SG11201506140WA - Sputtering target - Google Patents
Sputtering targetInfo
- Publication number
- SG11201506140WA SG11201506140WA SG11201506140WA SG11201506140WA SG11201506140WA SG 11201506140W A SG11201506140W A SG 11201506140WA SG 11201506140W A SG11201506140W A SG 11201506140WA SG 11201506140W A SG11201506140W A SG 11201506140WA SG 11201506140W A SG11201506140W A SG 11201506140WA
- Authority
- SG
- Singapore
- Prior art keywords
- sputtering target
- sputtering
- target
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0466—Alloys based on noble metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013084817 | 2013-04-15 | ||
PCT/JP2014/051970 WO2014171161A1 (en) | 2013-04-15 | 2014-01-29 | Sputtering target |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201506140WA true SG11201506140WA (en) | 2015-09-29 |
Family
ID=51731122
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201506140WA SG11201506140WA (en) | 2013-04-15 | 2014-01-29 | Sputtering target |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5944580B2 (en) |
MY (1) | MY174738A (en) |
SG (1) | SG11201506140WA (en) |
TW (1) | TWI593810B (en) |
WO (1) | WO2014171161A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016047236A1 (en) * | 2014-09-22 | 2016-03-31 | Jx金属株式会社 | Sputtering target for magnetic recording film formation and production method therefor |
CN106378455A (en) * | 2015-07-31 | 2017-02-08 | 汉能新材料科技有限公司 | Molybdenum alloy rotary metal pipe material and preparation method thereof |
TWI761264B (en) * | 2021-07-15 | 2022-04-11 | 光洋應用材料科技股份有限公司 | Fe-pt-ag based sputtering target and method of preparing the same |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007080781A1 (en) * | 2006-01-13 | 2007-07-19 | Nippon Mining & Metals Co., Ltd. | Nonmagnetic material particle dispersed ferromagnetic material sputtering target |
SG190918A1 (en) * | 2010-11-29 | 2013-07-31 | Mitsui Mining & Smelting Co | Sputtering target |
US9683284B2 (en) * | 2011-03-30 | 2017-06-20 | Jx Nippon Mining & Metals Corporation | Sputtering target for magnetic recording film |
MY161774A (en) * | 2011-09-26 | 2017-05-15 | Jx Nippon Mining & Metals Corp | Fe-pt-c based sputtering target |
JP2014034730A (en) * | 2012-08-10 | 2014-02-24 | Mitsui Mining & Smelting Co Ltd | Sintered body and sputtering target |
-
2014
- 2014-01-29 JP JP2015512326A patent/JP5944580B2/en active Active
- 2014-01-29 WO PCT/JP2014/051970 patent/WO2014171161A1/en active Application Filing
- 2014-01-29 MY MYPI2015703289A patent/MY174738A/en unknown
- 2014-01-29 SG SG11201506140WA patent/SG11201506140WA/en unknown
- 2014-02-07 TW TW103104039A patent/TWI593810B/en active
Also Published As
Publication number | Publication date |
---|---|
TWI593810B (en) | 2017-08-01 |
MY174738A (en) | 2020-05-12 |
JP5944580B2 (en) | 2016-07-05 |
JPWO2014171161A1 (en) | 2017-02-16 |
TW201446975A (en) | 2014-12-16 |
WO2014171161A1 (en) | 2014-10-23 |
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