NL7807528A - Fotogevoelige elementen alsmede daaruit vervaardigde gedrukte schakelingen. - Google Patents
Fotogevoelige elementen alsmede daaruit vervaardigde gedrukte schakelingen.Info
- Publication number
- NL7807528A NL7807528A NL7807528A NL7807528A NL7807528A NL 7807528 A NL7807528 A NL 7807528A NL 7807528 A NL7807528 A NL 7807528A NL 7807528 A NL7807528 A NL 7807528A NL 7807528 A NL7807528 A NL 7807528A
- Authority
- NL
- Netherlands
- Prior art keywords
- photo
- sensitive elements
- printed circuits
- circuits manufactured
- manufactured
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/0108—Transparent
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
- H05K2203/1377—Protective layers
- H05K2203/1394—Covering open PTHs, e.g. by dry film resist or by metal disc
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0094—Filling or covering plated through-holes or blind plated vias, e.g. for masking or for mechanical reinforcement
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/136—Coating process making radiation sensitive element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/14—Dimensionally stable material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/162—Protective or antiabrasion layer
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52082573A JPS5836331B2 (ja) | 1977-07-12 | 1977-07-12 | レジスト像の形成法 |
JP15709177A JPS5487869A (en) | 1977-12-26 | 1977-12-26 | Method of producing printed circuit base board |
Publications (3)
Publication Number | Publication Date |
---|---|
NL7807528A true NL7807528A (nl) | 1979-01-16 |
NL187372B NL187372B (nl) | 1991-04-02 |
NL187372C NL187372C (nl) | 1991-09-02 |
Family
ID=26423601
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NLAANVRAGE7807528,A NL187372C (nl) | 1977-07-12 | 1978-07-12 | Werkwijze voor het vormen van een beeld, waarbij een fotogevoelige samenstelling wordt aangebracht op een substraat. |
Country Status (5)
Country | Link |
---|---|
US (3) | US4211560A (nl) |
DE (1) | DE2830622C2 (nl) |
FR (1) | FR2397770A1 (nl) |
GB (2) | GB2049972B (nl) |
NL (1) | NL187372C (nl) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2049972B (en) * | 1977-07-12 | 1982-06-23 | Asahi Chemical Ind | Photosensitive element for producing a printed circuit board |
JPS57208556A (en) | 1981-06-18 | 1982-12-21 | Nippon Paint Co Ltd | Photosensitive printing plate material |
US4888450A (en) * | 1981-12-11 | 1989-12-19 | At&T Bell Laboratories | Circuit board fabrication leading to increased capacity |
JPS58502079A (ja) * | 1981-12-11 | 1983-12-01 | ウエスタ−ン エレクトリツク カムパニ− インコ−ポレ−テツド | 容量を増大する回路板の製造 |
JPS58178348A (ja) * | 1982-04-13 | 1983-10-19 | Nippon Synthetic Chem Ind Co Ltd:The | 画像形成法 |
US4567128A (en) * | 1982-04-14 | 1986-01-28 | E. I. Du Pont De Nemours And Company | Cover sheet in a photosensitive element |
US4631246A (en) * | 1982-04-14 | 1986-12-23 | E. I. Du Pont De Nemours And Company | Uniform cover sheet with rough surface in a photosensitive element |
JPS5997140A (ja) * | 1982-11-26 | 1984-06-04 | Fuji Photo Film Co Ltd | カラ−プル−フイングシ−トの製法 |
US4483917A (en) * | 1983-02-14 | 1984-11-20 | The Dow Chemical Company | Photoresist stripper composition and method of use |
US4438192A (en) * | 1983-02-14 | 1984-03-20 | The Dow Chemical Company | Photoresist stripper composition and method of use |
US4582778A (en) * | 1983-10-25 | 1986-04-15 | Sullivan Donald F | Multi-function photopolymer for efficiently producing high resolution images on printed wiring boards, and the like |
US4846552A (en) * | 1986-04-16 | 1989-07-11 | The United States Of America As Represented By The Secretary Of The Air Force | Method of fabricating high efficiency binary planar optical elements |
KR940004022B1 (ko) * | 1989-05-17 | 1994-05-11 | 아사히가세이고오교 가부시끼가이샤 | 광경화성 수지 적층체 및 그것을 사용하는 프린트 배선판의 제조방법 |
JPH0476985A (ja) * | 1990-07-18 | 1992-03-11 | Cmk Corp | プリント配線板の製造法 |
EP0729071A1 (de) * | 1995-02-15 | 1996-08-28 | Schablonentechnik Kufstein Aktiengesellschaft | Verfahren zur Herstellung einer Druckschablone |
TW475098B (en) * | 1995-10-27 | 2002-02-01 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition and photosensitive resin laminated film containing the same |
US6156433A (en) | 1996-01-26 | 2000-12-05 | Dai Nippon Printing Co., Ltd. | Electrode for plasma display panel and process for producing the same |
MY120763A (en) | 1997-09-19 | 2005-11-30 | Hitachi Chemical Co Ltd | Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer |
US6424339B1 (en) * | 2000-06-16 | 2002-07-23 | The Bergquist Company | Touch screen assembly |
DE10260235B4 (de) * | 2002-12-20 | 2010-10-28 | Infineon Technologies Ag | Verfahren zum Strukturieren einer Resistschicht und Negativ-Resistschicht |
JP4322757B2 (ja) * | 2004-09-06 | 2009-09-02 | 富士フイルム株式会社 | パターン形成材料及びパターン形成方法 |
KR100714377B1 (ko) | 2006-02-27 | 2007-05-04 | 김수학 | 연결부가 생략된 패턴을 형성시키는 방법 및 연결부가생략된 패턴이 형성된 금속평판 |
TW200939452A (en) * | 2008-03-05 | 2009-09-16 | Harvatek Corp | LED chip package structure applied to a backlight module manufacturing method thereof |
KR101318517B1 (ko) * | 2008-05-30 | 2013-10-16 | 코오롱인더스트리 주식회사 | 필름형 광분해성 전사재료 |
CN111279804B (zh) * | 2017-12-20 | 2023-10-24 | 住友电气工业株式会社 | 制造印刷电路板和层压结构的方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL87862C (nl) * | 1951-08-20 | |||
US2731347A (en) * | 1951-10-20 | 1956-01-17 | Du Pont | Photographic emulsions containing fluorine substituted ethylene polymers as delustering agents |
BE538815A (nl) * | 1954-06-08 | 1900-01-01 | ||
BE635432A (nl) * | 1962-07-26 | |||
US3269861A (en) * | 1963-06-21 | 1966-08-30 | Day Company | Method for electroless copper plating |
DE1202136B (de) * | 1964-06-04 | 1965-09-30 | Agfa Ag | Photographisches Material mit einer aussen angeordneten, eine rauhe Oberflaeche besitzenden Schutzschicht |
US3404057A (en) * | 1966-02-07 | 1968-10-01 | Du Pont | Stripping and laminating machine |
DE1572153B2 (de) * | 1966-06-27 | 1971-07-22 | E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) | Fotopolymerisierbares aufzeichnungsmaterial |
US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
CH475690A (fr) * | 1967-07-14 | 1969-07-15 | Jaquet Henri | Procédé pour la fabrication de circuits imprimés et circuit imprimé obtenu par ce procédé |
US3469982A (en) | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
GB1275471A (en) * | 1969-06-04 | 1972-05-24 | Du Pont | Improvements relating to photo-resists |
US3785817A (en) | 1970-10-05 | 1974-01-15 | A Kuchta | Transfer of photopolymer images by irradiation |
DE2123702C3 (de) | 1971-05-13 | 1988-05-26 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung eines Reliefbildes |
JPS5034966B2 (nl) * | 1972-07-24 | 1975-11-12 | ||
US3867153A (en) * | 1972-09-11 | 1975-02-18 | Du Pont | Photohardenable element |
US4072527A (en) * | 1972-09-27 | 1978-02-07 | E. I. Du Pont De Nemours And Company | Oxygen barrier layers for photopolymerizable elements |
JPS5547383B2 (nl) * | 1972-12-13 | 1980-11-29 | ||
US3832176A (en) * | 1973-04-06 | 1974-08-27 | Eastman Kodak Co | Novel photoresist article and process for its use |
JPS5421089B2 (nl) * | 1973-05-29 | 1979-07-27 | ||
US3856527A (en) * | 1973-08-06 | 1974-12-24 | Eastman Kodak Co | Protective layer for photothermographic elements |
US3898086A (en) * | 1974-07-12 | 1975-08-05 | Minnesota Mining & Mfg | Sheet material useful in image transfer techniques |
US4126466A (en) * | 1974-07-22 | 1978-11-21 | E. I. Du Pont De Nemours And Company | Composite, mask-forming, photohardenable elements |
US4081282A (en) * | 1975-11-03 | 1978-03-28 | Seal Incorporated | Dry transfer image systems with non-light sensitive frangible layer |
GB2049972B (en) * | 1977-07-12 | 1982-06-23 | Asahi Chemical Ind | Photosensitive element for producing a printed circuit board |
-
1978
- 1978-07-10 GB GB8021847A patent/GB2049972B/en not_active Expired
- 1978-07-10 GB GB7829290A patent/GB2000874B/en not_active Expired
- 1978-07-11 US US05/923,763 patent/US4211560A/en not_active Expired - Lifetime
- 1978-07-11 FR FR7820677A patent/FR2397770A1/fr active Granted
- 1978-07-12 DE DE2830622A patent/DE2830622C2/de not_active Expired
- 1978-07-12 NL NLAANVRAGE7807528,A patent/NL187372C/nl not_active IP Right Cessation
-
1979
- 1979-12-18 US US06/104,944 patent/US4301230A/en not_active Expired - Lifetime
-
1981
- 1981-08-25 US US06/295,960 patent/US4360582A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
FR2397770A1 (fr) | 1979-02-09 |
DE2830622C2 (de) | 1985-03-14 |
US4301230A (en) | 1981-11-17 |
US4360582A (en) | 1982-11-23 |
NL187372B (nl) | 1991-04-02 |
NL187372C (nl) | 1991-09-02 |
FR2397770B1 (nl) | 1984-06-08 |
GB2049972B (en) | 1982-06-23 |
US4211560A (en) | 1980-07-08 |
DE2830622A1 (de) | 1979-01-18 |
GB2049972A (en) | 1980-12-31 |
GB2000874B (en) | 1982-02-17 |
GB2000874A (en) | 1979-01-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BB | A search report has been drawn up | ||
A85 | Still pending on 85-01-01 | ||
BC | A request for examination has been filed | ||
V1 | Lapsed because of non-payment of the annual fee |
Effective date: 19960201 |