JP2009188266A - Liquid raw material vaporizer and film-forming device using it - Google Patents

Liquid raw material vaporizer and film-forming device using it Download PDF

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JP2009188266A
JP2009188266A JP2008027997A JP2008027997A JP2009188266A JP 2009188266 A JP2009188266 A JP 2009188266A JP 2008027997 A JP2008027997 A JP 2008027997A JP 2008027997 A JP2008027997 A JP 2008027997A JP 2009188266 A JP2009188266 A JP 2009188266A
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liquid
raw material
vaporizer
radiant heat
source
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Yasuyuki Okabe
庸之 岡部
Nariyuki Okura
成幸 大倉
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to CN2008801264743A priority patent/CN101939827B/en
Priority to KR1020107013745A priority patent/KR101176737B1/en
Priority to PCT/JP2008/072233 priority patent/WO2009098815A1/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
    • H01L21/02175—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal
    • H01L21/02181—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing hafnium, e.g. HfO2
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment

Abstract

<P>PROBLEM TO BE SOLVED: To prevent clogging of an air permeable member with droplets left unvaporized by averaging the temperature of the entire air permeable member in vaporization of the droplets of liquid raw material through the air permeable member. <P>SOLUTION: The liquid raw material vaporizer 300 has a liquid raw material supply part 300A dropping and discharging the liquid raw material to a vaporization space 350, a vaporization part 300B, an inlet 338 introducing the dropped liquid raw material from the liquid raw material supply part into the vaporization part, a mist trap part 360 constituted by the air permeable member 362 disposed in the vaporization part and made of a material heated with radiant heat, a radiation heater 370 radiating the entire outer surface of the air permeable member with heat rays to heat the air permeable member with the radiant heat, and an outlet 340 feeding a raw gas generated by vaporizing the dropped liquid raw material through the heated air permeable member to the outside. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は，液体原料を気化させて原料ガスを生成する液体原料気化器及びそれを用いた成膜装置に関する。   The present invention relates to a liquid source vaporizer that generates a source gas by vaporizing a liquid source and a film forming apparatus using the same.

半導体基板やガラス基板などの被処理基板の表面上に，誘電体，金属，半導体などの薄膜を成膜する方法として，上記被処理基板が載置されている成膜室に有機金属化合物などの有機原料ガスを供給し，この有機原料ガスと酸素やアンモニアなどの他のガスとを反応させて成膜する化学気相成長（ＣＶＤ：Ｃｈｅｍｉｃａｌ Ｖａｐｏｒ Ｄｅｐｏｓｉｔｉｏｎ）法が知られている。このようなＣＶＤ法で用いられる有機原料は，常温で液体あるいは固体であるものが多いため，有機原料を気化させるための気化器が必要になる。   As a method of forming a thin film of dielectric, metal, semiconductor, etc. on the surface of a substrate to be processed such as a semiconductor substrate or a glass substrate, an organic metal compound or the like is formed in a film forming chamber in which the substrate to be processed is placed. There is known a chemical vapor deposition (CVD) method in which an organic source gas is supplied and this organic source gas is reacted with another gas such as oxygen or ammonia to form a film. Since many organic raw materials used in such a CVD method are liquid or solid at room temperature, a vaporizer for vaporizing the organic raw materials is required.

通常，上記有機原料は，予め溶媒を用いて液体状にされてから気化器に導入される。このような液体原料を気化させて原料ガスを生成する従来の気化器としては，例えば気化室内に多数の孔を有する気化面を設け，この気化面を抵抗加熱ヒータで加熱しつつ，ノズルから液体原料を吐出して液滴（ミスト）状にしたものをキャリアガスの流れに乗せて気化面に吹き付けることによって気化させるものがある。   Usually, the organic raw material is introduced into a vaporizer after having been liquefied beforehand using a solvent. As a conventional vaporizer that vaporizes such a liquid raw material to generate a raw material gas, for example, a vaporization surface having a large number of holes is provided in the vaporization chamber, and the vaporization surface is heated by a resistance heater while the liquid is discharged from the nozzle. There is a type in which a raw material discharged into droplets (mist) is vaporized by being placed on the flow of a carrier gas and sprayed on a vaporization surface.

このような気化器においては，気化効率を高めるために液体原料をできるだけ小径な液滴にして気化面に吹き付けることが望ましい。ところが，液滴の径を小さくするほど，気化面に接触せずにその孔を通り抜けてしまう虞がある。このように気化しきれなかった液滴は，キャリアガスの気流に乗って成膜室内に浸入してパーティクル発生の要因になる。例えば気化しきれなかった液体原料の液滴が成膜室内に浸入した際にその成膜室に酸素が残留していると，その液滴が酸化して微細なパーティクルとなり，これが基板に付着すると異常成膜や膜質不良が生じるという問題がある。   In such a vaporizer, in order to increase the vaporization efficiency, it is desirable to spray the liquid raw material into droplets having a diameter as small as possible and spray the vaporized surface. However, the smaller the diameter of the droplet, the more likely it will pass through the hole without contacting the vaporization surface. The droplets that could not be vaporized in this way enter the film formation chamber on the carrier gas stream and cause generation of particles. For example, if a liquid source droplet that could not be vaporized entered the deposition chamber and oxygen remained in the deposition chamber, the droplet would oxidize into fine particles that would adhere to the substrate. There is a problem that abnormal film formation and film quality defects occur.

このため，従来は，気化器で生成された原料ガスを微小な孔を有するフィルタを通して成膜室に供給させるようにし，このフィルタを抵抗加熱ヒータなどで加熱して，原料ガスに含まれる気化しきれなかった液滴をフィルタを通して気化させるようにしていた。これによれば，気化器自体の気化効率が多少悪くても，気化しきれなかった液滴がそのまま成膜室内に浸入することを防ぐことができる。   For this reason, conventionally, the raw material gas generated by the vaporizer is supplied to the film forming chamber through a filter having minute holes, and this filter is heated by a resistance heater or the like to vaporize the raw material gas. The droplets that could not be broken were vaporized through the filter. According to this, even if the vaporization efficiency of the vaporizer itself is somewhat poor, it is possible to prevent the liquid droplets that could not be vaporized from entering the film forming chamber as they are.

また，気化効率を高めるため，細孔を有する固体充填物や多孔質体のような微小な孔を有する通気性部材を配置し，この通気性部材を抵抗加熱ヒータや熱媒体などで加熱して，液体原料の液滴を通して気化させるものもある（例えば特許文献１，２参照）。これによれば，液滴が通気性部材に接触する可能性も増えるので，気化効率を高めることができる。   In addition, in order to increase the vaporization efficiency, a gas-permeable member having fine pores such as a solid packing having a pore or a porous material is disposed, and the gas-permeable member is heated by a resistance heater or a heat medium. Some of them are vaporized through droplets of a liquid source (see, for example, Patent Documents 1 and 2). According to this, since the possibility that the droplet contacts the breathable member increases, the vaporization efficiency can be improved.

特開２００５−３４７５９８号公報JP 2005-347598 A 特開平１０−８５５８１号公報Japanese Patent Laid-Open No. 10-85581

しかしながら，従来，液体原料の液滴を気化するために使用されていた固体充填物，多孔質体，フィルタなどの通気性部材は，抵抗加熱ヒータからの熱伝導によって加熱していたので，通気性部材全体に渡って均一に熱量を供給することができなかった。通気性部材のうち例えば抵抗加熱ヒータから離れていて熱量が十分届かない部分など温度が低い部分が存在するので，液滴が気化されずに目詰まりを起こす虞があった。   However, air-permeable members such as solid fillers, porous bodies, and filters that have been used to vaporize liquid raw material droplets have been heated by heat conduction from a resistance heater. The amount of heat could not be supplied uniformly over the entire member. Among the breathable members, for example, there are portions where the temperature is low, such as a portion where the amount of heat does not reach sufficiently because they are separated from the resistance heater, so there is a possibility that the droplets are not vaporized and clogged.

特に，通気性部材の表面には多数の孔が形成されていることからその表面積は広く，元来，通気性部材は放熱性が高いものである。しかもその表面は，温度の低い原料ガスや液体原料の液滴に晒されている。このため，通気性部材全体のうち抵抗加熱ヒータからの熱が伝わりにくい領域はさらに温度が低下してしまう。また，通気性部材の表面に液体原料の液滴が付着して気化されると，そのときの気化熱によって通気性部材から熱が奪われることになる。このとき，熱が伝わりにくい領域ではその気化熱分の熱エネルギーを十分に補充することができず，結果として通気性部材の中で温度差が生じてしまう。   In particular, since a large number of holes are formed on the surface of the air-permeable member, the surface area thereof is wide, and the air-permeable member originally has high heat dissipation. In addition, the surface is exposed to low temperature source gas or liquid source droplets. For this reason, in the whole breathable member, the temperature of the region where the heat from the resistance heater is difficult to be transmitted further decreases. Further, when a liquid material droplet adheres to the surface of the air-permeable member and is vaporized, heat is removed from the air-permeable member by the heat of vaporization at that time. At this time, in the region where heat is not easily transmitted, the heat energy corresponding to the heat of vaporization cannot be sufficiently replenished, resulting in a temperature difference in the breathable member.

例えば特許文献１に記載の気化器では，固体充填物はその外側の抵抗加熱ヒータからの熱伝導によって加熱されるため，固体充填物のうち抵抗加熱ヒータに近い外周領域に比べて中央領域の温度が低くなるなど，固体充填物全体の温度を均一にすることは困難である。このような場合，中央領域の温度が液体原料を気化させることができる温度に達せず，気化不良が発生して固体充填物が目詰まりする虞がある。   For example, in the vaporizer described in Patent Document 1, since the solid filling is heated by heat conduction from the resistance heater on the outside, the temperature in the central region of the solid filling is higher than the outer peripheral region near the resistance heater. It is difficult to make the temperature of the entire solid packing uniform, such as lowering the temperature. In such a case, the temperature of the central region does not reach the temperature at which the liquid raw material can be vaporized, and vaporization failure may occur and the solid packing may be clogged.

これに対して，特許文献２に記載の気化器では，多孔質体にて目詰まりを起こすことなく液体原料を効率よく気化させるために，多孔質体内の一部を通る流路を設け，この流路に熱媒体を流通させることによって多孔質体の内部から加熱している。しかしながら，これだけでは目詰まりを防止する点で十分とは言えない。すなわち，熱媒体を流通させる流路は多孔質体内の一部に配置されているだけであるため，多孔質体全体にわたって均一に熱を伝えることはできない。このため部分的に気化不良が発生し，多孔質体が目詰まりする虞は払拭しきれない。また，多孔質体全体にわたって均一に熱を伝えるためには，多孔質体全体に隈無く流路を形成すればよいとも考えられる。しかし，そのようにすれば構造が複雑となるばかりか，流路を形成した分だけ原料ガスが通過できる領域が減少し，多孔質体における圧力損失が大きくなってしまう。これでは，所定の流量の原料ガスを得ることができなくなる。   In contrast, in the vaporizer described in Patent Document 2, in order to efficiently vaporize the liquid raw material without causing clogging in the porous body, a flow path passing through a part of the porous body is provided. Heating is performed from the inside of the porous body by circulating a heat medium through the flow path. However, this alone is not sufficient to prevent clogging. That is, since the flow path through which the heat medium flows is only arranged in a part of the porous body, heat cannot be transmitted uniformly over the entire porous body. For this reason, poor vaporization occurs partially, and the possibility of clogging the porous body cannot be wiped out. In addition, in order to transmit heat uniformly over the entire porous body, it is considered that a flow path may be formed throughout the entire porous body. However, by doing so, not only the structure becomes complicated, but also the region through which the source gas can pass is reduced by the amount of the flow path formed, and the pressure loss in the porous body increases. This makes it impossible to obtain a raw material gas having a predetermined flow rate.

そこで，本発明はこのような問題に鑑みてなされたもので，その目的とするところは，液体原料の液滴を通気性部材を通して気化させる際に，通気性部材全体の温度を均一にすることができ，気化しきれずに目詰まりを起こすことを防止できる液体原料気化器およびそれを用いた成膜装置を提供することにある。   Therefore, the present invention has been made in view of such problems, and an object of the present invention is to make the temperature of the entire breathable member uniform when vaporizing liquid raw material droplets through the breathable member. An object of the present invention is to provide a liquid source vaporizer that can prevent clogging without being vaporized and a film forming apparatus using the same.

上記課題を解決するために，本発明のある観点によれば，液体原料を液滴状にして吐出する液体原料供給部と，前記液滴状の液体原料を気化させて原料ガスを生成する気化部と，前記液体原料供給部からの前記液滴状の液体原料を前記気化部内に導入する導入口と，前記気化部内に配置され，輻射熱によって加熱される材料で構成された通気性部材からなるミストトラップ部と，前記通気性部材の外側表面の全体に熱線を照射し，その輻射熱によって前記通気性部材を加熱する輻射熱ヒータと，加熱された前記通気性部材に前記液滴状の液体原料を通して気化させることによって生成した原料ガスを外部に送出する送出口とを備えたことを特徴とする液体原料気化器が提供される。   In order to solve the above-described problems, according to one aspect of the present invention, a liquid material supply unit that discharges liquid material in the form of droplets, and a vaporization that generates the material gas by vaporizing the liquid material in the form of droplets. And an introduction port for introducing the liquid material in the form of liquid droplets from the liquid material supply unit into the vaporization unit, and a breathable member disposed in the vaporization unit and made of a material heated by radiant heat A radiant heat heater that irradiates the entire outer surface of the mist trap portion and the breathable member with heat rays and heats the breathable member by the radiant heat, and the liquid material in the form of droplets is passed through the heated breathable member. There is provided a liquid raw material vaporizer characterized by comprising a delivery port for sending the raw material gas generated by vaporization to the outside.

上記課題を解決するために，本発明の別の観点によれば，液体原料を気化させて原料ガスを生成する液体原料気化器から原料ガスを導入して被処理基板に対して成膜処理を行う成膜室を備える成膜装置であって，前記液体原料気化器は，前記液体原料を液滴状にして吐出する液体原料供給部と，前記液滴状の液体原料を気化させて原料ガスを生成する気化部と，前記液体原料供給部からの前記液滴状の液体原料を前記気化部内に導入する導入口と，前記気化部内に配置され，輻射熱によって加熱される材料で構成された通気性部材からなるミストトラップ部と，前記通気性部材の外側表面の全体に熱線を照射し，その輻射熱によって前記通気性部材を加熱する輻射熱ヒータと，加熱された前記通気性部材に前記液滴状の液体原料を通して気化させることによって生成した原料ガスを外部に送出する送出口とを備えたことを特徴とする成膜装置が提供される。   In order to solve the above problems, according to another aspect of the present invention, a raw material gas is introduced from a liquid raw material vaporizer that vaporizes a liquid raw material to generate a raw material gas, and a film forming process is performed on the substrate to be processed. A film forming apparatus including a film forming chamber, wherein the liquid source vaporizer includes a liquid source supply unit that discharges the liquid source in the form of droplets, and a source gas that vaporizes the droplet-like liquid source A vaporizer configured to generate gas, an inlet for introducing the liquid material in the form of liquid droplets from the liquid material supply unit into the vaporization unit, and a vent configured by a material disposed in the vaporization unit and heated by radiant heat A mist trap portion made of a heat-permeable member, and a radiant heat heater that irradiates the entire outer surface of the air-permeable member with heat rays and heats the air-permeable member with its radiant heat, and the droplet-like shape on the heated air-permeable member. Vaporization through liquid raw materials Film forming apparatus characterized is provided that includes a delivery port delivering the generated raw material gas to the outside by causing.

このような本発明によれば，液滴状の液体原料を捕捉して気化させるミストトラップ部を輻射熱によって加熱される通気性部材で構成し，輻射熱ヒータによって通気性部材の外側表面全体に熱線を照射するので，通気性部材全体を均一に加熱することができる。これにより全体に渡って通気性部材の温度を均一にすることができるので，通気性部材に液滴状の液体原料を通すだけで，液滴を満遍なくすべて気化させることができる。これにより，従来以上に気化効率を向上させることができるとともに，部分的な温度低下による気化不良を防止できるため，通気性部材の目詰まりを防止することができる。さらに，通気性部材の外側表面全体を直接加熱できるので，通気性部材を液滴状の液体原料が通る際に，液滴の気化熱によりどの部分で熱が奪われても，素早く熱エネルギーを補充することができる。   According to the present invention as described above, the mist trap part that captures and vaporizes the liquid material in the form of liquid droplets is constituted by the breathable member heated by radiant heat, and the radiant heat heater applies the heat rays to the entire outer surface of the breathable member. Since irradiation is performed, the entire breathable member can be heated uniformly. As a result, the temperature of the air-permeable member can be made uniform throughout, so that all the liquid droplets can be vaporized evenly by simply passing the liquid material in the form of liquid droplets through the air-permeable member. Thereby, while being able to improve vaporization efficiency more than before, since the vaporization defect by a partial temperature fall can be prevented, clogging of a breathable member can be prevented. Furthermore, since the entire outer surface of the air-permeable member can be directly heated, no matter where the heat is taken away by the vaporization heat of the liquid droplets when the liquid material passes through the air-permeable member, heat energy can be quickly obtained. Can be replenished.

また，上記気化部の前記導入口と前記送出口とは対向して設け，前記通気性部材は，前記導入口側から前記送出口側にわたって配置された筒状の形状をなし，前記導入口側の端部は閉じられるとともに，前記送出口側の端部は前記送出口に連通するように構成するのが好ましい。このように，通気性部材を筒状に形成することで，よりコンパクトなサイズで通気性部材の表面の面積をより大きくとれるので，より多くの液滴状の液体原料を気化させて十分な量の原料ガスを生成できるとともに，所定の温度まで加熱する時間を短くできるなど，加熱効率を高めることもできる。また，導入口側の端部は閉じられることにより，導入口から供給される液体原料の液滴を輻射熱ヒータに囲まれる通気性部材の外側側面に導くことができる。   Further, the introduction port and the delivery port of the vaporization section are provided to face each other, and the air-permeable member has a cylindrical shape arranged from the introduction port side to the delivery port side, and the introduction port side It is preferable that the end of the outlet is closed and the end on the outlet side communicates with the outlet. In this way, by forming the air-permeable member in a cylindrical shape, the surface area of the air-permeable member can be increased with a more compact size. Therefore, a sufficient amount of liquid material can be vaporized by vaporizing more liquid droplets. In addition, it is possible to increase the heating efficiency, such as shortening the time for heating to a predetermined temperature. Further, by closing the end portion on the introduction port side, it is possible to guide the liquid material droplet supplied from the introduction port to the outer side surface of the breathable member surrounded by the radiant heat heater.

この場合，上記輻射熱ヒータは，前記通気性部材の外側表面を囲むように配置することが好ましい。このような輻射熱ヒータは，例えば所望の形状に加工し易いカーボンヒータにより構成される。これによれば，輻射熱ヒータから通気性部材の表面全体を一度に加熱できるので，加熱効率をより高めることができる。   In this case, it is preferable that the radiant heater is disposed so as to surround the outer surface of the breathable member. Such a radiant heater is composed of, for example, a carbon heater that can be easily processed into a desired shape. According to this, since the whole surface of the air-permeable member can be heated from the radiant heat heater at a time, the heating efficiency can be further increased.

さらに，上記通気性部材と前記輻射熱ヒータとの間に，前記液滴状の液体原料が流通する気化空間と前記輻射熱ヒータの配設空間とを仕切る筒状の仕切部材を前記通気性部材を囲むように設け，前記仕切部材は，前記輻射熱ヒータが照射する熱線を透過させる通気性のない部材で構成することが好ましい。このような仕切部材は例えば石英で構成する。このような仕切部材を設けることによって，輻射熱ヒータの表面にパーティクルが付着することを防止できるとともに，液滴状の液体原料の気化効率を向上させることができる。すなわち，仕切部材の内側表面とミストトラップ部の外側側面との間に輻射熱ヒータに囲まれる流路が形成されるので，この流路を通る液滴状の液体原料に輻射熱ヒータからの熱線が直接作用するとともに，通気性部材が加熱されれば流路全体の雰囲気も加熱される。これにより，液滴状の液滴の気化効率をより向上させることができる。   Further, a cylindrical partition member that partitions the vaporization space in which the liquid material in the form of liquid droplets circulates and the installation space of the radiant heat heater is surrounded by the gas permeable member between the gas permeable member and the radiant heat heater. It is preferable that the partition member is formed of a non-breathable member that transmits heat rays irradiated by the radiant heater. Such a partition member is made of, for example, quartz. By providing such a partition member, it is possible to prevent particles from adhering to the surface of the radiant heat heater and to improve the vaporization efficiency of the liquid material in the form of droplets. That is, since a flow path surrounded by the radiant heat heater is formed between the inner surface of the partition member and the outer side surface of the mist trap part, the heat rays from the radiant heat heater are directly applied to the liquid droplet material passing through the flow path. In addition, if the air-permeable member is heated, the atmosphere of the entire flow path is also heated. Thereby, the vaporization efficiency of a droplet-like droplet can be further improved.

この場合，さらに通気性部材の導入口側の端部を閉じることで，導入口から供給される液体原料の液滴のすべてをミストトラップ部と仕切部材との間に形成される輻射熱ヒータに囲まれた流路に導くことができる。これにより，すべての液体原料の液滴に輻射熱ヒータの熱線を作用させることができるとともに，輻射熱ヒータで直接加熱される通気性部材の外側表面に効率よく導くことができる。従って，気化効率をより一層向上させることができる。   In this case, by closing the end of the breathable member on the inlet side, all of the liquid material droplets supplied from the inlet are surrounded by a radiant heat heater formed between the mist trap and the partition member. Can be led to a defined flow path. Thus, the heat rays of the radiant heater can be applied to all liquid raw material droplets, and can be efficiently guided to the outer surface of the breathable member that is directly heated by the radiant heater. Therefore, the vaporization efficiency can be further improved.

また，前記通気性部材の温度を測定する温度センサと，前記温度センサによって測定された前記通気性部材の温度に基づいて前記輻射熱ヒータを制御することにより，前記通気性部材の温度を所定の温度に調節する制御部とを設けるようにしてもよい。温度センサによって通気性部材の温度を直接測定して監視し，その測定された温度に基づいて，輻射熱ヒータを制御することで，通気性部材の温度を正確に調整することができる。このため，通気性部材全体の温度を所定の温度に常に保持することができる。   Further, the temperature of the breathable member is controlled, and the radiant heater is controlled based on the temperature of the breathable member measured by the temperature sensor, whereby the temperature of the breathable member is set to a predetermined temperature. A control unit that adjusts to the above may be provided. The temperature of the breathable member can be accurately adjusted by directly measuring and monitoring the temperature of the breathable member with the temperature sensor and controlling the radiant heat heater based on the measured temperature. For this reason, the temperature of the whole breathable member can always be kept at a predetermined temperature.

また，上記気化部の外枠を構成するハウジングの内側面は，前記輻射熱ヒータからの熱線を反射して前記通気性部材の外側表面に向かうように鏡面加工することが好ましい。これにより，輻射熱ヒータからの熱線を効率よく通気性部材に集めることができるので，通気性部材の加熱効率を高めることができる。   The inner surface of the housing constituting the outer frame of the vaporizing section is preferably mirror-finished so as to reflect the heat rays from the radiant heat heater and go to the outer surface of the breathable member. Thereby, the heat rays from the radiant heat heater can be efficiently collected on the breathable member, so that the heating efficiency of the breathable member can be increased.

上記課題を解決するために，本発明の別の観点によれば，液体原料を気化させて原料ガスを生成する他の液体原料気化器に接続される液体原料気化器であって，前記他の液体原料気化器で生成された原料ガスを導入する導入口と，輻射熱によって加熱される材料で構成された通気性部材からなるミストトラップ部と，前記通気性部材の外側表面の全体に熱線を照射し，その輻射熱によって前記通気性部材を加熱する輻射熱ヒータと，前記導入口から導入した前記他の液体原料気化器からの原料ガスを，加熱された前記通気性部材を通して外部に送出する送出口とを備えたことを特徴とする液体原料気化器が提供される。   In order to solve the above-mentioned problems, according to another aspect of the present invention, there is provided a liquid source vaporizer connected to another liquid source vaporizer for generating a source gas by vaporizing a liquid source. Irradiate the entire outer surface of the breathable member with an introduction port for introducing the raw material gas generated by the liquid raw material vaporizer, a mist trap part made of a breathable member made of a material heated by radiant heat And a radiant heat heater that heats the breathable member by the radiant heat, and a delivery port that sends the source gas from the other liquid source vaporizer introduced from the inlet to the outside through the heated breathable member; A liquid raw material vaporizer is provided.

このような本発明によれば，輻射熱ヒータからの輻射熱によって加熱された通気性部材に他の液体原料気化器で生成された原料ガスを通すことにより，他の液体原料気化器で気化しきれなかった液滴も，本発明にかかる液体原料気化器で気化させることができる。   According to the present invention, by passing the raw material gas generated by the other liquid raw material vaporizer through the breathable member heated by the radiant heat from the radiant heat heater, the other liquid raw material vaporizer cannot be vaporized. The liquid droplets can also be vaporized by the liquid raw material vaporizer according to the present invention.

上記課題を解決するために，本発明の別の観点によれば，液体原料を気化させて原料ガスを生成する液体原料気化器から原料ガスを導入して被処理基板に対して成膜処理を行う成膜室を備える成膜装置であって，前記液体原料気化器は，液体原料を気化させて原料ガスを生成する第１の液体原料気化器とこれに接続された第２の液体原料気化器により構成され，前記第２の液体原料気化器は，前記第１の液体原料気化器で生成された原料ガスを導入する導入口と，輻射熱によって加熱される材料で構成された通気性部材からなるミストトラップ部と，前記通気性部材の外側表面の全体に熱線を照射し，その輻射熱によって前記通気性部材を加熱する輻射熱ヒータと，前記導入口から導入した前記第１の液体原料気化器からの原料ガスを，加熱された前記通気性部材を通して外部に送出する送出口とを備えたことを特徴とする成膜装置が提供される。   In order to solve the above problems, according to another aspect of the present invention, a raw material gas is introduced from a liquid raw material vaporizer that vaporizes a liquid raw material to generate a raw material gas, and a film forming process is performed on the substrate to be processed. A film forming apparatus including a film forming chamber, wherein the liquid raw material vaporizer includes a first liquid raw material vaporizer that vaporizes a liquid raw material to generate a raw material gas, and a second liquid raw material vaporizer connected thereto. The second liquid raw material vaporizer comprises an inlet for introducing the raw material gas generated by the first liquid raw material vaporizer, and a breathable member composed of a material heated by radiant heat. A mist trap section, a radiant heat heater that irradiates the entire outer surface of the breathable member with heat rays, and heats the breathable member by the radiant heat, and the first liquid raw material vaporizer introduced from the inlet. The raw material gas is heated Film forming apparatus characterized by comprising a delivery port delivering the outside is provided through said breathable member.

このような本発明によれば，輻射熱ヒータからの輻射熱によって加熱された第２の液体原料気化器の通気性部材に，第１の液体原料気化器で生成された原料ガスを通すことにより，第１の液体原料気化器で気化しきれなかった液滴も，第２の液体原料気化器で気化させることができる。これにより，成膜室などに原料ガスとともに液体原料の液滴が入り込むことを防止できる。   According to the present invention, the raw material gas generated by the first liquid raw material vaporizer is passed through the gas permeable member of the second liquid raw material vaporizer heated by the radiant heat from the radiant heat heater. Droplets that could not be vaporized by one liquid source vaporizer can also be vaporized by the second liquid source vaporizer. Thereby, it is possible to prevent liquid material droplets from entering the film forming chamber and the like together with the material gas.

本発明によれば，液体原料の液滴を通気性部材に通す際に，輻射熱ヒータによる輻射熱によって通気性部材の全体を直接加熱することができる。このため，通気性部材全体に渡って均一に加熱することができるので，液滴を満遍なくすべて気化させることができる。これにより，従来よりも気化効率を向上させることができるとともに，部分的な温度低下による気化不良を防止できるため，通気性部材の目詰まりを防止することができる。   According to the present invention, when the liquid material droplets are passed through the breathable member, the entire breathable member can be directly heated by the radiant heat generated by the radiant heat heater. For this reason, since it can heat uniformly over the whole air permeable member, all the droplets can be vaporized uniformly. As a result, the vaporization efficiency can be improved as compared with the conventional case, and the vaporization failure due to a partial temperature drop can be prevented, so that the air-permeable member can be prevented from being clogged.

以下に添付図面を参照しながら，本発明の好適な実施の形態について詳細に説明する。なお，本明細書及び図面において，実質的に同一の機能構成を有する構成要素については，同一の符号を付することにより重複説明を省略する。   Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the present specification and drawings, components having substantially the same functional configuration are denoted by the same reference numerals, and redundant description is omitted.

（第１実施形態にかかる成膜装置）
まず，本発明の第１実施形態にかかる成膜装置について図面を参照しながら説明する。図１は第１実施形態にかかる成膜装置の概略構成例を説明するための図である。図１に示す成膜装置１００は，被処理基板例えば半導体ウエハ（以下，単に「ウエハ」という）Ｗ上にＣＶＤ法により金属酸化物膜を成膜するものであり，例えばＨＴＢ（ハフニウムタートブトキサイド）などのＨｆを含有する液体原料を供給する液体原料供給源１１０と，Ａｒなどの不活性ガスをキャリアガスとして供給するキャリアガス供給源１２０と，液体原料供給源１１０から供給される液体原料を気化させて原料ガスを生成する液体原料気化器３００と，液体原料気化器３００が生成した原料ガスを用いてウエハＷに例えばＨｆＯ２膜を形成する成膜室２００と，成膜装置１００の各部を制御する制御部１４０を備えている。 (Film Forming Apparatus According to First Embodiment)
First, a film forming apparatus according to a first embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a diagram for explaining a schematic configuration example of a film forming apparatus according to the first embodiment. A film forming apparatus 100 shown in FIG. 1 forms a metal oxide film on a substrate to be processed, for example, a semiconductor wafer (hereinafter simply referred to as “wafer”) W by a CVD method, for example, an HTB (hafnium tarbutoxy). Liquid source supply source 110 for supplying a liquid source containing Hf such as side), a carrier gas supply source 120 for supplying an inert gas such as Ar as a carrier gas, and a liquid source supplied from the liquid source supply source 110 Of a liquid source vaporizer 300 that generates a source gas by vaporizing, a film formation chamber 200 that forms, for example, an HfO 2 film on the wafer W using the source gas generated by the liquid source vaporizer 300, and a film forming apparatus 100 A control unit 140 that controls each unit is provided.

液体原料供給源１１０と液体原料気化器３００は，液体原料供給配管１１２で接続されており，キャリアガス供給源１２０と液体原料気化器３００は，キャリアガス供給配管１２２で接続されており，液体原料気化器３００と成膜室２００は，原料ガス供給配管１３２で接続されている。そして，液体原料供給配管１１２には液体原料流量制御バルブ１１４が備えられ，キャリアガス供給配管１２２にはキャリアガス流量制御バルブ１２４が備えられ，原料ガス供給配管１３２には原料ガス流量制御バルブ１３４が備えられている。これら液体原料流量制御バルブ１１４，キャリアガス流量制御バルブ１２４及び原料ガス流量制御バルブ１３４は，制御部１４０からの制御信号によってそれぞれの開度が調整されるように構成されている。制御部１４０は，液体原料供給配管１１２を流れる液体原料の流量，キャリアガス供給配管１２２を流れるキャリアガスの流量，及び原料ガス供給配管１３２を流れる原料ガスの流量を測定して，その測定結果に応じて制御信号を出力することが好ましい。   The liquid source supply source 110 and the liquid source vaporizer 300 are connected by a liquid source supply pipe 112, and the carrier gas supply source 120 and the liquid source vaporizer 300 are connected by a carrier gas supply pipe 122. The vaporizer 300 and the film forming chamber 200 are connected by a source gas supply pipe 132. The liquid source supply pipe 112 is provided with a liquid source flow rate control valve 114, the carrier gas supply pipe 122 is provided with a carrier gas flow rate control valve 124, and the source gas supply pipe 132 is provided with a source gas flow rate control valve 134. Is provided. The liquid raw material flow rate control valve 114, the carrier gas flow rate control valve 124 and the raw material gas flow rate control valve 134 are configured such that their opening degrees are adjusted by a control signal from the control unit 140. The control unit 140 measures the flow rate of the liquid raw material flowing through the liquid raw material supply pipe 112, the flow rate of the carrier gas flowing through the carrier gas supply pipe 122, and the flow rate of the raw material gas flowing through the raw material gas supply pipe 132. Accordingly, it is preferable to output a control signal.

成膜室２００は，例えば略円筒状の側壁部材２１０を有し，この側壁部材２１０と天壁部材２１２と底壁部材２１４に囲まれた内部空間に，ウエハＷが水平に載置されるサセプタ２２２を備えて構成される。側壁部材２１０と天壁部材２１２と底壁部材２１４は，例えばアルミニウム，ステンレス鋼などの金属で構成される。サセプタ２２２は，円筒状の複数の支持部材２２４（ここでは，１本のみ図示）により支持されている。また，サセプタ２２２にはヒータ２２６が埋め込まれており，電源２２８からこのヒータ２２６に供給される電力を制御することによってサセプタ２２２上に載置されたウエハＷの温度を調整することができる。   The film formation chamber 200 includes, for example, a substantially cylindrical side wall member 210, and a susceptor on which the wafer W is horizontally placed in an internal space surrounded by the side wall member 210, the top wall member 212, and the bottom wall member 214. 222 is comprised. The side wall member 210, the top wall member 212, and the bottom wall member 214 are made of a metal such as aluminum or stainless steel. The susceptor 222 is supported by a plurality of cylindrical support members 224 (only one is shown here). A heater 226 is embedded in the susceptor 222, and the temperature of the wafer W placed on the susceptor 222 can be adjusted by controlling the power supplied from the power source 228 to the heater 226.

成膜室２００の底壁部材２１４には排気口２３０が形成されており，この排気口２３０には排気手段２３２が接続されている。そして排気手段２３２によって成膜室２００内を所定の真空度に調節することができる。   An exhaust port 230 is formed in the bottom wall member 214 of the film forming chamber 200, and an exhaust unit 232 is connected to the exhaust port 230. Then, the inside of the film formation chamber 200 can be adjusted to a predetermined degree of vacuum by the exhaust unit 232.

成膜室２００の天壁部材２１２には，シャワーヘッド２４０が取り付けられている。このシャワーヘッド２４０には原料ガス供給配管１３２が接続されており，この原料ガス供給配管１３２を経由して，液体原料気化器３００で生成された原料ガスがシャワーヘッド２４０内に導入される。シャワーヘッド２４０は，内部空間２４２と，この内部空間２４２に連通する多数のガス吐出孔２４４を有している。原料ガス供給配管１３２を介してシャワーヘッド２４０の内部空間２４２に導入された原料ガスは，ガス吐出孔２４４からサセプタ２２２上のウエハＷに向けて吐出される。   A shower head 240 is attached to the top wall member 212 of the film forming chamber 200. A raw material gas supply pipe 132 is connected to the shower head 240, and the raw material gas generated by the liquid raw material vaporizer 300 is introduced into the shower head 240 via the raw material gas supply pipe 132. The shower head 240 has an internal space 242 and a number of gas discharge holes 244 communicating with the internal space 242. The source gas introduced into the internal space 242 of the shower head 240 via the source gas supply pipe 132 is discharged toward the wafer W on the susceptor 222 from the gas discharge hole 244.

この成膜装置１００では，液体原料気化器３００からの原料ガスが次のようにして供給される。液体原料気化器３００に液体原料供給源１１０からの液体原料が液体原料供給配管１１２を介して供給されるとともに，キャリアガス供給源１２０からのキャリアガスがキャリアガス供給配管１２２を介して供給されると，液体原料気化器３００の後述する液体原料供給部３００Ａによってキャリアガスとともに液体原料が液滴状となって気化部３００Ｂに吐出され，その液滴が気化部３００Ｂで気化されて原料ガスが生成される。液体原料気化器３００で生成された原料ガスは，原料ガス供給配管１３２を介して成膜室２００に供給され，成膜室２００内のウエハＷに対して所望のプロセス処理が施される。   In the film forming apparatus 100, the source gas from the liquid source vaporizer 300 is supplied as follows. The liquid source from the liquid source supply source 110 is supplied to the liquid source vaporizer 300 via the liquid source supply pipe 112 and the carrier gas from the carrier gas supply source 120 is supplied via the carrier gas supply pipe 122. Then, a liquid source supply unit 300A, which will be described later, of the liquid source vaporizer 300 forms a liquid material together with a carrier gas in the form of droplets and is discharged into the vaporization unit 300B. The droplets are vaporized in the vaporization unit 300B to generate a source gas Is done. The source gas generated in the liquid source vaporizer 300 is supplied to the film forming chamber 200 via the source gas supply pipe 132, and a desired process is performed on the wafer W in the film forming chamber 200.

上記のような成膜装置１００の液体原料気化器３００において液体原料を完全に気化させることができなかった場合，液体原料の液滴の一部が原料ガスに混入して原料ガス供給配管１３２に送出され，成膜室２００内に流入する虞がある。このように成膜室２００内に流入した液体原料の液滴は，パーティクルとしてウエハＷ上に形成される膜の膜質を低下させる要因となり得る。また，液体原料気化器３００において液体原料の気化効率が悪化した場合，成膜室２００に供給される原料ガスの流量が不足し，ウエハＷに例えばＨｆＯ２膜を形成する際に所望の成膜レートが得られなくなる虞がある。 When the liquid source vaporizer 300 of the film forming apparatus 100 as described above cannot completely vaporize the liquid source, some of the liquid source droplets are mixed into the source gas and enter the source gas supply pipe 132. There is a risk of being sent out and flowing into the film forming chamber 200. As described above, the liquid material droplets flowing into the film forming chamber 200 may cause deterioration in the quality of the film formed on the wafer W as particles. Further, when the vaporization efficiency of the liquid source deteriorates in the liquid source vaporizer 300, the flow rate of the source gas supplied to the film formation chamber 200 is insufficient, and a desired film formation is performed when, for example, an HfO 2 film is formed on the wafer W. There is a risk that the rate cannot be obtained.

そこで，本実施形態にかかる液体原料気化器３００では，液体原料の液滴のすべてを効率よく気化させて，成膜室２００における成膜処理に十分な量の良質な原料ガスを生成することができるように構成する。このような液体原料気化器３００の具体的な構成例を以下に説明する。   Therefore, in the liquid source vaporizer 300 according to the present embodiment, all of the liquid source droplets can be efficiently vaporized to generate a sufficient amount of high-quality source gas for the film forming process in the film forming chamber 200. Configure as you can. A specific configuration example of such a liquid raw material vaporizer 300 will be described below.

（第１実施形態にかかる液体原料気化器の構成例）
次に，本発明の第１実施形態にかかる液体原料気化器３００の構成例について図面を参照しながら説明する。図２は，第１実施形態にかかる液体原料気化器３００の概略構成例を示す縦断面図である。この液体原料気化器３００は，大きく分けて，液体原料を液滴状にして後段に供給する液体原料供給部３００Ａと，この液体原料供給部３００Ａから供給される液体原料を気化させる気化部３００Ｂとから構成されている。 (Configuration example of liquid raw material vaporizer according to the first embodiment)
Next, a configuration example of the liquid raw material vaporizer 300 according to the first embodiment of the present invention will be described with reference to the drawings. FIG. 2 is a longitudinal sectional view showing a schematic configuration example of the liquid raw material vaporizer 300 according to the first embodiment. The liquid raw material vaporizer 300 is roughly divided into a liquid raw material supply unit 300A for supplying the liquid raw material in the form of droplets to the subsequent stage, and a vaporization unit 300B for vaporizing the liquid raw material supplied from the liquid raw material supply unit 300A. It is composed of

まず液体原料供給部３００Ａの構成例について説明する。この液体原料供給部３００Ａには，上面から内部に垂直方向に延びる液体原料流路３１０が設けられており，側面から内部に水平方向に延びるキャリアガス流路３１２が設けられている。液体原料流路３１０の一端には液体原料供給配管１１２が接続されており，キャリアガス流路３１２の一端にはキャリアガス供給配管１２２が接続されている。   First, a configuration example of the liquid raw material supply unit 300A will be described. The liquid source supply unit 300A is provided with a liquid source channel 310 extending vertically from the upper surface to the inside, and a carrier gas channel 312 extending horizontally from the side to the inside. A liquid source supply pipe 112 is connected to one end of the liquid source channel 310, and a carrier gas supply pipe 122 is connected to one end of the carrier gas channel 312.

液体原料流路３１０の他端には，液体原料を液滴状にして吐出する吐出ノズル３１４が備えられている。この吐出ノズル３１４は，例えば先細りに構成され（図２ではこの構成の図示を省略する），その先端の吐出口３１６が気化部３００Ｂ内の気化空間３５０に向くように配置される。   The other end of the liquid material flow path 310 is provided with a discharge nozzle 314 that discharges the liquid material in the form of droplets. The discharge nozzle 314 is tapered, for example (not shown in FIG. 2), and is disposed so that the discharge port 316 at the tip thereof faces the vaporization space 350 in the vaporization unit 300B.

吐出ノズル３１４の吐出口３１６の直径は，気化部３００Ｂ内に供給される液体原料の液滴の目標サイズに応じて決定される。気化部３００Ｂ内において，液滴状の液体原料を確実に気化させるためには，液滴のサイズは小さい方が有利であるため，吐出口３１６の直径も小さいことが好ましい。ただし，液滴のサイズが小さくなり過ぎると，液滴を気化して得られる原料ガスの流量が不足する虞がある。これらの点を考慮して，吐出口３１６の直径を決定することが好ましい。   The diameter of the discharge port 316 of the discharge nozzle 314 is determined according to the target size of the liquid material droplets supplied into the vaporization unit 300B. In order to reliably vaporize the liquid material in the form of droplets in the vaporization unit 300B, it is preferable that the droplet size is small, and therefore it is preferable that the diameter of the discharge port 316 is also small. However, if the droplet size becomes too small, the flow rate of the raw material gas obtained by vaporizing the droplet may be insufficient. It is preferable to determine the diameter of the discharge port 316 in consideration of these points.

吐出ノズル３１４の構成材料としては，有機溶媒に対する耐性を有するポリイミド樹脂などの合成樹脂又はステンレス鋼やチタンなどの金属が好ましい。吐出ノズル３１４を合成樹脂で構成すれば，吐出される前の液体原料に周囲から熱が伝導しないようにすることができる。とりわけポリイミド樹脂を用いることで，液体原料の残渣（析出物）が吐出ノズル３１４に付着し難くなり，ノズルの目詰まりを防止することもできる。   As a constituent material of the discharge nozzle 314, a synthetic resin such as a polyimide resin having resistance to an organic solvent or a metal such as stainless steel or titanium is preferable. If the discharge nozzle 314 is made of synthetic resin, heat can be prevented from being conducted from the surroundings to the liquid raw material before being discharged. In particular, the use of polyimide resin makes it difficult for liquid raw material residues (precipitates) to adhere to the discharge nozzle 314, thereby preventing nozzle clogging.

また，液体原料供給部３００Ａの内部には，吐出ノズル３１４の先端を囲むようにキャリアガス噴射部３１８が配設されている。キャリアガス噴射部３１８は上記キャリアガス流路３１２の他端に接続されており，キャリアガス流路３１２からのキャリアガスを液体原料とともに気化部３００Ｂの気化空間３５０に向けて噴出するように構成されている。   A carrier gas injection unit 318 is disposed inside the liquid source supply unit 300A so as to surround the tip of the discharge nozzle 314. The carrier gas injection unit 318 is connected to the other end of the carrier gas channel 312 and is configured to eject the carrier gas from the carrier gas channel 312 together with the liquid material toward the vaporization space 350 of the vaporization unit 300B. ing.

具体的には，キャリアガス噴射部３１８は吐出ノズル３１４の先端を囲むカップ状に形成されており，その底部にキャリアガス噴出口３２０が形成されている。キャリアガス噴出口３２０は，吐出ノズル３１４の先端の吐出口３１６の近傍にこの吐出口３１６を囲むように形成されている。これによって吐出口３１６の周りからキャリアガスを噴出することができるようになり，吐出口３１６から吐出される液体原料の液滴を確実に気化部３００Ｂに向けて飛行させ，気化部３００Ｂ内に設けられた後述のミストトラップ部３６０に誘導することができる。   Specifically, the carrier gas injection unit 318 is formed in a cup shape surrounding the tip of the discharge nozzle 314, and the carrier gas injection port 320 is formed at the bottom thereof. The carrier gas outlet 320 is formed in the vicinity of the outlet 316 at the tip of the outlet nozzle 314 so as to surround the outlet 316. As a result, the carrier gas can be ejected from around the ejection port 316, and the liquid material droplets ejected from the ejection port 316 are surely made to fly toward the vaporization unit 300B and provided in the vaporization unit 300B. Can be guided to the mist trap unit 360 described later.

次に，気化部３００Ｂの構成例について説明する。気化部３００Ｂは，略円筒状のハウジング３３０と，この中心部に形成された気化空間３５０に設けられた円筒状の通気性部材３６２からなるミストトラップ部３６０と，この通気性部材３６２の周囲を囲むように配設され，輻射熱により通気性部材３６２を均一に加熱する輻射熱ヒータ３７０と，輻射熱ヒータ３７０と通気性部材３６２との間に輻射熱ヒータ３７０の配設空間と気化空間３５０とを仕切る仕切部材としての円筒状のスリーブ部材３４２とを備える。   Next, a configuration example of the vaporization unit 300B will be described. The vaporizing unit 300B includes a substantially cylindrical housing 330, a mist trap unit 360 including a cylindrical air-permeable member 362 provided in a vaporization space 350 formed in the center, and a periphery of the air-permeable member 362. A radiant heat heater 370 that uniformly heats the breathable member 362 by radiant heat; And a cylindrical sleeve member 342 as a member.

以下，気化部３００Ｂの各部の構成をより詳細に説明する。ハウジング３３０の上流側の端部には液体原料供給部３００Ａから供給される液体原料の液滴を取り込む導入口３３８が形成されており，下流側の端部には液体原料の液滴が気化空間で気化して生成された原料ガスを送出する送出口３４０が形成されている。ミストトラップ部３６０は導入口３３８から送出口３４０にわたって配置された円筒状の通気性部材３６２からなる。通気性部材３６２は，その一端が閉じられており，他端は開口して送出口３４０を覆うように取り付けられている。これにより，ミストトラップ部３６０によって気化空間３５０は，通気性部材３６２の内側空間３６６と外側空間３６８とに仕切られる。   Hereinafter, the structure of each part of the vaporization part 300B is demonstrated in detail. An inlet 338 for taking in liquid droplets supplied from the liquid raw material supply unit 300A is formed at the upstream end of the housing 330, and the liquid raw material droplets are vaporized at the downstream end. An outlet 340 is formed through which the raw material gas generated by vaporization is sent out. The mist trap part 360 includes a cylindrical air-permeable member 362 disposed from the inlet 338 to the outlet 340. One end of the breathable member 362 is closed, and the other end is attached so as to open and cover the delivery port 340. Thus, the vaporization space 350 is partitioned into the inner space 366 and the outer space 368 of the air-permeable member 362 by the mist trap part 360.

このようなミストトラップ部３６０には，導入口３３８からの液体原料の液滴がキャリアガスとともに吹き付けられる。このとき，液体原料の液滴は，外側空間３６８に回り込み，加熱された通気性部材３６２の外側表面に吹き付けられて気化し，原料ガスとなって内側空間３６６へ入り込み，送出口３４０から送出されることになる。   The liquid source droplets from the inlet 338 are sprayed onto the mist trap unit 360 together with the carrier gas. At this time, the liquid raw material droplets circulate into the outer space 368 and are sprayed and vaporized on the outer surface of the heated air-permeable member 362 to enter the inner space 366 as raw material gas, and are sent out from the outlet 340. Will be.

このような気化部３００Ｂの構成例を図３，図４を参照しながら，さらに詳細に説明する。図３は図２に示す気化部３００Ｂの構成例を説明するための断面斜視図である。図４は輻射熱ヒータ３７０の配設例を示す斜視図である。なお，図３では輻射熱ヒータ３７０の図示を省略している。気化部３００Ｂのハウジング３３０は，円筒状の側壁部材３３１とこの側壁部材３３１の上流側の端部と下流側の端部を閉じるようにそれぞれ設けられた上流側端壁部材３３２と下流側端壁部材３３４からなる。   A configuration example of such a vaporization unit 300B will be described in more detail with reference to FIGS. FIG. 3 is a cross-sectional perspective view for explaining a configuration example of the vaporizing unit 300B shown in FIG. FIG. 4 is a perspective view showing an arrangement example of the radiant heater 370. In FIG. 3, the radiation heater 370 is not shown. The housing 330 of the vaporizing section 300B includes a cylindrical side wall member 331, an upstream end wall member 332 and a downstream end wall provided to close the upstream end and the downstream end of the side wall member 331, respectively. It consists of a member 334.

上記導入口３３８は，上流側端壁部材３３２に形成され，上記送出口３４０は，下流側端壁部材３３４に形成される。ハウジング３３０を構成する側壁部材３３１，上流側端壁部材３３２，下流側端壁部材３３４はそれぞれ，例えばアルミニウム，ステンレス鋼などの金属で構成される。上流側端壁部材３３２と下流側端壁部材３３４はそれぞれ，例えば図２に示すように複数のボルトなどの締結部材３３６にて側壁部材３３１に取り付けられている。なお，輻射熱ヒータ３７０からの熱線（例えば遠赤外線などの電磁波）がハウジング３３０の中心部の気化空間３５０へ向かうように，側壁部材３３１の内側表面は鏡面加工が施されている。これにより，輻射熱ヒータ３７０からの熱線を効率よく気化空間３５０内の通気性部材３６２に集めることができるので，通気性部材３６２の加熱効率を高めることができる。   The introduction port 338 is formed in the upstream end wall member 332, and the delivery port 340 is formed in the downstream end wall member 334. The side wall member 331, the upstream side end wall member 332, and the downstream side end wall member 334 constituting the housing 330 are each made of a metal such as aluminum or stainless steel. Each of the upstream end wall member 332 and the downstream end wall member 334 is attached to the side wall member 331 by fastening members 336 such as a plurality of bolts, for example, as shown in FIG. The inner surface of the side wall member 331 is mirror-finished so that heat rays (for example, electromagnetic waves such as far infrared rays) from the radiant heat heater 370 are directed to the vaporization space 350 at the center of the housing 330. Thereby, the heat rays from the radiant heat heater 370 can be efficiently collected in the air-permeable member 362 in the vaporization space 350, so that the heating efficiency of the air-permeable member 362 can be increased.

上記スリーブ部材３４２は，ハウジング３３０の内側に側壁部材３３１と同軸の二重管構造をなすように設けられている。スリーブ部材３４２は上流側端壁部材３３２と下流側端壁部材３３４の間に押さえ込むように取り付けられている。そして，例えば図２に示すように，スリーブ部材３４２の両端に形成されたフランジがそれぞれ，上流側端壁部材３３２と下流側端壁部材３３４の内側に形成されているザグリ３４４，３４６に挿入されて位置決めされる。   The sleeve member 342 is provided inside the housing 330 so as to form a double pipe structure coaxial with the side wall member 331. The sleeve member 342 is attached so as to be pressed between the upstream end wall member 332 and the downstream end wall member 334. For example, as shown in FIG. 2, flanges formed at both ends of the sleeve member 342 are inserted into counterbore 344 and 346 formed inside the upstream end wall member 332 and the downstream end wall member 334, respectively. Is positioned.

スリーブ部材３４２と，上流側端壁部材３３２及び下流側端壁部材３３４との接触部分はそれぞれ例えば金属製のＯリングなどのシール部材３４８によりシールされている。これにより，スリーブ部材３４２の内側の気化空間３５０と，外側の輻射熱ヒータ３７０の配設空間とはシールされる。   The contact portions between the sleeve member 342 and the upstream end wall member 332 and the downstream end wall member 334 are respectively sealed by a seal member 348 such as a metal O-ring. Thereby, the vaporization space 350 inside the sleeve member 342 and the installation space of the outside radiant heater 370 are sealed.

このようなスリーブ部材３４２を設けることにより，スリーブ部材３４２の内側の気化空間３５０と，外側の輻射熱ヒータ３７０の配設空間とが仕切られるため，例えば気化空間３５０で熱分解された液体原料の成分などのパーティクルが輻射熱ヒータ３７０の表面に付着することを防止できる。このため，手間のかかる輻射熱ヒータ３７０の表面の洗浄などが不要となり，メンテナンスの回数も減らすことができる。この場合，スリーブ部材３４２の内側にパーティクルが付着する可能性もあるが，スリーブ部材３４２のみを洗浄することによって簡単に除去できる。なお，スリーブ部材３４２は筒状であり，その内側表面を滑らかに加工することによってパーティクルが付着し難くすることもできる。   By providing such a sleeve member 342, the vaporization space 350 inside the sleeve member 342 and the arrangement space of the external radiant heater 370 are partitioned, so that, for example, the components of the liquid raw material thermally decomposed in the vaporization space 350 Or the like can be prevented from adhering to the surface of the radiant heat heater 370. This eliminates the need for troublesome cleaning of the surface of the radiant heater 370 and reduces the number of maintenance operations. In this case, particles may adhere to the inside of the sleeve member 342, but can be easily removed by cleaning only the sleeve member 342. The sleeve member 342 has a cylindrical shape, and particles can be made difficult to adhere by processing the inner surface thereof smoothly.

ミストトラップ部３６０は，スリーブ部材３４２内に形成される気化空間３５０に設けられる。ミストトラップ部３６０は，上述したように円筒状の通気性部材３６２からなる。この通気性部材３６２の上流側の端部にはその開口端面を閉じる円板状の閉じ部材３６４が設けられており，下流側の端部は開口したまま，送出口３４０の周りを囲んだ状態で下流側端壁部材３３４に接合するように取り付けらている。こうして，通気性部材３６２の下流側の端部は送出口３４０に連通するようになっている。   The mist trap part 360 is provided in the vaporization space 350 formed in the sleeve member 342. As described above, the mist trap part 360 includes the cylindrical air-permeable member 362. A disc-shaped closing member 364 that closes the opening end face is provided at the upstream end of the air-permeable member 362, and the downstream end is open and surrounds the delivery port 340. And are attached so as to be joined to the downstream end wall member 334. Thus, the downstream end of the air-permeable member 362 communicates with the delivery port 340.

このミストトラップ部３６０は，導入口３３８からキャリアガスとともに導入された液体原料の液滴を通気性部材３６２で捕捉して気化させるものである。液体原料の液滴が気化すると原料ガスとなってキャリアガスとともに通気性部材３６２の内側空間３６６に入り込み，送出口３４０から送出される。なお，通気性部材３６２の下流側の端部を下流側端壁部材３３４に直接接合せずに，断熱部材を挟んで接合するようにしてもよい。これによれば，ミストトラップ部３６０の熱が下流側端壁部材３３４に逃げることを防ぐことができるので，加熱効率を高めることができる。   The mist trap unit 360 traps and vaporizes liquid source liquid droplets introduced together with the carrier gas from the introduction port 338 by the air-permeable member 362. When the liquid raw material droplets are vaporized, the raw material gas enters the inner space 366 of the air-permeable member 362 together with the carrier gas, and is sent out from the delivery port 340. It should be noted that the downstream end of the air-permeable member 362 may be joined with the heat insulating member interposed therebetween without directly joining the downstream end wall member 334. According to this, since the heat of the mist trap part 360 can be prevented from escaping to the downstream side end wall member 334, the heating efficiency can be increased.

ここで，通気性部材３６２について説明する。通気性部材３６２は，液体原料の液滴を通すことなく捕捉して，これが気化して生成した原料ガスを通す通気性を有するものである。また，通気性部材３６２の構成材料としては，輻射熱ヒータ３７０による熱線によってそのものが加熱される特性，例えば赤外線などの電磁波を吸収してそのものの温度が上昇しやすい特性を有するものを用いる。このような特性を有するものとしては，例えばポーラス構造を有する炭化ケイ素（ＳｉＣ）などのセラミックス又はステンレス鋼などの金属が挙げられる。なお，閉じ部材３６４は通気性部材３６２と同様に例えば炭化ケイ素（ＳｉＣ）などのセラミックス又はステンレス鋼などの金属で構成される。   Here, the air-permeable member 362 will be described. The air permeable member 362 has air permeability through which a raw material gas captured by vaporization of liquid material droplets is allowed to pass without passing therethrough. In addition, as a constituent material of the air-permeable member 362, a material that is heated by heat rays from the radiant heater 370, for example, a material that absorbs electromagnetic waves such as infrared rays and easily rises in temperature is used. As what has such a characteristic, metals, such as ceramics, such as silicon carbide (SiC) which has a porous structure, or stainless steel, are mentioned, for example. Note that the closing member 364 is made of a ceramic such as silicon carbide (SiC) or a metal such as stainless steel, like the air-permeable member 362.

通気性部材３６２の厚みは，熱容量のみならず，気化効率や加熱温度などをも考慮して決定することが好ましい。通気性部材３６２の厚みを薄くするほど，通気性部材３６２の熱容量が小さくなるので，加熱効率を向上させることができ，また加熱に必要な時間も短縮できる。ところが，通気性部材３６２の厚みを薄くするほど，通気性部材３６２の表面積も少なくなるので，液滴状の液体原料の気化効率が低下する。但し，加熱温度を高くすることで気化効率の低下を抑えることができる。従って，通気性部材３６２の厚みは，十分な気化効率が得られる範囲で，できる限り薄い方が好ましい。   The thickness of the breathable member 362 is preferably determined in consideration of not only the heat capacity but also the vaporization efficiency and the heating temperature. As the thickness of the air-permeable member 362 is reduced, the heat capacity of the air-permeable member 362 is reduced, so that the heating efficiency can be improved and the time required for heating can be shortened. However, as the thickness of the air-permeable member 362 is reduced, the surface area of the air-permeable member 362 is also reduced, so that the vaporization efficiency of the liquid material in the form of liquid drops. However, a decrease in vaporization efficiency can be suppressed by increasing the heating temperature. Therefore, the thickness of the air-permeable member 362 is preferably as thin as possible within a range where sufficient vaporization efficiency can be obtained.

なお，通気性部材３６２の長さは側壁部材３３１の長さよりも短く形成されており，通気性部材３６２の径はスリーブ部材３４２よりも小さく形成されている。このため，通気性部材３６２の上流側の端部（閉じ部材３６４側の端部）は，上流側端壁部材３３２から少し離れ，通気性部材３６２の側面はスリーブ部材３４２よりも内側になる。これにより，導入口３３８に向けて吐出された液滴とキャリアガスが通気性部材３６２の上流側から側面（外側空間３６８）に向かう流路が形成される。   The length of the breathable member 362 is shorter than the length of the side wall member 331, and the diameter of the breathable member 362 is smaller than that of the sleeve member 342. For this reason, the upstream end portion (end portion on the closing member 364 side) of the air permeable member 362 is slightly separated from the upstream end wall member 332, and the side surface of the air permeable member 362 is inside the sleeve member 342. As a result, a flow path is formed in which the liquid droplets and the carrier gas discharged toward the inlet 338 are directed from the upstream side of the air-permeable member 362 toward the side surface (outer space 368).

このように通気性部材３６２とスリーブ部材３４２との間に流路を形成することにより，この流路（外側空間３６８）を通る液滴を効率よく通気性部材３６２の側面に導くことができるので，その液滴のほとんどは通気性部材３６２の外側表面に吹き付けられて気化する。さらに，この流路は輻射熱ヒータ３７０の内側に形成されるので，この流路を通る液滴の一部は輻射熱ヒータ３７０からの熱線を直接受けてその輻射熱により気化する。このように流路を輻射熱ヒータ３７０の内側に形成することにより，ミストトラップ部３６０の通気性部材３６２を通る前に気化させることもできる。   By forming a flow path between the air-permeable member 362 and the sleeve member 342 in this manner, liquid droplets passing through the flow path (outer space 368) can be efficiently guided to the side surface of the air-permeable member 362. , Most of the droplets are sprayed on the outer surface of the air-permeable member 362 to be vaporized. Furthermore, since this flow path is formed inside the radiant heat heater 370, a part of the liquid droplets passing through this flow path directly receives the heat rays from the radiant heat heater 370 and is vaporized by the radiant heat. Thus, by forming the flow path inside the radiant heat heater 370, it is possible to vaporize before passing through the air-permeable member 362 of the mist trap part 360.

なお，スリーブ部材３４２は輻射熱ヒータ３７０からの例えば熱線（例えば遠赤外線などの電磁波）を透過する材料で構成される。このような材料としては，例えば透明の石英やアルミナなどが挙げられる。これにより，輻射熱ヒータ３７０からの熱線がスリーブ部材３４２を透過してほとんど減衰することなく通気性部材３６２に照射されるので，その輻射熱によって通気性部材３６２をスリーブ部材３４２の外側から効率よく加熱することができる。このように熱線を発する輻射熱ヒータ３７０としては，例えばＱＣＨ−ＨＥＡＴＥＲ（登録商標）などのカーボンヒータを用いることができる。なお，輻射熱ヒータ３７０としては，これに限られるものではなく，ハロゲンヒータ，ニクロムヒータを用いてもよい。このような輻射熱ヒータ３７０は，例えばヒータ電源３７４から供給される電力を制御して，輻射熱ヒータ３７０から照射される熱線の強さ（ヒータパワー）を制御することにより，通気性部材３６２に与えられる熱量を制御できる。   The sleeve member 342 is made of a material that transmits, for example, heat rays (for example, electromagnetic waves such as far infrared rays) from the radiant heater 370. Examples of such a material include transparent quartz and alumina. As a result, the heat rays from the radiant heat heater 370 pass through the sleeve member 342 and irradiate the air permeable member 362 with little attenuation, so that the air permeable member 362 is efficiently heated from the outside of the sleeve member 342 by the radiant heat. be able to. As the radiant heat heater 370 that emits heat rays in this way, for example, a carbon heater such as QCH-HEATER (registered trademark) can be used. The radiant heat heater 370 is not limited to this, and a halogen heater or a nichrome heater may be used. Such a radiant heat heater 370 is given to the air-permeable member 362 by controlling the power (heater power) irradiated from the radiant heat heater 370 by controlling the power supplied from the heater power source 374, for example. The amount of heat can be controlled.

ここで，輻射熱ヒータ３７０の配設例について説明する。輻射熱ヒータ３７０は例えば図４に示すように，スリーブ部材３４２の外側から通気性部材３６２の側面（外側表面）を覆うように配置される。図４では，輻射熱ヒータ３７０としてＱＣＨ−ＨＥＡＴＥＲ（登録商標）を用いて，つづら折り状に構成したものである。このような輻射熱ヒータ３７０によれば，通気性部材３６２の通気性部材３６２の側面（外側表面）全体に輻射熱ヒータ３７０からの熱線を照射できるので，その輻射熱により，全体に渡って通気性部材３６２の温度を均一に加熱することができる。   Here, an arrangement example of the radiant heat heater 370 will be described. For example, as shown in FIG. 4, the radiant heat heater 370 is disposed so as to cover the side surface (outer surface) of the air-permeable member 362 from the outside of the sleeve member 342. In FIG. 4, QCH-HEATER (registered trademark) is used as the radiant heat heater 370 and is configured in a zigzag manner. According to such a radiant heat heater 370, the entire side surface (outer surface) of the air permeable member 362 of the air permeable member 362 can be irradiated with the heat rays from the radiant heat heater 370. Can be uniformly heated.

輻射熱ヒータ３７０の端部は，図２に示すように下流側端壁部材３３４に形成されている貫通孔３７２から気化部３００Ｂのハウジング３３０の外に延出して，ヒータ電源３７４に接続されている。また，通気性部材３６２には熱電対などの温度センサ３７６が設けられている。これらヒータ電源３７４，温度センサ３７６は，制御部１４０に接続されている。制御部１４０は，温度センサ３７６からの温度に応じて，ヒータ電源３７４の電力を制御することにより輻射熱ヒータ３７０を制御し，通気性部材３６２を所定の温度に加熱制御することができる。   As shown in FIG. 2, the end of the radiant heater 370 extends from the through hole 372 formed in the downstream end wall member 334 to the outside of the housing 330 of the vaporization unit 300 </ b> B and is connected to the heater power supply 374. . The air permeable member 362 is provided with a temperature sensor 376 such as a thermocouple. These heater power supply 374 and temperature sensor 376 are connected to the control unit 140. The control unit 140 can control the radiant heater 370 by controlling the electric power of the heater power supply 374 according to the temperature from the temperature sensor 376, and can control the air-permeable member 362 to a predetermined temperature.

（成膜装置の動作）
次に，本実施形態にかかる成膜装置１００の動作について説明する。成膜装置１００は制御部１４０により各部が制御され，動作するようになっている。液体原料気化器３００によって原料ガスを生成するにあたり，液体原料気化器３００の輻射熱ヒータ３７０を発熱させて通気性部材３６２を所定の温度に加熱する。このとき，輻射熱ヒータ３７０からは熱線が通気性部材３６２の周りに放射され，通気性部材３６２はその全体がむらなく所定の温度に加熱される。そして，温度センサ３７６により通気性部材３６２の温度が測定され，その測定温度に基づいてヒータ電源３７４を介して輻射熱ヒータ３７０のパワーが調整される。こうして，通気性部材３６２の温度を所定の温度に保持する。このときの通気性部材３６２の温度は，例えば液体原料の気化温度よりも高い温度（例えば１００〜３００℃）に保持される。 (Operation of the deposition system)
Next, the operation of the film forming apparatus 100 according to the present embodiment will be described. Each unit of the film forming apparatus 100 is controlled by a control unit 140 to operate. When generating the raw material gas by the liquid raw material vaporizer 300, the radiant heat heater 370 of the liquid raw material vaporizer 300 is heated to heat the air-permeable member 362 to a predetermined temperature. At this time, heat rays are radiated from the radiant heater 370 around the air-permeable member 362, and the entire air-permeable member 362 is uniformly heated to a predetermined temperature. Then, the temperature of the breathable member 362 is measured by the temperature sensor 376, and the power of the radiant heat heater 370 is adjusted via the heater power supply 374 based on the measured temperature. Thus, the temperature of the air permeable member 362 is maintained at a predetermined temperature. At this time, the temperature of the air-permeable member 362 is maintained at a temperature (for example, 100 to 300 ° C.) higher than the vaporization temperature of the liquid raw material, for example.

続いて，所定の流量の液体原料が液体原料供給配管１１２を介して液体原料供給源１１０から液体原料気化器３００に供給されるように，液体原料流量制御バルブ１１４の開度を調整する。これとともに，所定の流量のキャリアガスがキャリアガス供給配管１２２を介してキャリアガス供給源１２０から液体原料気化器３００に供給されるように，キャリアガス流量制御バルブ１２４の開度を調整する。   Subsequently, the opening degree of the liquid material flow rate control valve 114 is adjusted so that a liquid material having a predetermined flow rate is supplied from the liquid material supply source 110 to the liquid material vaporizer 300 via the liquid material supply pipe 112. At the same time, the opening degree of the carrier gas flow control valve 124 is adjusted so that the carrier gas having a predetermined flow rate is supplied from the carrier gas supply source 120 to the liquid raw material vaporizer 300 via the carrier gas supply pipe 122.

液体原料供給配管１１２を介して液体原料気化器３００に供給された液体原料は，液体原料流路３１０を経由して吐出ノズル３１４に達し，吐出口３１６から液滴状となって吐出される。また，液体原料とともに液体原料気化器３００に供給されたキャリアガスは，キャリアガス流路３１２を経由してキャリアガス噴射部３１８に達し，キャリアガス噴出口３２０から気化部３００Ｂの気化空間３５０に向けて噴射される。このように噴射されたキャリアガスは，吐出ノズル３１４の吐出口３１６近傍を通過するため，吐出口３１６から連続的に吐出された液体原料の液滴をその流れに乗せて気化部３００Ｂ内に供給することができる。   The liquid raw material supplied to the liquid raw material vaporizer 300 via the liquid raw material supply pipe 112 reaches the discharge nozzle 314 via the liquid raw material flow path 310 and is discharged as droplets from the discharge port 316. In addition, the carrier gas supplied to the liquid source vaporizer 300 together with the liquid source reaches the carrier gas injection unit 318 via the carrier gas flow path 312 and is directed from the carrier gas injection port 320 toward the vaporization space 350 of the vaporization unit 300B. Is injected. Since the jetted carrier gas passes through the vicinity of the discharge port 316 of the discharge nozzle 314, liquid material droplets continuously discharged from the discharge port 316 are put on the flow and supplied into the vaporization unit 300B. can do.

吐出ノズル３１４から吐出された液体原料の液滴は，キャリアガスとともに導入口３３８から気化空間３５０のミストトラップ部３６０に向けて吹き付けられる。このとき，その液滴とキャリアガスはミストトラップ部３６０の上流側から流路（外側空間３６８）に沿って側面に導かれるので，ミストトラップ部３６０の通気性部材３６２の外側表面に吹き付けられることになる。   The liquid material droplets discharged from the discharge nozzle 314 are sprayed together with the carrier gas from the inlet 338 toward the mist trap portion 360 of the vaporization space 350. At this time, the droplet and the carrier gas are guided to the side surface along the flow path (outer space 368) from the upstream side of the mist trap part 360, and thus are sprayed on the outer surface of the air-permeable member 362 of the mist trap part 360. become.

通気性部材３６２は輻射熱ヒータ３７０からの輻射熱によって全体的に均一に液体原料の気化温度よりも高い所定の温度に調整されている。このため，液体原料の液滴は通気性部材３６２の表面のいずれの箇所に吹き付けられても，その液滴を十分に気化させることができる。   The air-permeable member 362 is adjusted to a predetermined temperature that is higher than the vaporization temperature of the liquid raw material uniformly by the radiant heat from the radiant heat heater 370. For this reason, even if the droplet of the liquid material is sprayed on any part of the surface of the air-permeable member 362, the droplet can be sufficiently vaporized.

このように液体原料の液滴は通気性部材３６２に吹き付けられて気化し，原料ガスとなって内側空間３６６に流入し，キャリアガスとともに送出口３４０を介して原料ガス供給配管１３２に送出される。原料ガス供給配管１３２に送出された原料ガスは，成膜室２００に供給され，シャワーヘッド２４０の内部空間２４２に導入され，ガス吐出孔２４４からサセプタ２２２上のウエハＷに向けて吐出される。そして，ウエハＷ上に所定の膜例えばＨｆＯ２膜が形成される。なお，成膜室２００に導入される原料ガスの流量は原料ガス供給配管１３２に備えられた原料ガス流量制御バルブ１３４の開度を制御することによって調整できる。 In this way, the liquid material droplets are sprayed and vaporized onto the air-permeable member 362, and flow into the inner space 366 as raw material gas, and are sent together with the carrier gas to the raw material gas supply pipe 132 through the delivery port 340. . The source gas sent to the source gas supply pipe 132 is supplied to the film forming chamber 200, introduced into the internal space 242 of the shower head 240, and discharged toward the wafer W on the susceptor 222 from the gas discharge hole 244. Then, a predetermined film such as an HfO 2 film is formed on the wafer W. The flow rate of the source gas introduced into the film forming chamber 200 can be adjusted by controlling the opening degree of the source gas flow rate control valve 134 provided in the source gas supply pipe 132.

以上のように第１実施形態にかかる液体原料気化器３００によれば，液滴状の液体原料を捕捉して気化させるミストトラップ部３６０を輻射熱によって加熱される通気性部材３６２で構成し，この通気性部材３６２の周囲を囲むように輻射熱ヒータ３７０を設けることにより，輻射熱ヒータ３７０からの輻射熱によって通気性部材３６２の全体を直接加熱できる。このため，全体に渡って通気性部材３６２の温度を均一にすることができるので，このような通気性部材３６２に液滴状の液体原料が吹き付けられるだけで，液滴を満遍なくすべて気化させることができる。これにより，従来以上に気化効率を向上させることができる。また，部分的な温度低下による気化不良を防止できるため，通気性部材３６２の目詰まりを防止することができる。従って，通気性部材３６２の寿命を延ばすことができ，ひいては気化部３００のメンテナンスサイクルを延ばすことができる。これにより，成膜装置１００におけるスループットを向上させることもできる。   As described above, according to the liquid source vaporizer 300 according to the first embodiment, the mist trap part 360 that captures and vaporizes the liquid material in the form of droplets is configured by the breathable member 362 that is heated by radiant heat. By providing the radiant heat heater 370 so as to surround the breathable member 362, the entire breathable member 362 can be directly heated by the radiant heat from the radiant heat heater 370. For this reason, since the temperature of the air-permeable member 362 can be made uniform throughout, the liquid material can be uniformly vaporized only by spraying the liquid material of the liquid droplets onto the air-permeable member 362. Can do. Thereby, vaporization efficiency can be improved more than before. In addition, since vaporization failure due to a partial temperature drop can be prevented, clogging of the air-permeable member 362 can be prevented. Therefore, the lifetime of the air-permeable member 362 can be extended, and as a result, the maintenance cycle of the vaporizing unit 300 can be extended. Thereby, the throughput in the film forming apparatus 100 can also be improved.

また，液滴状の液体原料が流通する気化空間３５０と，輻射熱ヒータ３７０の配設空間とを仕切るスリーブ部材３４２を設けることによって，輻射熱ヒータ３７０の表面にパーティクルが付着することを防止できるとともに，液体原料の液滴の気化効率を向上させることができる。すなわち，スリーブ部材３４２の内側表面と通気性部材３６２の外側側面との間に輻射熱ヒータ３７０に囲まれる流路が形成されるので，この流路を通る液体原料の液滴に輻射熱ヒータ３７０からの熱線が直接作用するとともに，流路全体の雰囲気も輻射熱ヒータ３７０によって加熱される。これにより，液体原料の液滴の気化効率をより向上させることができる。   In addition, by providing the sleeve member 342 that partitions the vaporization space 350 through which the liquid material in the form of liquid droplets flows and the space in which the radiant heater 370 is disposed, it is possible to prevent particles from adhering to the surface of the radiant heater 370. The vaporization efficiency of the liquid raw material droplets can be improved. That is, since a flow path surrounded by the radiant heat heater 370 is formed between the inner surface of the sleeve member 342 and the outer side surface of the air-permeable member 362, liquid droplets of the liquid material passing through the flow path are emitted from the radiant heat heater 370. While the heat rays act directly, the atmosphere of the entire flow path is also heated by the radiant heat heater 370. Thereby, the vaporization efficiency of the liquid raw material droplets can be further improved.

また，温度センサ３７６によって通気性部材３６２の温度をリアルタイムで測定し，その測定された温度に基づいて輻射熱ヒータ３７０を制御するので，通気性部材３６２の温度が常に設定温度を保持するように調整できる。このため成膜処理中，通気性部材３６２全体の温度を常に均一に保って，通気性部材３６２に吹き付けられた液滴状の液体原料を確実に気化させて，成膜室２００に対して所望の流量の原料ガスを安定的に供給できる。   Further, the temperature of the air permeable member 362 is measured in real time by the temperature sensor 376, and the radiant heat heater 370 is controlled based on the measured temperature, so that the temperature of the air permeable member 362 is always adjusted to maintain the set temperature. it can. For this reason, during the film forming process, the temperature of the entire air-permeable member 362 is always kept uniform, and the liquid material in the form of liquid droplets sprayed on the air-permeable member 362 is surely vaporized. Can be stably supplied.

また，液体原料供給部３００Ａの条件，例えば液体原料の種類や量，液滴の大きさなどに応じて通気性部材３６２の温度が最適になるように輻射熱ヒータ３７０のパワーを調整するようにしてもよい。これにより，液体原料供給部３００Ａの条件に拘わらず，気化効率を向上させることができる。   Further, the power of the radiant heat heater 370 is adjusted so that the temperature of the air-permeable member 362 is optimized in accordance with the conditions of the liquid source supply unit 300A, for example, the type and amount of the liquid source, the size of the droplets, and the like. Also good. Thereby, vaporization efficiency can be improved irrespective of the conditions of the liquid raw material supply unit 300A.

なお，第１実施形態においては，ミストトラップ部を一端が閉じられた円筒状の通気性部材３６２で構成した場合について説明したが，必ずしもこれに限定されるもではない。例えばミストトラップ部３６０を上流側に凸となる円錐状の通気性部材３６２で構成してもよい。この場合，ミストトラップ部３６０全体を通気性部材３６２で構成してもよく，先端部分を開口して閉じ部材３６４を取り付けるようにしてもよい。また，輻射熱ヒータ３７０は通気性部材３６２の外側表面に沿って配置するようにしてもよい。   In the first embodiment, the case where the mist trap portion is configured by the cylindrical air-permeable member 362 whose one end is closed has been described, but the present invention is not necessarily limited thereto. For example, the mist trap part 360 may be configured by a conical air-permeable member 362 that protrudes upstream. In this case, the entire mist trap portion 360 may be constituted by the air-permeable member 362, or the tip portion may be opened and the closing member 364 may be attached. Further, the radiant heater 370 may be disposed along the outer surface of the air-permeable member 362.

また，通気性部材３６２の一端を閉じる閉じ部材３６４は，通気性部材３６２と同様に通気性を有する部材で構成してもよいが，この閉じ部材３６４を通気性を有しない部材で構成することによって，導入口３３８から気化空間３５０に供給される液体原料の液滴のすべてを輻射熱ヒータ３７０の内側に形成される通気性部材３６２とスリーブ部材３４２との間の流路（外側空間３６８）に導くことができる。これにより，すべての液体原料の液滴に輻射熱ヒータ３７０の熱線を作用させることができるとともに，輻射熱ヒータ３７０で直接加熱される通気性部材３６２の外側表面に効率よく導くことができる。従って，気化効率をより一層向上させることができる。   Further, the closing member 364 that closes one end of the air-permeable member 362 may be formed of a member having air permeability similarly to the air-permeable member 362. However, the closing member 364 is formed of a member that does not have air permeability. As a result, all of the liquid source droplets supplied from the inlet 338 to the vaporization space 350 are transferred to the flow path (outer space 368) between the air-permeable member 362 and the sleeve member 342 formed inside the radiant heater 370. Can lead. Thus, the heat rays of the radiant heater 370 can be applied to all liquid raw material droplets, and can be efficiently guided to the outer surface of the breathable member 362 that is directly heated by the radiant heater 370. Therefore, the vaporization efficiency can be further improved.

また，ハウジング３３０，スリーブ部材３４２，通気性部材３６２は，円筒状に形成した場合について説明したが，必ずしもこれに限定されるものではなく，円筒以外の筒状に形成してもよい。例えば角筒状に形成してもよい。また，気化部３００Ｂはスリーブ部材３４２を設けずに構成してもよい。   Further, the case where the housing 330, the sleeve member 342, and the air-permeable member 362 are formed in a cylindrical shape has been described. However, the present invention is not necessarily limited thereto, and may be formed in a cylindrical shape other than the cylindrical shape. For example, it may be formed in a rectangular tube shape. Further, the vaporizing unit 300B may be configured without providing the sleeve member 342.

（第２実施形態にかかる成膜装置）
次に，本発明の第２実施形態にかかる成膜装置について図面を参照しながら説明する。図５は第２実施形態にかかる成膜装置１０２の概略構成例を説明するための図である。ここでは，成膜装置１０２に利用する液体原料気化器３０２を第１の液体原料気化器３０４とこれに接続配管３０６で接続された第２の液体原料気化器３０８により構成した場合について説明する。なお，第２実施形態にかかる成膜装置１０２における液体原料気化器３０２以外の構成については図１に示す第１実施形態にかかる成膜装置１００と同様であるため，図５では同一機能構成を有する構成要素には同一符号を付してそれらの詳細な説明を省略する。 (Film Forming Apparatus According to Second Embodiment)
Next, a film forming apparatus according to a second embodiment of the present invention will be described with reference to the drawings. FIG. 5 is a diagram for explaining a schematic configuration example of the film forming apparatus 102 according to the second embodiment. Here, a case where the liquid raw material vaporizer 302 used for the film forming apparatus 102 is configured by the first liquid raw material vaporizer 304 and the second liquid raw material vaporizer 308 connected to this by a connection pipe 306 will be described. Since the configuration of the film forming apparatus 102 according to the second embodiment other than the liquid source vaporizer 302 is the same as that of the film forming apparatus 100 according to the first embodiment shown in FIG. Constituent elements having the same reference numerals are given and detailed descriptions thereof are omitted.

第２実施形態にかかる液体原料気化器３０２は，液体原料供給源１１０から供給される液体原料を気化させて原料ガスを生成する第１の液体原料気化器３０４と，第１の液体原料気化器３０４で生成された原料ガスの吐出口に接続配管３０６を介して接続される第２の液体原料気化器３０８とを備え，第２の液体原料気化器３０８の吐出口から吐出した原料ガスを原料ガス供給配管１３２を介して成膜室２００に供給するように構成されたものである。   The liquid source vaporizer 302 according to the second embodiment includes a first liquid source vaporizer 304 that generates a source gas by vaporizing a liquid source supplied from the liquid source supply source 110, and a first liquid source vaporizer. And a second liquid source vaporizer 308 connected to the discharge port of the source gas generated in 304 via a connection pipe 306, and the source gas discharged from the discharge port of the second liquid source vaporizer 308 is used as a raw material. It is configured to be supplied to the film forming chamber 200 via the gas supply pipe 132.

第２実施形態にかかる第２の液体原料気化器３０８の構成例を図６に示す。第２の液体原料気化器３０８は，第１実施形態にかかる液体原料気化器３００のうちの気化部３００Ｂのみの構成からなる液体原料気化器である。したがって，第２の液体原料気化器３０８は，図２に示す気化部３００Ｂと同様の構成であるため，同一機能構成を有する構成要素には同一符号を付してそれらの詳細な説明を省略する。   A configuration example of the second liquid source vaporizer 308 according to the second embodiment is shown in FIG. The second liquid raw material vaporizer 308 is a liquid raw material vaporizer composed of only the vaporization unit 300B of the liquid raw material vaporizer 300 according to the first embodiment. Therefore, since the second liquid raw material vaporizer 308 has the same configuration as the vaporization unit 300B shown in FIG. 2, components having the same functional configuration are denoted by the same reference numerals and detailed description thereof is omitted. .

一方の第１の液体原料気化器３０４は，液体原料供給源１１０から供給される液体原料を気化させて原料ガスを生成する液体原料気化器であれば，その構成や種類などは問わず，従来の液体原料気化器であってもよい。   The first liquid raw material vaporizer 304 is a liquid raw material vaporizer that generates a raw material gas by vaporizing the liquid raw material supplied from the liquid raw material supply source 110, regardless of its configuration or type. The liquid raw material vaporizer may be used.

このような本発明によれば，第２の液体原料気化器３０８において輻射熱によって全体的に均一に温度を上昇させた通気性部材３６２に，第１の液体原料気化器３０４で生成された原料ガスを通すことにより，第１の液体原料気化器３０４で気化しきれなかった液滴も，第２の液体原料気化器３０８で気化させることができる。これにより，成膜室２００などに原料ガスとともに液体原料の液滴が流入することを防止できる。また，通気性部材３６２の部分的な温度低下による気化不良を防止できるため，通気性部材３６２の目詰まりを防止することができる。   According to the present invention as described above, the raw material gas generated by the first liquid raw material vaporizer 304 is added to the air-permeable member 362 whose temperature has been increased uniformly uniformly by the radiant heat in the second liquid raw material vaporizer 308. By passing the liquid droplets, the liquid droplets that could not be vaporized by the first liquid raw material vaporizer 304 can be vaporized by the second liquid raw material vaporizer 308. Accordingly, it is possible to prevent liquid source droplets from flowing into the film forming chamber 200 and the like together with the source gas. Further, since the vaporization failure due to a partial temperature decrease of the air-permeable member 362 can be prevented, the air-permeable member 362 can be prevented from being clogged.

以上，添付図面を参照しながら本発明の好適な実施形態について説明したが，本発明は係る例に限定されない。当業者であれば，特許請求の範囲に記載された範疇内において，各種の変更例又は修正例に想到し得ることは明らかであり，それらについても当然に本発明の技術的範囲に属するものと了解される。   As mentioned above, although preferred embodiment of this invention was described referring an accompanying drawing, this invention is not limited to the example which concerns. It will be apparent to those skilled in the art that various changes and modifications can be made within the scope of the claims, and these are of course within the technical scope of the present invention. Understood.

例えば本発明にかかる液体原料気化器は，ＭＯＣＶＤ装置，プラズマＣＶＤ装置，ＡＬＤ（原子層成膜）装置，ＬＰ−ＣＶＤ（バッチ式，縦型，横型，ミニバッチ式）などに用いられる液体原料気化器にも適用可能である。   For example, the liquid source vaporizer according to the present invention is a liquid source vaporizer used for MOCVD apparatus, plasma CVD apparatus, ALD (atomic layer deposition) apparatus, LP-CVD (batch type, vertical type, horizontal type, minibatch type) and the like. It is also applicable to.

本発明は，液体原料を気化して原料ガスを生成する液体原料気化器及びそれを用いた成膜装置に適用可能である。   The present invention is applicable to a liquid source vaporizer that vaporizes a liquid source to generate a source gas and a film forming apparatus using the same.

本発明の第１実施形態にかかる成膜装置の構成例を示す図である。It is a figure which shows the structural example of the film-forming apparatus concerning 1st Embodiment of this invention. 同実施形態にかかる液体原料気化器の構成例を示す縦断面図である。It is a longitudinal cross-sectional view which shows the structural example of the liquid raw material vaporizer | carburetor concerning the embodiment. 図２に示す気化部の一部の構成例を示す断面斜視図である。It is a cross-sectional perspective view which shows the example of a structure of a part of vaporization part shown in FIG. 図２に示す輻射熱ヒータの配設例を示す斜視図である。It is a perspective view which shows the example of arrangement | positioning of the radiant heat heater shown in FIG. 本発明の第２実施形態にかかる成膜装置の構成例を示す図である。It is a figure which shows the structural example of the film-forming apparatus concerning 2nd Embodiment of this invention. 同実施形態にかかる液体原料気化器の構成例を示す縦断面図である。It is a longitudinal cross-sectional view which shows the structural example of the liquid raw material vaporizer | carburetor concerning the embodiment.

符号の説明Explanation of symbols

１００，１０２ 成膜装置
１１０ 液体原料供給源
１１２ 液体原料供給配管
１１４ 液体原料流量制御バルブ
１２０ キャリアガス供給源
１２２ キャリアガス供給配管
１２４ キャリアガス流量制御バルブ
１３２ 原料ガス供給配管
１３４ 原料ガス流量制御バルブ
１４０ 制御部
２００ 成膜室
２１０ 側壁部材
２１２ 天壁部材
２１４ 底壁部材
２２２ サセプタ
２２４ 支持部材
２２６ ヒータ
２２８ 電源
２３０ 排気口
２３２ 排気手段
２４０ シャワーヘッド
２４２ 内部空間
２４４ ガス吐出孔
３００ 液体原料気化器
３００Ａ 液体原料供給部
３００Ｂ 気化部
３０２，３０４，３０８ 液体原料気化器
３０６ 接続配管
３１０ 液体原料流路
３１２ キャリアガス流路
３１４ 吐出ノズル
３１６ 吐出口
３１８ キャリアガス噴射部
３２０ キャリアガス噴出口
３３０ ハウジング
３３１ 側壁部材
３３２ 上流側端壁部材
３３４ 下流側単壁部材
３３６ 締結部材
３３８ 導入口
３４０ 送出口
３４２ スリーブ部材
３４４，３４６ ザグリ
３４８ シール部材
３５０ 気化空間
３６０ ミストトラップ部
３６２ 通気性部材
３６４ 閉じ部材
３６６ 内側空間
３６８ 外側空間（流路）
３７０ 輻射熱ヒータ
３７２ 貫通孔
３７４ ヒータ電源
３７６ 温度センサ
Ｗ ウエハ 100, 102 Film forming apparatus 110 Liquid source supply source 112 Liquid source supply pipe 114 Liquid source flow control valve 120 Carrier gas supply source 122 Carrier gas supply pipe 124 Carrier gas flow control valve 132 Source gas supply pipe 134 Source gas flow control valve 140 Control unit 200 Film forming chamber 210 Side wall member 212 Top wall member 214 Bottom wall member 222 Support member 226 Heater 228 Power source 230 Exhaust port 232 Exhaust means 240 Shower head 242 Internal space 244 Gas discharge hole 300 Liquid source vaporizer 300A Liquid source Supply unit 300B Vaporization unit 302, 304, 308 Liquid raw material vaporizer 306 Connection pipe 310 Liquid raw material flow channel 312 Carrier gas flow channel 314 Discharge nozzle 316 Discharge port 318 Carrier gas injection unit 320 Carrier gas discharge port 330 Housing 331 Side wall member 332 Upstream end wall member 334 Downstream single wall member 336 Fastening member 338 Inlet 340 Outlet 342 Sleeve member 344, 346 Counterbore 348 Sealing member 350 Vaporization space 360 Mist trap 362 Breathable member 364 Closing member 366 Inner space 368 Outer space (flow path)
370 Radiant Heat Heater 372 Through Hole 374 Heater Power Supply 376 Temperature Sensor W Wafer

Claims (11)

液体原料を液滴状にして吐出する液体原料供給部と，
前記液滴状の液体原料を気化させて原料ガスを生成する気化部と，
前記液体原料供給部からの前記液滴状の液体原料を前記気化部内に導入する導入口と，
前記気化部内に配置され，輻射熱によって加熱される材料で構成された通気性部材からなるミストトラップ部と，
前記通気性部材の外側表面の全体に熱線を照射し，その輻射熱によって前記通気性部材を加熱する輻射熱ヒータと，
加熱された前記通気性部材に前記液滴状の液体原料を通して気化させることによって生成した原料ガスを外部に送出する送出口と，
を備えたことを特徴とする液体原料気化器。 A liquid material supply unit for discharging the liquid material in droplets;
A vaporizing section that vaporizes the liquid material in the form of droplets to generate a raw material gas;
An inlet for introducing the liquid material in the form of droplets from the liquid material supply unit into the vaporization unit;
A mist trap portion made of a gas-permeable member made of a material disposed in the vaporization portion and heated by radiant heat;
A radiant heat heater that irradiates the entire outer surface of the breathable member with heat rays and heats the breathable member with its radiant heat;
A delivery port for sending the raw material gas generated by vaporizing the liquid material in the form of droplets to the heated air-permeable member;
A liquid raw material vaporizer characterized by comprising: 前記気化部の前記導入口と前記送出口とは対向して設け，
前記通気性部材は，前記導入口側から前記送出口側にわたって配置された筒状の形状をなし，前記導入口側の端部は閉じられるとともに，前記送出口側の端部は前記送出口に連通するように構成したことを特徴とする請求項１に記載の液体原料気化器。 The introduction port and the delivery port of the vaporization unit are provided to face each other,
The breathable member has a cylindrical shape arranged from the inlet side to the outlet side, the end on the inlet side is closed, and the end on the outlet side is connected to the outlet. The liquid raw material vaporizer according to claim 1, wherein the liquid raw material vaporizer is configured to communicate with each other. 前記輻射熱ヒータは，前記通気性部材の外側表面を囲むように配置したことを特徴とする請求項２に記載の液体原料気化器。 The liquid raw material vaporizer according to claim 2, wherein the radiant heat heater is disposed so as to surround an outer surface of the breathable member. 前記輻射熱ヒータは，カーボンヒータにより構成されることを特徴とする請求項３に記載の液体原料気化器。 4. The liquid source vaporizer according to claim 3, wherein the radiant heat heater is constituted by a carbon heater. 前記通気性部材と前記輻射熱ヒータとの間に，前記液滴状の液体原料が流通する気化空間と前記輻射熱ヒータの配設空間とを仕切る筒状の仕切部材を前記通気性部材を囲むように設け，
前記仕切部材は，前記輻射熱ヒータが照射する熱線を透過させる通気性のない部材で構成したことを特徴とする請求項３に記載の液体原料気化器。 Between the breathable member and the radiant heat heater, a cylindrical partition member that divides the vaporization space in which the liquid material in the form of liquid droplets circulates and the radiant heat heater is disposed so as to surround the breathable member. Provided,
4. The liquid raw material vaporizer according to claim 3, wherein the partition member is a non-breathable member that transmits heat rays emitted from the radiant heat heater. 5. 前記仕切部材は石英で構成したことを特徴とする請求項５に記載の液体原料気化器。 6. The liquid raw material vaporizer according to claim 5, wherein the partition member is made of quartz. 前記通気性部材の温度を測定する温度センサと，
前記温度センサによって測定された前記通気性部材の温度に基づいて前記輻射熱ヒータを制御することにより，前記通気性部材の温度を所定の温度に調節する制御部と，
を設けたことを特徴とする請求項１に記載の液体原料気化器。 A temperature sensor for measuring the temperature of the breathable member;
A controller for adjusting the temperature of the breathable member to a predetermined temperature by controlling the radiant heat heater based on the temperature of the breathable member measured by the temperature sensor;
The liquid raw material vaporizer according to claim 1, wherein: 前記気化部の外枠を構成するハウジングの内側面は，前記輻射熱ヒータからの熱線を反射して前記通気性部材の外側表面に向かうように鏡面加工したことを特徴とする請求項７に記載の液体原料気化器。 The inner surface of the housing constituting the outer frame of the vaporizing part is mirror-finished so as to reflect the heat rays from the radiant heat heater and go to the outer surface of the breathable member. Liquid raw material vaporizer. 液体原料を気化させて原料ガスを生成する他の液体原料気化器に接続される液体原料気化器であって，
前記他の液体原料気化器で生成された原料ガスを導入する導入口と，
輻射熱によって加熱される材料で構成された通気性部材からなるミストトラップ部と，
前記通気性部材の外側表面の全体に熱線を照射し，その輻射熱によって前記通気性部材を加熱する輻射熱ヒータと，
前記導入口から導入した前記他の液体原料気化器からの原料ガスを，加熱された前記通気性部材を通して外部に送出する送出口と，
を備えたことを特徴とする液体原料気化器。 A liquid raw material vaporizer connected to another liquid raw material vaporizer that vaporizes a liquid raw material to produce a raw material gas,
An inlet for introducing a raw material gas generated by the other liquid raw material vaporizer;
A mist trap portion made of a breathable member made of a material heated by radiant heat;
A radiant heat heater that irradiates the entire outer surface of the breathable member with heat rays and heats the breathable member with its radiant heat;
A delivery port for sending the source gas from the other liquid source vaporizer introduced from the introduction port to the outside through the heated breathable member;
A liquid raw material vaporizer characterized by comprising: 液体原料を気化させて原料ガスを生成する液体原料気化器から原料ガスを導入して被処理基板に対して成膜処理を行う成膜室を備える成膜装置であって，
前記液体原料気化器は，
前記液体原料を液滴状にして吐出する液体原料供給部と，
前記液滴状の液体原料を気化させて原料ガスを生成する気化部と，
前記液体原料供給部からの前記液滴状の液体原料を前記気化部内に導入する導入口と，
前記気化部内に配置され，輻射熱によって加熱される材料で構成された通気性部材からなるミストトラップ部と，
前記通気性部材の外側表面の全体に熱線を照射し，その輻射熱によって前記通気性部材を加熱する輻射熱ヒータと，
加熱された前記通気性部材に前記液滴状の液体原料を通して気化させることによって生成した原料ガスを外部に送出する送出口と，
を備えたことを特徴とする成膜装置。 A film forming apparatus including a film forming chamber for performing a film forming process on a substrate to be processed by introducing a source gas from a liquid source vaporizer that vaporizes a liquid source to generate a source gas,
The liquid source vaporizer is
A liquid source supply unit for discharging the liquid source in the form of droplets;
A vaporizing section that vaporizes the liquid material in the form of droplets to generate a raw material gas;
An inlet for introducing the liquid material in the form of droplets from the liquid material supply unit into the vaporization unit;
A mist trap portion made of a gas-permeable member made of a material disposed in the vaporization portion and heated by radiant heat;
A radiant heat heater that irradiates the entire outer surface of the breathable member with heat rays and heats the breathable member with its radiant heat;
A delivery port for sending the raw material gas generated by vaporizing the liquid material in the form of droplets to the heated air-permeable member;
A film forming apparatus comprising: 液体原料を気化させて原料ガスを生成する液体原料気化器から原料ガスを導入して被処理基板に対して成膜処理を行う成膜室を備える成膜装置であって，
前記液体原料気化器は，液体原料を気化させて原料ガスを生成する第１の液体原料気化器とこれに接続された第２の液体原料気化器により構成され，
前記第２の液体原料気化器は，
前記第１の液体原料気化器で生成された原料ガスを導入する導入口と，
輻射熱によって加熱される材料で構成された通気性部材からなるミストトラップ部と，
前記通気性部材の外側表面の全体に熱線を照射し，その輻射熱によって前記通気性部材を加熱する輻射熱ヒータと，
前記導入口から導入した前記第１の液体原料気化器からの原料ガスを，加熱された前記通気性部材を通して外部に送出する送出口と，
を備えたことを特徴とする成膜装置。
A film forming apparatus including a film forming chamber for performing a film forming process on a substrate to be processed by introducing a source gas from a liquid source vaporizer that vaporizes a liquid source to generate a source gas,
The liquid raw material vaporizer includes a first liquid raw material vaporizer that vaporizes a liquid raw material to generate a raw material gas, and a second liquid raw material vaporizer connected thereto,
The second liquid source vaporizer is
An inlet for introducing the raw material gas generated by the first liquid raw material vaporizer;
A mist trap portion made of a breathable member made of a material heated by radiant heat;
A radiant heat heater that irradiates the entire outer surface of the breathable member with heat rays and heats the breathable member with its radiant heat;
A delivery port for sending the raw material gas from the first liquid raw material vaporizer introduced from the introduction port to the outside through the heated breathable member;
A film forming apparatus comprising:
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