NL2002968A1 - Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby. - Google Patents
Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby. Download PDFInfo
- Publication number
- NL2002968A1 NL2002968A1 NL2002968A NL2002968A NL2002968A1 NL 2002968 A1 NL2002968 A1 NL 2002968A1 NL 2002968 A NL2002968 A NL 2002968A NL 2002968 A NL2002968 A NL 2002968A NL 2002968 A1 NL2002968 A1 NL 2002968A1
- Authority
- NL
- Netherlands
- Prior art keywords
- optical element
- apparatus including
- lithographic apparatus
- device manufacturing
- device manufactured
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7704808P | 2008-06-30 | 2008-06-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2002968A1 true NL2002968A1 (nl) | 2009-12-31 |
Family
ID=41464116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2002968A NL2002968A1 (nl) | 2008-06-30 | 2009-06-05 | Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby. |
Country Status (3)
Country | Link |
---|---|
US (1) | US8289499B2 (nl) |
JP (1) | JP4951032B2 (nl) |
NL (1) | NL2002968A1 (nl) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9402425B2 (en) * | 2013-03-15 | 2016-08-02 | Target Brands, Inc. | Garment for selectively supporting shields for expressing milk |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2791038B2 (ja) * | 1988-06-24 | 1998-08-27 | 株式会社日立製作所 | 分光器及びそれを用いた投影露光装置並びに投影露光方法 |
US5124859A (en) * | 1991-05-24 | 1992-06-23 | Gte Government Systems Corporation | Narrow bandpass reflective optical filter |
JPH11305034A (ja) * | 1998-04-22 | 1999-11-05 | Noritsu Koki Co Ltd | 光選択フィルタおよびこれを備えた光源装置 |
JP2000147660A (ja) * | 1998-11-06 | 2000-05-26 | Victor Co Of Japan Ltd | 光学装置 |
US6462876B1 (en) * | 1999-11-16 | 2002-10-08 | Agere Systems Guardian Corp. | Multi-wavelength etalon |
US6479195B1 (en) * | 2000-09-15 | 2002-11-12 | Intel Corporation | Mask absorber for extreme ultraviolet lithography |
AU2001286245A1 (en) * | 2000-09-19 | 2002-04-02 | Nikon Corporation | Exposure system, exposure method, and production method for device |
TWI240151B (en) * | 2000-10-10 | 2005-09-21 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
DE10127225A1 (de) * | 2001-05-22 | 2002-11-28 | Zeiss Carl | Ultraviolettlicht-Abschwächungsfilter |
JP2003195192A (ja) * | 2001-12-27 | 2003-07-09 | Mitsubishi Electric Corp | 分散補償器 |
JP2005268035A (ja) * | 2004-03-18 | 2005-09-29 | Canon Inc | Euv光源の評価用評価装置、およびそれを用いた評価方法 |
DK1743197T3 (da) * | 2004-04-23 | 2011-11-28 | Olivier M Parriaux | Højeffektivt optisk diffraktionsapparat |
US7196343B2 (en) * | 2004-12-30 | 2007-03-27 | Asml Netherlands B.V. | Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby |
US7453645B2 (en) * | 2004-12-30 | 2008-11-18 | Asml Netherlands B.V. | Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby |
US7250620B2 (en) * | 2005-01-20 | 2007-07-31 | Infineon Technologies Ag | EUV lithography filter |
JP2006215278A (ja) * | 2005-02-03 | 2006-08-17 | Matsushita Electric Ind Co Ltd | 光学素子および照明装置 |
NO322368B1 (no) * | 2005-04-15 | 2006-09-25 | Sinvent As | Infrarod deteksjon av gass - diffraktiv. |
US7336416B2 (en) * | 2005-04-27 | 2008-02-26 | Asml Netherlands B.V. | Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method |
JP2007298968A (ja) * | 2006-04-07 | 2007-11-15 | Fujitsu Ltd | 波長分散補償デバイス |
FR2899697B1 (fr) * | 2006-04-07 | 2009-11-27 | Commissariat Energie Atomique | Masque de photolitographie en extreme ultra-violet, avec couche d'arret resonante |
NL1036469A1 (nl) * | 2008-02-27 | 2009-08-31 | Asml Netherlands Bv | Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby. |
-
2009
- 2009-06-05 NL NL2002968A patent/NL2002968A1/nl not_active Application Discontinuation
- 2009-06-23 JP JP2009148144A patent/JP4951032B2/ja not_active Expired - Fee Related
- 2009-06-30 US US12/495,043 patent/US8289499B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP4951032B2 (ja) | 2012-06-13 |
US8289499B2 (en) | 2012-10-16 |
US20100002216A1 (en) | 2010-01-07 |
JP2010016371A (ja) | 2010-01-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1A | A request for search or an international type search has been filed | ||
WDAP | Patent application withdrawn |
Effective date: 20100319 |