SG10201602836QA - Laser processing apparatus - Google Patents

Laser processing apparatus

Info

Publication number
SG10201602836QA
SG10201602836QA SG10201602836QA SG10201602836QA SG10201602836QA SG 10201602836Q A SG10201602836Q A SG 10201602836QA SG 10201602836Q A SG10201602836Q A SG 10201602836QA SG 10201602836Q A SG10201602836Q A SG 10201602836QA SG 10201602836Q A SG10201602836Q A SG 10201602836QA
Authority
SG
Singapore
Prior art keywords
processing apparatus
laser processing
laser
processing
Prior art date
Application number
SG10201602836QA
Inventor
Odanaka Kentaro
Ohkubo Hironari
Kawasaki Zentaro
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201602836QA publication Critical patent/SG10201602836QA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/362Laser etching
    • B23K26/364Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • B23K26/032Observing, e.g. monitoring, the workpiece using optical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B23K26/042Automatically aligning the laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0665Shaping the laser beam, e.g. by masks or multi-focusing by beam condensation on the workpiece, e.g. for focusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/083Devices involving movement of the workpiece in at least one axial direction
    • B23K26/0853Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment
    • B23K26/702Auxiliary equipment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation
    • H01L21/268Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/40Semiconductor devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Laser Beam Processing (AREA)
  • Dicing (AREA)
SG10201602836QA 2015-05-15 2016-04-11 Laser processing apparatus SG10201602836QA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015099843A JP6553940B2 (en) 2015-05-15 2015-05-15 Laser processing equipment

Publications (1)

Publication Number Publication Date
SG10201602836QA true SG10201602836QA (en) 2016-12-29

Family

ID=57208920

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201602836QA SG10201602836QA (en) 2015-05-15 2016-04-11 Laser processing apparatus

Country Status (7)

Country Link
US (1) US10668569B2 (en)
JP (1) JP6553940B2 (en)
KR (1) KR102437902B1 (en)
CN (1) CN106141444B (en)
DE (1) DE102016107709A1 (en)
SG (1) SG10201602836QA (en)
TW (1) TWI670131B (en)

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* Cited by examiner, † Cited by third party
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JP6559074B2 (en) * 2016-01-28 2019-08-14 株式会社ディスコ Package wafer processing method
JP6666173B2 (en) * 2016-03-09 2020-03-13 株式会社ディスコ Laser processing equipment
JP2018094596A (en) * 2016-12-13 2018-06-21 株式会社ディスコ Laser processing device
JP2018121031A (en) * 2017-01-27 2018-08-02 株式会社ディスコ Laser processing device
JP6893730B2 (en) * 2017-04-10 2021-06-23 株式会社ディスコ Processing method of work piece
JP6912267B2 (en) * 2017-05-09 2021-08-04 株式会社ディスコ Laser processing method
JP6934381B2 (en) * 2017-09-28 2021-09-15 株式会社ディスコ Laser processing equipment
JP7066368B2 (en) * 2017-10-24 2022-05-13 住友重機械工業株式会社 Laser machining machine control device, laser machining method, and laser machining machine
JP7013276B2 (en) * 2018-02-23 2022-01-31 株式会社ディスコ Processing equipment
JP2020113678A (en) * 2019-01-15 2020-07-27 株式会社ディスコ Workpiece unit
JP7269090B2 (en) * 2019-05-14 2023-05-08 株式会社ディスコ Workpiece division method
JP7478945B2 (en) * 2020-01-17 2024-05-08 株式会社東京精密 Wafer processing system and wafer processing method
JP2022138338A (en) * 2021-03-10 2022-09-26 株式会社ディスコ Processing device
CN113118637A (en) * 2021-03-29 2021-07-16 上海燊星机器人科技有限公司 Automatic distance measurement laser lithography method

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JPS54111757A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Dicing method
JP3248646B2 (en) * 1994-01-17 2002-01-21 株式会社東京精密 Dicing method and apparatus
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US7157038B2 (en) * 2000-09-20 2007-01-02 Electro Scientific Industries, Inc. Ultraviolet laser ablative patterning of microstructures in semiconductors
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US20060091126A1 (en) * 2001-01-31 2006-05-04 Baird Brian W Ultraviolet laser ablative patterning of microstructures in semiconductors
US6527965B1 (en) * 2001-02-09 2003-03-04 Nayna Networks, Inc. Method for fabricating improved mirror arrays for physical separation
US6706999B1 (en) * 2003-02-24 2004-03-16 Electro Scientific Industries, Inc. Laser beam tertiary positioner apparatus and method
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JP4630692B2 (en) 2005-03-07 2011-02-09 株式会社ディスコ Laser processing method
JP4755839B2 (en) * 2005-03-23 2011-08-24 株式会社ディスコ Laser processing equipment
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JP6438209B2 (en) * 2014-04-07 2018-12-12 株式会社荏原製作所 Control device for generating timing signal for imaging device in inspection device, and method for transmitting timing signal to imaging device
JP6501530B2 (en) * 2015-01-21 2019-04-17 株式会社ディスコ Laser processing equipment
JP6494382B2 (en) * 2015-04-06 2019-04-03 株式会社ディスコ Wafer generation method

Also Published As

Publication number Publication date
TW201641204A (en) 2016-12-01
US20160332260A1 (en) 2016-11-17
CN106141444A (en) 2016-11-23
DE102016107709A1 (en) 2016-11-17
KR102437902B1 (en) 2022-08-29
JP2016219492A (en) 2016-12-22
KR20160134494A (en) 2016-11-23
JP6553940B2 (en) 2019-07-31
CN106141444B (en) 2019-09-17
US10668569B2 (en) 2020-06-02
TWI670131B (en) 2019-09-01

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