NL7713791A - Werkwijze ter bereiding van fotopolymeriseer- bare massa's. - Google Patents
Werkwijze ter bereiding van fotopolymeriseer- bare massa's.Info
- Publication number
- NL7713791A NL7713791A NL7713791A NL7713791A NL7713791A NL 7713791 A NL7713791 A NL 7713791A NL 7713791 A NL7713791 A NL 7713791A NL 7713791 A NL7713791 A NL 7713791A NL 7713791 A NL7713791 A NL 7713791A
- Authority
- NL
- Netherlands
- Prior art keywords
- masses
- preparing
- preparing photopolymerizable
- photopolymerizable masses
- photopolymerizable
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S525/922—Polyepoxide polymer having been reacted to yield terminal ethylenic unsaturation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
- Y10T428/31529—Next to metal
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31692—Next to addition polymer from unsaturated monomers
- Y10T428/31699—Ester, halide or nitrile of addition polymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19762658935 DE2658935A1 (de) | 1976-12-24 | 1976-12-24 | Photopolymerisierbare masse und deren verwendung |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7713791A true NL7713791A (nl) | 1978-06-27 |
Family
ID=5996698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7713791A NL7713791A (nl) | 1976-12-24 | 1977-12-13 | Werkwijze ter bereiding van fotopolymeriseer- bare massa's. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4134813A (de) |
BE (1) | BE862134A (de) |
DE (1) | DE2658935A1 (de) |
FR (1) | FR2375256A1 (de) |
NL (1) | NL7713791A (de) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61228002A (ja) | 1985-04-02 | 1986-10-11 | Nippon Paint Co Ltd | 高感度光硬化性樹脂組成物 |
US4753997A (en) * | 1985-11-27 | 1988-06-28 | The Standard Oil Company | Process for grafting maleic anhydride or styrene-maleic anhydride onto polyolefins |
US5204378A (en) * | 1986-03-24 | 1993-04-20 | Nippon Telegraph And Telephone Corporation | Fluorine-containing epoxy(meth)acrylate resin adhesive cured in presence of photoinitiator |
DE3788887T2 (de) * | 1986-03-24 | 1994-09-01 | Nippon Telegraph & Telephone | Epoxy(meth)acrylatharz, Verfahren zu dessen Herstellung, und Klebstoffzusammensetzung, die dasselbe enthält. |
DE3710282A1 (de) * | 1987-03-28 | 1988-10-13 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3710281A1 (de) * | 1987-03-28 | 1988-10-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3743454A1 (de) * | 1987-12-22 | 1989-07-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3743457A1 (de) * | 1987-12-22 | 1989-07-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3743455A1 (de) * | 1987-12-22 | 1989-07-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
EP0511860B2 (de) † | 1991-04-30 | 2001-09-05 | Sericol Limited | Lichthärtbare Zusammensetzung |
ATE425876T1 (de) * | 2006-11-30 | 2009-04-15 | Fujifilm Corp | Tintenzusammensetzung zur tintenstrahlaufzeichnung und verfahren zur tintenstrahlaufzeichnung |
EP1944173B1 (de) | 2007-01-15 | 2010-04-21 | FUJIFILM Corporation | Tintenzusammensetzung und Tintenstrahlaufzeichnungsverfahren damit |
JP5224824B2 (ja) * | 2007-01-15 | 2013-07-03 | 富士フイルム株式会社 | インク組成物及びそれを用いたインクジェット記録方法 |
JP4601009B2 (ja) * | 2007-03-30 | 2010-12-22 | 富士フイルム株式会社 | インクジェット記録用インクセット及びインクジェット記録方法 |
JP5247096B2 (ja) * | 2007-09-18 | 2013-07-24 | 富士フイルム株式会社 | インクジェット記録用インク組成物、及び、インクジェット記録方法 |
JP5255369B2 (ja) * | 2007-09-25 | 2013-08-07 | 富士フイルム株式会社 | 光硬化性コーティング組成物、オーバープリント及びその製造方法 |
US8129447B2 (en) * | 2007-09-28 | 2012-03-06 | Fujifilm Corporation | Ink composition and inkjet recording method using the same |
JP5148235B2 (ja) * | 2007-09-28 | 2013-02-20 | 富士フイルム株式会社 | インク組成物 |
JP5159232B2 (ja) * | 2007-09-28 | 2013-03-06 | 富士フイルム株式会社 | インク組成物及びそれを用いたインクジェット記録方法 |
JP5457636B2 (ja) | 2008-01-22 | 2014-04-02 | 富士フイルム株式会社 | 光硬化性組成物、光硬化性インク組成物、光硬化物の製造方法、及び、インクジェット記録方法 |
JP5348955B2 (ja) * | 2008-07-10 | 2013-11-20 | 富士フイルム株式会社 | インク組成物、インクセット、インクジェット記録方法、及び、印刷物 |
JP5258428B2 (ja) * | 2008-07-16 | 2013-08-07 | 富士フイルム株式会社 | 水性インク組成物、インクジェット記録用水性インク組成物およびインクジェット記録方法 |
JP5106285B2 (ja) * | 2008-07-16 | 2012-12-26 | 富士フイルム株式会社 | 光硬化性組成物、インク組成物、及び該インク組成物を用いたインクジェット記録方法 |
US8378002B2 (en) | 2008-07-16 | 2013-02-19 | Fujifilm Corporation | Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method |
JP5258429B2 (ja) * | 2008-07-16 | 2013-08-07 | 富士フイルム株式会社 | インク組成物、及び、それを用いたインクジェット記録方法 |
JP2010024277A (ja) * | 2008-07-16 | 2010-02-04 | Fujifilm Corp | インクジェット用インク組成物、及び、インクジェット記録方法 |
JP5383133B2 (ja) * | 2008-09-19 | 2014-01-08 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法及び印刷物成形体の製造方法 |
JP5344892B2 (ja) | 2008-11-27 | 2013-11-20 | 富士フイルム株式会社 | インクジェット用インク組成物、及びインクジェット記録方法 |
JP2010230721A (ja) * | 2009-03-25 | 2010-10-14 | Fujifilm Corp | 感光性組成物、感光性フィルム、及び、永久パターン形成方法 |
JP5383289B2 (ja) | 2009-03-31 | 2014-01-08 | 富士フイルム株式会社 | インク組成物、インクジェット用であるインク組成物、インクジェット記録方法、およびインクジェット法による印刷物 |
JP2012031388A (ja) * | 2010-05-19 | 2012-02-16 | Fujifilm Corp | 印刷方法、オーバープリントの作製方法、ラミネート加工方法、発光ダイオード硬化性コーティング組成物、及び、発光ダイオード硬化性インク組成物 |
KR101413078B1 (ko) | 2011-12-30 | 2014-07-02 | 제일모직 주식회사 | 포지티브형 감광성 수지 조성물 |
EP2921536A1 (de) | 2014-03-20 | 2015-09-23 | ALLNEX AUSTRIA GmbH | Strahlungshärtbare Zusammensetzung mit inerten Harzen |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3759807A (en) * | 1969-01-28 | 1973-09-18 | Union Carbide Corp | Photopolymerization process using combination of organic carbonyls and amines |
US3787212A (en) * | 1972-08-04 | 1974-01-22 | Monsanto Co | Polymeric photosensitive compositions and methods using same |
US3857769A (en) * | 1973-11-08 | 1974-12-31 | Scm Corp | Photopolymerizable coating compositions and process for making same which contains a thioxanthone and an activated halogenated azine compound as sensitizers |
US3903322A (en) * | 1974-03-07 | 1975-09-02 | Continental Can Co | Photopolymerizable ethylenically unsaturated compounds photoinitiated with benzoyl derivatives of diphenyl sulfide and an organic amine compound |
US3966573A (en) * | 1974-10-31 | 1976-06-29 | Sun Chemical Corporation | Photopolymerization co-initiator systems |
-
1976
- 1976-12-24 DE DE19762658935 patent/DE2658935A1/de not_active Withdrawn
-
1977
- 1977-12-08 US US05/858,744 patent/US4134813A/en not_active Expired - Lifetime
- 1977-12-13 NL NL7713791A patent/NL7713791A/xx not_active Application Discontinuation
- 1977-12-21 BE BE183696A patent/BE862134A/xx unknown
- 1977-12-22 FR FR7738814A patent/FR2375256A1/fr not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
FR2375256A1 (fr) | 1978-07-21 |
DE2658935A1 (de) | 1978-07-06 |
BE862134A (fr) | 1978-06-21 |
US4134813A (en) | 1979-01-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BV | The patent application has lapsed |