NL1028342A1 - Keramisch glas met lage thermisch expansie. - Google Patents
Keramisch glas met lage thermisch expansie.Info
- Publication number
- NL1028342A1 NL1028342A1 NL1028342A NL1028342A NL1028342A1 NL 1028342 A1 NL1028342 A1 NL 1028342A1 NL 1028342 A NL1028342 A NL 1028342A NL 1028342 A NL1028342 A NL 1028342A NL 1028342 A1 NL1028342 A1 NL 1028342A1
- Authority
- NL
- Netherlands
- Prior art keywords
- thermal expansion
- low thermal
- ceramic glass
- ceramic
- glass
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
- C03C10/0027—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents containing SiO2, Al2O3, Li2O as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0036—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
- C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/005—Other surface treatment of glass not in the form of fibres or filaments by irradiation by atoms
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Ceramic Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Mechanical Engineering (AREA)
- Glass Compositions (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004008824A DE102004008824B4 (de) | 2004-02-20 | 2004-02-20 | Glaskeramik mit geringer Wärmeausdehnung sowie deren Verwendung |
DE102004008824 | 2004-02-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
NL1028342A1 true NL1028342A1 (nl) | 2005-08-23 |
NL1028342C2 NL1028342C2 (nl) | 2007-07-17 |
Family
ID=34832984
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL1028342A NL1028342C2 (nl) | 2004-02-20 | 2005-02-18 | Keramisch glas met lage thermische expansie. |
Country Status (5)
Country | Link |
---|---|
US (1) | US7220690B2 (nl) |
JP (1) | JP4504835B2 (nl) |
CN (1) | CN1657462B (nl) |
DE (1) | DE102004008824B4 (nl) |
NL (1) | NL1028342C2 (nl) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7118449B1 (en) * | 2004-09-20 | 2006-10-10 | Carl Zeiss Smt Ag | Method of manufacturing an optical element |
JP4933863B2 (ja) * | 2005-10-25 | 2012-05-16 | 株式会社オハラ | 結晶化ガラスおよび結晶化ガラスの製造方法 |
US7875565B1 (en) * | 2006-05-31 | 2011-01-25 | Corning Incorporated | Transparent glass-ceramic armor |
JP4977406B2 (ja) * | 2006-06-06 | 2012-07-18 | 株式会社オハラ | 結晶化ガラス及び結晶化ガラスの製造方法 |
DE102007044064A1 (de) * | 2006-09-14 | 2008-03-27 | Carl Zeiss Smt Ag | Verfahren zum Herstellen einer Spiegelanordnung für die Halbleiterlithographie und Spiegelanordnung zur Reflexion elektromagnetischer Strahlung |
JP5070006B2 (ja) * | 2007-11-02 | 2012-11-07 | 株式会社オハラ | 結晶化ガラス |
JP2010135732A (ja) * | 2008-08-01 | 2010-06-17 | Asahi Glass Co Ltd | Euvマスクブランクス用基板 |
DE102008040964B4 (de) * | 2008-08-04 | 2010-07-15 | Carl Zeiss Smt Ag | Entfernen reflektierender Schichten von EUV-Spiegeln |
DE102008039042B4 (de) | 2008-08-21 | 2011-04-14 | Schott Ag | Substrat für einen Spiegelträger mit reduziertem Gewicht sowie Spiegel mit gewichtsreduziertem Spiegelträger |
JP2012181220A (ja) * | 2009-07-02 | 2012-09-20 | Asahi Glass Co Ltd | ArFリソグラフィ用ミラー、およびArFリソグラフィ用光学部材 |
WO2011020690A2 (en) * | 2009-08-07 | 2011-02-24 | Carl Zeiss Smt Gmbh | Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure apparatus for microlithography, and projection exposure apparatus |
DE102010002188B4 (de) * | 2010-02-22 | 2018-11-08 | Schott Ag | Transparente LAS-Glaskeramik hergestellt mit alternativen umweltfreundlichen Läutermitteln |
EP2364957A1 (en) * | 2010-02-26 | 2011-09-14 | Corning Incorporated | Glass ceramics with bulk scattering properties and methods of making them |
DE102010028488A1 (de) * | 2010-05-03 | 2011-11-03 | Carl Zeiss Smt Gmbh | Substrate für Spiegel für die EUV-Lithographie und deren Herstellung |
CN102385143B (zh) * | 2011-10-18 | 2013-06-19 | 北京空间机电研究所 | 一种微晶低温镜头及其相机 |
DE102012201075A1 (de) * | 2012-01-25 | 2013-07-25 | Carl Zeiss Smt Gmbh | Optische Anordnung, EUV-Lithographieanlage und Verfahren zum Konfigurieren einer optischen Anordnung |
KR102055992B1 (ko) | 2012-03-28 | 2019-12-13 | 호야 가부시키가이샤 | 마스크 블랭크용 기판, 다층 반사막 부착 기판, 투과형 마스크 블랭크, 반사형 마스크 블랭크, 투과형 마스크, 반사형 마스크 및 반도체 장치의 제조 방법 |
US9822983B2 (en) | 2012-05-31 | 2017-11-21 | Bsh Home Appliances Corporation | Self-cleaning household appliance having a range door with a full glass inner surface |
KR101570968B1 (ko) * | 2012-11-20 | 2015-11-23 | 코닝정밀소재 주식회사 | 유기 발광소자용 기판, 그 제조방법 및 이를 구비하는 유기 발광소자 |
KR101878164B1 (ko) * | 2012-12-28 | 2018-07-13 | 호야 가부시키가이샤 | 마스크 블랭크용 기판, 다층 반사막 부착 기판, 반사형 마스크 블랭크, 반사형 마스크, 마스크 블랭크용 기판의 제조방법 및 다층 반사막 부착 기판의 제조방법, 그리고 반도체 장치의 제조방법 |
KR101858947B1 (ko) | 2013-08-30 | 2018-05-17 | 호야 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크 블랭크의 제조방법, 반사형 마스크 및 반도체 장치의 제조방법 |
JP2015110508A (ja) * | 2013-10-31 | 2015-06-18 | 株式会社オハラ | 結晶化ガラス |
CN105829259A (zh) | 2013-12-22 | 2016-08-03 | 应用材料公司 | 用于紫外线光刻的玻璃陶瓷及其制造方法 |
JP7038473B2 (ja) * | 2014-02-21 | 2022-03-18 | ショット アクチエンゲゼルシャフト | 高均一性ガラスセラミック素子 |
JP5767357B1 (ja) * | 2014-03-26 | 2015-08-19 | Hoya株式会社 | マスクブランク用基板、マスクブランク及び転写用マスク、並びにそれらの製造方法 |
JP2014144915A (ja) * | 2014-04-28 | 2014-08-14 | Ohara Inc | 結晶化ガラス |
DE102016209359A1 (de) * | 2016-05-31 | 2017-11-30 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
US10626046B2 (en) | 2016-10-12 | 2020-04-21 | Corning Incorporated | Glass ceramics |
DE102018111144A1 (de) * | 2017-05-26 | 2018-11-29 | Schott Ag | Präzisionskomponente |
KR102373824B1 (ko) * | 2017-09-06 | 2022-03-15 | 삼성전자주식회사 | 조리장치 및 그 제조방법 |
CN115073008A (zh) | 2021-03-16 | 2022-09-20 | 肖特股份有限公司 | 具有特定热膨胀特性的玻璃陶瓷 |
JP2024511363A (ja) | 2021-03-16 | 2024-03-13 | ショット アクチエンゲゼルシャフト | 特定の熱膨張挙動を示すeuvl精密部品 |
DE102022118025A1 (de) | 2022-07-19 | 2024-01-25 | Schott Ag | Heiß-Füge-Prozess zur Herstellung von komplexen Leichtgewichtsstrukturen |
DE102022123616A1 (de) | 2022-09-15 | 2024-03-21 | Schott Ag | Glaskeramik mit spezifischem thermischen Ausdehnungsverhalten |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3514275A (en) * | 1965-10-18 | 1970-05-26 | Owens Illinois Inc | Lightweight telescope mirror blank product and process of producing the same from glass |
DE1902432B2 (de) * | 1967-07-01 | 1976-10-14 | Jenaer Glaswerk Schott & Gen., 6500 Mainz | Transparente glaskeramiken mit einem thermischen ausdehnungskoeffizienten von 0 + 1,5 mal 10 hoch -7 /grad c der im bereich von -30 bis + 70 grad c wenig temperaturabhaengig ist |
US4192688A (en) * | 1972-07-07 | 1980-03-11 | Owens-Illinois, Inc. | Product and process for forming same |
GB2159514B (en) * | 1984-05-23 | 1987-12-02 | Zeiss Stiftung | Glass ceramic with specific thermal expansion behaviour |
IL84383A (en) | 1987-11-06 | 1994-08-26 | Kyro Oy | Apparatus for cutting glass blanks |
FR2657079B1 (fr) * | 1990-01-12 | 1993-04-09 | Corning France | Verres precurseurs de vitroceramiques, procede de conversion de ces verres en vitroceramiques a dilation tres faible ou nulle et vitroceramiques obtenues. |
US5508235A (en) * | 1994-07-06 | 1996-04-16 | Schott Glass Technologies, Inc. | Cladding glass ceramic for use in high powered lasers |
JP2668057B2 (ja) * | 1994-09-13 | 1997-10-27 | 株式会社オハラ | 低膨張透明ガラスセラミックス |
JP3219705B2 (ja) * | 1996-11-14 | 2001-10-15 | 株式会社オハラ | 磁気情報記憶媒体用ガラスセラミックス基板 |
JPH10212135A (ja) * | 1997-01-29 | 1998-08-11 | Ohara Inc | 熱膨張係数が連続的に変化している部分を有するガラスセラミックス |
US5968857A (en) * | 1997-03-31 | 1999-10-19 | Corning Incorporated | Glass-ceramics |
JP2883328B2 (ja) * | 1997-05-27 | 1999-04-19 | 株式会社オハラ | 磁気ヘッド浮上量測定用模擬ディスク |
JP4298822B2 (ja) * | 1997-12-22 | 2009-07-22 | 株式会社オハラ | 発光性ガラスセラミックス |
JP3311308B2 (ja) * | 1998-03-03 | 2002-08-05 | 株式会社オハラ | 垂直磁気記録媒体用ガラスセラミックス基板 |
DE19939787C2 (de) * | 1999-08-21 | 2003-11-27 | Schott Glas | Transparente, mit Vanadiumoxid-Zusatz dunkel einfärbbare Glaskeramik mit Hochquarz-Mischkristallen als vorherrschende Kristallphase, Verfahren zu ihrer Herstellung und ihre Verwendung |
JP2001150452A (ja) * | 1999-11-25 | 2001-06-05 | Ohara Inc | 樹脂成形用型及びその製造方法 |
DE10110225C2 (de) * | 2001-03-02 | 2003-07-17 | Schott Glas | Glaskeramisches Trägermaterial, Verfahren zu seiner Herstellung und seine Verwendung |
DE10139188A1 (de) * | 2001-08-16 | 2003-03-06 | Schott Glas | Glaskeramik für röntgenoptische Komponenten |
US20030125184A1 (en) * | 2001-12-21 | 2003-07-03 | Schott Glas | Glass ceramic product with variably adjustable zero crossing of the CTE-T curve |
-
2004
- 2004-02-20 DE DE102004008824A patent/DE102004008824B4/de not_active Expired - Lifetime
-
2005
- 2005-02-07 US US11/052,581 patent/US7220690B2/en active Active
- 2005-02-18 JP JP2005041577A patent/JP4504835B2/ja active Active
- 2005-02-18 NL NL1028342A patent/NL1028342C2/nl active Search and Examination
- 2005-02-21 CN CN2005100525744A patent/CN1657462B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN1657462B (zh) | 2011-04-13 |
CN1657462A (zh) | 2005-08-24 |
NL1028342C2 (nl) | 2007-07-17 |
JP4504835B2 (ja) | 2010-07-14 |
US20050197242A1 (en) | 2005-09-08 |
DE102004008824B4 (de) | 2006-05-04 |
US7220690B2 (en) | 2007-05-22 |
DE102004008824A1 (de) | 2005-09-08 |
JP2005231994A (ja) | 2005-09-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1A | A request for search or an international type search has been filed | ||
RD2N | Patents in respect of which a decision has been taken or a report has been made (novelty report) |
Effective date: 20070313 |
|
PD2B | A search report has been drawn up |