NO174286B - Gjenstand med hoey transmittans og lav emissivitet - Google Patents
Gjenstand med hoey transmittans og lav emissivitet Download PDFInfo
- Publication number
- NO174286B NO174286B NO865236A NO865236A NO174286B NO 174286 B NO174286 B NO 174286B NO 865236 A NO865236 A NO 865236A NO 865236 A NO865236 A NO 865236A NO 174286 B NO174286 B NO 174286B
- Authority
- NO
- Norway
- Prior art keywords
- oxide
- film
- metal
- zinc
- layer
- Prior art date
Links
- 238000002834 transmittance Methods 0.000 title claims abstract description 21
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 19
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 18
- 230000001681 protective effect Effects 0.000 claims abstract description 8
- 229910044991 metal oxide Inorganic materials 0.000 claims description 29
- 150000004706 metal oxides Chemical class 0.000 claims description 29
- 238000000576 coating method Methods 0.000 claims description 23
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 22
- 239000011701 zinc Substances 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 19
- 239000011135 tin Substances 0.000 claims description 15
- 229910052718 tin Inorganic materials 0.000 claims description 13
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 11
- 230000003667 anti-reflective effect Effects 0.000 claims description 11
- 229910052725 zinc Inorganic materials 0.000 claims description 11
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 7
- 229910001887 tin oxide Inorganic materials 0.000 claims description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 5
- 239000000126 substance Substances 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 56
- 229910052751 metal Inorganic materials 0.000 description 24
- 239000002184 metal Substances 0.000 description 24
- 238000004544 sputter deposition Methods 0.000 description 24
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 22
- 229910052709 silver Inorganic materials 0.000 description 22
- 239000004332 silver Substances 0.000 description 22
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- 229910001128 Sn alloy Inorganic materials 0.000 description 14
- 229910052802 copper Inorganic materials 0.000 description 14
- 239000010949 copper Substances 0.000 description 14
- 239000011521 glass Substances 0.000 description 14
- 229910001092 metal group alloy Inorganic materials 0.000 description 14
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 12
- 229910001297 Zn alloy Inorganic materials 0.000 description 9
- 238000000151 deposition Methods 0.000 description 9
- 229910003437 indium oxide Inorganic materials 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 6
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical group [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 6
- 239000011253 protective coating Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910000416 bismuth oxide Inorganic materials 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000006911 nucleation Effects 0.000 description 3
- 238000010899 nucleation Methods 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 229910000464 lead oxide Inorganic materials 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- CSBHIHQQSASAFO-UHFFFAOYSA-N [Cd].[Sn] Chemical compound [Cd].[Sn] CSBHIHQQSASAFO-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- BEQNOZDXPONEMR-UHFFFAOYSA-N cadmium;oxotin Chemical compound [Cd].[Sn]=O BEQNOZDXPONEMR-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003251 chemically resistant material Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000011505 plaster Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3613—Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12597—Noncrystalline silica or noncrystalline plural-oxide component [e.g., glass, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12597—Noncrystalline silica or noncrystalline plural-oxide component [e.g., glass, etc.]
- Y10T428/12604—Film [e.g., glaze, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12611—Oxide-containing component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12611—Oxide-containing component
- Y10T428/12618—Plural oxides
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Description
Foreliggende oppfinnelse angår en gjenstand med høy transmittans og lav emisivitet.
Nærmere bestemt omfatter oppfinnelsen en gjenstand med høy transmittans og lav emissivitet omfattende
a. et transparent, ikke-metallisk substrat;
b. en første, transparent antireflektiv film omfattende
et metalloksyd avsatt på en overflate av substratet; c. en transparent infrarød reflektiv metallisk film avsatt efter den første antireflektive metalloksydf ilm; d. en andre, transparent antireflektiv film omfattende sink-, tinn- eller sink/tinnoksyd, avsatt efter den
infrarøde, reflektive metalliske film, og gjenstanden karakteriseres ved
e. et beskyttende titanoksyd-toppbelegg, avsatt efter den andre antireflektive metalloksydfilm.
TJS-PS 4.094.763 beskriver fremstilling av transparente, elektroledende gjenstander ved katodesputring av metaller som tinn og indium på ildfaste substrater som glass, ved en temperatur over 200°C i en lavtrykksatmosfaere inneholdende en kontrollert mengde oksygen.
US-PS 4.113.599 beskriver en katodesputringsteknikk for reaktiv avsetning av indiumoksyd hvori strømningshastigheten for oksygen justeres for å opprettholde en konstant utlad-ningsstrøm mens strømningshastigheten for argon justeres for å opprettholde et konstant trykk i sputringskammeret.
US-PS 4.166.018 beskriver en sputringsapparatur der et magnetisk felt tildannes nær en plan sputringsoverflate hvorved feltet omfatter bøyede strømningslinjer over et lukket sløyfeerosjonsområde av sputringsoverflaten.
US-PS 4.201.649 beskriver en fremgangsmåte for å fremstille lavresistans indiumoksydfilmer ved først å avsette et meget tynt primersjikt av indiumoksyd ved lav temperatur før oppvarming av substratet for å avsette hovedtykkelsen av det ledende sjikt av indiumoksyd ved katodesputring ved karakteristisk høye katodesputringstemperaturer.
US-PS 4.327.967 beskriver en varmereflekterende plate med et nøytralt, farvet ytre utseende omfattende en glassplate, en interferensfilm med en refraksjonsindeks på over 2 på glassoverflaten, en varmereflekterende gullfilm over inter-ferensf ilmen og en nøytraliseringsfilm av krom, jern, nikkel, titan eller legeringer derav over gullfilmen.
US-PS 4.349.425, beskriver likestrømsreaktivsputring av kadmium-tinnlegeringer i argonoksygenblandinger for å danne kadmiumtinnoksydfilmer med lav elektrisk resistivitet og høy optisk transparens.
US-PS 4.462.883 beskriver et lavmisjonsbelegg fremstilt ved katodesputring av et sjikt av sølv, en liten mengde metall forskjellig fra sølv og et antirefleksjonssjikt av metalloksyd på et transparent substrat som glass. Antirefleksjons-sj iktet kan være tinnoksyd, titanoksyd, sinkoksyd, indiumoksyd, vismutoksyd eller zirkoniumoksyd.
US-Reissue 27.473 beskriver en flersjikts transparent gjenstand som benytter et tynt sjikt av gull eller kobber anordnet mellom to sjikt av transparent materiale som forskjellige metaller, titanoksyd, blyoksyd eller vismutoksyd .
For å forbedre energieffektiviteten for dobbeltvindusenheter er det ønskelig å tilveiebringe et belegg på en av glassover-flatene som øker isolasjonsevnen til enheten ved å redusere strålingsvarmeoverføringen. Belegget må derfor ha lav emissivitet i infrarødt bølgelengdeområde av strålings-spektret. Av praktiske grunner må belegget ha høy transmisjon i det synlige bølgelengdeområde. Av estetiske grunner bør belegget ha en lav lysreflektans og fortrinnsvis være i det vesentlige farveløst.
Belegg med høy transmittans og lav emissivitet som beskrevet ovenfor omfatter generelt et tynt metallisk sjikt for infrarød reflektans og lav emissivitet, anordnet mellom de elektriske sjikt av metalloksyder for å redusere den synlige reflektans. Disse flersjiktsfilmer fremstilles karakteristisk ved katodesputring, spesielt magnetronsputring. De metalliske sjikt kan være gull eller kobber, men er generelt sølv. Metalloksydsjiktene som beskrives i den kjente teknikk inkluderer tinn-, indium-, titan-, vismut-, sink-, zirkon- og blyoksydet. I enkelte tilfeller inneholder disse oksyder små mengder andre metaller som mangan i vismutoksyd, indium i tinnoksyd og omvendt, for å overvinne visse mangler som dårlig stabilitet eller marginal emissivitet. Imidlertid har alle disse metalloksyder visse mangler.
Selv om belegget kan opprettholdes på en indre overflate av en dobbeltvindusenhet i bruk, der det beskyttes fra elementer og omgivelsespåvirkninger som ville forårsake forringelse, er allikevel et stabilt, effektivt belegg som kan motstå behand-ling, pakking, vasking og andre fabrikasjonsprosesser mellom fremstilling og installasjon, spesielt ønskelig. Disse egenskaper søkes i metalloksydet. I tillegg til hårdhet som gir mekanisk stabilitet, inerthet som gir kjemisk stabilitet og god adhesjon både til glass- og metallsjiktet, bør metalloksydet også ha følgende egenskaper.
Metalloksydet må ha en rimelig høy refraksjonsindeks, fortrinnsvis større enn 2,0, for å redusere refleksjon i det metalliske sjikt og således forbedre transmisjonen til det belagte produkt. Metalloksydet må også ha minimal absorpsjon for å maksimalisere transmittansen til det belagte produkt. Av kommersielle grunner bør metalloksydet være rimelig, ha en relativt høy avsetningshastighet ved magnetronsputring, og være ikke-toksisk.
Det muligens viktigste og også vanskeligste kriterium å tilfredsstille for metalloksydfilmen er samvirket med den metalliske film. Metalloksydfilmen må ha lav porøsitet for å beskytte den underliggende metallfilm fra ytre påvirkning, og lav diffusivitet for metallet for å opprettholde integriteten til de separate sjikt. Til slutt, og fremfor alt, må metalloksydet gi god kjernedannelsesoverflate for avsetning av det metalliske sjikt slik at en metallisk film kan avsettes med minimum resistans og maksimum transmittans. Egenskapene til kontinuerlige og diskontinuerlige sølvfilmer er beskrevet i TJS-PS 4.462.884.
Av de metalloksydf lers j iktsfilmer som er i generell bruk er de som omfatter sinkoksyd og vismutoksyd utilstrekkelig stabile, idet disse oksyder er oppløselige både i sure og alkaliske stoffer, slik at flersjiktsfilmen brytes ned av fingeravtrykk og ødelegges i salt-, svoveldioksyd- og fuktighetsprøver. Indiumoksyd, fortrinnsvis dopet med tinn, er mere varig og beskyttende for et underliggende metallsjikt; imidlertid sputrer indium langsomt og er relativt kostbart. Tinnoksyd som kan dopes med indium eller antimon er også mere stabilt og beskyttende for et underliggende metallsjikt men gir ikke en egnet overflate for kjernedannelse for sølvfilm, noe som resulterer i høy resistans og lav transmittans. Egenskapene til en metalloksydfilm som resulterer i dårlig kjernedannelse for en efterpå avsatt sølvfilm er ikke påvist, imidlertid har forsøk vært praktisert i utstrakt grad med metalloksydene som beskrevet ovenfor.
US-SN 665.680 tilveiebringer en ny filmsammensetning av et oksyd av en metallegering så vel som en ny flersjiktsfilm av metall- og metallegeringsoksydsjikt for bruk som belegg med høy transmittans og lav emissivitet.
I henhold til dette forbedrer oppfinnelsen stabiliteten for f lersjiktsfilmer, spesielt f lersjiktsfilmer omfattende metall- og/eller metalllegeringsoksydsjikt og metallsjikt som sølv, ved å tilveiebringe et ytre beskyttende sjikt av et spesielt kjemisk motstandsdyktig materiale som titanoksyd.
En filmsammensetning som fortrinnsvis består av et oksyd av et metall eller en metallegering avsettes fortrinnsvis ved katodesputring, fortrinnsvis magnetronsputring. Et katodemål fremstilles omfattende det ønskede metall eller metall-legeringselementene. Målet sputres så i en reaktiv atmosfære, fortrinnsvis inneholdende oksygen, for å avsette en metall eller metallegeringsoksydfilm på en overflate av et substrat.
Et brukbart metallegeringsoksyd er et oksyd av en legering omfattende sink og tinn. En sink- tinnlegeringsoksydfilm kan avsettes ved katodesputring, fortrinnsvis magnetisk under-støttet. Katodesputring er også en foretrukket metode for avsetning av filmer med høy transmittans og lav emissivitet. Slike filmer omfatter karakteristisk flere sjikt og fortrinnsvis et sjikt av sterkt reflekterende metall som gull eller sølv, anordnet mellom antireflekterende metalloksydsjikt som indium- eller titanoksyd, eller fortrinnsvis et oksyd av en legering av sink og tinn som fortrinnsvis omfatter sinkstannat.
Mens forskjellige metallegeringer kan sputres for å danne metallegeringsoksydfilmer, er, for å fremstille en foretrukket flersjiktsfilm med høy transmittans og lav emissivitet, legeringer av tinn og sink foretrukket. For eksempel omfatter en brukbar legering sink og tinn, fortrinnsvis i andeler på 10 til 90% sink og 90 til 10$ tinn. En slik sink/tinnlegering inneholder for eksempel fra 30-60$ sink og har et sink:tinnforhold på 40:60 til 60:40. Et meget brukbart område er 46:54 til 50:50 sink:tinn. En katode av sink/tinnlegeringer sputres reaktivt i en oksyderende atmosfære og det resulterer i avsetning av et metalloksydsjikt omfattende sink, tinn og oksygen, fortrinnsvis bestående av sinkstannat, Zn2Sn04.
I en konvensjonell magnetronsputringsprosess blir et substrat anordnet i et belegningskammer overfor en katode med en måloverflate av materiale som skal sputres. Foretrukne substrater ifølge oppfinnelsen er glass, keramer og plaster som ikke ugunstig påvirkes ved belegningsprosessens driftsbeting-elser.
Katoden kan være av en hvilken som helst konvensjonell konstruksjon, fortrinnsvis en langstrakt rektangulær konstruksjon, forbundet med en elektrisk spenningskilde, og fortrinnsvis benyttet i kombinasjon med et magnetisk felt for å forbedre sputringsprosessen. Minst en katodemåloverflate omfatter en metallegering som sink/tinn, som sputres i en reaktiv atmosfære for å danne en metallegeringsoksydfilm. Anoden er fortrinnsvis en symmetrisk konstruert og anordnet innretning som beskrevet i US-PS 4.478.702.
I en utførelsesform blir for eksempel en flersjiktsfilm avsatt ved katodesputring for derved å danne et belegg med høy transmittans og lav emissivitet. I tillegg til metall-legeringsmålet omfatter minst en andre katodeoverflate et metall som skal sputres for å danne et reflektivt metallisk sjikt. Den minst ene ytterligere katodemåloverflate omfatter metallet som skal avsettes som primersjiktet. Et stabilt flersjiktsbelegg med en reflektiv metallisk film i kombinasjon med en antireflektiv metallisk legeringsoksydfilm fremstilles som følger ved bruk av primersjiktet for å forbedre adhesjonen mellom metall- og metalloksydfilmer.
Et rent glassubstrat anbringes i et belegningskammer som evakueres, fortrinnsvis til mindre enn IO"<4> torr, og helst mindre enn 2 x 10~<5> torr. En utvalgt atmosfære av inerte og reaktive gasser, fortrinnsvis argon og oksygen, opprettes i kammeret til et trykk på mellom 5 x IO-<4> og 10~<2> torr. En katode med en måloverflate av sink/tinnmetallegeringer opereres over overflaten av substratet som skal belegges. Målmetallet sputres, reagerer med atmosfæren i kammeret og avsetter et sink/tinnlegeringsoksydbelegningssjikt på glassoverflaten.
Efter at det første sjikt av sink/tinnlegeringsoksydet er avsatt blir belegningskammeret evakuert og en inert atmosfære som ren argon opprettes ved et trykk mellom ca. 5 x IO-<4> og IO-<2> torr. En katode med en måloverflate av et metallsjikt som kobber sputres for å avsette et primersjikt over sink/- tinnlegeringsoksydsjiktet. En katode med en måloverflate av sølv sputres så for å avsette et reflekterende sjikt av metallisk sølv over primersjiktet som forbedrer adhesjonen av sølvfilmen til den underliggende metalloksydfilm. Et ytterligere primersjikt avsettes så ved sputring av et metall som kobber over det reflekterende sølvsjikt for å forbedre adhesjonen mellom sølvfilmen og den overliggende metalloksydfilm som avsettes derefter. Til slutt avsettes et andre sjikt av sink/tinnlegeringsoksyd over det første primersjikt under i det vesentlige de samme betingelser som ble benyttet for å avsette det første sink/tinnlegeringsoksydsjikt.
Det er gunstig hvis så et beskyttende titanoksyd-toppbelegg blir avsatt over den siste metalloksydfilm. Dette beskyttende toppbelegg avsettes fortrinnsvis ved sputring over metalloksydf ilmsj iktet , et sjikt av et metall som beskrevet i US-SN 530.579.
Den kjemiske motstandsevne for en flersjiktsfilm forbedres best ved avsetning av et beskyttende belegg omfattende titanoksyd over flersjiktsfilmen. Fortrinnsvis blir beskyttende titanoksydbelegg avsatt ved katodesputring ved relativt høy avsetningshastighet og lavt uttrykk, fortrinnsvis ca. 3 millitorr. Et beskyttende belegg omfattende titanoksyd kan tildannes ved sputring av titan i en oksygen-tilstrekkelig atmosfære til å avsette titanoksyd direkte. Videre kan et beskyttende belegg omfattende titanoksyd tildannes ved sputring av titan i en inertatmosfære for derved å avsette en titanholdig film som derefter oksyderes til titanoksyd ved eksponering til en oksyderende atmosfære som luft.
Oppfinnelsen skal forklares nærmere ut fra beskrivelsen av et spesielt eksempel nedenfor. I eksemplene henvises det til sink-tinnlegeringsoksydfilmen som sinkstannat selv om filmsammensetningen ikke nødvendigvis nøyaktig er Zn2Sn04.
EKSEMPEL
En flersjiktsfilm avsettes på et soda/kalksilisiumdioksyd-glassubstrat for å oppnå et belagt produkt med høy transmittans og lav emissivitet. En stasjonær katode med målene 12,7 cm x 43,2 cm omfatter en sputringsoverflate av sinktinnlegering bestående av 50,4 vekt-% og 47,6 vekt-$ tinn. Glassubstratet anbringes i belegningskammeret som evakueres for å opprette et trykk på 4 millitorr i en atmosfære av 50:50 argon:oksygen. Katoden sputres i et magnetisk felt ved en effekt på 1,7 kW mens glasset transporteres forbi sputringsoverflaten i en fremføringshastighet av 2,8 m/min. En film av sinkstannat avsettes på glassoverflaten. Tre forbiføringer i en filmtykkelse på ca. 340 Ångstrøm, noe som resulterer i en reduksjon av transmittansen fra 90$ for glassubstratet til 83% for det sinkstannatbelagte glass-substrat. En stasjonær katode med et kobbermål sputres så for å produsere et kobberprimersjikt over sinkstannatet, noe som reduserer transmittansen til ca. 80,6$. Derefter blir et sjikt av sølv avsatt over kobberprimersjiktet ved sputring av et sølvkatodemål i en atmosfære av argon under et trykk på 4 millitorr. Med substratet ført under sølvkatodemålet med samme hastighet er to forbiføringer nødvendig for å avsette
10 pg sølv/cm<2>, noe som tilsvarer en tykkelse på ca. 90 Ångstrøm og noe som reduserer transmittansen til det belagte substrat til ca. 70,3$. Et andre kobberprimersjikt sputres over sølvsjiktet for å forbedre adhesjonen og å beskytte sølvsjiktet før det endelige antireflektive sjikt av sinkstannat avsettes. Fordi kobberprimersjiktene reduserer transmittansen er deres tykkelse fortrinnsvis minimal. Kobber-primers j iktene avsettes ved sputring av et kobbermål ved minimum effekt i argon under et trykk på 4 millitorr. Transmittansen til prøven reduseres til 68,3$ efter avsetnin-gen av det andre kobberprimersjiktet. Derefter blir sink-tinnlegeringskatodemålet sputret i en oksyderende atmosfære for å gi en sinkstannatfilm. Fire forbiføringer i en hastighet av 2,8 m/min. gir en filmtykkelse på ca. 430 Ångstrøm og øker transmittansen i det belagte produkt fra 68,3 til 83,2$. Flersjiktsbelegget har en overflateresistans på 10 ohm/m<2> og en lett blåaktig reflektans fra begge sider med en lumen-reflektans på 5$ fra den belagte side, og 6$ fra den ubelagte side. Til slutt blir en stasjonær titankatode på 12,7 cm lang 43,2 cm sputret ved 10 kW i en atmosfære av like volumer argon og oksygen under et trykk på 3 millitorr. To forbifør-inger av substratet ved en hastighet på 2,8 m/min. er til-strekkelig til å avsette et flytende belegg av titanoksyd med en tykkelse på ca. 15 til 20 Ångstrøm. Det beskyttende belegg av titanoksyd påvirker ikke vesentlige resistans - og reflektansegenskapene til flersjiktsbelegget og endrer ikke transmittansen mer enn ca. 1$.
Den forbedrede stabilitet for den belagte gjenstand som oppnås ved den forbedrede adhesjon mellom metall- og metalloksydf ilmene som et resultat av primersjiktene ifølge oppfinnelsen vises lett ved en enkel avslipningsprøve bestående av å gni den belagte overflate med en fuktig duk. En overflate belagt med sinkstannat/sølv/sinkstannat uten primersjikt ifølge oppfinnelsen får en økning i reflektansen fra ca. 6$ til 18$ efter flere overføringer av en fuktig duk, noe som indikerer fjerning av både toppsinkstannatsjiktet og den underliggende sølvfilm. I motsetning til dette gir for-lenget heftig gnidning med en fuktig klut ingen synlig endring for en sinkstannat/kobber/sølv/kobber/sinkstannat-belagt gjenstand omfattende primersjiktene ifølge oppfinnelsen .
Foretrukne titanoksydbeskyttende belegg har tykkelser innen området ca. 10-50 Ångstrøm. Med et titanoksydbeskyttende belegg som er ca. 20 Ångstrøm tykt blir varigheten for et flersjiktsbelegg ifølge dette eksempel øket fra 2 timer til 22 timer i en 2,5$ saltoppløsning ved omgivelsestemperatur og fra 5 timer til 1 uke ved Cleveland-fuktighetssprøven, gjennomført med en Q-plate Cleveland Condensation Tester modell QCT-ADO inneholdende deionisert vann av ca. 66°C.
Claims (1)
- Gjenstand med høy transmittans og lav emissivitet omfattende a. et transparent, ikke-metallisk substrat; b. en første, transparent antireflektiv film omfattende et metalloksyd avsatt på en overflate av substratet; c. en transparent infrarød reflektiv metallisk film avsatt efter den første antireflektive metalloksydf ilm; d. en andre, transparent antireflektiv film omfattende sink-, tinn- eller sink/tinnoksyd, avsatt efter den infrarøde, reflektive metalliske film, og gjenstanden karakteriseres ved e. et beskyttende titanoksyd-toppbelegg, avsatt efter den andre antireflektive metalloksydfilm.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/812,680 US4716086A (en) | 1984-12-19 | 1985-12-23 | Protective overcoat for low emissivity coated article |
Publications (4)
Publication Number | Publication Date |
---|---|
NO865236D0 NO865236D0 (no) | 1986-12-22 |
NO865236L NO865236L (no) | 1987-06-24 |
NO174286B true NO174286B (no) | 1994-01-03 |
NO174286C NO174286C (no) | 1994-04-13 |
Family
ID=25210322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO865236A NO174286C (no) | 1985-12-23 | 1986-12-22 | Gjenstand med höy transmittans og lav emissivitet |
Country Status (19)
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US (1) | US4716086A (no) |
EP (1) | EP0226993B2 (no) |
JP (1) | JPH0745710B2 (no) |
KR (1) | KR900003979B1 (no) |
CN (1) | CN1019319B (no) |
AT (1) | ATE54300T1 (no) |
AU (1) | AU571380B2 (no) |
CA (1) | CA1327294C (no) |
DE (1) | DE3672462D1 (no) |
DK (1) | DK166536B1 (no) |
ES (1) | ES2015525T5 (no) |
FI (1) | FI90050C (no) |
GR (1) | GR3000824T3 (no) |
HK (1) | HK67592A (no) |
IN (1) | IN169768B (no) |
MY (1) | MY101707A (no) |
NO (1) | NO174286C (no) |
NZ (1) | NZ218479A (no) |
ZA (1) | ZA869153B (no) |
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JPH0832436B2 (ja) * | 1986-11-27 | 1996-03-29 | 旭硝子株式会社 | 透明導電性積層体 |
US4859532A (en) * | 1986-11-27 | 1989-08-22 | Asahi Glass Company Ltd. | Transparent laminated product |
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CA1331867C (en) * | 1986-12-29 | 1994-09-06 | James Joseph Finley | Low emissivity film for high temperature processing |
US4898790A (en) * | 1986-12-29 | 1990-02-06 | Ppg Industries, Inc. | Low emissivity film for high temperature processing |
US5270517A (en) * | 1986-12-29 | 1993-12-14 | Ppg Industries, Inc. | Method for fabricating an electrically heatable coated transparency |
DE3716860A1 (de) * | 1987-03-13 | 1988-09-22 | Flachglas Ag | Verfahren zum herstellen einer vorgespannten und/oder gebogenen glasscheibe mit silberschicht, danach hergestellte glasscheibe sowie deren verwendung |
US4938857A (en) * | 1987-03-26 | 1990-07-03 | Ppg Industries, Inc. | Method for making colored metal alloy/oxynitride coatings |
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US5178966A (en) * | 1987-03-26 | 1993-01-12 | Ppg Industries, Inc. | Composite with sputtered films of bismuth/tin oxide |
US4883721A (en) * | 1987-07-24 | 1989-11-28 | Guardian Industries Corporation | Multi-layer low emissivity thin film coating |
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- 1986-12-15 AT AT86117415T patent/ATE54300T1/de not_active IP Right Cessation
- 1986-12-15 DE DE8686117415T patent/DE3672462D1/de not_active Expired - Lifetime
- 1986-12-15 ES ES86117415T patent/ES2015525T5/es not_active Expired - Lifetime
- 1986-12-15 EP EP86117415A patent/EP0226993B2/en not_active Expired - Lifetime
- 1986-12-19 DK DK618586A patent/DK166536B1/da not_active IP Right Cessation
- 1986-12-22 JP JP61306193A patent/JPH0745710B2/ja not_active Expired - Lifetime
- 1986-12-22 FI FI865262A patent/FI90050C/fi not_active IP Right Cessation
- 1986-12-22 KR KR1019860011072A patent/KR900003979B1/ko not_active IP Right Cessation
- 1986-12-22 NO NO865236A patent/NO174286C/no unknown
- 1986-12-23 MY MYPI86000236A patent/MY101707A/en unknown
- 1986-12-23 CN CN86108656A patent/CN1019319B/zh not_active Expired
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Also Published As
Publication number | Publication date |
---|---|
FI90050C (fi) | 1993-12-27 |
GR3000824T3 (en) | 1991-11-15 |
US4716086A (en) | 1987-12-29 |
ES2015525T5 (es) | 1996-01-16 |
HK67592A (en) | 1992-09-18 |
NZ218479A (en) | 1990-03-27 |
EP0226993B2 (en) | 1995-11-29 |
NO865236L (no) | 1987-06-24 |
EP0226993A1 (en) | 1987-07-01 |
FI865262A (fi) | 1987-06-24 |
KR870006232A (ko) | 1987-07-10 |
DE3672462D1 (de) | 1990-08-09 |
NO865236D0 (no) | 1986-12-22 |
AU571380B2 (en) | 1988-04-14 |
JPH0745710B2 (ja) | 1995-05-17 |
ZA869153B (no) | 1988-06-03 |
AU6654986A (en) | 1987-06-25 |
ATE54300T1 (de) | 1990-07-15 |
EP0226993B1 (en) | 1990-07-04 |
KR900003979B1 (ko) | 1990-06-07 |
CN86108656A (zh) | 1987-09-23 |
IN169768B (no) | 1991-12-21 |
DK166536B1 (da) | 1993-06-07 |
FI865262A0 (fi) | 1986-12-22 |
JPS62196366A (ja) | 1987-08-29 |
NO174286C (no) | 1994-04-13 |
MY101707A (en) | 1992-01-17 |
DK618586D0 (da) | 1986-12-19 |
FI90050B (fi) | 1993-09-15 |
DK618586A (da) | 1987-06-24 |
CN1019319B (zh) | 1992-12-02 |
ES2015525B3 (es) | 1990-09-01 |
CA1327294C (en) | 1994-03-01 |
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