NL2002990A1 - Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method. - Google Patents

Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method. Download PDF

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Publication number
NL2002990A1
NL2002990A1 NL2002990A NL2002990A NL2002990A1 NL 2002990 A1 NL2002990 A1 NL 2002990A1 NL 2002990 A NL2002990 A NL 2002990A NL 2002990 A NL2002990 A NL 2002990A NL 2002990 A1 NL2002990 A1 NL 2002990A1
Authority
NL
Netherlands
Prior art keywords
lithographic apparatus
deposition
device manufacturing
multilayer mirror
uncapped
Prior art date
Application number
NL2002990A
Other languages
English (en)
Inventor
Maarten Van Herpen
Vadim Banine
Wouter Soer
Martin Jak
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2002990A1 publication Critical patent/NL2002990A1/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
NL2002990A 2008-06-30 2009-06-09 Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method. NL2002990A1 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7706608P 2008-06-30 2008-06-30
US13691008P 2008-10-14 2008-10-14

Publications (1)

Publication Number Publication Date
NL2002990A1 true NL2002990A1 (nl) 2009-12-31

Family

ID=41226930

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2002990A NL2002990A1 (nl) 2008-06-30 2009-06-09 Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method.

Country Status (7)

Country Link
US (2) US8405051B2 (nl)
JP (1) JP5380530B2 (nl)
KR (1) KR20110026497A (nl)
CN (1) CN102077142B (nl)
NL (1) NL2002990A1 (nl)
TW (1) TWI413871B (nl)
WO (1) WO2010006847A1 (nl)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2002990A1 (nl) * 2008-06-30 2009-12-31 Asml Netherlands Bv Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method.
CA2948551C (en) 2014-05-13 2020-07-14 Coelux S.R.L. Chromatic mirror, chromatic panel and applications thereof
DE102015207140A1 (de) 2015-04-20 2016-10-20 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
US9776218B2 (en) * 2015-08-06 2017-10-03 Asml Netherlands B.V. Controlled fluid flow for cleaning an optical element
US11347143B2 (en) * 2019-09-30 2022-05-31 Taiwan Semiconductor Manufacturing Company Ltd. Cleaning method, method for forming semiconductor structure and system thereof
WO2022161771A1 (en) * 2021-01-29 2022-08-04 Asml Netherlands B.V. Cleaning apparatus and method
WO2022233506A1 (en) * 2021-05-06 2022-11-10 Asml Netherlands B.V. Lithography apparatus and method

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US6614505B2 (en) 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
EP1394612B1 (en) 2002-08-27 2008-10-08 ASML Netherlands B.V. Lithographic projection apparatus and reflector assembly for use in said apparatus
EP1496521A1 (en) 2003-07-09 2005-01-12 ASML Netherlands B.V. Mirror and lithographic apparatus with mirror
EP1515188A1 (en) 2003-09-10 2005-03-16 ASML Netherlands B.V. Method for protecting an optical element, and optical element
US7355672B2 (en) * 2004-10-04 2008-04-08 Asml Netherlands B.V. Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
JP2006202671A (ja) 2005-01-24 2006-08-03 Ushio Inc 極端紫外光光源装置及び極端紫外光光源装置で発生するデブリの除去方法
DE202005003232U1 (de) 2005-03-01 2005-05-25 Judo Wasseraufbereitung Gmbh Vorrichtung zur Verbesserung des Raumklimas
DE102005032320B4 (de) * 2005-07-08 2007-10-31 Carl Zeiss Smt Ag Anordnung mit optischem Element und Reinigungsvorrichtung, Projektionsbelichtungsanlage für die Mikrolithographie, Reinigungsvorrichtung und Reinigungsverfahren
US7561247B2 (en) * 2005-08-22 2009-07-14 Asml Netherlands B.V. Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
US7462850B2 (en) * 2005-12-08 2008-12-09 Asml Netherlands B.V. Radical cleaning arrangement for a lithographic apparatus
US7518128B2 (en) * 2006-06-30 2009-04-14 Asml Netherlands B.V. Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned
US7473908B2 (en) * 2006-07-14 2009-01-06 Asml Netherlands B.V. Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
US7875863B2 (en) * 2006-12-22 2011-01-25 Asml Netherlands B.V. Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method
WO2009121385A1 (en) 2008-04-03 2009-10-08 Carl Zeiss Smt Ag Cleaning module and euv lithography device with cleaning module
NL2002990A1 (nl) * 2008-06-30 2009-12-31 Asml Netherlands Bv Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method.

Also Published As

Publication number Publication date
US20110117504A1 (en) 2011-05-19
WO2010006847A1 (en) 2010-01-21
KR20110026497A (ko) 2011-03-15
TWI413871B (zh) 2013-11-01
TW201007380A (en) 2010-02-16
JP5380530B2 (ja) 2014-01-08
JP2011526421A (ja) 2011-10-06
US8405051B2 (en) 2013-03-26
CN102077142A (zh) 2011-05-25
CN102077142B (zh) 2014-04-30
US8742381B2 (en) 2014-06-03
US20130161542A1 (en) 2013-06-27

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AD1A A request for search or an international type search has been filed
WDAP Patent application withdrawn

Effective date: 20100319