NL7506133A - Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam - Google Patents

Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam

Info

Publication number
NL7506133A
NL7506133A NL7506133A NL7506133A NL7506133A NL 7506133 A NL7506133 A NL 7506133A NL 7506133 A NL7506133 A NL 7506133A NL 7506133 A NL7506133 A NL 7506133A NL 7506133 A NL7506133 A NL 7506133A
Authority
NL
Netherlands
Prior art keywords
ion beam
feed
frame
axis
housing containing
Prior art date
Application number
NL7506133A
Other languages
Dutch (nl)
Other versions
NL163668B (en
NL163668C (en
Original Assignee
Aita Konstantinovna Zaitseva
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aita Konstantinovna Zaitseva filed Critical Aita Konstantinovna Zaitseva
Priority to NL7506133A priority Critical patent/NL163668C/en
Publication of NL7506133A publication Critical patent/NL7506133A/en
Publication of NL163668B publication Critical patent/NL163668B/en
Application granted granted Critical
Publication of NL163668C publication Critical patent/NL163668C/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H01L21/67213—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The device housing has a window for ion beam passage, which can be covered by a door with sensors controlling the distribution of the ion current on target surface. The feed is mounted in a frame (35) which is rotatable, together with the feed, in the housing (26) about the frame long axis. The latter passes through the treated workpiece under an angle to the ion beam (3) axis, thus enabling the workpiece to be treated all round without changing the direction of the ion beam. In this manner the other parts and gears driving the feed and frame are kept away from the effective range of the ion beam. Preferably the feed is in the form of a drum (33) mounted on a hub (34) rotatably mounted in the frame.
NL7506133A 1975-05-26 1975-05-26 Device for machining parts using an ion beam. NL163668C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NL7506133A NL163668C (en) 1975-05-26 1975-05-26 Device for machining parts using an ion beam.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7506133A NL163668C (en) 1975-05-26 1975-05-26 Device for machining parts using an ion beam.

Publications (3)

Publication Number Publication Date
NL7506133A true NL7506133A (en) 1976-11-30
NL163668B NL163668B (en) 1980-04-15
NL163668C NL163668C (en) 1980-09-15

Family

ID=19823805

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7506133A NL163668C (en) 1975-05-26 1975-05-26 Device for machining parts using an ion beam.

Country Status (1)

Country Link
NL (1) NL163668C (en)

Also Published As

Publication number Publication date
NL163668B (en) 1980-04-15
NL163668C (en) 1980-09-15

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee