FR2316723A1 - Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam - Google Patents

Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam

Info

Publication number
FR2316723A1
FR2316723A1 FR7520942A FR7520942A FR2316723A1 FR 2316723 A1 FR2316723 A1 FR 2316723A1 FR 7520942 A FR7520942 A FR 7520942A FR 7520942 A FR7520942 A FR 7520942A FR 2316723 A1 FR2316723 A1 FR 2316723A1
Authority
FR
France
Prior art keywords
ion beam
feed
frame
axis
housing containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7520942A
Other languages
French (fr)
Other versions
FR2316723B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZAITSEVA AITA
Original Assignee
ZAITSEVA AITA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ZAITSEVA AITA filed Critical ZAITSEVA AITA
Priority to FR7520942A priority Critical patent/FR2316723A1/en
Publication of FR2316723A1 publication Critical patent/FR2316723A1/en
Application granted granted Critical
Publication of FR2316723B1 publication Critical patent/FR2316723B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/08—Holders for targets or for other objects to be irradiated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H01L21/67213—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)

Abstract

The device housing has a window for ion beam passage, which can be covered by a door with sensors controlling the distribution of the ion current on target surface. The feed is mounted in a frame (35) which is rotatable, together with the feed, in the housing (26) about the frame long axis. The latter passes through the treated workpiece under an angle to the ion beam (3) axis, thus enabling the workpiece to be treated all round without changing the direction of the ion beam. In this manner the other parts and gears driving the feed and frame are kept away from the effective range of the ion beam. Preferably the feed is in the form of a drum (33) mounted on a hub (34) rotatably mounted in the frame.
FR7520942A 1975-07-03 1975-07-03 Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam Granted FR2316723A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7520942A FR2316723A1 (en) 1975-07-03 1975-07-03 Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7520942A FR2316723A1 (en) 1975-07-03 1975-07-03 Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam

Publications (2)

Publication Number Publication Date
FR2316723A1 true FR2316723A1 (en) 1977-01-28
FR2316723B1 FR2316723B1 (en) 1978-12-22

Family

ID=9157476

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7520942A Granted FR2316723A1 (en) 1975-07-03 1975-07-03 Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam

Country Status (1)

Country Link
FR (1) FR2316723A1 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2221815A1 (en) * 1973-03-16 1974-10-11 Philips Nv

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2221815A1 (en) * 1973-03-16 1974-10-11 Philips Nv

Also Published As

Publication number Publication date
FR2316723B1 (en) 1978-12-22

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Legal Events

Date Code Title Description
ST Notification of lapse