RO64896A - PHOTOPOLYMERIZABLE COMPOSITION - Google Patents

PHOTOPOLYMERIZABLE COMPOSITION

Info

Publication number
RO64896A
RO64896A RO7269624A RO6962472A RO64896A RO 64896 A RO64896 A RO 64896A RO 7269624 A RO7269624 A RO 7269624A RO 6962472 A RO6962472 A RO 6962472A RO 64896 A RO64896 A RO 64896A
Authority
RO
Romania
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Application number
RO7269624A
Other languages
French (fr)
Romanian (ro)
Inventor
Michael N Gilano
Melvin A Lipson
Richard E Beaupre
Original Assignee
Dynachem Co,Us
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dynachem Co,Us filed Critical Dynachem Co,Us
Publication of RO64896A publication Critical patent/RO64896A/en

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12Using specific substances
    • H05K2203/122Organic non-polymeric compounds, e.g. oil, wax, thiol
    • H05K2203/124Heterocyclic organic compounds, e.g. azole, furan
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • H05K3/064Photoresists
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
RO7269624A 1971-02-04 1972-02-01 PHOTOPOLYMERIZABLE COMPOSITION RO64896A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11279771A 1971-02-04 1971-02-04

Publications (1)

Publication Number Publication Date
RO64896A true RO64896A (en) 1980-01-15

Family

ID=22345895

Family Applications (1)

Application Number Title Priority Date Filing Date
RO7269624A RO64896A (en) 1971-02-04 1972-02-01 PHOTOPOLYMERIZABLE COMPOSITION

Country Status (23)

Country Link
JP (2) JPS5538961B1 (en)
AU (1) AU461461B2 (en)
BE (1) BE778729A (en)
BG (1) BG26673A3 (en)
CA (1) CA965291A (en)
CH (1) CH592322A5 (en)
DD (1) DD101035A5 (en)
DE (1) DE2205146C2 (en)
DK (2) DK142623B (en)
ES (1) ES399317A1 (en)
FI (1) FI57429C (en)
FR (1) FR2124974A5 (en)
GB (1) GB1361298A (en)
HK (1) HK28382A (en)
IL (1) IL38677A (en)
IT (1) IT949005B (en)
LU (1) LU64712A1 (en)
NL (1) NL176021C (en)
NO (1) NO141804C (en)
PL (1) PL83391B1 (en)
RO (1) RO64896A (en)
SE (1) SE390218B (en)
ZA (1) ZA72345B (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1056189A (en) * 1974-04-23 1979-06-12 Ernst Leberzammer Polymeric binders for aqueous processable photopolymer compositions
ZA757984B (en) * 1974-10-04 1976-12-29 Dynachem Corp Polymers for aqueous processed photoresists
JPS5917414B2 (en) * 1975-10-07 1984-04-21 村上スクリ−ン (株) Photosensitive composition and photosensitive film for screen plates
JPS5944615B2 (en) * 1976-02-16 1984-10-31 富士写真フイルム株式会社 Photosensitive resin composition and metal image forming material using the same
SU941918A1 (en) * 1976-08-10 1982-07-07 Предприятие П/Я Г-4444 Dry film protoresist material
US4239849A (en) 1978-06-19 1980-12-16 Dynachem Corporation Polymers for aqueous processed photoresists
JPS55501072A (en) * 1978-12-25 1980-12-04
DE3034343A1 (en) * 1979-02-21 1981-04-09 Panelgraphic Corp RADIATION CURABLE CELLULOSIC POLYACRYLIC ABRASION RESISTANT COATING
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
DE3560654D1 (en) * 1984-02-18 1987-10-22 Basf Ag Photosensitive recording material
DD250593A1 (en) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb PHOTOPOLYMERIZABLE MATERIAL
DE3504254A1 (en) 1985-02-08 1986-08-14 Basf Ag, 6700 Ludwigshafen LIGHT SENSITIVE RECORDING ELEMENT
DE3619129A1 (en) * 1986-06-06 1987-12-10 Basf Ag LIGHT SENSITIVE RECORDING ELEMENT
DE3841025A1 (en) * 1988-12-06 1990-06-07 Hoechst Ag POLYMERIZABLE MIXTURE BY RADIATION AND RECORDING MATERIAL MADE THEREOF
JP2613462B2 (en) * 1988-12-28 1997-05-28 コニカ株式会社 Image forming material and image forming method
JP2515885Y2 (en) * 1990-09-28 1996-10-30 アンリツ株式会社 Display of measuring device
DE19638032A1 (en) * 1996-09-18 1998-03-19 Du Pont Deutschland Photopolymerizable mixture with lower oxygen sensitivity for the production of color proofs
US7052824B2 (en) 2000-06-30 2006-05-30 E. I. Du Pont De Nemours And Company Process for thick film circuit patterning
US20100209843A1 (en) 2009-02-16 2010-08-19 E. I. Du Pont De Nemours And Company Process for thick film circuit patterning

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
US2893868A (en) * 1955-08-22 1959-07-07 Du Pont Polymerizable compositions
NL218803A (en) * 1956-07-09
GB835849A (en) * 1957-04-26 1960-05-25 Du Pont Photopolymerisable compositions and uses thereof
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Also Published As

Publication number Publication date
CA965291A (en) 1975-04-01
LU64712A1 (en) 1973-09-04
DE2205146A1 (en) 1972-11-23
ZA72345B (en) 1973-03-28
AU461461B2 (en) 1975-05-12
NL7201460A (en) 1972-08-08
FR2124974A5 (en) 1972-09-22
GB1361298A (en) 1974-07-24
IT949005B (en) 1973-06-11
HK28382A (en) 1982-07-02
SE390218B (en) 1976-12-06
AU3839272A (en) 1973-08-02
BG26673A3 (en) 1979-05-15
NL176021C (en) 1987-07-16
FI57429B (en) 1980-04-30
DE2205146C2 (en) 1990-03-08
DK142623B (en) 1980-12-01
IL38677A (en) 1974-12-31
DD101035A5 (en) 1973-10-12
JPS5538961B1 (en) 1980-10-07
IL38677A0 (en) 1972-03-28
DK144184B (en) 1982-01-04
FI57429C (en) 1980-08-11
ES399317A1 (en) 1974-12-16
JPH0136924B2 (en) 1989-08-03
NL176021B (en) 1984-09-03
CH592322A5 (en) 1977-10-31
JPS58144824A (en) 1983-08-29
BE778729A (en) 1972-07-31
DK144184C (en) 1982-06-14
NO141804C (en) 1980-05-14
NO141804B (en) 1980-02-04
PL83391B1 (en) 1975-12-31
DK142623C (en) 1981-08-03

Similar Documents

Publication Publication Date Title
US4071424B1 (en) Photopolymerizable composition
AR217039A1 (en) PHOTOPOLYMERIZABLE COMPOSITION
BE762638A (en) NEW PHOTOPOLYMERISABLE COMPOSITION
NL7600794A (en) PHOTOPOLYMERIZABLE MIXTURE.
IT1048387B (en) PHOTOPOLYMERIZABLE DENTAL PRODUCT
BE828841A (en) PHOTOPOLYMERISABLE COMPOSITIONS
IT944098B (en) PHOTOSENSITIVE COMPOSITIONS FOR RELIEF STRUCTURES
SE382958B (en) LASRING FOR BEHALLARLOCK
BE761035A (en) PHOTOPOLYMERISABLE COMPOSITIONS
SE431880C (en) PHOTOPOLYMERIZABLE COMPOSITION
RO64896A (en) PHOTOPOLYMERIZABLE COMPOSITION
BE829434R (en) PHOTOPOLYMERISABLE COMPOSITION
BE793266A (en) PHOTOPOLYMERISABLE COMPOSITION
BE833472A (en) PHOTOPOLYMERISABLE COMPOSITIONS
IT966335B (en) DISINFESTANT COMPOSITION
ZA716216B (en) Photopolymerizable compositions
SE373315B (en) SLITLENK FOR DECKKEDJOR
BE789658A (en) POLYURETHANE-TAR COMPOSITIONS
IT1050203B (en) ANTI-BREATHING COMPOSITION
SE396102B (en) BERBAND FOR BLIXTLAS
BE782599A (en) ELEKTROFOTOGRAFISCHE LAGEN GESENSITIZATION
BE775619A (en) ANESTHESIC COMPOSITIONS
BE795477A (en) IMPROVED PHOTOPOLYMERISABLE COMPOSITIONS
BE820404A (en) PHOTOPOLYMERISABLE COMPOSITIONS
SE412391B (en) AB STOCKHOLMS PATENTBYRA