SG11201510599VA - System and method for defect detection and photoluminescence measurement of a sample - Google Patents
System and method for defect detection and photoluminescence measurement of a sampleInfo
- Publication number
- SG11201510599VA SG11201510599VA SG11201510599VA SG11201510599VA SG11201510599VA SG 11201510599V A SG11201510599V A SG 11201510599VA SG 11201510599V A SG11201510599V A SG 11201510599VA SG 11201510599V A SG11201510599V A SG 11201510599VA SG 11201510599V A SG11201510599V A SG 11201510599VA
- Authority
- SG
- Singapore
- Prior art keywords
- sample
- defect detection
- photoluminescence measurement
- photoluminescence
- measurement
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6489—Photoluminescence of semiconductors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N2021/6495—Miscellaneous methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8845—Multiple wavelengths of illumination or detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/061—Sources
- G01N2201/06113—Coherent sources; lasers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/066—Modifiable path; multiple paths in one sample
- G01N2201/0662—Comparing measurements on two or more paths in one sample
Landscapes
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361839494P | 2013-06-26 | 2013-06-26 | |
| US14/212,496 US9354177B2 (en) | 2013-06-26 | 2014-03-14 | System and method for defect detection and photoluminescence measurement of a sample |
| PCT/US2014/044149 WO2014210195A1 (en) | 2013-06-26 | 2014-06-25 | System and method for defect detection and photoluminescence measurement of a sample |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201510599VA true SG11201510599VA (en) | 2016-01-28 |
Family
ID=52114670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201510599VA SG11201510599VA (en) | 2013-06-26 | 2014-06-25 | System and method for defect detection and photoluminescence measurement of a sample |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US9354177B2 (en) |
| EP (1) | EP3014654A4 (en) |
| JP (5) | JP6282733B2 (en) |
| KR (4) | KR20160024968A (en) |
| CN (2) | CN105493258B (en) |
| SG (1) | SG11201510599VA (en) |
| TW (2) | TWI664418B (en) |
| WO (1) | WO2014210195A1 (en) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9442076B2 (en) | 2014-12-12 | 2016-09-13 | Bell Helicopter Textron Inc. | Infrared radiometric imaging inspection of steel parts |
| CN107110782B (en) * | 2015-01-28 | 2020-12-29 | 东丽工程株式会社 | Defect inspection method and defect inspection apparatus for wide band gap semiconductor substrate |
| JP6296001B2 (en) * | 2015-05-20 | 2018-03-20 | 信越半導体株式会社 | Manufacturing method and evaluation method of silicon epitaxial wafer |
| US9911574B2 (en) * | 2015-08-14 | 2018-03-06 | The Trustees of Princeton University, Office of Technology and Trademark Licensing | Scanning probe lithography methods utilizing an enclosed sinusoidal pattern |
| JP6531579B2 (en) * | 2015-09-10 | 2019-06-19 | 株式会社Sumco | Wafer inspection method and wafer inspection apparatus |
| US10625111B2 (en) * | 2016-01-26 | 2020-04-21 | Beaverfit Limited | Training apparatus |
| CN105842233A (en) * | 2016-05-10 | 2016-08-10 | 山东大学 | Detection system for collecting dual-wavelength electrochemiluminescence light intensity information |
| TWI586957B (en) * | 2016-06-24 | 2017-06-11 | 諾貝爾生物有限公司 | Multi-channel fluorescene detecting system and method using the same |
| US10371626B2 (en) * | 2016-08-17 | 2019-08-06 | Kla-Tencor Corporation | System and method for generating multi-channel tunable illumination from a broadband source |
| CN108072613B (en) * | 2016-11-11 | 2020-09-08 | 台湾积体电路制造股份有限公司 | Optical detection device and detection method thereof |
| KR101838818B1 (en) * | 2016-11-30 | 2018-03-14 | 세메스 주식회사 | Fluorescent microscope and substrate inspection apparatus including the same |
| TWI646323B (en) * | 2016-12-01 | 2019-01-01 | 友達晶材股份有限公司 | Silicon crystal material detection method and detection device |
| KR101810078B1 (en) | 2016-12-22 | 2017-12-18 | 주식회사 에타맥스 | System for defect detection by photoluminescence and scattering measurement of a sample |
| US10234402B2 (en) | 2017-01-05 | 2019-03-19 | Kla-Tencor Corporation | Systems and methods for defect material classification |
| US10551320B2 (en) * | 2017-01-30 | 2020-02-04 | Kla-Tencor Corporation | Activation of wafer particle defects for spectroscopic composition analysis |
| WO2018194210A1 (en) * | 2017-04-20 | 2018-10-25 | 한국세라믹기술원 | Method for analyzing crystal polytype using ultraviolet photoluminescence |
| KR102037984B1 (en) * | 2017-11-23 | 2019-10-29 | 주식회사 나노정밀코리아 | a multi-functional optical inspecting device |
| US20190162885A1 (en) * | 2017-11-30 | 2019-05-30 | Qualcomm Incorporated | Optical bandpass filter design |
| KR20230110665A (en) * | 2018-04-02 | 2023-07-24 | 에이에스엠엘 네델란즈 비.브이. | Architecture for large active area high speed detector |
| KR102067972B1 (en) | 2018-09-21 | 2020-01-20 | 주식회사 에타맥스 | Led inspection system capable of simultaneous detection of photoluminescence and scattered light |
| US11733173B1 (en) | 2019-02-28 | 2023-08-22 | Lumina Instruments Inc. | Time domain multiplexed defect scanner |
| CN110208272B (en) * | 2019-06-18 | 2020-06-23 | 上海精测半导体技术有限公司 | Surface detection device and method |
| PT3799998T (en) * | 2019-10-02 | 2022-08-12 | Adige Spa | Method of detecting the operating condition of an optical element arranged along a propagation path of a laser beam of a machine for processing a material, system for carrying out said method and a laser processing machine provided with such system |
| JP2023513217A (en) * | 2020-02-07 | 2023-03-30 | ベクトン・ディキンソン・アンド・カンパニー | Clustered wavelength division photodetection system and method of use |
| CN111426446A (en) * | 2020-04-23 | 2020-07-17 | 空气动力学国家重点实验室 | Multichannel focusing laser differential interferometer |
| TWI758923B (en) * | 2020-10-27 | 2022-03-21 | 財團法人工業技術研究院 | Laser inspection system |
| JP2023010461A (en) | 2021-07-09 | 2023-01-20 | 株式会社デンソー | User equipment, base station, and communication control method |
| WO2023039471A1 (en) * | 2021-09-09 | 2023-03-16 | Onto Innovation Inc. | High resolution multispectral multi-field-of-view imaging system for wafer inspection |
| KR102564487B1 (en) * | 2021-10-08 | 2023-08-07 | 주식회사 에타맥스 | Defect Classification Equipment for Silicon Carbide Substrate using Single Incident Light-based PhotoLuminescence and Defect Classification Method using The Same |
| KR102602029B1 (en) * | 2021-11-11 | 2023-11-14 | 주식회사 에타맥스 | Micro LED Inspection Device for Performing Photoluminescence Inspection and Automatic Optical Inspection Simultaneously |
| KR102640751B1 (en) * | 2021-11-24 | 2024-02-27 | 주식회사 에스에스솔루션 | A device for detecting a gas mixture of hazardous substances using dichroic filters |
| CN117012663B (en) * | 2023-08-24 | 2024-06-11 | 上海优睿谱半导体设备有限公司 | Wafer defect detection system and method |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6201601B1 (en) | 1997-09-19 | 2001-03-13 | Kla-Tencor Corporation | Sample inspection system |
| US6534774B2 (en) * | 2000-09-08 | 2003-03-18 | Mitsubishi Materials Silicon Corporation | Method and apparatus for evaluating the quality of a semiconductor substrate |
| US6791099B2 (en) * | 2001-02-14 | 2004-09-14 | Applied Materials, Inc. | Laser scanning wafer inspection using nonlinear optical phenomena |
| GB0107618D0 (en) * | 2001-03-27 | 2001-05-16 | Aoti Operating Co Inc | Detection and classification of micro-defects in semi-conductors |
| JP2003028797A (en) * | 2001-07-11 | 2003-01-29 | Hitachi Software Eng Co Ltd | Fluorescence reader |
| GB0216815D0 (en) * | 2002-07-19 | 2002-08-28 | Aoti Operating Co Inc | Detection method and apparatus |
| US7352456B2 (en) * | 2003-04-08 | 2008-04-01 | Kla-Tencor Technologies Corp. | Method and apparatus for inspecting a substrate using a plurality of inspection wavelength regimes |
| US7304310B1 (en) * | 2003-11-21 | 2007-12-04 | Kla-Tencor Technologies Corp. | Methods and systems for inspecting a specimen using light scattered in different wavelength ranges |
| TWI236773B (en) * | 2004-06-21 | 2005-07-21 | Nat Univ Chung Hsing | High-efficiency light-emitting device |
| JP4182935B2 (en) | 2004-08-25 | 2008-11-19 | 住友電気工業株式会社 | Method for growing gallium nitride crystal and method for manufacturing gallium nitride substrate |
| JP3917154B2 (en) | 2004-11-19 | 2007-05-23 | 独立行政法人 宇宙航空研究開発機構 | Defect evaluation method and apparatus for semiconductor sample |
| JP4633549B2 (en) * | 2005-06-15 | 2011-02-16 | 財団法人電力中央研究所 | Photoluminescence mapping measuring device |
| TWI439684B (en) * | 2005-07-06 | 2014-06-01 | Nanometrics Inc | Photoluminescence imaging with preferential detection of photoluminescence signals emitted from a specified material layer of a wafer or other workpiece |
| US7664608B2 (en) * | 2006-07-14 | 2010-02-16 | Hitachi High-Technologies Corporation | Defect inspection method and apparatus |
| US7362426B1 (en) * | 2006-10-06 | 2008-04-22 | Wafermasters, Inc. | Raman and photoluminescence spectroscopy |
| JP4827099B2 (en) * | 2007-01-19 | 2011-11-30 | トヨタ自動車株式会社 | Powder phosphor and method for manufacturing the same, and light emitting device, display device and fluorescent lamp having powder phosphor |
| JP2010109156A (en) | 2008-10-30 | 2010-05-13 | Oki Electric Ind Co Ltd | Method and device for inspecting semiconductor device |
| US7907269B2 (en) | 2009-07-23 | 2011-03-15 | Kla-Tencor Corporation | Scattered light separation |
| JP2011199132A (en) | 2010-03-23 | 2011-10-06 | Sumitomo Electric Ind Ltd | Semiconductor device and method of manufacturing the same |
| US9163987B2 (en) | 2010-08-24 | 2015-10-20 | Kla-Tencor Corporation | Defect inspection and photoluminescence measurement system |
| SG190678A1 (en) * | 2010-12-16 | 2013-07-31 | Kla Tencor Corp | Wafer inspection |
| JP5682858B2 (en) | 2011-05-20 | 2015-03-11 | 株式会社Sumco | Silicon wafer evaluation method and manufacturing method |
| US20120326054A1 (en) * | 2011-06-22 | 2012-12-27 | Mark Anthony Meloni | In Situ Photoluminescence Characterization System and Method |
| US9279774B2 (en) | 2011-07-12 | 2016-03-08 | Kla-Tencor Corp. | Wafer inspection |
| JP6036940B2 (en) | 2015-08-10 | 2016-11-30 | 日本電気株式会社 | COMMUNICATION SYSTEM, NODE, CONTROL DEVICE, COMMUNICATION METHOD, AND PROGRAM |
-
2014
- 2014-03-14 US US14/212,496 patent/US9354177B2/en active Active
- 2014-04-09 TW TW106130946A patent/TWI664418B/en active
- 2014-04-09 TW TW103113077A patent/TWI603073B/en active
- 2014-06-25 JP JP2016523896A patent/JP6282733B2/en active Active
- 2014-06-25 CN CN201480046386.8A patent/CN105493258B/en active Active
- 2014-06-25 KR KR1020167002039A patent/KR20160024968A/en not_active IP Right Cessation
- 2014-06-25 CN CN201811188708.9A patent/CN109540853B/en active Active
- 2014-06-25 EP EP14818432.8A patent/EP3014654A4/en not_active Withdrawn
- 2014-06-25 WO PCT/US2014/044149 patent/WO2014210195A1/en active Application Filing
- 2014-06-25 SG SG11201510599VA patent/SG11201510599VA/en unknown
- 2014-06-25 KR KR1020217027588A patent/KR102356942B1/en active IP Right Grant
- 2014-06-25 KR KR1020207021775A patent/KR102297502B1/en active IP Right Grant
- 2014-06-25 KR KR1020217027586A patent/KR102356943B1/en active IP Right Grant
-
2016
- 2016-05-27 US US15/167,721 patent/US9772289B2/en active Active
-
2018
- 2018-01-24 JP JP2018009623A patent/JP2018105871A/en active Pending
-
2020
- 2020-02-07 JP JP2020019461A patent/JP6870129B2/en active Active
-
2021
- 2021-04-14 JP JP2021068274A patent/JP7160496B2/en active Active
-
2022
- 2022-10-11 JP JP2022163211A patent/JP7502389B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN109540853A (en) | 2019-03-29 |
| KR102297502B1 (en) | 2021-09-03 |
| JP2022186764A (en) | 2022-12-15 |
| KR102356943B1 (en) | 2022-02-08 |
| JP2018105871A (en) | 2018-07-05 |
| JP7160496B2 (en) | 2022-10-25 |
| JP6282733B2 (en) | 2018-02-21 |
| CN109540853B (en) | 2021-04-09 |
| US9354177B2 (en) | 2016-05-31 |
| JP6870129B2 (en) | 2021-05-12 |
| TWI603073B (en) | 2017-10-21 |
| US20150001421A1 (en) | 2015-01-01 |
| TW201510510A (en) | 2015-03-16 |
| KR20210109062A (en) | 2021-09-03 |
| KR20160024968A (en) | 2016-03-07 |
| WO2014210195A1 (en) | 2014-12-31 |
| KR20200093690A (en) | 2020-08-05 |
| JP7502389B2 (en) | 2024-06-18 |
| CN105493258B (en) | 2018-11-09 |
| CN105493258A (en) | 2016-04-13 |
| JP2020073935A (en) | 2020-05-14 |
| JP2021114619A (en) | 2021-08-05 |
| TWI664418B (en) | 2019-07-01 |
| KR20210109061A (en) | 2021-09-03 |
| US20160377548A1 (en) | 2016-12-29 |
| EP3014654A1 (en) | 2016-05-04 |
| TW201743049A (en) | 2017-12-16 |
| KR102356942B1 (en) | 2022-02-08 |
| EP3014654A4 (en) | 2017-03-01 |
| JP2016525214A (en) | 2016-08-22 |
| US9772289B2 (en) | 2017-09-26 |
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