MX167504B - Esteres dibasicos para limpiar circuitos electronicos - Google Patents
Esteres dibasicos para limpiar circuitos electronicosInfo
- Publication number
- MX167504B MX167504B MX014837A MX1483789A MX167504B MX 167504 B MX167504 B MX 167504B MX 014837 A MX014837 A MX 014837A MX 1483789 A MX1483789 A MX 1483789A MX 167504 B MX167504 B MX 167504B
- Authority
- MX
- Mexico
- Prior art keywords
- electronic circuits
- dibasic esters
- cleaning electronic
- composition
- residue
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title 1
- 239000002253 acid Substances 0.000 abstract 1
- 230000001804 emulsifying effect Effects 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2093—Esters; Carbonates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/024—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/032—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Detergent Compositions (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
La presente invención se refiere a un método para separar residuos orgánicos de una superficie contaminada, que comprende: a) poner en contacto la superficie con una composición que comprende cuando menos un éster de ácido dibásico y de 0 a aproximadamente 40 por ciento en peso de un agente tensioactivo emulsificador apropiado; b) dejar que continua el contacto durante un tiempo suficiente para solubilizar el residuo; y c) separar la composición y el residuo solubilizado, de la superficie.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15363788A | 1988-02-08 | 1988-02-08 | |
US07/305,897 US4934391A (en) | 1988-02-08 | 1989-02-02 | Dibasic esters for cleaning electronic circuits |
Publications (1)
Publication Number | Publication Date |
---|---|
MX167504B true MX167504B (es) | 1993-03-25 |
Family
ID=23182844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX014837A MX167504B (es) | 1988-02-08 | 1989-02-08 | Esteres dibasicos para limpiar circuitos electronicos |
Country Status (6)
Country | Link |
---|---|
US (1) | US4934391A (es) |
JP (1) | JPH04503079A (es) |
AU (1) | AU3428789A (es) |
CA (1) | CA1321335C (es) |
MX (1) | MX167504B (es) |
WO (1) | WO1990008603A1 (es) |
Families Citing this family (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5120371A (en) * | 1990-11-29 | 1992-06-09 | Petroferm Inc. | Process of cleaning soldering flux and/or adhesive tape with terpenet and monobasic ester |
US5062988A (en) * | 1989-08-07 | 1991-11-05 | E. I. Du Pont De Nemours And Company | Cleaning composition of dibasic ester, hydrocarbon solvent and compatibilizing component |
US5084200A (en) * | 1989-08-07 | 1992-01-28 | E. I. Du Pont De Nemours And Company | Cleaning composition of dibasic ester, hydrocarbon solvent, compatibilizing surfactant and water |
US5011620A (en) * | 1989-08-07 | 1991-04-30 | E. I. Du Pont De Nemours And Company | Cleaning composition of dibasic ester and hydrocarbon solvent |
JP2789046B2 (ja) * | 1989-11-08 | 1998-08-20 | 荒川化学工業株式会社 | ロジン系ハンダフラックスの洗浄剤 |
US5330582A (en) * | 1989-11-08 | 1994-07-19 | Arakawa Chemical Industries, Ltd. | Method for cleaning rosin-base solder flux |
SG48276A1 (en) * | 1990-03-16 | 1998-04-17 | Japan Field Kk | Cleaning method and cleaning apparatus |
US5300154A (en) * | 1990-08-14 | 1994-04-05 | Bush Boake Allen Limited | Methods for cleaning articles |
US5096501A (en) * | 1990-08-27 | 1992-03-17 | E. I. Du Pont De Nemours & Company | Environmentally safe cleaning process and cleaning composition useful therein |
DE4034765A1 (de) * | 1990-11-02 | 1992-05-07 | Schwegmann Bernd Gmbh Co Kg | Reinigungs- und regenerierungsmittel mit verbesserten chemisch-technischen eigenschaften sowie guenstiger umweltvertraeglichkeit |
US5080722A (en) * | 1991-02-26 | 1992-01-14 | At&T Bell Laboratories | Method for cleaning electrical connectors |
DE4116580A1 (de) * | 1991-05-21 | 1992-11-26 | Henkel Kgaa | Verwendung von fettsaeure-2-ethylhexylestern als kaltreinigungsmittel |
US5196136A (en) * | 1991-06-20 | 1993-03-23 | E. I. Du Pont De Nemours And Company | Cleaning composition of hydrocarbon component, surfactant and multibasic ester additive |
US5238504A (en) * | 1991-09-27 | 1993-08-24 | Advanced Research Technologies | Use of terpene hydrocarbons and ketone blends for electrical contact cleaning |
US5354492A (en) * | 1992-09-04 | 1994-10-11 | Cook Composites And Polymers Company | Aqueous cleaning solutions for removing uncured urethane resin systems from the surfaces of processing equipment |
US5288332A (en) * | 1993-02-05 | 1994-02-22 | Honeywell Inc. | A process for removing corrosive by-products from a circuit assembly |
US5415800A (en) * | 1993-06-09 | 1995-05-16 | Motsenbocker; Gregg | Cleanser for releasing adherent deposits from surfaces |
USRE35976E (en) * | 1993-10-29 | 1998-12-01 | Baldwin Graphic Systems, Inc. | Pre-packaged, pre-soaked cleaning system and method for making the same |
US5368157A (en) * | 1993-10-29 | 1994-11-29 | Baldwin Graphic Systems, Inc. | Pre-packaged, pre-soaked cleaning system and method for making the same |
US20020185157A1 (en) * | 1994-11-30 | 2002-12-12 | Engel Peter Goth | Method of cleaning screen printing frames |
US5604193A (en) * | 1994-12-08 | 1997-02-18 | Dotolo Research Corporation | Adhesive and enamel remover, and method of use with d-limonene, dibasic ester, an N-methyl pyrrolidone |
CN1096942C (zh) * | 1995-05-01 | 2002-12-25 | 鲍德温·格拉菲克***有限公司 | 就地浸渍和印刷机上浸渍清洁***及其使用方法 |
EP0741034B1 (en) * | 1995-05-01 | 2002-04-17 | Baldwin Graphic Systems, Inc | Cleaning system and process for making same employing reduced air cleaning fabric |
ATE255157T1 (de) * | 1995-05-18 | 2003-12-15 | Textil Color Ag | Zusammensetzung zum waschen und reinigen von textilmaterialien |
US6035483A (en) * | 1995-06-07 | 2000-03-14 | Baldwin Graphic Systems, Inc. | Cleaning system and process for making and using same employing a highly viscous solvent |
WO1997024409A1 (en) * | 1995-12-28 | 1997-07-10 | Eco Solutions Limited | Aqueous composition for plasticising paint prior to strip |
US5814163A (en) * | 1996-09-09 | 1998-09-29 | Macdermid, Incorporated | Composition and process for cleaning inks form various surfaces including printing plates |
JP2946030B2 (ja) * | 1996-09-11 | 1999-09-06 | 株式会社色素オオタ・オータス | サーマルヘッド感熱性スクリーン印刷用孔版原紙及び該孔版原紙を用いた製版方法 |
GB9716273D0 (en) | 1997-07-31 | 1997-10-08 | Kimberly Clark Ltd | Hand cleanser |
PT1000138E (pt) * | 1997-07-31 | 2004-01-30 | Du Pont | Microemulsoes aquosas |
US6165962A (en) * | 1997-07-31 | 2000-12-26 | E. I. Du Pont De Nemours And Comapny | Aqueous microemulsions |
US5916857A (en) * | 1997-11-17 | 1999-06-29 | Federal Service & Supply, Inc. | Cleaning composition for removing viscid resinous organic matter |
WO1999047614A2 (en) | 1998-03-19 | 1999-09-23 | Eco Solutions Limited | Aqueous composition for removing coatings |
US5958149A (en) | 1998-09-17 | 1999-09-28 | S. C. Johnson & Son, Inc. | Method of cleaning surfaces, composition suitable for use in the method, and of preparing the composition |
EP1147067A4 (en) * | 1998-11-25 | 2002-10-09 | Petroferm Inc | AQUEOUS CLEANING COMPOSITION |
FR2799765B1 (fr) * | 1999-10-19 | 2003-01-03 | Chim 92 | Solution pour le nettoyage d'ecrans de serigraphie |
DE60012767T2 (de) * | 1999-10-19 | 2005-08-25 | Chim 92 | Reinigungsmittel, verfahren zur reinigung von siebdruckschablonen und vorrichtung zur reinigung |
US6743828B1 (en) * | 2000-01-03 | 2004-06-01 | Harvey Katz | Reduction in polystyrene foams with dibasic esters |
US6422246B1 (en) * | 2000-02-29 | 2002-07-23 | United Microelectronics Corp. | Method removing residual photoresist |
US6929702B1 (en) | 2000-10-02 | 2005-08-16 | Gregg Motsenbocker | Compositions and methods for releasing adherent deposits from surfaces and substrates |
US6800141B2 (en) * | 2001-12-21 | 2004-10-05 | International Business Machines Corporation | Semi-aqueous solvent based method of cleaning rosin flux residue |
DE102005041533B3 (de) * | 2005-08-31 | 2007-02-08 | Atotech Deutschland Gmbh | Lösung und Verfahren zum Entfernen von ionischen Verunreinigungen von einem Werkstück |
GB0605157D0 (en) * | 2006-03-15 | 2006-04-26 | Gramos Applied Ltd | Decontaminant formulations |
US7468345B2 (en) * | 2006-09-29 | 2008-12-23 | Eco Holdings, Llc | Graffiti cleaning solution including a non-aqueous concentrate and diluted aqueous solution |
FR2918994B1 (fr) * | 2007-07-20 | 2012-10-19 | Rhodia Operations | Formulations de diesters d'acide carboxylique et leur utilisation pour le traitement de materiaux. |
JP2011520009A (ja) * | 2008-05-09 | 2011-07-14 | ローディア・オペラシオン | 環境保護型溶媒を導入した清浄組成物及び使用方法 |
US8222194B2 (en) * | 2008-05-09 | 2012-07-17 | Rhodia Operations | Cleaning compositions incorporating green solvents and methods for use |
FR2941462B1 (fr) * | 2009-01-23 | 2013-07-05 | Rhodia Operations | Composition decapante |
SG173172A1 (en) | 2009-01-28 | 2011-08-29 | Advanced Tech Materials | Lithographic tool in situ clean formulations |
US8771925B2 (en) * | 2009-08-25 | 2014-07-08 | Eastman Kodak Company | Flexographic processing solution and method of use |
BR112012009201A2 (pt) * | 2009-10-19 | 2016-08-16 | Rhodia Operations | sistemas de limpeza autoemulsionantes e métodos de uso |
CA2818736A1 (en) * | 2010-11-22 | 2012-05-31 | Rhodia Operations | Dilutable cleaning compositions and methods for use |
MX2013006410A (es) | 2010-12-10 | 2013-12-02 | Rhodia Operations | Esteres dibasicos utilizados como co-solventes de terpeno, sustituidos y/o portadores en aplicaciones de limpieza de arena alquitranada/bitumen asfalteno. |
AU2013249359B2 (en) | 2012-04-17 | 2016-09-22 | Rhodia Operations | Polysaccharide slurries with environmentally friendly activator solvents |
WO2015108872A1 (en) | 2014-01-16 | 2015-07-23 | Elevance Renewable Sciences, Inc. | Olefinic ester compositions and their use as cleaning agents |
CN115287125A (zh) * | 2022-06-15 | 2022-11-04 | 湖北三赢兴光电科技股份有限公司 | 一种感光芯片清洗液及其制备方法和应用 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5457700A (en) * | 1977-10-18 | 1979-05-09 | Toray Industries | Heat transfer electric insulating sheet |
JPS55157700A (en) * | 1979-05-28 | 1980-12-08 | Ube Industries | Cleaning agent |
EP0166522B1 (en) * | 1984-05-24 | 1991-07-24 | Pegel, Karl Heinrich | Cosmetic preparation |
US4780235A (en) * | 1987-04-16 | 1988-10-25 | E. I. Du Pont De Nemours And Company | Paint remover |
-
1989
- 1989-02-02 US US07/305,897 patent/US4934391A/en not_active Expired - Lifetime
- 1989-02-07 CA CA000590306A patent/CA1321335C/en not_active Expired - Fee Related
- 1989-02-08 MX MX014837A patent/MX167504B/es unknown
- 1989-02-27 JP JP1504657A patent/JPH04503079A/ja active Pending
- 1989-02-27 WO PCT/US1989/000484 patent/WO1990008603A1/en unknown
- 1989-02-27 AU AU34287/89A patent/AU3428789A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO1990008603A1 (en) | 1990-08-09 |
AU3428789A (en) | 1990-08-24 |
US4934391A (en) | 1990-06-19 |
CA1321335C (en) | 1993-08-17 |
JPH04503079A (ja) | 1992-06-04 |
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