SG11202001334QA - Positive type photosensitive siloxane composition and cured film using the same - Google Patents
Positive type photosensitive siloxane composition and cured film using the sameInfo
- Publication number
- SG11202001334QA SG11202001334QA SG11202001334QA SG11202001334QA SG11202001334QA SG 11202001334Q A SG11202001334Q A SG 11202001334QA SG 11202001334Q A SG11202001334Q A SG 11202001334QA SG 11202001334Q A SG11202001334Q A SG 11202001334QA SG 11202001334Q A SG11202001334Q A SG 11202001334QA
- Authority
- SG
- Singapore
- Prior art keywords
- same
- cured film
- positive type
- type photosensitive
- siloxane composition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
- C08G77/52—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages containing aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/80—Siloxanes having aromatic substituents, e.g. phenyl side groups
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials For Photolithography (AREA)
- Silicon Polymers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017187040A JP2019061166A (en) | 2017-09-27 | 2017-09-27 | Positive photosensitive siloxane composition and cured film containing the same |
PCT/EP2018/075749 WO2019063460A1 (en) | 2017-09-27 | 2018-09-24 | Positive type photosensitive siloxane composition and cured film using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202001334QA true SG11202001334QA (en) | 2020-04-29 |
Family
ID=63683210
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202001334QA SG11202001334QA (en) | 2017-09-27 | 2018-09-24 | Positive type photosensitive siloxane composition and cured film using the same |
Country Status (7)
Country | Link |
---|---|
US (1) | US20200225583A1 (en) |
JP (2) | JP2019061166A (en) |
KR (1) | KR102614196B1 (en) |
CN (1) | CN111148805B (en) |
SG (1) | SG11202001334QA (en) |
TW (1) | TWI797164B (en) |
WO (1) | WO2019063460A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019120750A (en) | 2017-12-28 | 2019-07-22 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | Photosensitive siloxane composition and patterning method using the same |
US11270241B2 (en) | 2019-06-13 | 2022-03-08 | Nice Ltd. | Systems and methods for discovery of automation opportunities |
US11481420B2 (en) | 2019-08-08 | 2022-10-25 | Nice Ltd. | Systems and methods for analyzing computer input to provide next action |
TW202125098A (en) * | 2019-10-10 | 2021-07-01 | 德商馬克專利公司 | Positive tone photoresist formulation using crosslinkable siloxane compounds |
US11763228B2 (en) | 2021-04-06 | 2023-09-19 | Nice Ltd. | Systems and methods for analyzing and connecting automation sequences |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10120676B4 (en) * | 2001-04-27 | 2005-06-16 | Infineon Technologies Ag | Process for structuring a photoresist layer |
TWI428697B (en) * | 2008-03-31 | 2014-03-01 | Hitachi Chemical Co Ltd | Silica based positive type photosensitive organic compound |
JP5509675B2 (en) * | 2008-05-30 | 2014-06-04 | 東レ株式会社 | Siloxane resin composition and optical device using the same |
JP5707407B2 (en) * | 2010-08-24 | 2015-04-30 | メルクパフォーマンスマテリアルズIp合同会社 | Positive photosensitive siloxane composition |
JP5726632B2 (en) * | 2011-05-19 | 2015-06-03 | メルクパフォーマンスマテリアルズIp合同会社 | Photosensitive siloxane resin composition |
KR101902164B1 (en) * | 2011-05-20 | 2018-10-01 | 메르크 파텐트 게엠베하 | Positive photosensitive siloxane composition |
SG11201402918VA (en) * | 2011-12-26 | 2014-10-30 | Toray Industries | Photosensitive resin composition and process for producing semiconductor element |
US20150029749A1 (en) * | 2013-07-24 | 2015-01-29 | JEFFREY Alan LAINE | Patterned light distribution device wedge (pldw) |
JP6480691B2 (en) | 2013-10-21 | 2019-03-13 | アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | Silicon-containing heat or light curable composition |
TWI551951B (en) * | 2014-05-07 | 2016-10-01 | 奇美實業股份有限公司 | Photosensitive composition, protecting film, and element having the protecting film |
KR101520793B1 (en) * | 2014-08-28 | 2015-05-18 | 엘티씨 (주) | Photo-sensitive poly silsesquinoxane resin compositions with high heat resistance |
KR20160093236A (en) * | 2015-01-29 | 2016-08-08 | 주식회사 이그잭스 | Composition of photo sensitive resin including polysiloxane |
US10620538B2 (en) * | 2015-02-04 | 2020-04-14 | Sakai Display Products Corporation | Positive type photosensitive siloxane composition, active matrix substrate, display apparatus, and method of manufacturing active matrix substrate |
JP2017151209A (en) * | 2016-02-23 | 2017-08-31 | アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | Positive photosensitive siloxane composition |
-
2017
- 2017-09-27 JP JP2017187040A patent/JP2019061166A/en active Pending
-
2018
- 2018-09-24 WO PCT/EP2018/075749 patent/WO2019063460A1/en active Application Filing
- 2018-09-24 SG SG11202001334QA patent/SG11202001334QA/en unknown
- 2018-09-24 JP JP2020508505A patent/JP7206255B2/en active Active
- 2018-09-24 US US16/651,110 patent/US20200225583A1/en active Pending
- 2018-09-24 KR KR1020207012242A patent/KR102614196B1/en active IP Right Grant
- 2018-09-24 CN CN201880062632.7A patent/CN111148805B/en active Active
- 2018-09-26 TW TW107133743A patent/TWI797164B/en active
Also Published As
Publication number | Publication date |
---|---|
JP2020535453A (en) | 2020-12-03 |
CN111148805A (en) | 2020-05-12 |
US20200225583A1 (en) | 2020-07-16 |
WO2019063460A1 (en) | 2019-04-04 |
TW201921115A (en) | 2019-06-01 |
JP7206255B2 (en) | 2023-01-17 |
KR20200060466A (en) | 2020-05-29 |
JP2019061166A (en) | 2019-04-18 |
CN111148805B (en) | 2023-02-17 |
TWI797164B (en) | 2023-04-01 |
KR102614196B1 (en) | 2023-12-19 |
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