2018-11-09 | 株式会社国际电气 | The manufacturing method of gasifier, substrate processing device and semiconductor devices |
-
2018
- 2018-03-23 WO PCT/JP2018/011626 patent/WO2019180906A1/en active Application Filing
- 2018-03-23 JP JP2020507238A patent/JP6907406B2/en active Active
- 2018-03-23 KR KR1020237033574A patent/KR20230142659A/en not_active Application Discontinuation
- 2018-03-23 KR KR1020207022183A patent/KR20200101981A/en not_active IP Right Cessation
- 2018-03-23 SG SG11202007413VA patent/SG11202007413VA/en unknown
- 2018-03-23 CN CN201880089963.XA patent/CN111742394A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2019180906A1 (en) | 2019-09-26 |
CN111742394A (en) | 2020-10-02 |
KR20230142659A (en) | 2023-10-11 |
JP6907406B2 (en) | 2021-07-21 |
JPWO2019180906A1 (en) | 2020-12-17 |
KR20200101981A (en) | 2020-08-28 |
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