JPS55118030A - Photopolymerizable composition - Google Patents

Photopolymerizable composition

Info

Publication number
JPS55118030A
JPS55118030A JP2575079A JP2575079A JPS55118030A JP S55118030 A JPS55118030 A JP S55118030A JP 2575079 A JP2575079 A JP 2575079A JP 2575079 A JP2575079 A JP 2575079A JP S55118030 A JPS55118030 A JP S55118030A
Authority
JP
Japan
Prior art keywords
substituted
photopolymerizable composition
compound
blended
photopolymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2575079A
Other languages
Japanese (ja)
Other versions
JPS626223B2 (en
Inventor
Teruo Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP2575079A priority Critical patent/JPS55118030A/en
Priority to GB8007123A priority patent/GB2045264B/en
Priority to DE19803008657 priority patent/DE3008657A1/en
Priority to US06/127,627 priority patent/US4258121A/en
Publication of JPS55118030A publication Critical patent/JPS55118030A/en
Publication of JPS626223B2 publication Critical patent/JPS626223B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Abstract

PURPOSE: To obtain a photopolymerizable composition of high sensitivity useful as a photosensitive layer of a photosensitive printing plate, a photoresist, etc. by blending a specified photopolymerization initiator into a photopolymerizable monomer having two or more ethylenic unsaturated groups.
CONSTITUTION: A compound represented by general formula I [where A is (substituted) arylene or (substituted) alkenylene and R is (substituted) alkyl or (substituted) aryl], e.g. the compound of formula II or III is used as a photopolymerization initiator. About 0.01W20, preferably 1W10wt% of the compound is blended into a monomer such as diethylene glycol methacrylate or methylene bisacrylamide having two or more polymerizable ethylenic unsaturated groups in one molecule to obtain a photopolymerizable composition. A linear organic polymer, a sensitizer, etc. may be blended.
COPYRIGHT: (C)1980,JPO&Japio
JP2575079A 1979-03-06 1979-03-06 Photopolymerizable composition Granted JPS55118030A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2575079A JPS55118030A (en) 1979-03-06 1979-03-06 Photopolymerizable composition
GB8007123A GB2045264B (en) 1979-03-06 1980-03-03 Photopolymerizable compositions containing ethylenic monomer
DE19803008657 DE3008657A1 (en) 1979-03-06 1980-03-06 PHOTOPOLYMERIZABLE MASSES
US06/127,627 US4258121A (en) 1979-03-06 1980-03-06 Photopolymerizable compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2575079A JPS55118030A (en) 1979-03-06 1979-03-06 Photopolymerizable composition

Publications (2)

Publication Number Publication Date
JPS55118030A true JPS55118030A (en) 1980-09-10
JPS626223B2 JPS626223B2 (en) 1987-02-09

Family

ID=12174499

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2575079A Granted JPS55118030A (en) 1979-03-06 1979-03-06 Photopolymerizable composition

Country Status (4)

Country Link
US (1) US4258121A (en)
JP (1) JPS55118030A (en)
DE (1) DE3008657A1 (en)
GB (1) GB2045264B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190947A (en) * 1982-04-08 1983-11-08 イ−ストマン　コダック　カンパニ− Composition for formation of radiant sensitive image
US5585218A (en) * 1993-06-02 1996-12-17 Sumitomo Chemical Company, Limited Photoresist composition containing alkyletherified polyvinylphenol
JP2010053121A (en) * 2008-07-30 2010-03-11 Sumitomo Chemical Co Ltd Acid generator for chemically amplified photoresist composition, method for producing the acid generator, and the chemically amplified photoresist composition
US11325368B2 (en) 2017-03-27 2022-05-10 Flint Group Germany Gmbh Method for producing pictorial relief structures

Families Citing this family (68)

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USRE31103E (en) * 1977-01-14 1982-12-14 Raychem Corporation Crosslinking agent for polymers and wire construction utilizing crosslinked polymers
CA1216998A (en) * 1980-09-10 1987-01-20 Donald P. Specht Photopolymerization compositions comprising amine- substituted photosensitizers and n-heterocyclic compounds bearing an n-oxy substituent
US4371605A (en) 1980-12-09 1983-02-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates
US4532332A (en) * 1981-08-17 1985-07-30 Ciba-Geigy Corporation N-(hydroxypolyoxaalkylene)phthalimides and succinimides and acrylate esters thereof
US4439517A (en) * 1982-01-21 1984-03-27 Ciba-Geigy Corporation Process for the formation of images with epoxide resin
US4425424A (en) 1982-04-08 1984-01-10 Eastman Kodak Company Dye-forming compositions
GB2120263B (en) * 1982-05-17 1985-07-31 Ciba Geigy Ag A process for curing acid-curable abrasive compositions
GB2127015A (en) * 1982-08-23 1984-04-04 Ici Plc N-substituted carbonate and sulphonate esters of N-hydroxy-1,8- naphthalimide
WO1984000888A1 (en) * 1982-09-01 1984-03-15 Univ Southern California Substituted n-benzenesulfonyloxyphthalimides
US4454218A (en) * 1982-09-13 1984-06-12 E. I. Du Pont De Nemours And Company N-Alkylindolylidene and N-alkylbenzo-thiazolylidene alkanones as sensitizers for photopolymer compositions
JPS59174831A (en) * 1983-03-24 1984-10-03 Fuji Photo Film Co Ltd Photopolymerizable composition
GB8413395D0 (en) * 1984-05-25 1984-07-04 Ciba Geigy Ag Production of images
US4737426A (en) * 1985-05-15 1988-04-12 Ciba-Geigy Corporation Cyclic acetals or ketals of beta-keto esters or amides
GB8512998D0 (en) * 1985-05-22 1985-06-26 Ciba Geigy Ag Production of images
DE3524808A1 (en) * 1985-07-11 1987-01-15 Ciba Geigy Ag METHOD FOR PRODUCING N-ALKYL- OR N-ARYLSULPHONYLOXYNAPHTHALIMIDES
DE3609318A1 (en) * 1986-03-20 1987-09-24 Basf Ag PHENANTHROIMIDAZOLE COMPOUNDS, METHOD FOR THEIR PRODUCTION AND THEIR USE
EP0388343B1 (en) * 1989-03-14 1996-07-17 International Business Machines Corporation Chemically amplified photoresist
JPH02148940U (en) * 1989-05-22 1990-12-18
EP0709410A3 (en) 1994-10-26 1997-03-26 Ocg Microelectronic Materials Polymers
JP3442176B2 (en) 1995-02-10 2003-09-02 富士写真フイルム株式会社 Photopolymerizable composition
US5593812A (en) * 1995-02-17 1997-01-14 International Business Machines Corporation Photoresist having increased sensitivity and use thereof
EP0778292A3 (en) * 1995-12-04 1998-11-04 Bayer Corporation Method for the production of anhydride modified polyvinyl acetals useful for photosensitive compositions
JP4130030B2 (en) 1999-03-09 2008-08-06 富士フイルム株式会社 Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative compound
US7410746B2 (en) * 2002-03-29 2008-08-12 Dai Nippon Printing Co., Ltd. Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition
JP4291638B2 (en) 2003-07-29 2009-07-08 富士フイルム株式会社 Alkali-soluble polymer and planographic printing plate precursor using the same
WO2005116776A1 (en) * 2004-05-26 2005-12-08 Jsr Corporation Resin composition for forming fine pattern and method for forming fine pattern
JP4452572B2 (en) 2004-07-06 2010-04-21 富士フイルム株式会社 Photosensitive composition and image recording method using the same
JP5089866B2 (en) 2004-09-10 2012-12-05 富士フイルム株式会社 Planographic printing method
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4474317B2 (en) 2005-03-31 2010-06-02 富士フイルム株式会社 Preparation method of lithographic printing plate
JP2006335826A (en) 2005-05-31 2006-12-14 Fujifilm Holdings Corp Ink composition for inkjet recording and method for manufacturing planographic printing plate using the same
JP5276264B2 (en) 2006-07-03 2013-08-28 富士フイルム株式会社 INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND METHOD FOR PRODUCING A lithographic printing plate
JP2008163081A (en) 2006-12-27 2008-07-17 Fujifilm Corp Laser-decomposable resin composition and pattern-forming material and laser-engravable flexographic printing plate precursor using the same
EP1952998B1 (en) 2007-02-01 2011-04-06 FUJIFILM Corporation Ink-jet recording device
EP1955858B1 (en) 2007-02-06 2014-06-18 FUJIFILM Corporation Ink-jet recording method and device
DE602008006279D1 (en) 2007-02-07 2011-06-01 Fujifilm Corp An ink jet recording apparatus having an ink jet printhead maintenance device and an ink jet printhead maintenance method
JP5227521B2 (en) 2007-02-26 2013-07-03 富士フイルム株式会社 Ink composition, ink jet recording method, printed matter, and ink set
JP5224699B2 (en) 2007-03-01 2013-07-03 富士フイルム株式会社 Ink composition, inkjet recording method, printed material, method for producing lithographic printing plate, and lithographic printing plate
JP5243072B2 (en) 2007-03-30 2013-07-24 富士フイルム株式会社 Ink composition, and image recording method and image recorded material using the same
JP5306681B2 (en) 2007-03-30 2013-10-02 富士フイルム株式会社 Polymerizable compound, polymer, ink composition, printed matter, and inkjet recording method
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US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
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JP2009214428A (en) * 2008-03-11 2009-09-24 Fujifilm Corp Original plate of lithographic printing plate and lithographic printing method
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JP7242673B2 (en) 2017-12-08 2023-03-20 フリント グループ ジャーマニー ゲーエムベーハー Method for identifying relief precursors for manufacturing relief structures
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NL219906A (en) * 1956-08-14
US3844790A (en) * 1972-06-02 1974-10-29 Du Pont Photopolymerizable compositions with improved resistance to oxygen inhibition
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190947A (en) * 1982-04-08 1983-11-08 イ−ストマン　コダック　カンパニ− Composition for formation of radiant sensitive image
US5585218A (en) * 1993-06-02 1996-12-17 Sumitomo Chemical Company, Limited Photoresist composition containing alkyletherified polyvinylphenol
JP2010053121A (en) * 2008-07-30 2010-03-11 Sumitomo Chemical Co Ltd Acid generator for chemically amplified photoresist composition, method for producing the acid generator, and the chemically amplified photoresist composition
US11325368B2 (en) 2017-03-27 2022-05-10 Flint Group Germany Gmbh Method for producing pictorial relief structures

Also Published As

Publication number Publication date
DE3008657A1 (en) 1980-09-11
GB2045264B (en) 1982-12-01
US4258121A (en) 1981-03-24
JPS626223B2 (en) 1987-02-09
GB2045264A (en) 1980-10-29

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