MX2009013010A - Recalentador del horno de estirado de cristal con al menos una abertura. - Google Patents
Recalentador del horno de estirado de cristal con al menos una abertura.Info
- Publication number
- MX2009013010A MX2009013010A MX2009013010A MX2009013010A MX2009013010A MX 2009013010 A MX2009013010 A MX 2009013010A MX 2009013010 A MX2009013010 A MX 2009013010A MX 2009013010 A MX2009013010 A MX 2009013010A MX 2009013010 A MX2009013010 A MX 2009013010A
- Authority
- MX
- Mexico
- Prior art keywords
- afterheater
- crystal pulling
- opening
- pulling furnace
- ribbon crystal
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/007—Pulling on a substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1036—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die]
- Y10T117/1044—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die] including means forming a flat shape [e.g., ribbon]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
Abstract
Un horno de estirado de cristal cinta tiene un interior para delimitar al menos una porción de uno o más cristales cinta, y un recalentador colocado dentro del interior; el recalentador tiene por lo menos una pared con una o más aberturas que facilitan el control del perfil de temperatura dentro del horno.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US94401707P | 2007-06-14 | 2007-06-14 | |
PCT/US2008/066860 WO2008157313A1 (en) | 2007-06-14 | 2008-06-13 | Ribbon crystal pulling furnace afterheater with at least one opening |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2009013010A true MX2009013010A (es) | 2010-01-20 |
Family
ID=39643160
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2009013011A MX2009013011A (es) | 2007-06-14 | 2008-06-13 | Control termico desmontable para hornos de estirado de cristal cinta. |
MX2009013010A MX2009013010A (es) | 2007-06-14 | 2008-06-13 | Recalentador del horno de estirado de cristal con al menos una abertura. |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2009013011A MX2009013011A (es) | 2007-06-14 | 2008-06-13 | Control termico desmontable para hornos de estirado de cristal cinta. |
Country Status (9)
Country | Link |
---|---|
US (2) | US8328932B2 (es) |
EP (2) | EP2152941A1 (es) |
JP (2) | JP2010529941A (es) |
KR (2) | KR20100021630A (es) |
CN (2) | CN101755076B (es) |
CA (2) | CA2701822A1 (es) |
MX (2) | MX2009013011A (es) |
MY (2) | MY149060A (es) |
WO (2) | WO2008157313A1 (es) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110155045A1 (en) * | 2007-06-14 | 2011-06-30 | Evergreen Solar, Inc. | Controlling the Temperature Profile in a Sheet Wafer |
US20140083349A1 (en) * | 2012-09-21 | 2014-03-27 | Max Era, Inc. | Removable thermal control for ribbon crystal pulling furnaces |
CN106498488B (zh) * | 2016-10-28 | 2019-04-02 | 同济大学 | 同时生长多种掺杂CaF2晶体的装置及基于该装置的制备方法 |
CN107513767B (zh) * | 2017-09-25 | 2020-02-07 | 常州大学 | 一种适用于多晶硅垂直生长机构的温度梯度产生装置及使用方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3265469A (en) * | 1964-09-21 | 1966-08-09 | Gen Electric | Crystal growing apparatus |
US4116641A (en) | 1976-04-16 | 1978-09-26 | International Business Machines Corporation | Apparatus for pulling crystal ribbons from a truncated wedge shaped die |
JPS5371689A (en) | 1976-12-08 | 1978-06-26 | Agency Of Ind Science & Technol | Manufacturing apparatus for band type silicon crystal |
US4118197A (en) * | 1977-01-24 | 1978-10-03 | Mobil Tyco Solar Energy Corp. | Cartridge and furnace for crystal growth |
US4158038A (en) | 1977-01-24 | 1979-06-12 | Mobil Tyco Solar Energy Corporation | Method and apparatus for reducing residual stresses in crystals |
JPS54128988A (en) | 1978-03-31 | 1979-10-05 | Toshiba Corp | Preparation of single crystal |
US4235848A (en) | 1978-06-15 | 1980-11-25 | Apilat Vitaly Y | Apparatus for pulling single crystal from melt on a seed |
IN154501B (es) * | 1980-03-10 | 1984-11-03 | Mobil Tyco Solar Energy Corp | |
US4267010A (en) * | 1980-06-16 | 1981-05-12 | Mobil Tyco Solar Energy Corporation | Guidance mechanism |
US4627887A (en) * | 1980-12-11 | 1986-12-09 | Sachs Emanuel M | Melt dumping in string stabilized ribbon growth |
US4443411A (en) * | 1980-12-15 | 1984-04-17 | Mobil Solar Energy Corporation | Apparatus for controlling the atmosphere surrounding a crystal growth zone |
US4356152A (en) * | 1981-03-13 | 1982-10-26 | Rca Corporation | Silicon melting crucible |
JPS6163593A (ja) * | 1984-09-05 | 1986-04-01 | Toshiba Corp | 化合物半導体単結晶の製造装置 |
JPS62113793A (ja) | 1985-11-13 | 1987-05-25 | Toshiba Corp | 帯状シリコン結晶の製造装置 |
DE3743951A1 (de) | 1986-12-26 | 1988-07-07 | Toshiba Ceramics Co | Einrichtung zum ziehen von siliziumeinkristallen mit einem waermeisolierzylinder und verfahren zur herstellung des materials desselben |
JPH09175892A (ja) | 1995-10-27 | 1997-07-08 | Japan Energy Corp | 単結晶の製造方法 |
JPH10251090A (ja) * | 1997-03-12 | 1998-09-22 | Mitsubishi Heavy Ind Ltd | 酸化物単結晶およびその育成方法 |
JP2001122696A (ja) * | 1999-10-21 | 2001-05-08 | Matsushita Seiko Co Ltd | リボンシリコンウェハの製造方法 |
DE60316337T2 (de) | 2002-10-18 | 2008-06-05 | Evergreen Solar Inc., Marlborough | Verfahren und vorrichtung zur kristallzüchtung |
US6814802B2 (en) * | 2002-10-30 | 2004-11-09 | Evergreen Solar, Inc. | Method and apparatus for growing multiple crystalline ribbons from a single crucible |
EP1851367B1 (de) * | 2005-02-03 | 2012-08-08 | Rec Scanwafer AS | Verfahren und vorrichtung zum herstellen gerichtet erstarrter blöcke aus halbleitermaterialien |
US20080134964A1 (en) * | 2006-12-06 | 2008-06-12 | Evergreen Solar, Inc. | System and Method of Forming a Crystal |
US8790460B2 (en) | 2009-05-18 | 2014-07-29 | Empire Technology Development Llc | Formation of silicon sheets by impinging fluid |
-
2008
- 2008-06-13 JP JP2010512374A patent/JP2010529941A/ja active Pending
- 2008-06-13 EP EP08770964A patent/EP2152941A1/en not_active Withdrawn
- 2008-06-13 US US12/138,799 patent/US8328932B2/en not_active Expired - Fee Related
- 2008-06-13 WO PCT/US2008/066860 patent/WO2008157313A1/en active Application Filing
- 2008-06-13 MX MX2009013011A patent/MX2009013011A/es unknown
- 2008-06-13 CN CN2008800186107A patent/CN101755076B/zh not_active Expired - Fee Related
- 2008-06-13 JP JP2010512375A patent/JP5314009B2/ja not_active Expired - Fee Related
- 2008-06-13 CN CN200880018611A patent/CN101715496A/zh active Pending
- 2008-06-13 US US12/138,791 patent/US8293007B2/en not_active Expired - Fee Related
- 2008-06-13 MY MYPI20095070A patent/MY149060A/en unknown
- 2008-06-13 KR KR1020097026951A patent/KR20100021630A/ko not_active Application Discontinuation
- 2008-06-13 CA CA2701822A patent/CA2701822A1/en not_active Abandoned
- 2008-06-13 CA CA2701825A patent/CA2701825A1/en not_active Abandoned
- 2008-06-13 MY MYPI20095068A patent/MY162987A/en unknown
- 2008-06-13 WO PCT/US2008/066865 patent/WO2008154654A1/en active Application Filing
- 2008-06-13 EP EP08770969A patent/EP2152942A1/en not_active Withdrawn
- 2008-06-13 MX MX2009013010A patent/MX2009013010A/es unknown
- 2008-06-13 KR KR1020097026953A patent/KR20100019536A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
MX2009013011A (es) | 2010-01-20 |
EP2152942A1 (en) | 2010-02-17 |
KR20100019536A (ko) | 2010-02-18 |
CN101755076A (zh) | 2010-06-23 |
CA2701825A1 (en) | 2008-12-24 |
WO2008154654A1 (en) | 2008-12-18 |
KR20100021630A (ko) | 2010-02-25 |
MY162987A (en) | 2017-07-31 |
JP5314009B2 (ja) | 2013-10-16 |
CN101715496A (zh) | 2010-05-26 |
CN101755076B (zh) | 2013-07-17 |
JP2010529941A (ja) | 2010-09-02 |
US8328932B2 (en) | 2012-12-11 |
US20080308035A1 (en) | 2008-12-18 |
CA2701822A1 (en) | 2008-12-18 |
EP2152941A1 (en) | 2010-02-17 |
US8293007B2 (en) | 2012-10-23 |
WO2008157313A1 (en) | 2008-12-24 |
US20080308034A1 (en) | 2008-12-18 |
JP2010529942A (ja) | 2010-09-02 |
MY149060A (en) | 2013-07-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
HH | Correction or change in general |