NL1012490A1 - Werkwijze en toestel voor analyse van dunne lagen met röntgen-fluorescentie. - Google Patents

Werkwijze en toestel voor analyse van dunne lagen met röntgen-fluorescentie.

Info

Publication number
NL1012490A1
NL1012490A1 NL1012490A NL1012490A NL1012490A1 NL 1012490 A1 NL1012490 A1 NL 1012490A1 NL 1012490 A NL1012490 A NL 1012490A NL 1012490 A NL1012490 A NL 1012490A NL 1012490 A1 NL1012490 A1 NL 1012490A1
Authority
NL
Netherlands
Prior art keywords
thin layer
ray fluorescence
layer analysis
analysis
fluorescence
Prior art date
Application number
NL1012490A
Other languages
English (en)
Other versions
NL1012490C2 (nl
Inventor
Peter Nico Brouwer
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Publication of NL1012490A1 publication Critical patent/NL1012490A1/nl
Application granted granted Critical
Publication of NL1012490C2 publication Critical patent/NL1012490C2/nl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
NL1012490A 1998-07-16 1999-07-02 Werkwijze en toestel voor analyse van dunne lagen met röntgen-fluorescentie. NL1012490C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98202383 1998-07-16
EP98202383 1998-07-16

Publications (2)

Publication Number Publication Date
NL1012490A1 true NL1012490A1 (nl) 1999-09-29
NL1012490C2 NL1012490C2 (nl) 2004-07-15

Family

ID=8233936

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1012490A NL1012490C2 (nl) 1998-07-16 1999-07-02 Werkwijze en toestel voor analyse van dunne lagen met röntgen-fluorescentie.

Country Status (4)

Country Link
US (1) US6173037B1 (nl)
JP (1) JP3820049B2 (nl)
DE (1) DE19931298B4 (nl)
NL (1) NL1012490C2 (nl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112924437A (zh) * 2019-12-06 2021-06-08 核工业西南物理研究院 一种激光诱导击穿光谱绝对定量分析方法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1076222A1 (en) * 1999-08-10 2001-02-14 Corus Aluminium Walzprodukte GmbH X-ray fluorescence measurement of aluminium sheet thickness
DE10050116A1 (de) * 1999-10-21 2001-04-26 Koninkl Philips Electronics Nv Verfahren und Vorrichtung zum Untersuchen einer Probe mit Hilfe von Röntgenfluoreszenzanalyse
US6704390B2 (en) * 2000-05-29 2004-03-09 Vladimir Kogan X-ray analysis apparatus provided with a multilayer mirror and an exit collimator
JP2002031522A (ja) * 2000-07-18 2002-01-31 Seiko Instruments Inc 蛍光ｘ線膜厚計
DE10159828B4 (de) * 2001-12-06 2007-09-20 Rigaku Industrial Corporation, Takatsuki Röntgenfluoreszenzspektrometer
US6891158B2 (en) * 2002-12-27 2005-05-10 Revera Incorporated Nondestructive characterization of thin films based on acquired spectrum
EP1579170B1 (en) * 2002-12-27 2010-11-03 Physical Electronics, Inc. Nondestructive characterization of thin films using measured basis spectra and/or based on acquired spectrum
JP3784371B2 (ja) * 2003-01-08 2006-06-07 松下電器産業株式会社 シリサイド存在比率の測定方法、熱処理温度の測定方法、半導体装置の製造方法およびｘ線受光素子
GB0321039D0 (en) * 2003-09-09 2003-10-08 Council Cent Lab Res Councils Ionising particle analyser
JP2006132945A (ja) * 2004-11-02 2006-05-25 Sii Nanotechnology Inc 蛍光ｘ線分析装置の検出下限モニタ
US7796726B1 (en) * 2006-02-14 2010-09-14 University Of Maryland, Baltimore County Instrument and method for X-ray diffraction, fluorescence, and crystal texture analysis without sample preparation
BRPI1003905A2 (pt) * 2010-01-21 2013-02-26 Universidade Federal Da Bahia mÉtodo para monitorar degradaÇço estrutural e falhas em materiais e dispositivo sensor
JP5907375B2 (ja) 2011-12-28 2016-04-26 株式会社テクノエックス 蛍光ｘ線分析装置及び蛍光ｘ線分析方法
KR20230136741A (ko) * 2021-02-26 2023-09-26 엔브이 베카에르트 에스에이 코팅에서의 화학 원소의 함량을 측정하는 방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58223047A (ja) * 1982-06-18 1983-12-24 Sumitomo Metal Ind Ltd 螢光ｘ線分析方法
JPH0660879B2 (ja) * 1984-05-10 1994-08-10 理学電機工業株式会社 被膜の厚みと組成の同時分析法
JPH0712206B2 (ja) * 1984-10-01 1995-02-08 日本放送協会 映像信号処理用基本装置
US4764945A (en) * 1984-10-05 1988-08-16 Kawasaki Steel Corp. Method of measuring layer thickness and composition of alloy plating
JPS61195335A (ja) * 1985-02-25 1986-08-29 Shimadzu Corp 薄層の定量分析方法
JPS62137552A (ja) * 1985-12-11 1987-06-20 Seiko Instr & Electronics Ltd 合金メツキ付着量計
US4959848A (en) * 1987-12-16 1990-09-25 Axic Inc. Apparatus for the measurement of the thickness and concentration of elements in thin films by means of X-ray analysis
US5081658A (en) * 1989-03-30 1992-01-14 Nkk Corporation Method of measuring plating amount and plating film composition of plated steel plate and apparatus therefor
JPH02302654A (ja) * 1989-05-17 1990-12-14 Nkk Corp ２層メッキ鋼板のメッキ付着量およびメッキ被膜組成の測定方法およびその測定装置
DE4021617C2 (de) * 1990-07-06 1993-12-02 Kugelfischer G Schaefer & Co Vorrichtung zum kontinuierlichen Messen des Eisengehaltes in Zinkschichten
JP2706601B2 (ja) * 1991-10-18 1998-01-28 理学電機工業株式会社 蛍光ｘ線分析方法および装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112924437A (zh) * 2019-12-06 2021-06-08 核工业西南物理研究院 一种激光诱导击穿光谱绝对定量分析方法
CN112924437B (zh) * 2019-12-06 2023-02-21 核工业西南物理研究院 一种激光诱导击穿光谱绝对定量分析方法

Also Published As

Publication number Publication date
JP3820049B2 (ja) 2006-09-13
DE19931298A1 (de) 2000-02-17
NL1012490C2 (nl) 2004-07-15
JP2000046765A (ja) 2000-02-18
DE19931298B4 (de) 2007-05-03
US6173037B1 (en) 2001-01-09

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Legal Events

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AD1A A request for search or an international type search has been filed
CD Transfer of rights (laid open patent application)

Owner name: PANALYTIC B.V.

RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20040513

PD2B A search report has been drawn up
MM Lapsed because of non-payment of the annual fee

Effective date: 20150801