SE8004005L - Fotodetektoranordning - Google Patents

Fotodetektoranordning

Info

Publication number
SE8004005L
SE8004005L SE8004005A SE8004005A SE8004005L SE 8004005 L SE8004005 L SE 8004005L SE 8004005 A SE8004005 A SE 8004005A SE 8004005 A SE8004005 A SE 8004005A SE 8004005 L SE8004005 L SE 8004005L
Authority
SE
Sweden
Prior art keywords
layers
bandgap
sequence
homojunctions
pairs
Prior art date
Application number
SE8004005A
Other languages
Unknown language ( )
English (en)
Inventor
J P Gordon
R E Nahory
M A Pollack
J M Worlock
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of SE8004005L publication Critical patent/SE8004005L/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/111—Devices sensitive to infrared, visible or ultraviolet radiation characterised by at least three potential barriers, e.g. photothyristors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/201—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys
    • H01L29/205—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys in different semiconductor regions, e.g. heterojunctions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
    • H01L31/107—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes
    • H01L31/1075—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes in which the active layers, e.g. absorption or multiplication layers, form an heterostructure, e.g. SAM structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • Ceramic Engineering (AREA)
  • Light Receiving Elements (AREA)
SE8004005A 1978-10-06 1980-05-29 Fotodetektoranordning SE8004005L (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/949,057 US4203124A (en) 1978-10-06 1978-10-06 Low noise multistage avalanche photodetector

Publications (1)

Publication Number Publication Date
SE8004005L true SE8004005L (sv) 1980-05-29

Family

ID=25488536

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8004005A SE8004005L (sv) 1978-10-06 1980-05-29 Fotodetektoranordning

Country Status (12)

Country Link
US (1) US4203124A (sv)
JP (1) JPS55500788A (sv)
AU (1) AU522867B2 (sv)
BE (1) BE879196A (sv)
CA (1) CA1135823A (sv)
ES (1) ES484787A1 (sv)
FR (1) FR2438343A1 (sv)
GB (1) GB2043346B (sv)
IT (1) IT7968943A0 (sv)
NL (1) NL7920079A (sv)
SE (1) SE8004005L (sv)
WO (1) WO1980000765A1 (sv)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4250516A (en) * 1979-08-06 1981-02-10 Bell Telephone Laboratories, Incorporated Multistage avalanche photodetector
US4383269A (en) * 1980-09-19 1983-05-10 Bell Telephone Laboratories, Incorporated Graded bandgap photodetector
US4486765A (en) * 1981-12-07 1984-12-04 At&T Bell Laboratories Avalanche photodetector including means for separating electrons and holes
US4476477A (en) * 1982-02-23 1984-10-09 At&T Bell Laboratories Graded bandgap multilayer avalanche photodetector with energy step backs
US4599632A (en) * 1982-08-30 1986-07-08 At&T Bell Laboratories Photodetector with graded bandgap region
US4794440A (en) * 1983-05-25 1988-12-27 American Telephone And Telegraph Company, At&T Bell Laboratories Heterojunction bipolar transistor
US4620214A (en) * 1983-12-02 1986-10-28 California Institute Of Technology Multiple quantum-well infrared detector
US4530752A (en) * 1984-06-20 1985-07-23 Union Oil Company Of California Oil shale retorting process
JPH01183174A (ja) * 1988-01-18 1989-07-20 Fujitsu Ltd 半導体受光素子
US5121181A (en) * 1989-01-31 1992-06-09 International Business Machines Corporation Resonant tunneling photodetector for long wavelength applications
US5959339A (en) * 1996-03-19 1999-09-28 Raytheon Company Simultaneous two-wavelength p-n-p-n Infrared detector
US6870239B1 (en) * 2003-04-04 2005-03-22 Solid State Scientific Corporation Avalanche photodiode having an extrinsic absorption region
US8279411B2 (en) * 2008-08-27 2012-10-02 The Boeing Company Systems and methods for reducing crosstalk in an avalanche photodiode detector array
US9395182B1 (en) 2011-03-03 2016-07-19 The Boeing Company Methods and systems for reducing crosstalk in avalanche photodiode detector arrays

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2569347A (en) * 1948-06-26 1951-09-25 Bell Telephone Labor Inc Circuit element utilizing semiconductive material
US3369132A (en) * 1962-11-14 1968-02-13 Ibm Opto-electronic semiconductor devices
US3757174A (en) * 1972-07-31 1973-09-04 Sharp Kk Light emitting four layer semiconductor
US3982261A (en) * 1972-09-22 1976-09-21 Varian Associates Epitaxial indium-gallium-arsenide phosphide layer on lattice-matched indium-phosphide substrate and devices
US3928261A (en) * 1973-05-17 1975-12-23 Minnesota Mining & Mfg Water removable film-forming compositions for topical application to skin
JPS5758075B2 (sv) * 1974-10-19 1982-12-08 Sony Corp
US4103312A (en) * 1977-06-09 1978-07-25 International Business Machines Corporation Semiconductor memory devices
US4110778A (en) * 1977-06-21 1978-08-29 The United States Of America As Represented By The Secretary Of The Air Force Narrow-band inverted homo-heterojunction avalanche photodiode

Also Published As

Publication number Publication date
CA1135823A (en) 1982-11-16
ES484787A1 (es) 1980-10-01
AU5147879A (en) 1980-04-17
FR2438343B1 (sv) 1981-05-29
IT7968943A0 (it) 1979-10-05
FR2438343A1 (fr) 1980-04-30
NL7920079A (nl) 1980-08-29
JPS55500788A (sv) 1980-10-16
GB2043346A (en) 1980-10-01
GB2043346B (en) 1982-05-06
US4203124A (en) 1980-05-13
AU522867B2 (en) 1982-07-01
BE879196A (fr) 1980-02-01
WO1980000765A1 (en) 1980-04-17

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