NL188795C - Werkwijze voor het vervaardigen van een kwartsglas. - Google Patents

Werkwijze voor het vervaardigen van een kwartsglas.

Info

Publication number
NL188795C
NL188795C NLAANVRAGE8320410,A NL8320410A NL188795C NL 188795 C NL188795 C NL 188795C NL 8320410 A NL8320410 A NL 8320410A NL 188795 C NL188795 C NL 188795C
Authority
NL
Netherlands
Prior art keywords
manufacturing
quartz glass
quartz
glass
Prior art date
Application number
NLAANVRAGE8320410,A
Other languages
English (en)
Dutch (nl)
Other versions
NL8320410A (nl
Original Assignee
Suwa Seikosha Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP22819882A external-priority patent/JPS59116135A/ja
Priority claimed from JP17064483A external-priority patent/JPS6065733A/ja
Priority claimed from JP17064383A external-priority patent/JPS6065732A/ja
Priority claimed from JP23757783A external-priority patent/JPS60131833A/ja
Application filed by Suwa Seikosha Kk filed Critical Suwa Seikosha Kk
Publication of NL8320410A publication Critical patent/NL8320410A/nl
Application granted granted Critical
Publication of NL188795C publication Critical patent/NL188795C/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/34—Wet processes, e.g. sol-gel process adding silica powder
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/901—Liquid phase reaction process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
NLAANVRAGE8320410,A 1982-12-23 1983-12-22 Werkwijze voor het vervaardigen van een kwartsglas. NL188795C (nl)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP22819882 1982-12-23
JP22819882A JPS59116135A (ja) 1982-12-23 1982-12-23 石英ガラスの製造方法
JP17064483A JPS6065733A (ja) 1983-09-16 1983-09-16 石英ガラスの製造方法
JP17064383A JPS6065732A (ja) 1983-09-16 1983-09-16 石英ガラスの製造方法
JP17064383 1983-09-16
JP17064483 1983-09-16
JP23757783A JPS60131833A (ja) 1983-12-16 1983-12-16 石英ガラスの製造方法
JP23757783 1983-12-16
PCT/JP1983/000450 WO1984002519A1 (en) 1982-12-23 1983-12-22 Process for producing quartz glass
JP8300450 1983-12-22

Publications (2)

Publication Number Publication Date
NL8320410A NL8320410A (nl) 1984-11-01
NL188795C true NL188795C (nl) 1992-10-01

Family

ID=27474331

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE8320410,A NL188795C (nl) 1982-12-23 1983-12-22 Werkwijze voor het vervaardigen van een kwartsglas.

Country Status (8)

Country Link
US (2) US4681615A (xx)
EP (1) EP0131057B1 (xx)
DE (1) DE3390375T1 (xx)
GB (1) GB2140408B (xx)
HK (1) HK69589A (xx)
NL (1) NL188795C (xx)
SG (1) SG39588G (xx)
WO (1) WO1984002519A1 (xx)

Families Citing this family (88)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3390375T1 (de) * 1982-12-23 1985-02-07 Suwa Seikosha Co. Ltd., Tokio/Tokyo Verfahren zur Herstellung von Siliciumdioxidglas
GB2165233B (en) * 1984-10-04 1988-03-09 Suwa Seikosha Kk Method of making a tubular silica glass member
JPS6191024A (ja) * 1984-10-05 1986-05-09 Seiko Epson Corp 円筒状シリカ系ガラスの製造方法
GB2165534B (en) * 1984-10-05 1988-10-19 Suwa Seikosha Kk Method of preparing parent material for optical fibres
DE3535388C2 (de) * 1984-10-05 1995-01-26 Suwa Seikosha Kk Verfahren zur Herstellung von dotiertem Quarzglas
DE3546846C2 (de) * 1984-10-05 1995-01-26 Suwa Seikosha Kk Verfahren zur Herstellung von dotiertem Quarzglas
NL8403667A (nl) * 1984-12-03 1986-07-01 Philips Nv Werkwijze voor de vervaardiging van monolitische glaslichamen.
US4622056A (en) * 1985-02-13 1986-11-11 Seiko Epson Corporation Method of preparing silica glass
JPH07121813B2 (ja) * 1985-07-16 1995-12-25 セイコーエプソン株式会社 平板状石英ガラスの製造方法
DE3537972A1 (de) * 1985-10-25 1987-04-30 Philips Patentverwaltung Verfahren zur herstellung von rotationssymmetrischen glaskoerpern
US4759879A (en) * 1986-01-28 1988-07-26 The United States Of America As Represented By The United States Department Of Energy Glass former composition and method for immobilizing nuclear waste using the same
ES2059368T3 (es) * 1986-03-26 1994-11-16 Syntex Inc Reactivo liquido simple para ensayos.
FR2596909B1 (fr) * 1986-04-08 1993-05-07 Tech Nles Ste Gle Procede d'immobilisation de dechets nucleaires dans un verre borosilicate
US4816299A (en) * 1987-05-20 1989-03-28 Corning Glass Works Encapsulating compositions containing ultra-pure, fused-silica fillers
US4961767A (en) * 1987-05-20 1990-10-09 Corning Incorporated Method for producing ultra-high purity, optical quality, glass articles
US4789389A (en) * 1987-05-20 1988-12-06 Corning Glass Works Method for producing ultra-high purity, optical quality, glass articles
US4883521A (en) * 1987-09-30 1989-11-28 Shin-Etsu Chemical Co., Ltd. Method for the preparation of silica glass
EP0328715B1 (en) * 1988-02-19 1992-08-05 Tohru Yamamoto A catalyst for sol-gel method using metal alkoxide and sol-gel method using the same
JPH01317155A (ja) * 1988-03-04 1989-12-21 Mitsubishi Kasei Corp セラミック成形体の製造法
US5215942A (en) * 1988-08-15 1993-06-01 The Regents Of The University Of California Diamond-containing ceramic composites and methods of making same
JPH02124739A (ja) * 1988-10-31 1990-05-14 Shin Etsu Chem Co Ltd 合成石英ガラスおよびその製造方法
JPH02172830A (ja) * 1988-12-26 1990-07-04 Hoya Corp ガラスの製造方法
IT1230709B (it) * 1989-02-10 1991-10-29 Enichem Spa Procedimento per la preparazione di monoliti di aerogel di ossidi di metalli.
US5207814A (en) * 1989-02-10 1993-05-04 Enichem S.P.A. Process for preparing monoliths of aerogels of metal oxides
JPH02293333A (ja) * 1989-04-28 1990-12-04 Hoya Corp ガラスの製造方法
JPH02307830A (ja) * 1989-05-18 1990-12-21 Chisso Corp 石英ガラス粉末の製造方法
BE1004293A3 (fr) * 1989-07-20 1992-10-27 Solvay Procede de fabrication d'un composite d'oxydes metalliques, poudres composites d'oxydes metalliques et materiaux ceramiques.
JPH0393638A (ja) * 1989-09-04 1991-04-18 Shin Etsu Chem Co Ltd 合成石英ガラス粉の製造方法
US5011796A (en) * 1989-10-23 1991-04-30 Martin Marietta Corporation Sol-gel preparation of polycrystalline strontium barium niobate (SBN)
US5023208A (en) * 1989-12-19 1991-06-11 Orion Laboratories, Inc. Sol-gel process for glass and ceramic articles
US5063179A (en) * 1990-03-02 1991-11-05 Cabot Corporation Process for making non-porous micron-sized high purity silica
US4999699A (en) * 1990-03-14 1991-03-12 International Business Machines Corporation Solder interconnection structure and process for making
JPH068179B2 (ja) * 1990-04-12 1994-02-02 東京工業大学長 屈折率分布ガラスの製造方法
US5076980A (en) * 1990-08-01 1991-12-31 Geltech, Inc. Method of making sol-gel monoliths
US5221364A (en) * 1992-02-20 1993-06-22 The United States Of America As Represented By The Secretary Of The Air Force Lightweight solar cell
US5250096A (en) * 1992-04-07 1993-10-05 At&T Bell Laboratories Sol-gel method of making multicomponent glass
GB9209967D0 (en) * 1992-05-08 1992-06-24 S & D Developments Ltd Ceramic product
US5260962A (en) * 1992-05-29 1993-11-09 The United States Of America As Represented By The Secretary Of The Air Force Compact Lightweight ring laser gyro
DE19525277A1 (de) * 1995-07-13 1997-01-16 Forschungszentrum Juelich Gmbh Si0¶2¶-Körper für das C·4·-Verfahren
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KR100229884B1 (ko) * 1997-03-10 1999-11-15 윤종용 솔-젤법을 이용한 고순도 실리카 유리의 제조방법
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KR100230457B1 (ko) * 1997-10-02 1999-11-15 윤종용 실리카 글래스 조성물 및 이를 이용한 실리카 글래스 제조방법
DE19745045C1 (de) * 1997-10-11 1999-07-15 Schott Glas Verfahren zum Herstellen von Sinterglas- oder Sinterglaskeramik-Formkörpern als natursteinähnliche Bau- und Dekorationsmaterialien
CN1113044C (zh) 1997-10-29 2003-07-02 三星电子株式会社 石英玻璃组合物
IT1306214B1 (it) * 1998-09-09 2001-05-30 Gel Design And Engineering Srl Processo per la preparazione di film vetrosi spessi di ossido disilicio secondo la tecnica sol-gel e film spessi cosi' ottenuti.
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KR100549423B1 (ko) * 1999-03-17 2006-02-06 삼성전자주식회사 졸-겔 공정용 실리카 글래스의 제조방법
KR100549424B1 (ko) * 1999-03-17 2006-02-06 삼성전자주식회사 졸-겔 공정용 실리카 글래스 조성물
JP3503131B2 (ja) * 1999-06-03 2004-03-02 サンケン電気株式会社 半導体発光装置
KR100357638B1 (ko) 1999-08-31 2002-10-25 삼성전자 주식회사 실리카 솔의 초음파 분산 장치
US6383443B1 (en) * 1999-11-24 2002-05-07 Yazaki Corporation Sol-gel process for making monolithic alpha-alumina articles having controlled porosity
CN1315725C (zh) * 1999-12-28 2007-05-16 株式会社渡边商行 二氧化硅粒子、合成石英粉、合成石英玻璃的合成方法
KR100346175B1 (ko) * 1999-12-30 2002-07-26 삼성전자 주식회사 솔-젤 공법을 이용한 실리카 글래스의 제조 방법
KR100330212B1 (ko) * 2000-01-11 2002-03-25 윤종용 압출에 의한 도핑된 실리카 글래스 제조 방법
WO2001053225A1 (en) * 2000-01-24 2001-07-26 Yazaki Corporation Sol-gel process for producing synthetic silica glass
US6620368B1 (en) * 2000-07-13 2003-09-16 Simax Technologies, Inc. Sol-gel process for production of oxide-based glass and ceramic articles
US6679945B2 (en) 2000-08-21 2004-01-20 Degussa Ag Pyrogenically prepared silicon dioxide
US6669892B2 (en) 2000-12-18 2003-12-30 Rahul Ganguli Method for preventing warpage of gel plates during sintering
US20020157418A1 (en) * 2001-03-19 2002-10-31 Rahul Ganguli Process for reducing or eliminating bubble defects in sol-gel silica glass
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US7001568B2 (en) 2002-02-01 2006-02-21 Simax Technologies, Inc. Method of removing liquid from pores of a sol-gel monolith
US20040194511A1 (en) * 2002-02-01 2004-10-07 Chih-Hsing Cheng Sol-gel-derived halogen-doped glass
US20030147606A1 (en) * 2002-02-01 2003-08-07 Shiho Wang Sol-gel-based optical preforms and methods of manufacture
US6928220B2 (en) 2002-02-01 2005-08-09 Simax Technologies, Inc. Sol-gel-derived optical fiber preform and method of manufacture
ITNO20030001A1 (it) * 2003-01-15 2004-07-16 Novara Technology Srl Processo sol-gel per la produzione di articoli vetrosi.
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US20100003182A1 (en) * 2006-06-02 2010-01-07 Lorenzo Costa Pellitized silica
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ATE496011T1 (de) * 2008-08-08 2011-02-15 Orion Tech Anstalt Sol-gel verfahren zur herstellung von monolithischen gegenständen aus quarzglas
DE102009060768B4 (de) 2009-12-30 2012-02-02 Thomas Kreuzberger Verfahren zur Herstellung eines optischen Elements aus einem Gelkörper und Haltevorrichtung für einen Gelkörper
DE202010018292U1 (de) 2010-06-02 2015-07-14 Thomas Kreuzberger Quarzglaskörper und Gelbkörper zur Herstellung eines Quarzglaskörpers
PT106781A (pt) 2013-02-15 2014-08-18 Inst Superior Técnico Aerogéis híbridos flexíveis preparados em condições subcríticas e processo de preparação dos mesmos
DE102014113482B4 (de) 2014-09-18 2019-01-03 Bruker Daltonik Gmbh Ionisierungskammer mit temperierter Gaszufuhr
PL409679A1 (pl) * 2014-10-06 2016-04-11 Wrocławskie Centrum Badań Eit + Spółka Z Ograniczoną Odpowiedzialnością Sposób wytwarzania pianosilikatów z domieszkami o właściwościach magnetycznych oraz pianosilikat wytworzony tym sposobem
DE102015102858B4 (de) 2015-02-20 2019-04-18 Iqs Gmbh Verfahren zur Herstellung eines Licht absorbierenden Quarzglases
EP3124443A1 (de) 2015-07-28 2017-02-01 D. Swarovski KG Kontinuierliches sol-gel verfahren zur herstellung von quarzglas
EP3281920A1 (de) 2016-08-12 2018-02-14 D. Swarovski KG Kontinuierliches sol-gel-verfahren zur herstellung von silicathaltigen gläsern oder glaskeramiken
KR20220140537A (ko) 2020-02-14 2022-10-18 울트라제닉스 파마수티컬 인코포레이티드 Cdkl5 결핍 장애를 치료하기 위한 유전자 요법

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JPS5722130A (en) * 1980-07-15 1982-02-05 Hitachi Ltd Production of optical glass
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DE3390375T1 (de) * 1982-12-23 1985-02-07 Suwa Seikosha Co. Ltd., Tokio/Tokyo Verfahren zur Herstellung von Siliciumdioxidglas

Also Published As

Publication number Publication date
GB2140408A (en) 1984-11-28
EP0131057A1 (en) 1985-01-16
NL8320410A (nl) 1984-11-01
GB8418301D0 (en) 1984-08-22
EP0131057A4 (en) 1985-06-10
US4681615A (en) 1987-07-21
GB2140408B (en) 1987-03-18
HK69589A (en) 1989-09-08
EP0131057B1 (en) 1987-11-04
WO1984002519A1 (en) 1984-07-05
DE3390375C2 (xx) 1989-11-30
DE3390375T1 (de) 1985-02-07
SG39588G (en) 1989-01-27
US4801318A (en) 1989-01-31

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V4 Discontinued because of reaching the maximum lifetime of a patent

Effective date: 20031222