PL3987358T3 - Projekcyjny układ optyczny do mikrolitografii i sposób wytwarzania komponentu strukturalnego - Google Patents
Projekcyjny układ optyczny do mikrolitografii i sposób wytwarzania komponentu strukturalnegoInfo
- Publication number
- PL3987358T3 PL3987358T3 PL20737364.8T PL20737364T PL3987358T3 PL 3987358 T3 PL3987358 T3 PL 3987358T3 PL 20737364 T PL20737364 T PL 20737364T PL 3987358 T3 PL3987358 T3 PL 3987358T3
- Authority
- PL
- Poland
- Prior art keywords
- microlithography
- producing
- projection optical
- optical unit
- structured component
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000001393 microlithography Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0626—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
- G02B17/0642—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102019208961.5A DE102019208961A1 (de) | 2019-06-19 | 2019-06-19 | Projektionsoptik und Projektionsbelichtungsanlage mit einer solchen Projektionsoptik |
PCT/EP2020/066866 WO2020254461A1 (en) | 2019-06-19 | 2020-06-18 | Projection optical unit for microlithography and method for producing a structured component |
Publications (1)
Publication Number | Publication Date |
---|---|
PL3987358T3 true PL3987358T3 (pl) | 2024-02-26 |
Family
ID=71527743
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL20737364.8T PL3987358T3 (pl) | 2019-06-19 | 2020-06-18 | Projekcyjny układ optyczny do mikrolitografii i sposób wytwarzania komponentu strukturalnego |
Country Status (10)
Country | Link |
---|---|
US (1) | US11650510B2 (pl) |
EP (1) | EP3987358B1 (pl) |
JP (1) | JP2022537365A (pl) |
KR (1) | KR20220024099A (pl) |
CN (1) | CN114008532A (pl) |
DE (1) | DE102019208961A1 (pl) |
ES (1) | ES2955806T3 (pl) |
PL (1) | PL3987358T3 (pl) |
TW (1) | TW202105077A (pl) |
WO (1) | WO2020254461A1 (pl) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102021205774A1 (de) | 2021-06-08 | 2022-12-08 | Carl Zeiss Smt Gmbh | Abbildende Optik |
DE102021205775A1 (de) * | 2021-06-08 | 2022-12-08 | Carl Zeiss Smt Gmbh | Abbildende Optik |
DE102021213959B4 (de) | 2021-12-08 | 2024-01-25 | Carl Zeiss Smt Gmbh | EUV-Lichtquelle sowie Analyse- und/oder Produktionssystem mit einer derartigen EUV-Lichtquelle |
DE102022206112A1 (de) * | 2022-06-20 | 2023-12-21 | Carl Zeiss Smt Gmbh | Abbildende EUV-Optik zur Abbildung eines Objektfeldes in ein Bildfeld |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007012564A1 (de) * | 2007-03-13 | 2008-09-25 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
WO2009152867A1 (en) | 2008-06-20 | 2009-12-23 | Carl Zeiss Smt Ag | Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method |
DE102008033340B3 (de) * | 2008-07-16 | 2010-04-08 | Carl Zeiss Smt Ag | Abbildende Optik |
WO2011095209A1 (de) | 2010-02-03 | 2011-08-11 | Carl Zeiss Smt Gmbh | Mikrolithographische projektionsbelichtungsanlage |
DE102010040811A1 (de) | 2010-09-15 | 2012-03-15 | Carl Zeiss Smt Gmbh | Abbildende Optik |
WO2013013947A2 (en) | 2011-07-26 | 2013-01-31 | Carl Zeiss Smt Gmbh | Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure method |
DE102012217769A1 (de) | 2012-09-28 | 2014-04-03 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
DE102014208770A1 (de) * | 2013-07-29 | 2015-01-29 | Carl Zeiss Smt Gmbh | Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik |
WO2016078819A1 (en) * | 2014-11-18 | 2016-05-26 | Carl Zeiss Smt Gmbh | Illumination optical unit for euv projection lithography |
KR20180014740A (ko) * | 2015-05-28 | 2018-02-09 | 칼 짜이스 에스엠테 게엠베하 | 대물 필드를 이미지 필드 내로 이미징하기 위한 이미징 광학 유닛, 및 이러한 이미징 광학 유닛을 포함하는 투영 노광 장치 |
DE102015221984A1 (de) * | 2015-11-09 | 2017-05-11 | Carl Zeiss Smt Gmbh | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik |
DE102015221983A1 (de) * | 2015-11-09 | 2017-05-11 | Carl Zeiss Smt Gmbh | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik |
DE102016212578A1 (de) * | 2016-07-11 | 2018-01-11 | Carl Zeiss Smt Gmbh | Projektionsoptik für die EUV-Projektionslithographie |
DE102017209162A1 (de) * | 2017-05-31 | 2018-06-07 | Carl Zeiss Smt Gmbh | Retardierungselement, sowie optisches System |
DE102017216893A1 (de) | 2017-09-25 | 2019-03-28 | Carl Zeiss Smt Gmbh | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld |
DE102019202759A1 (de) * | 2019-02-28 | 2019-04-18 | Carl Zeiss Smt Gmbh | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projek-tionsbelichtungsanlage mit einer derartigen abbildenden Optik |
-
2019
- 2019-06-19 DE DE102019208961.5A patent/DE102019208961A1/de not_active Ceased
-
2020
- 2020-06-18 PL PL20737364.8T patent/PL3987358T3/pl unknown
- 2020-06-18 ES ES20737364T patent/ES2955806T3/es active Active
- 2020-06-18 CN CN202080044731.XA patent/CN114008532A/zh active Pending
- 2020-06-18 JP JP2021575423A patent/JP2022537365A/ja active Pending
- 2020-06-18 KR KR1020217041574A patent/KR20220024099A/ko unknown
- 2020-06-18 TW TW109120604A patent/TW202105077A/zh unknown
- 2020-06-18 EP EP20737364.8A patent/EP3987358B1/en active Active
- 2020-06-18 WO PCT/EP2020/066866 patent/WO2020254461A1/en unknown
-
2021
- 2021-12-16 US US17/552,688 patent/US11650510B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP3987358C0 (en) | 2023-06-07 |
WO2020254461A1 (en) | 2020-12-24 |
EP3987358A1 (en) | 2022-04-27 |
ES2955806T3 (es) | 2023-12-07 |
CN114008532A (zh) | 2022-02-01 |
TW202105077A (zh) | 2021-02-01 |
EP3987358B1 (en) | 2023-06-07 |
DE102019208961A1 (de) | 2020-12-24 |
US11650510B2 (en) | 2023-05-16 |
US20220107570A1 (en) | 2022-04-07 |
JP2022537365A (ja) | 2022-08-25 |
KR20220024099A (ko) | 2022-03-03 |
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