SG11201709671YA - Semiconductor device manufacturing method - Google Patents

Semiconductor device manufacturing method

Info

Publication number
SG11201709671YA
SG11201709671YA SG11201709671YA SG11201709671YA SG11201709671YA SG 11201709671Y A SG11201709671Y A SG 11201709671YA SG 11201709671Y A SG11201709671Y A SG 11201709671YA SG 11201709671Y A SG11201709671Y A SG 11201709671YA SG 11201709671Y A SG11201709671Y A SG 11201709671YA
Authority
SG
Singapore
Prior art keywords
semiconductor device
device manufacturing
manufacturing
semiconductor
Prior art date
Application number
SG11201709671YA
Inventor
Naoya Saiki
Katsuhiko Horigome
Hiroyuki Yoneyama
Yoshio Arai
Original Assignee
Lintec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lintec Corp filed Critical Lintec Corp
Publication of SG11201709671YA publication Critical patent/SG11201709671YA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
SG11201709671YA 2015-05-25 2016-04-08 Semiconductor device manufacturing method SG11201709671YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015105685 2015-05-25
PCT/JP2016/061574 WO2016189986A1 (en) 2015-05-25 2016-04-08 Semiconductor device manufacturing method

Publications (1)

Publication Number Publication Date
SG11201709671YA true SG11201709671YA (en) 2017-12-28

Family

ID=57393938

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201709671YA SG11201709671YA (en) 2015-05-25 2016-04-08 Semiconductor device manufacturing method

Country Status (6)

Country Link
JP (1) JP6539919B2 (en)
KR (1) KR102528047B1 (en)
CN (1) CN107615453B (en)
SG (1) SG11201709671YA (en)
TW (1) TWI683358B (en)
WO (1) WO2016189986A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6775436B2 (en) * 2017-02-02 2020-10-28 リンテック株式会社 Manufacturing method for film adhesives, semiconductor processing sheets and semiconductor devices
CN108091605B (en) * 2017-12-06 2018-12-21 英特尔产品(成都)有限公司 A method of it reducing wafer and accidentally removes
JP6821749B2 (en) * 2018-07-12 2021-01-27 デクセリアルズ株式会社 Pickup device, mounting device, pickup method, mounting method
CN109786310A (en) * 2019-01-14 2019-05-21 东莞记忆存储科技有限公司 Crystalline substance gummed paper is glued with the method for die separation
JP2020129639A (en) * 2019-02-12 2020-08-27 株式会社ディスコ Device package formation method
JPWO2020195808A1 (en) * 2019-03-26 2020-10-01
CN109967872B (en) * 2019-04-23 2021-05-07 苏州福唐智能科技有限公司 Semiconductor laser welding method and welding structure thereof
US20220293554A1 (en) * 2019-08-26 2022-09-15 Lintec Corporation Method of manufacturing laminate
JP7301480B2 (en) * 2019-10-17 2023-07-03 株式会社ディスコ Wafer processing method
JP7370215B2 (en) * 2019-10-25 2023-10-27 三菱電機株式会社 Manufacturing method of semiconductor device
CN112846534B (en) * 2020-12-30 2023-03-21 武汉理工氢电科技有限公司 3CCM cutting method
CN116918037A (en) * 2021-03-08 2023-10-20 琳得科株式会社 Method for manufacturing semiconductor device

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001144213A (en) * 1999-11-16 2001-05-25 Hitachi Ltd Method for manufacturing semiconductor device and semiconductor device
JP3544362B2 (en) * 2001-03-21 2004-07-21 リンテック株式会社 Method for manufacturing semiconductor chip
US6709953B2 (en) * 2002-01-31 2004-03-23 Infineon Technologies Ag Method of applying a bottom surface protective coating to a wafer, and wafer dicing method
US6908784B1 (en) * 2002-03-06 2005-06-21 Micron Technology, Inc. Method for fabricating encapsulated semiconductor components
US6582983B1 (en) * 2002-07-12 2003-06-24 Keteca Singapore Singapore Method and wafer for maintaining ultra clean bonding pads on a wafer
JP2005191508A (en) * 2003-12-05 2005-07-14 Rohm Co Ltd Semiconductor device and manufacturing method for the same
JP5353703B2 (en) * 2007-10-09 2013-11-27 日立化成株式会社 Manufacturing method of semiconductor chip with adhesive film, adhesive film for semiconductor used in manufacturing method, and manufacturing method of semiconductor device
JP2012079936A (en) * 2010-10-01 2012-04-19 Nitto Denko Corp Dicing, die-bonding film and method for manufacturing semiconductor device
JP5865044B2 (en) * 2011-12-07 2016-02-17 リンテック株式会社 Dicing sheet with protective film forming layer and chip manufacturing method
JP5976326B2 (en) 2012-01-25 2016-08-23 日東電工株式会社 Manufacturing method of semiconductor device and adhesive film used for manufacturing method of semiconductor device
JP5908543B2 (en) * 2014-08-07 2016-04-26 日東電工株式会社 Manufacturing method of semiconductor device

Also Published As

Publication number Publication date
CN107615453B (en) 2020-09-01
TW201642337A (en) 2016-12-01
JP6539919B2 (en) 2019-07-10
CN107615453A (en) 2018-01-19
KR102528047B1 (en) 2023-05-02
JPWO2016189986A1 (en) 2018-03-15
TWI683358B (en) 2020-01-21
WO2016189986A1 (en) 2016-12-01
KR20180010194A (en) 2018-01-30

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