NL219906A - - Google Patents
Info
- Publication number
- NL219906A NL219906A NL219906DA NL219906A NL 219906 A NL219906 A NL 219906A NL 219906D A NL219906D A NL 219906DA NL 219906 A NL219906 A NL 219906A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/42—Introducing metal atoms or metal-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/44—Preparation of metal salts or ammonium salts
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/46—Reaction with unsaturated dicarboxylic acids or anhydrides thereof, e.g. maleinisation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/20—Chemical modification of a polymer leading to a crosslinking, either explicitly or inherently
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US604006A US2902365A (en) | 1956-08-14 | 1956-08-14 | Photopolymerizable compositions and elements and process of making reliefs therefrom |
Publications (1)
Publication Number | Publication Date |
---|---|
NL219906A true NL219906A (zh) |
Family
ID=24417796
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL219906D NL219906A (zh) | 1956-08-14 | ||
NL219906A NL102156C (zh) | 1956-08-14 | 1957-08-14 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL219906A NL102156C (zh) | 1956-08-14 | 1957-08-14 |
Country Status (7)
Country | Link |
---|---|
US (1) | US2902365A (zh) |
BE (1) | BE560077A (zh) |
CH (1) | CH398075A (zh) |
DE (1) | DE1121928B (zh) |
FR (1) | FR1192207A (zh) |
GB (1) | GB825795A (zh) |
NL (2) | NL102156C (zh) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3014799A (en) * | 1955-12-20 | 1961-12-26 | Gerald Oster | Cross-linking of hydrocarbons |
US3070442A (en) * | 1958-07-18 | 1962-12-25 | Du Pont | Process for producing colored polymeric relief images and elements therefor |
DE1095665B (de) * | 1959-01-12 | 1960-12-22 | Hans Hoerner | Verfahren zur fotomechanischen Herstellung von Hochdruckformen aus mehreren Kunststoffschichten |
NL128039C (zh) * | 1959-07-01 | 1969-08-15 | ||
NL259795A (zh) * | 1960-01-08 | |||
BE599102A (zh) * | 1960-01-27 | |||
BE604100A (zh) * | 1960-06-03 | |||
US3147116A (en) * | 1961-11-28 | 1964-09-01 | Gen Aniline & Film Corp | Printing plates comprising hydrophobic resisto formed by crosslinking photopolymerized hydrophilic monomers with an isocyanate |
BE631588A (zh) * | 1962-04-27 | |||
BE635636A (zh) * | 1962-08-01 | |||
US3380827A (en) * | 1962-08-24 | 1968-04-30 | Bowles Eng Corp | Optical maching process |
DE1572153B2 (de) * | 1966-06-27 | 1971-07-22 | E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) | Fotopolymerisierbares aufzeichnungsmaterial |
BE788560A (fr) * | 1972-06-09 | 1973-03-08 | Du Pont | Protection contre le halo dans la formation d'images dans des photopolymeres en couches multiples |
JPS5236042B2 (zh) * | 1973-11-19 | 1977-09-13 | ||
JPS5917414B2 (ja) * | 1975-10-07 | 1984-04-21 | 村上スクリ−ン (株) | スクリ−ン版用感光性組成物及び感光膜 |
US4334970A (en) * | 1976-11-05 | 1982-06-15 | The Richardson Company | Radiation curable solvent-free compositions recovery system |
US4102683A (en) * | 1977-02-10 | 1978-07-25 | Rca Corp. | Nonreflecting photoresist process |
DE2846647A1 (de) * | 1978-10-26 | 1980-05-08 | Basf Ag | Photopolymerisierbare mischung fuer die herstellung von druck- und reliefformen |
JPS55118030A (en) * | 1979-03-06 | 1980-09-10 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
US4278753A (en) * | 1980-02-25 | 1981-07-14 | Horizons Research Incorporated | Plasma developable photoresist composition with polyvinyl formal binder |
JPS59226346A (ja) * | 1983-06-07 | 1984-12-19 | Fuotopori Ouka Kk | プリント回路の製造方法 |
NZ223177A (en) * | 1987-01-17 | 1990-01-29 | Nippon Paint Co Ltd | Water-developable photosensitive resin composition capable of hot melt molding and printing plate therefrom |
NZ223178A (en) * | 1987-01-17 | 1990-01-29 | Nippon Paint Co Ltd | Water-developable photosensitive resin composition capable of being hot melt molded, printing plates therefrom and methods of preparation |
EP0670521A1 (en) * | 1994-02-28 | 1995-09-06 | Toray Industries, Inc. | Photosensitive resin composition and process for producing the same |
US5753414A (en) * | 1995-10-02 | 1998-05-19 | Macdermid Imaging Technology, Inc. | Photopolymer plate having a peelable substrate |
EP1364367A2 (en) * | 2001-02-27 | 2003-11-26 | TDK Corporation | Method for producing photoresist master for optical information medium, and method for producing stamper for optical information medium |
BRPI0909424B1 (pt) * | 2008-03-27 | 2019-02-19 | Fujifilm Corporation | Processo para produção de uma placa de impressão litográfica |
CN115785553B (zh) * | 2022-12-23 | 2023-06-13 | 湖北力生电缆有限公司 | 一种交联聚乙烯绝缘电缆 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2367661A (en) * | 1941-12-31 | 1945-01-23 | Du Pont | Process of photopolymerization |
GB566795A (en) * | 1943-04-14 | 1945-01-15 | William Elliott Frew Gates | Improvements in and relating to the production of relief images |
US2413275A (en) * | 1943-08-27 | 1946-12-24 | Prophylactic Brush Co | Polyvinyl acetal maleates and method of making same |
GB618181A (en) * | 1946-10-30 | 1949-02-17 | Bakelite Ltd | Improvements in or relating to screens or stencils |
NL87862C (zh) * | 1951-08-20 | |||
US2787546A (en) * | 1955-02-08 | 1957-04-02 | Eastman Kodak Co | Light-sensitive photographic elements for photomechanical processes |
-
0
- NL NL219906D patent/NL219906A/xx unknown
-
1956
- 1956-08-14 US US604006A patent/US2902365A/en not_active Expired - Lifetime
-
1957
- 1957-08-08 GB GB25100/57A patent/GB825795A/en not_active Expired
- 1957-08-13 FR FR1192207D patent/FR1192207A/fr not_active Expired
- 1957-08-14 BE BE560077D patent/BE560077A/xx unknown
- 1957-08-14 DE DEP19115A patent/DE1121928B/de active Pending
- 1957-08-14 NL NL219906A patent/NL102156C/xx active
- 1957-08-14 CH CH4942557A patent/CH398075A/de unknown
Also Published As
Publication number | Publication date |
---|---|
DE1121928B (de) | 1962-01-11 |
US2902365A (en) | 1959-09-01 |
CH398075A (de) | 1965-08-31 |
NL102156C (zh) | 1962-03-15 |
GB825795A (en) | 1959-12-23 |
BE560077A (zh) | 1957-08-31 |
FR1192207A (fr) | 1959-10-23 |