SG11201706686YA - Methods for determining resist deformation - Google Patents
Methods for determining resist deformationInfo
- Publication number
- SG11201706686YA SG11201706686YA SG11201706686YA SG11201706686YA SG11201706686YA SG 11201706686Y A SG11201706686Y A SG 11201706686YA SG 11201706686Y A SG11201706686Y A SG 11201706686YA SG 11201706686Y A SG11201706686Y A SG 11201706686YA SG 11201706686Y A SG11201706686Y A SG 11201706686YA
- Authority
- SG
- Singapore
- Prior art keywords
- methods
- resist deformation
- determining resist
- determining
- deformation
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
- G03F7/70441—Optical proximity correction [OPC]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562133782P | 2015-03-16 | 2015-03-16 | |
PCT/EP2016/053877 WO2016146355A1 (en) | 2015-03-16 | 2016-02-24 | Methods for determining resist deformation |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201706686YA true SG11201706686YA (en) | 2017-09-28 |
Family
ID=55409854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201706686YA SG11201706686YA (en) | 2015-03-16 | 2016-02-24 | Methods for determining resist deformation |
Country Status (8)
Country | Link |
---|---|
US (1) | US10423076B2 (ko) |
EP (1) | EP3271783B1 (ko) |
JP (1) | JP6640236B2 (ko) |
KR (2) | KR102182005B1 (ko) |
CN (1) | CN107430351B (ko) |
SG (1) | SG11201706686YA (ko) |
TW (1) | TWI620033B (ko) |
WO (1) | WO2016146355A1 (ko) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10437157B2 (en) | 2014-12-09 | 2019-10-08 | Asml Netherlands B.V. | Method and apparatus for image analysis |
WO2016091536A1 (en) * | 2014-12-09 | 2016-06-16 | Asml Netherlands B.V. | Method and apparatus for image analysis |
WO2017172158A1 (en) * | 2016-03-29 | 2017-10-05 | Applied Materials, Inc. | Integrated metrology and process system for semiconductor substrate local stress and overlay correction |
US11625520B2 (en) | 2017-12-04 | 2023-04-11 | Asml Netherlands B.V. | Systems and methods for predicting layer deformation |
EP3492983A1 (en) * | 2017-12-04 | 2019-06-05 | ASML Netherlands B.V. | Systems and methods for predicting layer deformation |
EP3531206A1 (en) * | 2018-02-23 | 2019-08-28 | ASML Netherlands B.V. | Systems and methods for improving resist model predictions |
US11709988B2 (en) * | 2018-12-31 | 2023-07-25 | Asml Netherlands B.V. | Method for predicting resist deformation |
CN109708590B (zh) * | 2019-01-23 | 2020-04-10 | 中国科学院长春光学精密机械与物理研究所 | 一种反射镜绝对加工面形的计算方法及*** |
KR20220093915A (ko) * | 2020-12-28 | 2022-07-05 | 삼성전자주식회사 | 반도체 집적회로 레이아웃의 확률적 취약점 검출 방법 및 이를 수행하는 컴퓨터 시스템 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5523193A (en) | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
DE59105735D1 (de) | 1990-05-02 | 1995-07-20 | Fraunhofer Ges Forschung | Belichtungsvorrichtung. |
US5229872A (en) | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
WO1997033205A1 (en) | 1996-03-06 | 1997-09-12 | Philips Electronics N.V. | Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
US6594012B2 (en) | 1996-07-05 | 2003-07-15 | Canon Kabushiki Kaisha | Exposure apparatus |
DE69735016T2 (de) | 1996-12-24 | 2006-08-17 | Asml Netherlands B.V. | Lithographisches Gerät mit zwei Objekthaltern |
US6433878B1 (en) * | 2001-01-29 | 2002-08-13 | Timbre Technology, Inc. | Method and apparatus for the determination of mask rules using scatterometry |
US7617477B2 (en) | 2005-09-09 | 2009-11-10 | Brion Technologies, Inc. | Method for selecting and optimizing exposure tool using an individual mask error model |
JP2008250139A (ja) | 2007-03-30 | 2008-10-16 | Fujifilm Corp | 露光装置における露光方法及び露光装置 |
US20080304034A1 (en) | 2007-06-07 | 2008-12-11 | Asml Netherlands B.V. | Dose control for optical maskless lithography |
NL1036189A1 (nl) | 2007-12-05 | 2009-06-08 | Brion Tech Inc | Methods and System for Lithography Process Window Simulation. |
CN102057330B (zh) * | 2008-06-03 | 2013-07-17 | Asml荷兰有限公司 | 基于模型的扫描器调节方法 |
NL2007577A (en) | 2010-11-10 | 2012-05-14 | Asml Netherlands Bv | Optimization of source, mask and projection optics. |
NL2008924A (en) | 2011-06-22 | 2013-01-02 | Asml Netherlands Bv | System and method to ensure source and image stability. |
US8473878B2 (en) * | 2011-11-28 | 2013-06-25 | Synopsys, Inc. | Lithographically enhanced edge determination |
NL2009982A (en) * | 2012-01-10 | 2013-07-15 | Asml Netherlands Bv | Source mask optimization to reduce stochastic effects. |
JP5789275B2 (ja) | 2012-02-03 | 2015-10-07 | エーエスエムエル ネザーランズ ビー.ブイ. | 3dレジストプロファイルのシミュレーション用のリソグラフィモデル |
KR101821666B1 (ko) | 2013-07-19 | 2018-01-24 | 에이에스엠엘 네델란즈 비.브이. | 비단조적 도즈 감도의 결정 및 적용 |
-
2016
- 2016-02-24 KR KR1020207003415A patent/KR102182005B1/ko active IP Right Grant
- 2016-02-24 WO PCT/EP2016/053877 patent/WO2016146355A1/en active Application Filing
- 2016-02-24 KR KR1020177029533A patent/KR102077173B1/ko active Application Filing
- 2016-02-24 US US15/553,879 patent/US10423076B2/en active Active
- 2016-02-24 SG SG11201706686YA patent/SG11201706686YA/en unknown
- 2016-02-24 JP JP2017543992A patent/JP6640236B2/ja active Active
- 2016-02-24 CN CN201680016535.5A patent/CN107430351B/zh active Active
- 2016-02-24 EP EP16705970.8A patent/EP3271783B1/en active Active
- 2016-03-09 TW TW105107234A patent/TWI620033B/zh active
Also Published As
Publication number | Publication date |
---|---|
US10423076B2 (en) | 2019-09-24 |
CN107430351A (zh) | 2017-12-01 |
TW201702747A (zh) | 2017-01-16 |
TWI620033B (zh) | 2018-04-01 |
EP3271783B1 (en) | 2021-04-07 |
KR102182005B1 (ko) | 2020-11-24 |
JP2018509651A (ja) | 2018-04-05 |
US20180246419A1 (en) | 2018-08-30 |
WO2016146355A1 (en) | 2016-09-22 |
EP3271783A1 (en) | 2018-01-24 |
JP6640236B2 (ja) | 2020-02-05 |
KR102077173B1 (ko) | 2020-02-13 |
KR20170141667A (ko) | 2017-12-26 |
KR20200015843A (ko) | 2020-02-12 |
CN107430351B (zh) | 2019-06-11 |
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