NL1036321A1 - Device control method and apparatus. - Google Patents
Device control method and apparatus. Download PDFInfo
- Publication number
- NL1036321A1 NL1036321A1 NL1036321A NL1036321A NL1036321A1 NL 1036321 A1 NL1036321 A1 NL 1036321A1 NL 1036321 A NL1036321 A NL 1036321A NL 1036321 A NL1036321 A NL 1036321A NL 1036321 A1 NL1036321 A1 NL 1036321A1
- Authority
- NL
- Netherlands
- Prior art keywords
- control method
- device control
- control
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/006—Electronic inspection or testing of displays and display drivers, e.g. of LED or LCD displays
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
- G09G3/3433—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices
- G09G3/346—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices based on modulation of the reflection angle, e.g. micromirrors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US829307P | 2007-12-20 | 2007-12-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL1036321A1 true NL1036321A1 (nl) | 2009-06-29 |
Family
ID=40898927
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL1036321A NL1036321A1 (nl) | 2007-12-20 | 2008-12-17 | Device control method and apparatus. |
Country Status (3)
Country | Link |
---|---|
US (1) | US8089672B2 (nl) |
JP (1) | JP2009152607A (nl) |
NL (1) | NL1036321A1 (nl) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5146696B2 (ja) * | 2010-03-03 | 2013-02-20 | Tdk株式会社 | 磁気センサ |
NL2006625A (en) | 2010-05-26 | 2011-11-29 | Asml Netherlands Bv | Illumination system and lithographic apparatus. |
US9175957B2 (en) * | 2012-09-24 | 2015-11-03 | Alces Technology, Inc. | Grayscale patterns from binary spatial light modulators |
US9335544B2 (en) * | 2013-03-15 | 2016-05-10 | Rit Wireless Ltd. | Electrostatically steerable actuator |
DE102014203041A1 (de) | 2014-02-19 | 2015-08-20 | Carl Zeiss Smt Gmbh | Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen |
US10451890B2 (en) | 2017-01-16 | 2019-10-22 | Cymer, Llc | Reducing speckle in an excimer light source |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5523193A (en) | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
EP0527166B1 (de) | 1990-05-02 | 1995-06-14 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Belichtungsvorrichtung |
US5229872A (en) | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
JPH06283404A (ja) * | 1993-03-26 | 1994-10-07 | Nec Corp | 縮小投影露光装置用のアパーチャ |
JPH09319008A (ja) * | 1996-05-29 | 1997-12-12 | Fuji Photo Film Co Ltd | 画像形成装置 |
ATE216091T1 (de) | 1997-01-29 | 2002-04-15 | Micronic Laser Systems Ab | Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl |
SE509062C2 (sv) | 1997-02-28 | 1998-11-30 | Micronic Laser Systems Ab | Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster |
JPH113849A (ja) * | 1997-06-12 | 1999-01-06 | Sony Corp | 可変変形照明フィルタ及び半導体露光装置 |
JPH11194749A (ja) * | 1998-01-05 | 1999-07-21 | Matsushita Electric Ind Co Ltd | 液晶表示装置とその駆動方法 |
JPH11218694A (ja) * | 1998-01-29 | 1999-08-10 | Nikon Corp | 露光光源装置及び露光光源制御方法 |
JPH11327516A (ja) * | 1998-05-13 | 1999-11-26 | Digital Electronics Corp | 表示装置 |
EP1046941B1 (en) * | 1999-04-21 | 2005-06-29 | Fuji Photo Film Co., Ltd. | Correcting method of light beam position in a scanning apparatus |
JP2001249649A (ja) * | 2000-03-08 | 2001-09-14 | Matsushita Electric Ind Co Ltd | 液晶表示装置の駆動方法 |
US7283112B2 (en) * | 2002-03-01 | 2007-10-16 | Microsoft Corporation | Reflective microelectrical mechanical structure (MEMS) optical modulator and optical display system |
JP2003302947A (ja) * | 2002-04-10 | 2003-10-24 | Seiko Epson Corp | 電気光学装置及びその駆動方法 |
US6666561B1 (en) * | 2002-10-28 | 2003-12-23 | Hewlett-Packard Development Company, L.P. | Continuously variable analog micro-mirror device |
JP2005091539A (ja) * | 2003-09-16 | 2005-04-07 | Fuji Photo Film Co Ltd | 画像記録方法および装置 |
US7446919B2 (en) * | 2004-04-30 | 2008-11-04 | Symbol Technologies, Inc. | Piezoelectric actuated scanning mirror |
JP4221346B2 (ja) * | 2004-09-06 | 2009-02-12 | Necディスプレイソリューションズ株式会社 | プロジェクタ |
US7289256B2 (en) * | 2004-09-27 | 2007-10-30 | Idc, Llc | Electrical characterization of interferometric modulators |
US7742016B2 (en) * | 2005-02-23 | 2010-06-22 | Pixtronix, Incorporated | Display methods and apparatus |
JP2006253487A (ja) * | 2005-03-11 | 2006-09-21 | Nikon Corp | 照明装置、投影露光方法、投影露光装置、及びマイクロデバイスの製造方法 |
US7283291B2 (en) * | 2005-04-08 | 2007-10-16 | The Boeing Company | High speed beam steering/field of view adjustment |
US7321416B2 (en) * | 2005-06-15 | 2008-01-22 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, device manufactured thereby, and controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion |
JP2007047638A (ja) * | 2005-08-12 | 2007-02-22 | Seiko Epson Corp | 画像表示装置及び光源装置 |
JP2007133006A (ja) * | 2005-11-08 | 2007-05-31 | Shinko Electric Ind Co Ltd | 露光機の故障検出装置 |
US7626181B2 (en) * | 2005-12-09 | 2009-12-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8052289B2 (en) * | 2006-06-07 | 2011-11-08 | Asml Netherlands B.V. | Mirror array for lithography |
JP4232834B2 (ja) * | 2007-03-07 | 2009-03-04 | セイコーエプソン株式会社 | アクチュエータ、光スキャナおよび画像形成装置 |
JP5374860B2 (ja) * | 2007-11-08 | 2013-12-25 | 株式会社ニコン | マイクロアクチュエータ及びその製造方法、マイクロアクチュエータアレー、マイクロアクチュエータ装置、光学デバイス、表示装置、露光装置、並びにデバイス製造方法 |
JP5172364B2 (ja) * | 2008-01-16 | 2013-03-27 | スタンレー電気株式会社 | 光偏向器 |
-
2008
- 2008-12-17 NL NL1036321A patent/NL1036321A1/nl active Search and Examination
- 2008-12-18 JP JP2008321885A patent/JP2009152607A/ja active Pending
- 2008-12-19 US US12/318,034 patent/US8089672B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2009152607A (ja) | 2009-07-09 |
US8089672B2 (en) | 2012-01-03 |
US20090190197A1 (en) | 2009-07-30 |
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AD1A | A request for search or an international type search has been filed |