SG108972A1 - Safety mechanism for a lithographic patterning device - Google Patents

Safety mechanism for a lithographic patterning device

Info

Publication number
SG108972A1
SG108972A1 SG200404313A SG200404313A SG108972A1 SG 108972 A1 SG108972 A1 SG 108972A1 SG 200404313 A SG200404313 A SG 200404313A SG 200404313 A SG200404313 A SG 200404313A SG 108972 A1 SG108972 A1 SG 108972A1
Authority
SG
Singapore
Prior art keywords
patterning device
safety mechanism
lithographic patterning
lithographic
safety
Prior art date
Application number
SG200404313A
Other languages
English (en)
Inventor
De Ven Bastiaan Lambertus Van
Gertjan Heerens
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP03077308A external-priority patent/EP1500980A1/de
Priority claimed from US10/740,822 external-priority patent/US7084961B2/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG108972A1 publication Critical patent/SG108972A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Library & Information Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG200404313A 2003-07-22 2004-07-19 Safety mechanism for a lithographic patterning device SG108972A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03077308A EP1500980A1 (de) 2003-07-22 2003-07-22 Lithographischer Projektionsapparat, Verfahren zur Herstellung eines Artikels und dabei erzeugter Artikel
US10/740,822 US7084961B2 (en) 2003-12-22 2003-12-22 Safety mechanism for a lithographic patterning device

Publications (1)

Publication Number Publication Date
SG108972A1 true SG108972A1 (en) 2005-02-28

Family

ID=34276734

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200404373A SG109002A1 (en) 2003-07-22 2004-07-19 Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG200404313A SG108972A1 (en) 2003-07-22 2004-07-19 Safety mechanism for a lithographic patterning device

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG200404373A SG109002A1 (en) 2003-07-22 2004-07-19 Lithographic apparatus, device manufacturing method, and device manufactured thereby

Country Status (6)

Country Link
EP (2) EP1500985B1 (de)
JP (5) JP4112533B2 (de)
KR (2) KR100614955B1 (de)
CN (2) CN1577108B (de)
SG (2) SG109002A1 (de)
TW (2) TWI245170B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7755742B2 (en) * 2005-10-11 2010-07-13 Asml Netherlands B.V. Lithographic apparatus with mounted sensor
EP2963498B8 (de) * 2006-01-19 2017-07-26 Nikon Corporation Belichtungsgerät, belichtungsverfahren und verfahren zur herstellung einer vorrichtung
JPWO2008007521A1 (ja) * 2006-07-11 2009-12-10 株式会社ニコン レチクル保持部材、レチクル・ステージ、露光装置、投影露光方法およびデバイス製造方法
US7869003B2 (en) 2006-07-12 2011-01-11 Asml Holding Nv Lithographic apparatus and device manufacturing method with reticle gripper
US8760187B2 (en) 2008-12-03 2014-06-24 L-3 Communications Corp. Thermocentric alignment of elements on parts of an apparatus
US8941814B2 (en) * 2011-06-20 2015-01-27 Nikon Corporation Multiple-blade holding devices
JP7097872B2 (ja) * 2016-07-29 2022-07-08 エーエスエムエル ホールディング エヌ．ブイ． ステージ装置
DE102017200636A1 (de) * 2017-01-17 2018-07-19 Carl Zeiss Smt Gmbh Optische Anordnung, insbesondere Lithographiesystem, mit einer Transportsicherung
CN109856917A (zh) * 2017-11-30 2019-06-07 上海微电子装备（集团）股份有限公司 安全装置、工件台及光刻机
CN108362771A (zh) * 2018-02-13 2018-08-03 京东方科技集团股份有限公司 一种损伤监测装置及***
WO2020099126A1 (en) * 2018-11-16 2020-05-22 Asml Holding N.V. Multiple-pad reticle bumpers to distribute impact load
CN113227903A (zh) * 2018-12-21 2021-08-06 Asml控股股份有限公司 直接驱动式掩模版安全闩锁
WO2020225151A1 (en) * 2019-05-09 2020-11-12 Asml Holding N.V. Bumper apparatus
KR20220142444A (ko) * 2020-02-14 2022-10-21 에이에스엠엘 홀딩 엔.브이. 리소그래피 장치를 위한 레티클 그리퍼 댐퍼 및 격리 시스템

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6012550A (ja) 1983-07-04 1985-01-22 Nippon Kogaku Kk <Nikon> 露光転写装置用マスク供給装置
US4820930A (en) * 1984-06-20 1989-04-11 Canon Kabushiki Kaisha Photomask positioning device
US4760429A (en) * 1986-11-05 1988-07-26 The Perkin-Elmer Corporation High speed reticle change system
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
JPH03273663A (ja) * 1990-03-23 1991-12-04 Canon Inc 基板保持装置
EP0527166B1 (de) 1990-05-02 1995-06-14 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Belichtungsvorrichtung
JP2699629B2 (ja) * 1990-09-07 1998-01-19 ヤマハ株式会社 楽音信号生成装置
US5253012A (en) * 1990-10-05 1993-10-12 Canon Kabushiki Kaisha Substrate holding apparatus for vertically holding a substrate in an exposure apparatus
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US5608773A (en) * 1993-11-30 1997-03-04 Canon Kabushiki Kaisha Mask holding device, and an exposure apparatus and a device manufacturing method using the device
JP3689949B2 (ja) * 1995-12-19 2005-08-31 株式会社ニコン 投影露光装置、及び該投影露光装置を用いたパターン形成方法
IL119213A (en) * 1996-09-06 2000-08-31 Orbot Instr Ltd Universal chuck for holding plates of various sizes
JP4072212B2 (ja) * 1996-11-19 2008-04-09 キヤノン株式会社 走査露光装置
US6172738B1 (en) * 1996-09-24 2001-01-09 Canon Kabushiki Kaisha Scanning exposure apparatus and device manufacturing method using the same
JPH10116780A (ja) * 1996-10-14 1998-05-06 Nikon Corp 縦型基板保持装置
WO1998028665A1 (en) 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
JP4126096B2 (ja) 1997-01-29 2008-07-30 マイクロニック レーザー システムズ アクチボラゲット 感光性被覆を有する基板上に集束レーザ放射により構造物を製作する方法と装置
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
JP3626504B2 (ja) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ ２個の物品ホルダを有する位置決め装置
JP3928232B2 (ja) * 1997-12-24 2007-06-13 ウシオ電機株式会社 露光装置におけるマスク保持装置
US6211945B1 (en) * 1998-05-19 2001-04-03 Orc Technologies, Inc. Apparatus and method for exposing substrates
DE60032568T2 (de) * 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
JP2001203145A (ja) 2000-01-20 2001-07-27 Nikon Corp 露光装置
US6717159B2 (en) * 2000-10-18 2004-04-06 Nikon Corporation Low distortion kinematic reticle support
KR100597035B1 (ko) * 2001-03-01 2006-07-04 에이에스엠엘 네델란즈 비.브이. 마스크핸들링방법, 마스크, 그를 위한 그리퍼를 포함하는기구 또는 장치, 디바이스 제조방법 및 그 디바이스
EP1237045B1 (de) * 2001-03-01 2007-05-02 ASML Netherlands B.V. Verfahren zur Übernahme einer lithographischen Maske
JP2003203847A (ja) 2002-01-08 2003-07-18 Canon Inc 露光装置

Also Published As

Publication number Publication date
KR20050011702A (ko) 2005-01-29
CN1577108A (zh) 2005-02-09
TWI266153B (en) 2006-11-11
EP1500985A2 (de) 2005-01-26
JP4112533B2 (ja) 2008-07-02
JP4797036B2 (ja) 2011-10-19
JP2008022034A (ja) 2008-01-31
TWI245170B (en) 2005-12-11
JP2008053741A (ja) 2008-03-06
JP2008205479A (ja) 2008-09-04
TW200515105A (en) 2005-05-01
EP1517185A1 (de) 2005-03-23
JP4116598B2 (ja) 2008-07-09
SG109002A1 (en) 2005-02-28
JP2005045254A (ja) 2005-02-17
CN1577108B (zh) 2010-10-06
EP1500985B1 (de) 2014-02-26
JP4468980B2 (ja) 2010-05-26
JP2005045253A (ja) 2005-02-17
KR20050011713A (ko) 2005-01-29
CN1577094A (zh) 2005-02-09
TW200510964A (en) 2005-03-16
KR100748445B1 (ko) 2007-08-10
KR100614955B1 (ko) 2006-08-25
CN1289969C (zh) 2006-12-13
EP1500985A3 (de) 2009-05-06

Similar Documents

Publication Publication Date Title
EP1623271A4 (de) Voreinstellungsschlüssel für eine projektionseinrichtung
HK1065243A1 (en) Lifting mechanism for a traction device
SG117593A1 (en) Lithographic apparatus having a gas flushing device
GB2446345C (en) Apparatus for actuating a safety device
SG108972A1 (en) Safety mechanism for a lithographic patterning device
TWI346256B (en) A lithographic apparatus
GB2370312B (en) Attachment device for a safety line
GB2399269B (en) Safety device for a cutting device
GB0414403D0 (en) A safety device
GB2403190B (en) A pedestrian safety device
TW507586U (en) Operation mechanism for gymnasium device
GB2401710B (en) A warning device
IL164251A0 (en) Imaging device for a printing form
ZA200605203B (en) Safety device for a fall restraint
AU2003217122A8 (en) A device for setting a direction
GB0001160D0 (en) A warning device for deaf-blind persons
GB0300715D0 (en) A safety device
GB0405160D0 (en) A pedestrian safety device
GB0301533D0 (en) Safety device for a ladder
DK1250066T3 (da) Gribeindretning til en bevægelig hjulmonteret genstand
TW587738U (en) A fixed mechanism
ZA200208891B (en) Safety device for a vehicle.
GB0327932D0 (en) A restraining device
GB0420777D0 (en) A safety device
TW573913U (en) Expansion device with a safety locking mechanism