SG10202102010YA - Method for producing polishing slurry, polishing abrasive particles, polishing slurry, and method for manufacturing glass substrate - Google Patents

Method for producing polishing slurry, polishing abrasive particles, polishing slurry, and method for manufacturing glass substrate

Info

Publication number
SG10202102010YA
SG10202102010YA SG10202102010YA SG10202102010YA SG10202102010YA SG 10202102010Y A SG10202102010Y A SG 10202102010YA SG 10202102010Y A SG10202102010Y A SG 10202102010YA SG 10202102010Y A SG10202102010Y A SG 10202102010YA SG 10202102010Y A SG10202102010Y A SG 10202102010YA
Authority
SG
Singapore
Prior art keywords
polishing
polishing slurry
glass substrate
abrasive particles
producing
Prior art date
Application number
SG10202102010YA
Inventor
Ken Tamura
Masanori Tamaki
Kyosuke Iiizumi
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of SG10202102010YA publication Critical patent/SG10202102010YA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Surface Treatment Of Glass (AREA)
SG10202102010YA 2014-07-31 2015-07-31 Method for producing polishing slurry, polishing abrasive particles, polishing slurry, and method for manufacturing glass substrate SG10202102010YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014156779 2014-07-31
JP2014156776 2014-07-31

Publications (1)

Publication Number Publication Date
SG10202102010YA true SG10202102010YA (en) 2021-04-29

Family

ID=55217713

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10202102010YA SG10202102010YA (en) 2014-07-31 2015-07-31 Method for producing polishing slurry, polishing abrasive particles, polishing slurry, and method for manufacturing glass substrate
SG11201610743PA SG11201610743PA (en) 2014-07-31 2015-07-31 Method for producing polishing slurry, polishing abrasive grains, polishing slurry, and method for producing glass substrate

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201610743PA SG11201610743PA (en) 2014-07-31 2015-07-31 Method for producing polishing slurry, polishing abrasive grains, polishing slurry, and method for producing glass substrate

Country Status (5)

Country Link
JP (1) JP6357536B2 (en)
CN (1) CN106661428B (en)
MY (1) MY182259A (en)
SG (2) SG10202102010YA (en)
WO (1) WO2016017819A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019164722A1 (en) * 2018-02-20 2019-08-29 Engis Corporation Fixed abrasive three-dimensional lapping and polishing plate and methods of making and using the same
JP7074644B2 (en) 2018-10-31 2022-05-24 信越化学工業株式会社 A method for manufacturing abrasive particles for polishing a synthetic quartz glass substrate, and a method for polishing a synthetic quartz glass substrate.
CN110756006B (en) * 2019-07-10 2021-09-28 内蒙古中泰汇金环保科技有限公司 Quenching absorption tower for treating waste gas generated by recycling hazardous waste inorganic salt

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3446988B2 (en) * 1997-04-10 2003-09-16 三井金属鉱業株式会社 Method for recovering abrasive raw materials from waste cerium abrasive
JP2001009723A (en) * 1999-07-02 2001-01-16 Kurita Water Ind Ltd Abrasive recovering device
JP2001277132A (en) * 2000-03-31 2001-10-09 Ando Michihiro Grinding wheel and its manufacturing method
WO2002028802A2 (en) * 2000-10-06 2002-04-11 3M Innovative Properties Company Ceramic aggregate particles
TWI281493B (en) * 2000-10-06 2007-05-21 Mitsui Mining & Smelting Co Polishing material
US6551366B1 (en) * 2000-11-10 2003-04-22 3M Innovative Properties Company Spray drying methods of making agglomerate abrasive grains and abrasive articles
US6797023B2 (en) * 2002-05-14 2004-09-28 Saint-Gobain Abrasives Technology Company Coated abrasives
JP4301434B2 (en) * 2003-03-04 2009-07-22 株式会社リコー Polishing abrasive grains and polishing tool
JP2004306210A (en) * 2003-04-08 2004-11-04 Speedfam Co Ltd Processing method and processing equipment for reusing cerium oxide-based polishing agent and water, in drainage in glass polishing
JP4849590B2 (en) * 2004-12-28 2012-01-11 株式会社リコー Polishing tool and manufacturing method thereof
JP2007136559A (en) * 2005-11-15 2007-06-07 Kurenooton Kk Vitrified grinding stone, and its manufacturing method
JP4729428B2 (en) * 2006-04-07 2011-07-20 Ａｇｃセイミケミカル株式会社 Regeneration method of cerium-based abrasive
JP5150833B2 (en) * 2006-07-07 2013-02-27 国立大学法人 熊本大学 Method for producing composite particles
MX2009007825A (en) * 2007-01-23 2009-10-13 Saint Gobain Abrasives Inc Coated abrasive products containing aggregates.
KR20120024824A (en) * 2009-06-25 2012-03-14 에보니크 데구사 게엠베하 Dispersion comprising cerium oxide and silicon dioxide
JP2011011307A (en) * 2009-07-03 2011-01-20 Sumco Corp Recycling method and recycling apparatus of slurry for use in wafer polishing
JP2012011525A (en) * 2010-07-02 2012-01-19 Admatechs Co Ltd Abrasive and manufacturing method thereof
US8888878B2 (en) * 2010-12-30 2014-11-18 Saint-Gobain Abrasives, Inc. Coated abrasive aggregates and products containg same
JP2013129056A (en) * 2011-11-21 2013-07-04 Tosoh Corp Zirconia composite powder for polishing and method for producing the same

Also Published As

Publication number Publication date
JPWO2016017819A1 (en) 2017-05-25
SG11201610743PA (en) 2017-02-27
CN106661428B (en) 2020-01-31
JP6357536B2 (en) 2018-07-11
CN106661428A (en) 2017-05-10
MY182259A (en) 2021-01-18
WO2016017819A1 (en) 2016-02-04

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