SG11201506140WA - Sputtering target - Google Patents

Sputtering target

Info

Publication number
SG11201506140WA
SG11201506140WA SG11201506140WA SG11201506140WA SG11201506140WA SG 11201506140W A SG11201506140W A SG 11201506140WA SG 11201506140W A SG11201506140W A SG 11201506140WA SG 11201506140W A SG11201506140W A SG 11201506140WA SG 11201506140W A SG11201506140W A SG 11201506140WA
Authority
SG
Singapore
Prior art keywords
sputtering target
sputtering
target
Prior art date
Application number
SG11201506140WA
Inventor
Atsushi Sato
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of SG11201506140WA publication Critical patent/SG11201506140WA/en

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851Coating a support with a magnetic layer by sputtering
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • C22C1/0466Alloys based on noble metals
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C30/00Alloys containing less than 50% by weight of each constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C33/00Making ferrous alloys
    • C22C33/02Making ferrous alloys by powder metallurgy
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
SG11201506140WA 2013-04-15 2014-01-29 Sputtering target SG11201506140WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013084817 2013-04-15
PCT/JP2014/051970 WO2014171161A1 (en) 2013-04-15 2014-01-29 Sputtering target

Publications (1)

Publication Number Publication Date
SG11201506140WA true SG11201506140WA (en) 2015-09-29

Family

ID=51731122

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201506140WA SG11201506140WA (en) 2013-04-15 2014-01-29 Sputtering target

Country Status (5)

Country Link
JP (1) JP5944580B2 (en)
MY (1) MY174738A (en)
SG (1) SG11201506140WA (en)
TW (1) TWI593810B (en)
WO (1) WO2014171161A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016047236A1 (en) * 2014-09-22 2016-03-31 Jx金属株式会社 Sputtering target for magnetic recording film formation and production method therefor
CN106378455A (en) * 2015-07-31 2017-02-08 汉能新材料科技有限公司 Molybdenum alloy rotary metal pipe material and preparation method thereof
TWI761264B (en) * 2021-07-15 2022-04-11 光洋應用材料科技股份有限公司 Fe-pt-ag based sputtering target and method of preparing the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007080781A1 (en) * 2006-01-13 2007-07-19 Nippon Mining & Metals Co., Ltd. Nonmagnetic material particle dispersed ferromagnetic material sputtering target
SG190918A1 (en) * 2010-11-29 2013-07-31 Mitsui Mining & Smelting Co Sputtering target
US9683284B2 (en) * 2011-03-30 2017-06-20 Jx Nippon Mining & Metals Corporation Sputtering target for magnetic recording film
MY161774A (en) * 2011-09-26 2017-05-15 Jx Nippon Mining & Metals Corp Fe-pt-c based sputtering target
JP2014034730A (en) * 2012-08-10 2014-02-24 Mitsui Mining & Smelting Co Ltd Sintered body and sputtering target

Also Published As

Publication number Publication date
TWI593810B (en) 2017-08-01
MY174738A (en) 2020-05-12
JP5944580B2 (en) 2016-07-05
JPWO2014171161A1 (en) 2017-02-16
TW201446975A (en) 2014-12-16
WO2014171161A1 (en) 2014-10-23

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